CN1048956C - 二次结晶超细白炭黑的制法 - Google Patents
二次结晶超细白炭黑的制法 Download PDFInfo
- Publication number
- CN1048956C CN1048956C CN96104972A CN96104972A CN1048956C CN 1048956 C CN1048956 C CN 1048956C CN 96104972 A CN96104972 A CN 96104972A CN 96104972 A CN96104972 A CN 96104972A CN 1048956 C CN1048956 C CN 1048956C
- Authority
- CN
- China
- Prior art keywords
- carbon black
- white carbon
- acid
- making
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 79
- 239000006229 carbon black Substances 0.000 title claims abstract description 39
- 238000002425 crystallisation Methods 0.000 title claims abstract description 28
- 230000008025 crystallization Effects 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 title claims abstract 3
- 238000000034 method Methods 0.000 claims abstract description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000013078 crystal Substances 0.000 claims abstract description 19
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000003756 stirring Methods 0.000 claims abstract description 10
- 238000005406 washing Methods 0.000 claims abstract description 9
- 239000004115 Sodium Silicate Substances 0.000 claims abstract description 8
- 229910052911 sodium silicate Inorganic materials 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 239000002253 acid Substances 0.000 claims description 22
- 239000007864 aqueous solution Substances 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 14
- 239000000377 silicon dioxide Substances 0.000 claims description 14
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 9
- 239000011707 mineral Substances 0.000 claims description 9
- 235000019353 potassium silicate Nutrition 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- 229960001866 silicon dioxide Drugs 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 7
- 239000000243 solution Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 238000004062 sedimentation Methods 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 238000000889 atomisation Methods 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 claims description 4
- 230000036632 reaction speed Effects 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 239000002826 coolant Substances 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 239000007900 aqueous suspension Substances 0.000 claims 1
- 239000006194 liquid suspension Substances 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 150000007522 mineralic acids Chemical class 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 238000001816 cooling Methods 0.000 abstract description 4
- 239000000725 suspension Substances 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 238000001694 spray drying Methods 0.000 abstract description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 235000010755 mineral Nutrition 0.000 description 5
- 235000011167 hydrochloric acid Nutrition 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- DPDMMXDBJGCCQC-UHFFFAOYSA-N [Na].[Cl] Chemical compound [Na].[Cl] DPDMMXDBJGCCQC-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012716 precipitator Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005486 sulfidation Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN96104972A CN1048956C (zh) | 1996-05-14 | 1996-05-14 | 二次结晶超细白炭黑的制法 |
| PCT/CN1997/000047 WO1997043213A1 (fr) | 1996-05-14 | 1997-05-14 | Particules de silice spongieuse et procede pour leur preparation |
| AU27618/97A AU725033B2 (en) | 1996-05-14 | 1997-05-14 | Spongy silica particles and method for preparing the same |
| DE69727971T DE69727971T2 (de) | 1996-05-14 | 1997-05-14 | Verfahren zu herstellung schwammartiger kieselsäureteilchen |
| EP97921583A EP0959041B1 (en) | 1996-05-14 | 1997-05-14 | Method for preparing spongy silica particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN96104972A CN1048956C (zh) | 1996-05-14 | 1996-05-14 | 二次结晶超细白炭黑的制法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1165113A CN1165113A (zh) | 1997-11-19 |
| CN1048956C true CN1048956C (zh) | 2000-02-02 |
Family
ID=5118654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN96104972A Expired - Lifetime CN1048956C (zh) | 1996-05-14 | 1996-05-14 | 二次结晶超细白炭黑的制法 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0959041B1 (OSRAM) |
| CN (1) | CN1048956C (OSRAM) |
| AU (1) | AU725033B2 (OSRAM) |
| DE (1) | DE69727971T2 (OSRAM) |
| WO (1) | WO1997043213A1 (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1631777B (zh) * | 2004-11-11 | 2010-09-29 | 孙晓珑 | 纳米二氧化硅粉体及其原位颗粒生成制造方法 |
| US20090084035A1 (en) * | 2007-09-28 | 2009-04-02 | General Electric Company | Polygeneration systems |
| CN101830474B (zh) * | 2010-05-17 | 2012-01-11 | 浙江建业化工股份有限公司 | 白炭黑的制备方法 |
| CN102120582B (zh) * | 2011-01-25 | 2014-09-10 | 泉州师范学院 | 搅拌磨法沉淀白炭黑的反应工艺 |
| CN103043610B (zh) * | 2011-10-12 | 2015-06-17 | 北京华宇同方化工科技开发有限公司 | 一种水解法处理四氯化硅的方法和系统 |
| CN104760963A (zh) * | 2015-04-02 | 2015-07-08 | 确成硅化学股份有限公司 | 利用三氧化硫烟气制备二氧化硅的方法 |
| CN106315593A (zh) * | 2016-07-25 | 2017-01-11 | 汪承源 | 一种超微孔纳米SiO2的制法 |
| CN108033453A (zh) * | 2017-12-06 | 2018-05-15 | 安徽凤阳赛吉元无机材料有限公司 | 一种改性沉淀法白炭黑的制备方法 |
| CN113015698A (zh) * | 2018-11-13 | 2021-06-22 | 日铁化学材料株式会社 | 半导体密封材料用二氧化硅球形颗粒 |
| CN111892080B (zh) * | 2020-08-07 | 2022-03-29 | 河南大学 | 一种石墨烯与氧化锡空心球复合纳米材料的制备方法 |
| CN116924421B (zh) * | 2023-07-31 | 2025-09-12 | 福建远翔新材料股份有限公司 | 一种高比表面积中度吸油值的摩擦剂的产生方法 |
| CN117720112B (zh) * | 2023-12-14 | 2024-08-06 | 华沃德源环境技术(济南)有限公司 | 利用制药副产醋酸制备白炭黑联产醋酸钠的方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5014639A (OSRAM) * | 1973-05-15 | 1975-02-15 | ||
| JPS5228755A (en) * | 1975-08-29 | 1977-03-03 | Matsushita Electric Ind Co Ltd | Heat exchanger |
| JPS601606A (ja) * | 1983-06-20 | 1985-01-07 | Victor Co Of Japan Ltd | 録音回路 |
| CN86104402A (zh) * | 1985-06-27 | 1987-01-28 | 日东化学工业株式会社 | 高纯度二氧化硅的制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3928540A (en) * | 1971-07-26 | 1975-12-23 | Ppg Industries Inc | Process for preparing silica pigment |
| CA947946A (en) * | 1971-07-27 | 1974-05-28 | National Research Council Of Canada | Preparation of reinforcing amorphous silica |
| JP2799773B2 (ja) * | 1993-09-29 | 1998-09-21 | ローヌ−プーラン シミ | 沈降シリカ |
| FR2710630B1 (fr) * | 1993-09-29 | 1995-12-29 | Rhone Poulenc Chimie | Nouvelles silices précipitées, leur procédé de préparation et leur utilisation au renforcement des élastomères. |
| JP2908253B2 (ja) * | 1994-09-26 | 1999-06-21 | 日本化学工業株式会社 | 水和珪酸とその製造方法 |
-
1996
- 1996-05-14 CN CN96104972A patent/CN1048956C/zh not_active Expired - Lifetime
-
1997
- 1997-05-14 EP EP97921583A patent/EP0959041B1/en not_active Expired - Lifetime
- 1997-05-14 WO PCT/CN1997/000047 patent/WO1997043213A1/zh not_active Ceased
- 1997-05-14 AU AU27618/97A patent/AU725033B2/en not_active Expired
- 1997-05-14 DE DE69727971T patent/DE69727971T2/de not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5014639A (OSRAM) * | 1973-05-15 | 1975-02-15 | ||
| JPS5228755A (en) * | 1975-08-29 | 1977-03-03 | Matsushita Electric Ind Co Ltd | Heat exchanger |
| JPS601606A (ja) * | 1983-06-20 | 1985-01-07 | Victor Co Of Japan Ltd | 録音回路 |
| CN86104402A (zh) * | 1985-06-27 | 1987-01-28 | 日东化学工业株式会社 | 高纯度二氧化硅的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0959041B1 (en) | 2004-03-03 |
| WO1997043213A1 (fr) | 1997-11-20 |
| AU2761897A (en) | 1997-12-05 |
| CN1165113A (zh) | 1997-11-19 |
| EP0959041A1 (en) | 1999-11-24 |
| DE69727971D1 (de) | 2004-04-08 |
| DE69727971T2 (de) | 2005-03-17 |
| EP0959041A4 (OSRAM) | 1999-11-24 |
| AU725033B2 (en) | 2000-10-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20000202 |
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| EXPY | Termination of patent right or utility model |