CN104885333A - 智能rf透镜效应:高效、动态和移动无线功率传输 - Google Patents

智能rf透镜效应:高效、动态和移动无线功率传输 Download PDF

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CN104885333A
CN104885333A CN201380069301.3A CN201380069301A CN104885333A CN 104885333 A CN104885333 A CN 104885333A CN 201380069301 A CN201380069301 A CN 201380069301A CN 104885333 A CN104885333 A CN 104885333A
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radiant body
equipment
lens
radiant
electromagnetic
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CN104885333B (zh
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考希克·森古普塔
赛义德·阿里·哈吉米里
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California Institute of Technology CalTech
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q21/00—Antenna arrays or systems
    • H01Q21/06—Arrays of individually energised antenna units similarly polarised and spaced apart
    • H01Q21/22—Antenna units of the array energised non-uniformly in amplitude or phase, e.g. tapered array or binomial array
    • H01Q21/225—Finite focus antenna arrays
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/20—Circuit arrangements or systems for wireless supply or distribution of electric power using microwaves or radio frequency waves
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/20—Circuit arrangements or systems for wireless supply or distribution of electric power using microwaves or radio frequency waves
    • H02J50/23—Circuit arrangements or systems for wireless supply or distribution of electric power using microwaves or radio frequency waves characterised by the type of transmitting antennas, e.g. directional array antennas or Yagi antennas
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/40—Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/40—Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices
    • H02J50/402—Circuit arrangements or systems for wireless supply or distribution of electric power using two or more transmitting or receiving devices the two or more transmitting or the two or more receiving devices being integrated in the same unit, e.g. power mats with several coils or antennas with several sub-antennas
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/80—Circuit arrangements or systems for wireless supply or distribution of electric power involving the exchange of data, concerning supply or distribution of electric power, between transmitting devices and receiving devices
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/90—Circuit arrangements or systems for wireless supply or distribution of electric power involving detection or optimisation of position, e.g. alignment
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02J—CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER; SYSTEMS FOR STORING ELECTRIC ENERGY
    • H02J50/00—Circuit arrangements or systems for wireless supply or distribution of electric power
    • H02J50/60—Circuit arrangements or systems for wireless supply or distribution of electric power responsive to the presence of foreign objects, e.g. detection of living beings

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Aerials With Secondary Devices (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)

Abstract

RF透镜包括大量辐射体，该大量辐射体适于发送其相位被调制为使辐射的功率集中于小的空间容积中以便给位于该空间中的电子设备供电的射频电磁EM波。因此，致使由辐射体发射的波在该空间中相长干涉。大量辐射体可选择地形成于一维或二维阵列中。由辐射体辐射的电磁波具有相同的频率但可变的振幅。

Description

智能RF透镜效应:高效、动态和移动无线功率传输
相关申请的交叉引用
本申请要求于2012年11月9日提交的题为“智能RF透明效应：高效、动态和移动无线功率传输(Smart RF Lensing:Efficient,Dynamic AndMobile Wireless Power Transfer)”的美国临时专利申请号61/724,638根据美国法典第35条119条的权益，其内容通过引用全部并入本文。
发明背景
本申请涉及无线通信，并更具体地涉及无线功率传输。
发明背景
用于给电子设备供电的电能主要来自有线源。传统的无线功率传输依赖于彼此放置非常靠近的两个线圈之间的磁感应效应。为了增大其效率，线圈尺寸被选择为小于所辐射的电磁波的波长。所传输的功率随着源和充电设备之间的距离增大而剧烈地减小。
发明简述
根据本发明的一个实施例的RF透镜部分地包括大量辐射体，其适于辐射电磁波以给远离RF透镜定位的设备供电。大量辐射体中的每个以相同频率进行操作。由大量辐射体中的每个辐射体辐射的电磁波的相位被选择为表示该辐射体和设备之间的距离。
在一个实施例中，大量辐射体形成于阵列中。在一个实施例中，阵列为一维阵列。在另一个实施例中，阵列为二维阵列。在一个实施例中，由辐射体辐射的电磁波的振幅为可变的。在一个实施例中，大量辐射体中的每个辐射体部分地包括可变延时元件、控制电路、放大器和天线，其中控制电路适于将由辐射体辐射的电磁波的相位或频率锁定到参考信号的相位或频率。
在一个实施例中，大量辐射体形成于第一辐射体瓦(tile)中，该第一辐射体瓦适于容纳其中放置有另一大量辐射体的第二辐射体瓦。在一个实施例中，RF透镜进一步适于追踪设备的位置。在一个实施例中，辐射体的第一子集中的每个包括电路，以用于接收由设备发送的电磁波，从而使RF透镜能够根据由辐射体的第一子集所接收的电磁波的相位来确定设备的位置。
在一个实施例中，辐射体的至少第一子集中的每个包括电路，以用于接收由设备发送的电磁波，从而使RF透镜能够根据从设备到辐射体的第一子集中的每个辐射体的电磁波的传播时间以及从RF透镜发送到设备的响应电磁波的传播时间来确定设备的位置。在一个实施例中，RF透镜形成于半导体基板中。
根据本发明的一个实施例给设备无线供电的方法部分地包括，从大量辐射体将具有相同频率的大量电磁波发送到设备；根据辐射体和设备之间的距离来选择大量辐射体中的每个辐射体的相位；以及使用由设备所接收的电磁波对设备充电。
在一个实施例中，方法进一步部分地包括，在阵列中形成辐射体。在一个实施例中，辐射体形成于一维阵列中。在另一个实施例中，辐射体形成于二维阵列中。在一个实施例中，方法进一步部分地包括，改变由每个辐射体所辐射的电磁波的振幅。
在一个实施例中，每个辐射体部分地包括，可变延时元件、控制锁定电路、放大器和天线，其中控制锁定电路适于将由辐射体辐射的电磁波的相位或频率锁定到参考信号的相位或频率。在一个实施例中，辐射体形成于第一辐射体瓦中，该第一辐射体瓦适于容纳其中放置有另一大量辐射体的第二辐射体瓦。
在一个实施例中，方法进一步部分地包括，追踪设备的位置。在一个实施例中，方法进一步部分地包括，根据由设备发送的以及由辐射体的至少一个子集中的每个所接收的电磁波的相对相位，来确定设备的位置。在一个实施例中，方法进一步部分地包括，根据由设备发送的以及由辐射体的至少一个子集中的每个所接收的电磁波的传播时间，以及进一步根据从RF透镜发送到设备的响应电磁波的传播时间，来确定设备的位置。在一个实施例中，方法进一步部分地包括，在半导体基板中形成RF透镜。
附图说明
图1示出根据本发明的一个实施例，形成RF透镜的辐射体的一维阵列。
图2为根据本发明的一个示例性实施例，将功率无线递送到第一位置处的设备的图1的RF透镜的侧视图。
图3为根据本发明的一个示例性实施例，将功率无线递送到第二位置处的设备的图1的RF透镜的侧视图。
图4为根据本发明的一个示例性实施例，将功率无线递送到第三位置处的设备的图1的RF透镜的侧视图。
图5为根据本发明的一个示例性实施例，形成RF透镜的辐射体的二维阵列。
图6A为根据本发明的一个示例性实施例，放置在RF透镜中的辐射体的简化方框图。
图6B为根据本发明的另一个示例性实施例，放置在RF透镜中的辐射体的简化方框图。
图7示出根据本发明的一个示例性实施例，适于被无线充电的设备的一些电子部件。
图8为根据本发明的一个示例性实施例，对设备无线充电的RF透镜的示意图。
图9为根据本发明的一个示例性实施例，对一对设备同时无线充电的RF透镜的示意图。
图10为根据本发明的一个示例性实施例，对一对移动设备和固定设备同时充电的RF透镜的示意图。
图11A示出根据本发明的一个示例性实施例，一维RF透镜的电磁场轮廓的计算机模拟。
图11B为用于生成图11A的电磁场轮廓的RF透镜的简化示意图。
图12示出由图11B的RF透镜生成的计算机模拟电磁场轮廓中的变量是其中所放置的每相邻对的辐射体之间的间距的函数。
图13A为根据本发明的一个示例性实施例，RF透镜的以及使用-15dB到0dB标度的示例性计算机模拟电磁场轮廓。
图13B示出使用-45dB到0dB标度的图13A的计算机模拟电磁场轮廓。
图14A为根据本发明的一个示例性实施例，图13A的RF透镜的以及使用-15dB到0dB标度的示例性计算机模拟电磁场轮廓。
图14B示出根据本发明的一个示例性实施例，使用-45dB到0dB标度的图14A的计算机模拟电磁场轮廓。
图15A为根据本发明的一个示例性实施例，RF透镜的以及使用-15dB到0dB标度的示例性计算机模拟电磁场轮廓。
图15B示出根据本发明的一个示例性实施例，使用-45dB到0dB标度的图15A的计算机模拟电磁场轮廓。
图16A为根据本发明的一个示例性实施例，使用-15dB到0dB标度的图15A的RF透镜的示例性计算机模拟电磁场轮廓。
图16B为根据本发明的一个示例性实施例，使用-45dB到0dB标度的图16A的计算机模拟电磁场轮廓。
图17A示出根据本发明的一个示例性实施例，其中放置有四个辐射体的示例性辐射体瓦。
图17B示出根据本发明的一个示例性实施例，使用图17A的大量辐射体瓦而形成的RF透镜。
图18为根据本发明的另一个示例性实施例，放置在RF透镜中的辐射体的简化方框图。
图19示出根据本发明的另一个示例性实施例，放置在适于被无线充电的设备中的一些电子部件。
图20示出根据本发明的另一个示例性实施例，使用由设备发送的信号追踪设备的RF透镜。
图21示出根据本发明的另一个示例性实施例，在存在大量散射物体的情况下将功率传输到设备的RF透镜。
图22A示出根据本发明的一个实施例，使用以圆形布置的大量辐射体而形成的RF透镜。
图22B示出根据本发明的一个实施例，使用以椭圆形布置的大量辐射体而形成的RF透镜。
具体实施方式
根据本发明的一个实施例的RF透镜包括大量辐射体，其适于发送射频电磁EM波(在下文中可选地被称作EM波或波)，其相位和振幅被调制以使辐射功率集中于小的空间容积中(在下文中可选地被称作聚集点或目标区)，以便给位于该空间中的电子设备供电。因此，致使由辐射体发射的波被在聚集点处相长干涉。尽管以下提供的描述是参考无线功率传输，本发明的以下实施例可用于无线传输任何其他类型的信息。
图1示出根据本发明的一个实施例，形成RF透镜的、布置在阵列100中的大量辐射体。阵列100被示出为包括N个辐射体101、102、103…10N-1、10N，其中每个适于辐射EM波，该EM波的振幅和相位可被独立地控制，以便在将被充电的设备被定位的聚集点处导致辐射的EM波的相长干涉，其中N为大于1的整数。图2为当选择了由辐射体10i(i为从1到N变化的整数)生成的波的相对相位，以使波之间的相长干涉发生在其中正进行无线充电的设备被定位的邻近区域102，即，聚集点时的阵列100的侧视图。区域102被示出为定位在离阵列100的中心104大约距离d1处。阵列中心和聚集点之间的距离在本文被可选地称作焦距。尽管RF透镜的以下描述被提供为对辐射体的一维或二维阵列的参考，但是要理解的是，根据本发明的RF透镜可具有辐射体的任何其他布置，诸如图22A中所示的辐射体202的圆形布置1000，或者图22B中所示的辐射体202的椭圆形布置1010。
如从图2中所示，假定每个辐射体10i定位在离阵列100的中心104的距离yi处。假定分别由Ai处和θi表示由辐射体10i辐射的波的振幅和相位。进一步假定由λ表示正被辐射的波的波长。为了使由辐射体辐射的波在区域102(即，期望聚集点)中相长干涉，在各种相位θi和距离yi之间满足以下关系：
由于可准确地控制RF信号的相位，因此可根据本发明将从多个源辐射的功率聚集在将被无线充电的设备被定位的目标区上。此外，随着设备从其初始位置移动，动态相位控制实现设备的追踪。例如，如图3所示，如果设备沿着焦平面移动到位于离阵列的中心点104距离d2的不同的位置，则为了确保目标区也位于距离d2处，可根据以下关系调节源的相位：
参考图4，如果设备移动到远离焦平面的不同位置处(例如，到沿着y轴的不同点处)，则可如下面所描述，动态地调节辐射体的相位，以便追踪和维护聚集在设备上的目标区。参数yc表示设备的新位置离阵列的焦平面的y向量(即，垂直于y轴并通过阵列100的中心104的平面)，如图4所示。
通过将由辐射体辐射的波的波长λ、图1中所示的阵列跨距或阵列孔径A和焦距来定义所传输的功率量，即(λF/A)。
在一个实施例中，每对辐射体之间的距离为被辐射的信号的波长的量级。例如，如果所辐射的波的频率为2.4GHz(即，波长为12.5cm)，则每两个辐射体之间的距离可为十分之几到几十个波长，这可根据应用变化。
根据本发明的RF透镜操作用于在近场和远场区域两者中无线传输功率。在光域中，近场区域被称作菲涅尔区域且被定义为其中焦距为孔径尺寸的量级的区域。在光域中，远场区域被称作夫琅和费区域且被定义为其中焦距(F)大致大于(2A2/λ)的区域。
为了将功率无线传输到设备，根据本发明，选择辐射体相位，以便考虑目标点和辐射体之间的距离中的差异。例如，假定图2中的焦距d1为孔径尺寸A的量级。因此，由于距离S1、S2、S3…SN彼此不同，所以改变辐射体101、102、103…10N的相应相位θ1、θ2、θ3…θN，以便满足以上所描述的表达式(1)。由于衍射受限长度，因此该类区域的焦点的尺寸(大约为λF/A)相对小。
根据本发明的辐射体阵列也操作用于将功率无线传输到其中焦距大于(2A2/λ)的远场区域中目标设备。对于该类区域，假定从不同阵列元件到聚焦光斑的距离为相同的。因此，对于该类区域，S1＝S2＝S3…..＝SN，且θ1＝θ2＝θ3…＝θN。该类区域的聚集点的尺寸相对较大且因此更适合用于较大器械的无线充电。
图5示出根据本发明的另一个实施例的RF透镜200。RF透镜200被示出为包括沿着行和列布置的二维阵列的辐射体202i,j。尽管RF透镜200被示出为包括沿着11行和11列放置的121个辐射体202i,j(整数i和j为从1到11变化的下标)，但是要理解的是，根据本发明的实施例的RF透镜可具有沿着U行和V列放置的任何数目的辐射体，其中U和V为大于1的整数。在以下描述中，辐射体202i,j可集中地或单独地被称作辐射体202。
如下面所进一步描述，阵列辐射体被锁定到参考频率，其可为辐射频率的分谐波(n＝1,2,3...)，或者在和辐射频率相同的频率下。由每个辐射体辐射的波的相位被独立地控制，以便使所辐射的波能够相长干涉并将它们的功率集中于空间中的任何区域内的目标区上。
图6A为根据本发明的一个实施例，放置在RF透镜200中的辐射体202的简化方框图。如所示出，辐射体202被示出为部分包括可编程延时元件(本文中也被称为相位调制器)210、锁相环路/锁频环路212、功率放大器214，和天线216。可编程延时元件210适于使信号W2延时，以生成信号W3。根据被施加到延时元件的控制信号Ctrl确定信号W2和W3之间的延时。在一个实施例中，锁相环路/锁频环路212接收信号W1以及具有频率Fref的参考时钟信号，以生成信号W2，其频率被锁定到参考频率Fref。在另一个实施例中，由锁相环路/锁频环路212生成的信号W2可具有由多个参考频率Fref定义的频率。信号W3由功率放大器214放大并由天线216发送。因此并如上所述，可通过放置在辐射体中的关联可编程延时元件210改变由每个辐射体202辐射的信号的相位。
图6B为根据本发明的另一个实施例，放置在RF透镜200中的辐射体202的简化方框图。如所示出，辐射体202被示出为部分包括可编程延时元件210、锁相环路/锁频环路212、功率放大器214，和天线216。可编程延时元件210适于使参考信号Fref延时，从而生成延时参考时钟信号Fref_Delay。根据被施加到延时元件210的控制信号Ctrl确定信号Fref和Fref_Delay之间的延时。由锁相环路/锁频环路212生成的信号W2可具有频率，其被锁定到信号Fref_Delay的频率或者信号Fref_Delay的多个频率。在一个实施例中(未示出)，延时元件放置在锁相环路/锁频环路212中并为锁相环路/锁频环路212的一部分。在另一个实施例中(未示出)，辐射体可不具有放大器。
图7示出根据本发明的一个实施例，适于无线充电的设备300的一些部件。设备300被示出为部分包括天线302、整流器304，和调节器306。天线302根据本发明接收由辐射体辐射的电磁波。整流器304适于将所接收的AC功率转换为DC功率。调节器306适于调节从整流器304接收的电压信号，并将所调节的电压施加到设备。在一个实施例中，如果接收器天线的孔径区域比得上电磁场的目标区的尺寸，则获得高功率传输效率。由于大多数辐射功率集中于形成目标区的小容积中，该种接收器天线因此被最优化用于确保大多数辐射功率用于为设备充电。在一个实施例中，可通过被要求用于无线充电的部件对设备进行外部翻新。在另一个实施例中，存在于充电设备中的现有电路，诸如天线、接收器等等可用于利用功率。
图8为对设备300无线充电的RF透镜200的示意图。在一些实施例中，RF透镜200同时对多个设备无线充电。图9示出RF透镜200同时对设备310充电，并315使用类似或不同的力量的聚焦波。图10示出RF透镜200对被假定为在室内的移动设备320、325和固定设备330无线充电。
图11A示出通过一维RF透镜在距离具有一批11个各向同性辐射体的RF透镜2米处生成的计算机模拟磁场轮廓。为三个不同的频率，即200MHz(波长150cm)、800MHz(波长37.5cm)和2400MHz(波长12.50cm)生成射束轮廓。由于假定RF透镜的每对相邻辐射体之间的距离为20cm，因此RF透镜具有2m的孔径。因此，波长为辐射体的孔径尺寸和焦距的量级。图11B为具有彼此间隔20cm的11个辐射体505k的RF透镜500的简化示意图，其中K为从1到11变化的整数。
绘图510、520和530分别为当选择了各种辐射体的相对相位，以便根据以上表达式(1)说明从辐射体505k中的每个到远离辐射体50562米的点的路径差时的200MHz、800MHz和由辐射体500辐射的2400个信号的电磁场轮廓的计算机模拟。对于这些轮廓中的每个，衍射受限聚焦尺寸为辐射信号的波长的量级。当将辐射体505k的相位设置为彼此相等时，绘图515、525和535分别为200MHz、800MHz和2400个信号在远离辐射体阵列距离2米处的电磁场轮廓的计算机模拟。
如从这些轮廓看出，对于具有200MHz频率的较大波长(即，绘图510、515)，由于从单独辐射体到聚集点的路径差不是本质上不同，因此相对忽略轮廓510和515之间的差异。然而，对于800MHz和2400MHz频率中的每个，当选择了各种辐射体的相对相位以便考虑从辐射体505k到聚集点的路径差时，EM限制(聚焦)大幅度地多于当将辐射体相位设置为彼此相等时。尽管提供给了以上示例对200MHz、800MHz和2400MHz的操作频率的参考，但是要理解的是，本发明的实施例可用于任何其他操作频率，诸如5.8GHz、10GHz和24GHz。
图12示出通过RF透镜500在远离RF透镜的2米距离处生成的计算机模拟磁场轮廓的变量是每相邻对的辐射体之间的间距的函数。假定RF透镜在2400MHz频率下操作。绘图610、620和630为在选择各种辐射体的相对相位以根据以上表达式(1)说明从各种辐射体505k到远离RF透镜2处的点的路径差之后，分别为5cm、10cm和20cm的辐射体间距生成的场轮廓的计算机模拟。绘图615、625和650为分别为5cm、10cm和20cm的辐射体间距生成的场轮廓的计算机模拟，其中假定放置在RF透镜500中的所有辐射体具有相同相位。如从这些绘图看出，当辐射体之间的距离增大，从而导致较大的孔径尺寸时，EM限制也增大，从而导致较小的聚集点。
图13A为RF透镜在远离其中放置有二维阵列的赫兹偶极子的RF透镜3米距离处的EM轮廓的计算机模拟，该赫兹偶极子以900MHz的频率进行操作，诸如图5所示的RF透镜200。假定偶极子辐射体之间的间距为30cm。选择辐射体的相对相位，以便考虑从辐射体到被假定为远离RF透镜3米距离处的焦点的路径差。换句话说，辐射体的相对相位被选择为提供给RF透镜大约3米的焦距。用于生成图13A的标度为-15dB到0dB。图13B示出使用-45dB到0dB标度的图13A的EM轮廓。
图14A为图13A/13B的RF透镜在远离焦点的2米距离处(即远离RF透镜5米处)的EM轮廓的计算机模拟。如从图14A中所示，辐射功率分散在与图13A和图13B中示出的那些相比更大的区域上。用于生成图14A的标度为-15dB到0dB。图14B示出使用-45dB到0dB标度的图14A的EM轮廓。
图15A为RF透镜在远离其中放置有二维阵列的赫兹偶极子的RF透镜3米距离处的EM轮廓的计算机模拟，该赫兹偶极子以900MHz的频率进行操作。假定偶极子辐射体之间的间距为30cm。选择辐射体的相对相位，以便考虑从辐射体到被假定为远离RF透镜3米距离处以及在离RF透镜的焦平面1.5cm的偏移处的焦点的路径差，即，聚集点具有离焦平面1.5米的y坐标(参考图4)。用于生成图15A的标度为-15dB到0dB。图15B示出使用-45dB到0dB标度的图15A的EM轮廓。
图16A为图15A/15B的RF透镜在远离焦点的2米距离处(即远离RF透镜的x-y平面5米处)的EM轮廓的计算机模拟。如从图16A中所示，辐射功率分散在与图15A中示出的那个相比更大的区域上。用于生成图16A的标度为-15dB到0dB。图16B示出使用-45dB到0dB标度的图16A的EM轮廓。图13A、图13B、图14A、图14B、图15A、图15B、图16A、图16B中所示的EM轮廓示出根据本发明的RF透镜在3D空间中的任何任意点处聚焦功率中的通用性。
根据本发明的一个方面，形成RF透镜的阵列的大小为可配置的且可通过使用辐射体瓦改变，该辐射体瓦中的每个可包括一个或多个辐射体。图17A示出其中放置有四个辐射体1511、1512、1521和1522的辐射体瓦700的示例。尽管辐射体瓦700被示出为包括四个辐射体，但是要理解的是，根据本发明的一个方面，辐射体瓦可具有少于(例如，一个)或多于(例如，6个)四个的辐射体。图17B示出使用7个辐射体瓦(即辐射体瓦70011、70012、70013、70021、70022、70031、70031)最初形成的并被提供有两个辐射体瓦70023和70033的RF透镜800，该7个辐射体瓦中的每个类似于图17A中示出的辐射体瓦700。尽管未示出，但是要理解的是，每个辐射体瓦包括电气连接，其必要地将功率供应给辐射体以及必要时从辐射体递送信息。在一个实施例中，在瓦中形成的辐射体类似于图6中所示的辐射体202。
根据本发明的一个方面，RF透镜适于追踪移动设备的位置，以便当移动设备改变位置时，继续充电过程。为了实现该目的，在一个实施例中，形成RF透镜的辐射体的一个子集的或全部包括接收器。被充电的设备还包括发送器，其适于在追踪相位期间辐射连续信号。通过RF透镜上所形成的至少三个不同的接收器来检测该信号的相位(传播时间)之间的相对差异，追踪充电设备的位置。
图18为根据本发明的一个实施例，放置在RF透镜(诸如图5中所示的RF透镜200)中的辐射体902的简化方框图。辐射体902类似于图6中所示的辐射体202，不同之处在于辐射体902具有接收器放大器和相位恢复电路218以及开关S1。在功率传输期间，开关S1经由节点A将天线216耦合到放置在发送路径中的功率放大器214。在追踪期间，开关S1经由节点B将天线216耦合到接收器放大器及放置在接收路径中的相位恢复电路218，以接收由正在充电的设备发送的信号。
图19示出根据本发明的一个实施例，适于无线充电的设备900的一些部件。设备900类似于图7中所示的设备300，其不同之处在于设备900具有发送放大器316和开关S2。在功率传输期间，开关S2经由节点D将天线302耦合到放置在接收路径中的整流器304。在追踪期间，开关S2经由节点C将天线302耦合到发送放大器316，以实现随后由RF透镜使用的信号的发送，以检测设备300的位置。图20示出通过接收由设备900发送的信号来追踪设备900的RF透镜200。
根据本发明的另一个实施例，基于脉冲的测量技术被用于追踪移动设备的位置。为了实现该目的，形成RF透镜的一个或多个辐射体在追踪相位期间发送脉冲。在接收脉冲后，正被追踪的设备发送由放置在阵列中的辐射体接收了哪个的响应。脉冲从RF透镜到正被追踪的设备的传播时间与响应脉冲从正被追踪的设备到RF透镜的传播时间一起表示正被追踪的设备的位置。在散射体存在的情况下，可使用该估计算法如极大似然或最小二乘方、卡尔曼滤波、这些技术的组合等等来追踪设备的位置。还可使用WiFi和GPS信号来确定和追踪设备的位置。
散射物体、反射物和吸收体的存在可影响RF透镜将射束有效地集中于正在进行无线充电的设备上的能力。例如，图21示出在存在大量散射物体250的情况下将功率传输给设备300的RF透镜950。为了使该类影响最小化，可改变阵列的单独辐射体的振幅和相位，以增大功率传输效率。多个技术中的任一个可用于改变单体辐射体的振幅或相位。
根据一个该种技术，为了使散射的影响最小化，通过放置在RF透镜中的一个或多个辐射体发送信号。从RF透镜辐射的信号由散射物体散射并由辐射体接收(参见图18)。相反散射算法然后用于构造环境的散射行为。可周期性地执行该种构造，以说明可随时间发生的任何改变。根据另一个技术，一部分或整个辐射体阵列可用于电子束扫描周围，以根据所接收的波构造散射行为。根据另一个技术，正在进行无线充电的设备适于周期性地将关于其接收的功率的信息发送给辐射体。最优化算法然后使用所接收的信息以说明散射，以便使功率传输效率最大化。
在一些实施例中，可调节辐射体的振幅/相位或者RF透镜的方位，以利用散射媒介的优点。这使散射物体能够具有合适的相位、振幅和极化，以便被用作辐射体的次级来源，该次级来源将功率引向设备，以增大功率传输效率。
本发明的以上实施例为说明性的且不是限制性的。本发明的实施例不限制于放置在RF透镜中的辐射体的数量，也不被限制于用于形成RF透镜的阵列的维数。本发明的实施例不限制于辐射体的类型、其操作频率等等。本发明的实施例不限制于可被无线充电的设备的类型。本发明的实施例不限制于基板的类型、半导体、柔性或其中可形成辐射体的各种部件的其他方式。鉴于本公开的内容，其他添加、减除或修改是明显的且被认为是落入随附权利要求的范围内。

Claims (34)

1.一种RF透镜，包括：
第一多个辐射体，其适于辐射电磁波以给远离所述RF透镜定位的设备供电，其中所述多个辐射体中的每个辐射体以第一频率进行操作，其中由所述多个辐射体中的每个辐射体辐射的电磁波的相位被选择为由该辐射体和所述设备之间的距离来确定。
2.根据权利要求1所述的RF透镜，其中所述第一多个辐射体形成于阵列中。
3.根据权利要求2所述的RF透镜，其中所述阵列为一维阵列。
4.根据权利要求2所述的RF透镜，其中所述阵列为二维阵列。
5.根据权利要求1所述的RF透镜，其中由所述第一多个辐射体中的每个辐射体辐射的电磁波的振幅为可变的。
6.根据权利要求1所述的RF透镜，其中所述第一多个辐射体中的每个辐射体包括：
可变延时元件；以及
天线。
7.根据权利要求1所述的RF透镜，其中所述第一多个辐射体形成于第一辐射体瓦中，所述第一辐射体瓦适于容纳其中放置有第二多个辐射体的第二辐射体瓦。
8.根据权利要求1所述的RF透镜，其中所述RF透镜还适于追踪所述设备的位置。
9.根据权利要求1所述的RF透镜，其中所述第一多个辐射体的至少第一子集中的每个辐射体包括电路，以用于接收由所述设备发送的电磁波，从而使所述RF透镜能够根据由所述第一多个辐射体的所述至少第一子集中的每个辐射体接收的电磁波的相位来确定所述设备的位置。
10.根据权利要求1所述的RF透镜，其中所述多个辐射体的至少第一子集中的每个辐射体包括电路，以用于接收由所述设备发送的电磁波，从而使所述RF透镜能够根据从所述设备到所述第一多个辐射体的所述至少第一子集中的每个辐射体的电磁波的传播时间以及从所述RF透镜发送到所述设备的响应电磁波的传播时间来确定所述设备的位置。
11.根据权利要求1所述的RF透镜，其中所述RF透镜形成于半导体基板中。
12.根据权利要求1所述的RF透镜，其中所述RF透镜形成于柔性基板中。
13.根据权利要求1所述的RF透镜，其中所述第一多个辐射体的振幅/相位还被选择为使由物体散射的电磁波能够给所述设备供电。
14.根据权利要求1所述的RF透镜，其中所述RF透镜还包括：
第二多个辐射体，其适于辐射电磁波以给第二设备供电，其中所述第二多个辐射体中的每个辐射体以不同于所述第一频率的第二频率进行操作，其中由所述第二多个辐射体中的每个辐射体辐射的电磁波的相位被选择为由该辐射体和所述第二设备之间的距离确定。
15.根据权利要求1所述的RF透镜，还包括控制电路，所述控制电路适于将由所述第一多个辐射体中的每个辐射体辐射的电磁波的相位或频率锁定到参考信号的相位或频率。
16.根据权利要求1所述的RF透镜，其中所述RF透镜还适于追踪第二设备并给所述第二设备供电。
17.根据权利要求1所述的RF透镜，其中所述第一多个辐射体中的第一个辐射体和所述第一多个辐射体中的第二个辐射体之间的距离不同于所述第一多个辐射体中的第三个辐射体和所述第一多个辐射体中的第四个辐射体之间的距离。
18.一种给设备无线供电的方法，所述方法包括：
将具有第一频率的多个电磁波从第一多个辐射体发送到所述设备；
根据所述第一多个辐射体中的每个辐射体和所述设备之间的距离，选择该辐射体的相位；以及
使用由所述设备接收的所述多个电磁波给所述设备供电。
19.根据权利要求18所述的方法，还包括：
在阵列中形成所述第一多个辐射体。
20.根据权利要求19所述的方法，还包括：
在一维阵列中形成所述第一多个辐射体。
21.根据权利要求19所述的方法，还包括：
在二维阵列中形成所述第一多个辐射体。
22.根据权利要求18所述的方法，还包括：
改变由所述第一多个辐射体中的每个辐射体辐射的电磁波的振幅。
23.根据权利要求18所述的方法，其中所述多个辐射体中的每个辐射体包括：
可变延时元件；以及
天线。
24.根据权利要求18所述的方法，其中所述第一多个辐射体形成于第一辐射体瓦中，所述第一辐射体瓦适于容纳其中放置有第二多个辐射体的第二辐射体瓦。
25.根据权利要求18所述的方法，还包括：
追踪所述设备的位置。
26.根据权利要求18所述的方法，还包括：
根据由所述设备发送的以及由所述第一多个辐射体的第一子集中的每个辐射体所接收的电磁波的相对相位，来确定所述设备的位置。
27.根据权利要求18所述的方法，还包括：
根据由所述设备发送的以及由所述第一多个辐射体的第一子集中的每个辐射体所接收的电磁波的传播时间，并还根据从所述RF透镜发送到所述设备的响应电磁波的传播时间，来确定所述设备的位置。
28.根据权利要求18所述的方法，还包括：
在半导体基板中形成所述第一多个辐射体。
29.根据权利要求18所述的方法，还包括：
在柔性基板中形成所述第一多个辐射体。
30.根据权利要求18所述的方法，还包括：
选择所述第一多个辐射体的振幅/相位以使由所述第一多个辐射体发送的以及由对象散射的电磁波能够给所述设备供电。
31.根据权利要求18所述的方法，还包括：
在从所述第一多个辐射体发送所述电磁波的同时，将具有第二频率的第二多个电磁波从第二多个辐射体发送到第二设备；
根据所述第二多个辐射体中的每个辐射体和所述第二设备之间的距离选择该辐射体的相位；
使用所述第二多个电磁波给所述第二设备供电。
32.根据权利要求18所述的方法，还包括：
将由所述第一多个辐射体中的每个辐射体辐射的电磁波的相位或频率锁定到参考信号的相位或频率。
33.根据权利要求18所述的方法，还包括：
使用由所述第一多个辐射体辐射的电磁波追踪第二设备并给所述第二设备供电。
34.根据权利要求18所述的方法，其中所述第一多个辐射体中的第一个辐射体和所述第一多个辐射体中的第二个辐射体之间的距离不同于所述第一多个辐射体中的第三个辐射体和所述第一多个辐射体中的第四个辐射体之间的距离。
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