CN104836102B - A kind of Gao Zhongying double-cavity excimer laser electric discharge synchronous control system and method - Google Patents
A kind of Gao Zhongying double-cavity excimer laser electric discharge synchronous control system and method Download PDFInfo
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- CN104836102B CN104836102B CN201510175072.4A CN201510175072A CN104836102B CN 104836102 B CN104836102 B CN 104836102B CN 201510175072 A CN201510175072 A CN 201510175072A CN 104836102 B CN104836102 B CN 104836102B
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Claims (4)
- The synchronous control system 1. a kind of double-cavity excimer laser is discharged, the laser include MO chambers and PA chambers, the MO chambers with PA chambers are respectively provided with the first power supply and second source, it is characterised in that the system includes delay measuring unit (1), master control list First (2), delay output unit (3), the first Timing acquisition unit (4a), the second Timing acquisition unit (4b) and state acquisition unit (5), wherein,The first Timing acquisition unit (4a) and the second Timing acquisition unit (4b) are respectively used to gather the MO chambers and PA chambers Pulsed discharge signal;The delay measuring unit (1) gathers according to the first Timing acquisition unit (4a) and the second Timing acquisition unit (4b) Pulsed discharge signal obtain light extraction delay value between the MO chambers and PA chambers;The state acquisition unit (5) is used for the status information for gathering the MO chambers and PA chambers;The main control unit (2) is used for light extraction delay value, delay adjustmentses according to the actual acquisition between the MO chambers and PA chambers Value and the status information of state acquisition unit (5) collection, perform closed loop control algorithm, obtain the renewal of two-chamber discharge lag Value, and give the value to the delay output unit (3);The delay output unit (3) is used for the updated value for receiving the two-chamber discharge lag that the main control unit (2) is sent, Simultaneously two pulses that the trigger pulse from host computer is divided into corresponding to the updated value of the two-chamber discharge lag export to First power supply and second source are discharged with triggering two power supply;The delay output unit (3) includes a programmable delay module (31), two constant time lag modules (32) and two Pulse-triggered output module;The programmable delay module (31) is prolonged after two renewals of delay value and output of main control unit renewal are received by serial ports Two pulse signals of duration, then send it to described two constant time lag modules respectively;Described two constant time lag modules (32) are used to correct the intrinsic delay time error of dual-cavity system;Described two pulse-triggered output modules (33) are used for the pulse output for receiving constant time lag module respectively, and electric pulse is turned Light pulse is changed to, triggers the first power supply and second source electric discharge.
- The synchronous control system 2. double-cavity excimer laser as claimed in claim 1 is discharged, it is characterised in that the delay is surveyed Measuring unit (1) includes impedance matching module (11), integration and pre-amplifying module (12), Time delay measurement module (13) and is delayed defeated Go out module (14),The impedance matching module (11) receives the first Timing acquisition unit (4a) and the second Timing acquisition unit (4b) is adopted The pulsed discharge signal of collection, for the decay for carrying out impedance matching to ensure signal integrity He avoid signal;The integration and pre-amplifying module (12) are used to signal is integrated and amplified, and obtain the pulse square wave of two-way standard Signal, and it is output to the Time delay measurement module (13);Time delay measurement module (13) is used for the two-way pulse square wave signal for measuring integration and pre-amplifying module (12) output Delay value, then by the delay value send to it is described delay output module (14);The delay output module (14) is used to export the delay value to give the main control unit (2).
- The synchronous control system 3. double-cavity excimer laser as claimed in claim 1 or 2 is discharged, it is characterised in that the master Control unit (2) includes the first single-chip microcomputer and second singlechip, is communicated between two single-chip microcomputers with dual port RAM;First monolithic owner It is responsible for the output of time delayed signal and the realization of delays time to control algorithm;Second singlechip is responsible for power state detection and and host computer Communication.
- The synchronisation control means 4. a kind of double-cavity excimer laser using system any one of claim 1-3 is discharged, The laser includes MO chambers and PA chambers, and the MO chambers and PA chambers are respectively provided with the first power supply and second source, it is characterised in that institute The method of stating comprises the following steps:S1, the pulsed discharge signal for being respectively used to gather the MO chambers and PA chambers;S2, the light extraction delay value between the MO chambers and PA chambers obtained according to the pulsed discharge signal;S3, the state acquisition unit (5) are used for the status information for gathering the MO chambers and PA chambers;S4, the light extraction delay value according between the MO chambers and PA chambers, delay adjustmentses value and the institute of state acquisition unit (5) collection Status information is stated, performs closed loop control algorithm, obtains the updated value of two-chamber discharge lag;S5, the trigger pulse from host computer be divided into corresponding to the updated value of the two-chamber discharge lag two pulses output Discharged to first power supply and second source with triggering two power supply.
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CN201510175072.4A CN104836102B (en) | 2015-04-14 | 2015-04-14 | A kind of Gao Zhongying double-cavity excimer laser electric discharge synchronous control system and method |
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CN201510175072.4A CN104836102B (en) | 2015-04-14 | 2015-04-14 | A kind of Gao Zhongying double-cavity excimer laser electric discharge synchronous control system and method |
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CN104836102B true CN104836102B (en) | 2018-03-23 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106300008B (en) * | 2016-08-30 | 2020-04-28 | 北京卓镭激光技术有限公司 | Method for regulating and controlling output frequency of laser |
CN113783101B (en) * | 2021-07-28 | 2024-02-02 | 北京科益虹源光电技术有限公司 | Energy control method and device for dual-cavity excimer laser |
CN116960712A (en) * | 2022-04-18 | 2023-10-27 | 北京科益虹源光电技术有限公司 | Method and device for detecting energy drop point of excimer laser |
CN116960716B (en) * | 2022-04-18 | 2024-03-29 | 北京科益虹源光电技术有限公司 | Energy drop recovery method and device for excimer laser |
CN117543324A (en) * | 2022-12-27 | 2024-02-09 | 北京科益虹源光电技术有限公司 | Synchronous control method and control equipment for dual-cavity excimer laser and laser |
Citations (3)
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CN1596492A (en) * | 2001-11-30 | 2005-03-16 | 西默股份有限公司 | Timing control for two-chamber gas discharge laser system |
CN102075165A (en) * | 2011-02-21 | 2011-05-25 | 国核电力规划设计研究院 | Multichannel timing high-voltage pulse generator and high-voltage trigger pulse generating devices |
CN102593704A (en) * | 2012-01-18 | 2012-07-18 | 中国科学院安徽光学精密机械研究所 | Synchronous control system of double-cavity excimer laser |
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US6798812B2 (en) * | 2002-01-23 | 2004-09-28 | Cymer, Inc. | Two chamber F2 laser system with F2 pressure based line selection |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN1596492A (en) * | 2001-11-30 | 2005-03-16 | 西默股份有限公司 | Timing control for two-chamber gas discharge laser system |
CN102075165A (en) * | 2011-02-21 | 2011-05-25 | 国核电力规划设计研究院 | Multichannel timing high-voltage pulse generator and high-voltage trigger pulse generating devices |
CN102593704A (en) * | 2012-01-18 | 2012-07-18 | 中国科学院安徽光学精密机械研究所 | Synchronous control system of double-cavity excimer laser |
Non-Patent Citations (1)
Title |
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MOPA准分子激光全固化电源同步模块的设计;尹洪虎 等;《现代电子技术》;20120531;第35卷(第10期);第132-135,138页 * |
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Effective date of registration: 20210312 Address after: 100176 building 10, 156 Jinghai 4th Road, Daxing Economic and Technological Development Zone, Beijing Patentee after: BEIJING RSLASER OPTO-ELECTRONICS TECHNOLOGY Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |