CN104821171B - 具有窄轨道宽度和小读间隙的磁传感器 - Google Patents

具有窄轨道宽度和小读间隙的磁传感器 Download PDF

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Publication number
CN104821171B
CN104821171B CN201510178423.7A CN201510178423A CN104821171B CN 104821171 B CN104821171 B CN 104821171B CN 201510178423 A CN201510178423 A CN 201510178423A CN 104821171 B CN104821171 B CN 104821171B
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CN
China
Prior art keywords
magnetic
sensor
layer
antiferromagnet
air
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CN201510178423.7A
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English (en)
Chinese (zh)
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CN104821171A (zh
Inventor
Z·高
H·S·吉尔
Y·洪
Q·勒
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Western Digital Technologies Inc
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Western Digital Technologies Inc
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/398—Specially shaped layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3912—Arrangements in which the active read-out elements are transducing in association with active magnetic shields, e.g. magnetically coupled shields
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/80—Constructional details

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
  • Hall/Mr Elements (AREA)
CN201510178423.7A 2014-01-31 2015-01-30 具有窄轨道宽度和小读间隙的磁传感器 Active CN104821171B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/170,487 US9047893B1 (en) 2014-01-31 2014-01-31 Magnetic sensor having narrow trackwidth and small read gap
US14/170,487 2014-01-31

Publications (2)

Publication Number Publication Date
CN104821171A CN104821171A (zh) 2015-08-05
CN104821171B true CN104821171B (zh) 2019-03-12

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Family Applications (1)

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CN201510178423.7A Active CN104821171B (zh) 2014-01-31 2015-01-30 具有窄轨道宽度和小读间隙的磁传感器

Country Status (3)

Country Link
US (1) US9047893B1 (enExample)
JP (1) JP6559965B2 (enExample)
CN (1) CN104821171B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
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US9269383B1 (en) * 2015-01-23 2016-02-23 HGST Netherlands B.V. Multi-sensor (MIMO) head having a back side antiferromagnetic middle shield
US9747933B1 (en) * 2016-02-16 2017-08-29 Tdk Corporation Magneto-resistive effect element having side shield integrated with upper shield
US11170808B1 (en) * 2021-01-14 2021-11-09 Western Digital Technologies, Inc. Dual free layer reader head with magnetic seed layer decoupled from shield

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CN1967893A (zh) * 2005-11-17 2007-05-23 日立环球储存科技荷兰有限公司 在磁阻传感器中用于改进交换偏置结构的斜角蚀刻的衬层
CN1983659A (zh) * 2005-12-14 2007-06-20 日立环球储存科技荷兰有限公司 电流垂直平面磁致电阻传感器
CN1988002A (zh) * 2005-12-22 2007-06-27 日立环球储存科技荷兰有限公司 控制磁致电阻传感器的自由层中的磁致伸缩的方法
US8320080B1 (en) * 2011-05-31 2012-11-27 Hitachi Global Storage Technologies Netherlands B.V. Three-terminal spin-torque oscillator (STO)

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JP3959881B2 (ja) * 1999-02-08 2007-08-15 Ｔｄｋ株式会社 磁気抵抗効果センサの製造方法
JP2000331316A (ja) * 1999-05-20 2000-11-30 Tdk Corp 磁気抵抗効果型ヘッド
JP2003158311A (ja) * 2001-11-20 2003-05-30 Sony Corp 磁気抵抗効果素子、磁気抵抗効果型磁気ヘッド、およびこれらの製造方法
US6865062B2 (en) 2002-03-21 2005-03-08 International Business Machines Corporation Spin valve sensor with exchange biased free layer and antiparallel (AP) pinned layer pinned without a pinning layer
JP2003318460A (ja) * 2002-04-24 2003-11-07 Alps Electric Co Ltd 磁気検出素子及びその製造方法
US7040005B2 (en) * 2003-03-19 2006-05-09 Headway Technologies, Inc. Process of making a GMR improvement in CPP spin valve head by inserting a current channeling layer (CCL)
US7265946B2 (en) * 2003-04-30 2007-09-04 Hitachi Global Storage Technologies Netherlands B.V. Multilayer self-pinned structure for CPP GMR
US7245463B2 (en) * 2003-07-25 2007-07-17 Hitachi Global Storage Technologies Netherlands B.V. Apparatus for extended self-pinned layer for a current perpendicular to plane head
US7171741B2 (en) * 2003-07-25 2007-02-06 Hitachi Global Storage Technologies Netherlands B.V. Method for extended self-pinned layer for a current perpendicular to plane head
US7099123B2 (en) * 2003-07-29 2006-08-29 Hitachi Global Storage Technologies Self-pinned abutted junction heads having an arrangement of a second hard bias layer and a free layer for providing a net net longitudinal bias on the free layer
US7092220B2 (en) * 2003-07-29 2006-08-15 Hitachi Global Storage Technologies Apparatus for enhancing thermal stability, improving biasing and reducing damage from electrostatic discharge in self-pinned abutted junction heads having a first self-pinned layer extending under the hard bias layers
US6980406B2 (en) * 2003-07-30 2005-12-27 Hitachi Global Storage Technologies Netherlands, B.V. Magnetic bias pinning layer for GMR sensor of a magnetic head for a hard disk drive
US7092221B2 (en) 2003-12-12 2006-08-15 Hitachi Global Storage Technologies Netherlands, B.V. Top CPP GMR/TV with back end of stripe pinned by insulating AFM
US7280325B1 (en) * 2004-03-31 2007-10-09 Western Digital (Fremont), Llc Ferromagnetic structure including a first section separated from a ferromagnetic layer by an electrically conductive nonmagnetic spacer and a second section elongated relative to the first section in at least one dimension
JP4002909B2 (ja) * 2004-06-04 2007-11-07 アルプス電気株式会社 Ｃｐｐ型巨大磁気抵抗効果ヘッド
US7342753B2 (en) * 2005-01-20 2008-03-11 Hitachi Global Storage Technologies Netherlands B.V. In-stack biasing of the free layer of a magnetoresistive read element
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US7869166B2 (en) * 2007-02-20 2011-01-11 Tdk Corporation Thin film magnetic head having a bias magnetic layer provided with antiferromagnetic layer and a pinned layer provided with hard magnetic layer
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US20090168235A1 (en) * 2007-12-27 2009-07-02 Kochan Ju Enhanced cpp read sensors with lateral spin transport
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US8941954B2 (en) * 2012-12-19 2015-01-27 HGST Netherlands B.V. Magnetic sensor with extended pinned layer and partial wrap around shield
US8842395B2 (en) * 2012-12-19 2014-09-23 HGST Netherlands B.V. Magnetic sensor having an extended pinned layer and shape enhanced bias structure

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1697025A (zh) * 2004-04-30 2005-11-16 日立环球储存科技荷兰有限公司 具有形成于端部区域的反铁磁钉扎层结构的自旋阀传感器
CN1967893A (zh) * 2005-11-17 2007-05-23 日立环球储存科技荷兰有限公司 在磁阻传感器中用于改进交换偏置结构的斜角蚀刻的衬层
CN1983659A (zh) * 2005-12-14 2007-06-20 日立环球储存科技荷兰有限公司 电流垂直平面磁致电阻传感器
CN1988002A (zh) * 2005-12-22 2007-06-27 日立环球储存科技荷兰有限公司 控制磁致电阻传感器的自由层中的磁致伸缩的方法
US8320080B1 (en) * 2011-05-31 2012-11-27 Hitachi Global Storage Technologies Netherlands B.V. Three-terminal spin-torque oscillator (STO)

Also Published As

Publication number Publication date
JP2015146224A (ja) 2015-08-13
CN104821171A (zh) 2015-08-05
US9047893B1 (en) 2015-06-02
JP6559965B2 (ja) 2019-08-14

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Applicant before: Hitachi Global Storage Technologies Netherlands B. V.

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