CN104678642A - 黑色矩阵与其制作方法及具有该黑色矩阵的液晶面板 - Google Patents
黑色矩阵与其制作方法及具有该黑色矩阵的液晶面板 Download PDFInfo
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Abstract
本发明提供一种黑色矩阵与其制作方法及具有该黑色矩阵的液晶面板,该黑色矩阵通过将混合树脂组合物涂布于基板上,干燥后通过光刻法进行图案化而制得,所述混合树脂组合物包括粘合树脂、光引发剂、小分子单体、溶剂、遮光材料、偶氮化合物、及添加剂,本发明的黑色矩阵中通过加入具有偏光特性的偶氮化合物,提升了遮光性能,提高了黑色矩阵的光学密度值,并可减少黑色矩阵中遮光材料的用量,增大黑色矩阵的阻抗值。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种黑色矩阵与其制作方法及具有该黑色矩阵的液晶面板。
背景技术
液晶显示装置(LCD,Liquid Crystal Display)具有机身薄、省电、无辐射等众多优点,得到了广泛的应用。如:液晶电视、移动电话、个人数字助理(PDA)、数字相机、计算机屏幕或笔记本电脑屏幕等。
通常液晶显示装置包括壳体、设于壳体内的液晶显示面板及设于壳体内的背光模组(Backlight module)。其中,液晶显示面板的结构主要是由一薄膜晶体管阵列基板(Thin Film Transistor Array Substrate,TFT Array Substrate)、一彩色滤光片基板(Color Filter,CF)、以及配置于两基板间的液晶层(LiquidCrystal Layer)所构成,其工作原理是通过在两片玻璃基板上施加驱动电压来控制液晶层的液晶分子的旋转,将背光模组的光线折射出来产生画面。
当前主流的液晶面板,在CF基板侧设置有黑色矩阵(Black Matrix,BM),以阻止每个像素处漏光的发生。黑色矩阵起初采用的是铬系材料的金属薄膜,但是由于工序复杂、成本高、环境污染等原因而逐渐被树脂型材料的黑矩阵取代。树脂型黑矩阵(RBM)是指将碳黑(Carbon)等遮光材料分散到树脂中,并与其他的树脂、光引发剂、单体、溶剂混和,将其涂布在CF基板上,干燥后并通过光刻法进行图案化而得到黑色矩阵。光学密度(OD)值是用来衡量遮光性能的物理单位,随着彩色滤光片的高性能化,对树脂黑矩阵的光学密度值的要求不断提高,现有提高光学密度值的方法主要有以下几种:
一、提高黑色矩阵光阻的膜厚。该种方法会导致涂在黑色矩阵上的彩色像素(R、G、B)所产生的表面阶差变大,因而会导致滤色器的平坦性降低,液晶的取向紊乱等问题。
二、在膜厚不变的前提下增加碳黑等遮光材料的含量。该种方法会使得树脂型黑矩阵的树脂比率减小,从而降低与基板的附着力;另外在曝光制程中碳黑易吸收紫外光,从而使底层的光阻因曝光不足不能固化而产生剥离。
三、降低碳黑的粒径来提高遮光性。该种方法易团聚而产生凝胶等问题。此外,由于碳黑为导电粒子,如果光阻体系中的碳黑较多时,会导致黑色矩阵的阻抗值(Rs)降低。
发明内容
本发明的目的在于提供一种黑色矩阵,具有较高的光学密度值,且遮光材料用量较少,具有较大的阻抗值。
本发明的另一目的在于提供一种黑色矩阵的制作方法,可提高黑色矩阵的光学密度值,并可减少遮光材料的用量,增大黑色矩阵的阻抗值,提高黑色矩阵成膜制程的稳定性。
本发明的再一目的在于提供一种液晶面板,其CF基板上的黑色矩阵兼具偏光特性与吸光特性,遮光效果强,具有较高的光学密度值,同时黑色矩阵中遮光材料的用量较少,具有较大的阻抗值。
为实现上述目的,本发明提供一种黑色矩阵,其通过将混合树脂组合物涂布于基板上,干燥后通过光刻法进行图案化而制得,其中,所述混合树脂组合物包括粘合树脂、光引发剂、小分子单体、溶剂、遮光材料、偶氮化合物、及添加剂,所述偶氮化合物具有偏光特性。
所述偶氮化合物的结构为其中,R1为氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基,R2为酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基。
所述遮光材料为黑色无机颜料或黑色有机颜料;所述粘合树脂为2-(甲基)丙烯酰氧乙基邻苯二甲酸;所述小分子单体为苯乙烯、丙烯酸脂或甲基丙烯酸脂;所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟);所述溶剂为丙二醇甲醚醋酸酯、环己酮、3-甲氧基丁基乙酸酯或二乙二醇丁醚醋酸酯。
所述黑色无机颜料为碳黑、氧化铬、氧化铁、氧化钛或石墨,所述黑色有机颜料为二萘嵌苯黑、花青黑或苯胺黑。
所述混合树脂组合物中,各组分的质量百分比为:粘合树脂5~10%、光引发剂0~1%、小分子单体0~1%、溶剂70~80%、遮光材料5-10%、偶氮化合物1-5%、添加剂0-0.5%。
本发明还提供一种黑色矩阵的制作方法,包括如下步骤:
步骤1、以所需制备的混合树脂组合物的总重量为基准,按照5~10wt%的比例称取粘合树脂、按照0~1wt%的比例称取光引发剂、按照0~1wt%的比例称取小分子单体、按照70~80wt%的比例称取溶剂、按照5-10wt%的比例称取遮光材料、按照1-5wt%的比例称取偶氮化合物、按照0-0.5wt%的比例称取添加剂,然后将上述准确称量的各组分混合均匀,制得混合树脂组合物;其中,所述偶氮化合物具有偏光特性;
步骤2、将上述混合树脂组合物涂布于基板上,通过软烤、曝光、显影、及硬烤制程制得具有偏光特性的黑色矩阵。
所述步骤1中,所述偶氮化合物的结构为其中,R1为氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基,R2为酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基。
所述步骤1中,所述遮光材料为黑色无机颜料或黑色有机颜料;所述粘合树脂为2-(甲基)丙烯酰氧乙基邻苯二甲酸;所述小分子单体为苯乙烯、丙烯酸脂或甲基丙烯酸脂;所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟);所述溶剂为丙二醇甲醚醋酸酯、环己酮、3-甲氧基丁基乙酸酯或二乙二醇丁醚醋酸酯。
所述黑色无机颜料为碳黑、氧化铬、氧化铁、氧化钛或石墨,所述黑色有机颜料为二萘嵌苯黑、花青黑或苯胺黑。
本发明还提供一种液晶面板,包括CF基板、与所述CF基板相对设置的TFT基板、及填充于所述CF基板与TFT基板之间的液晶层,所述CF基板上设有黑色矩阵与彩色光阻,所述黑色矩阵为如上任一所述的黑色矩阵。
本发明的有益效果:本发明的黑色矩阵,含有具有偏光特性的偶氮化合物,遮光性能好,具有较高的光学密度值,并且黑色矩阵中遮光材料的用量较少,具有较大的阻抗值。本发明的黑色矩阵的制作方法,通过在黑色矩阵中加入具有偏光特性的偶氮化合物,增强了黑色矩阵的遮光性能,提高了黑色矩阵的光学密度值,并且由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值,同时使得在曝光过程中,紫外光更容易照射到膜的底部,从而减少了许多工程上的问题,增加了制程的稳定性。本发明的液晶面板,CF基板上的黑色矩阵中含有具有偏光特性的偶氮化合物,兼具偏光特性与吸光特性,黑色矩阵除了利用遮光材料对经过下偏光片、液晶旋转后的偏振光进行吸收与遮挡外,还具有偏振功能,使得光传到黑色矩阵时,下偏光片、黑色矩阵形成了偏光系统,进一步增强了遮光性能,提高了黑色矩阵的光学密度值,同时由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值。
为了能更进一步了解本发明的特征以及技术内容,请参阅以下有关本发明的详细说明与附图,然而附图仅提供参考与说明用,并非用来对本发明加以限制。
附图说明
下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其他有益效果显而易见。
附图中,
图1为本发明的黑色矩阵中偶氮化合物分子轨道示意图;
图2为现有的黑色矩阵的阻抗值与碳黑含量的关系图;
图3为本发明的黑色矩阵的制作方法的流程图;
图4为本发明的液晶面板的剖面示意图;
图5为一种现有液晶面板的入光示意图;
图6为本发明的液晶面板的入光示意图;
图7为本发明的黑色矩阵与现有的黑色矩阵的光学密度值与碳黑含量的关系图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。
本发明首先提供一种黑色矩阵,其通过将混合树脂组合物涂布于基板上,干燥后通过光刻法进行图案化而制得,其中,所述混合树脂组合物包括粘合树脂(Polymer)、光引发剂(Photo Initiator)、小分子单体(Monomer)、溶剂(Solvent)、遮光材料、偶氮化合物、及添加剂,所述偶氮化合物具有偏光特性。所述粘合树脂能够形成膜层并支持交联反应,所述光引发剂能够在光照下快速形成自由基,所述小分子单体能够聚合官能团,所述溶剂能够调节涂布性能,所述遮光材料能够起到遮光作用,所述偶氮化合物具有偏光特性且能够均匀分散于体系中。
具体的,本发明采用的偶氮化合物为芳香烃偶氮化合物,其结构为其中,R1为推电子基团,如氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基等,R2为吸电子基团,如酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基等。
请参阅图1,为本发明的黑色矩阵中偶氮化合物的分子轨道示意图。所述偶氮化合物分子结构在两个芳环之间以N=N双键连接,形成共轭结构,分子链刚性很强,使得分子共面而呈线形排列,该种结构使得所述偶氮化合物具有偏光特性。
具体的,所述遮光材料可以为碳黑、氧化铬、氧化铁、氧化钛或石墨等无机颜料,也可以为耐热耐光与耐溶剂性较佳的二萘嵌苯黑(Perylene blace)、花青黑(cyanine blace)、苯胺黑(aniline black)等黑色有机颜料。
所述粘合树脂为碱溶性树脂,如2-(甲基)丙烯酰氧乙基邻苯二甲酸等。
所述小分子单体为具有不饱和双键结构的苯乙烯、丙烯酸脂或甲基丙烯酸脂等。
所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟)【商品名:CGI-2424,Ciba Specialty Chemicals】。
所述溶剂为丙二醇甲醚醋酸酯(PGMEA)、环己酮(Cyclohexanone)、3-甲氧基丁基乙酸酯(3-Methoxy butyl acetate)或二乙二醇丁醚醋酸酯(2-(2-butoxyethoxy)-Ethanol acetate)等。
具体地,所述混合树脂组合物中,各组分的质量百分比为:粘合树脂5~10%、光引发剂0~1%、小分子单体0~1%、溶剂70~80%、遮光材料5-10%、偶氮化合物1-5%、添加剂0-0.5%。
请参阅图2,为现有的黑色矩阵的阻抗值(Rs)与碳黑含量的关系图。
请参阅表1,为现有的黑色矩阵的光学密度(OD)值/阻抗(Rs)值与碳黑含量的关系数据表。
表1.黑色矩阵的光学密度值/阻抗值与碳黑含量的关系数据表
由图2和表1可知,在添加碳黑作为黑色矩阵的遮光材料时,所述液晶面板中黑色矩阵的光学密度值取决于碳黑的含量,相同条件下,黑色矩阵中碳黑的含量越多,相应的光学密度值就越大。然而由于碳黑具有导电特性,因此黑色矩阵中碳黑的含量越多,黑色矩阵的阻抗值就越小。而本发明中,由于偶氮化合物的加入,使得本发明的黑色矩阵在具有相同光学密度值的情况下,碳黑等遮光材料的用量可以相对减少,从而增加了黑色矩阵的阻抗值。
本发明的黑色矩阵,由于含有具有偏光特性的偶氮化合物,因此遮光性能好,具有较高的光学密度值,并且黑色矩阵中遮光材料的用量较少,从而具有较大的阻抗值。
请参阅图3,本发明还提供一种黑色矩阵的制作方法,包括如下步骤:
步骤1、以所需制备的混合树脂组合物的总重量为基准,按照5~10wt%的比例称取粘合树脂、按照0~1wt%的比例称取光引发剂、按照0~1wt%的比例称取小分子单体、按照70~80wt%的比例称取溶剂、按照5-10wt%的比例称取遮光材料、按照1-5wt%的比例称取偶氮化合物、按照0-0.5wt%的比例称取添加剂,然后将上述准确称量的各组分混合均匀,制得混合树脂组合物;其中,所述偶氮化合物具有偏光特性。
具体地,所述遮光材料可以为碳黑、氧化铬、氧化铁、氧化钛或石墨等无机颜料,也可以为耐热耐光与耐溶剂性较佳的二萘嵌苯黑(Perylene blace)、花青黑(cyanine blace)、苯胺黑(aniline black)等黑色有机颜料。
所述粘合树脂为碱溶性树脂,如2-(甲基)丙烯酰氧乙基邻苯二甲酸等。
所述小分子单体为具有不饱和双键结构的苯乙烯、丙烯酸脂或甲基丙烯酸脂等。
所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟)【商品名:CGI-2424,Ciba Specialty Chemicals】。
所述溶剂为丙二醇甲醚醋酸酯(PGMEA)、环己酮(Cyclohexanone)、3-甲氧基丁基乙酸酯(3-Methoxy butyl acetate)或二乙二醇丁醚醋酸酯(2-(2-butoxyethoxy)-Ethanol acetate)等。
所述偶氮化合物的结构为其中,R1为推电子基团,如氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基等,R2为吸电子基团,如酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基等。
步骤2、将上述混合树脂组合物涂布于基板上,通过软烤、曝光、显影、及硬烤制程制得具有偏光特性的黑色矩阵。
值得说明的是,所述硬烤制程中没有对黑色矩阵进行定向拉伸,从而使制得的黑色矩阵对偏振光的选择相对随机。
上述黑色矩阵的制作方法,通过在黑色矩阵中加入具有偏光特性的偶氮化合物,增强了黑色矩阵的遮光性能,提高了黑色矩阵的光学密度值,并且由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值,同时使得在黑色矩阵的黄光制程的曝光过程中,紫外光更容易照射到膜的底部,从而减少了许多工程上的问题,增加了制程的稳定性。
请参阅图4,本发明还提供一种液晶面板,包括CF基板1、与所述CF基板1相对设置的TFT基板2、填充于所述CF基板1与TFT基板2之间的液晶层3、设于所述CF基板1上表面的上偏光片4、设于所述TFT基板2下表面的下偏光片5、及粘结所述CF基板1与TFT基板2的框胶6,所述CF基板1上设有黑色矩阵11与彩色光阻,所述黑色矩阵11为通过将混合树脂组合物涂布于基板上,干燥后通过光刻法进行图案化而制得,所述混合树脂组合物包括粘合树脂、光引发剂、小分子单体、溶剂、遮光材料、偶氮化合物、及添加剂,所述偶氮化合物具有偏光特性。
具体的,所述遮光材料可以为碳黑、氧化铬、氧化铁、氧化钛或石墨等无机颜料,也可以为耐热耐光与耐溶剂性较佳的二萘嵌苯黑(Perylene blace)、花青黑(cyanine blace)、苯胺黑(aniline black)等黑色有机颜料。
所述粘合树脂为碱溶性树脂,如2-(甲基)丙烯酰氧乙基邻苯二甲酸等。
所述小分子单体为具有不饱和双键结构的苯乙烯、丙烯酸脂或甲基丙烯酸脂等。
所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟)【商品名:CGI-2424,Ciba Specialty Chemicals】。
所述溶剂为丙二醇甲醚醋酸酯(PGMEA)、环己酮(Cyclohexanone)、3-甲氧基丁基乙酸酯(3-Methoxy butyl acetate)或二乙二醇丁醚醋酸酯(2-(2-butoxyethoxy)-Ethanol acetate)等。
所述偶氮化合物的结构为其中,R1为推电子基团,如氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基等,R2为吸电子基团,如酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基等。
具体地,所述混合树脂组合物中,各组分的质量百分比为:粘合树脂5~10%、光引发剂0~1%、小分子单体0~1%、溶剂70~80%、遮光材料5-10%、偶氮化合物1-5%、添加剂0-0.5%。
请参阅图5,为一种现有液晶面板的入光示意图,该现有液晶面板的黑色矩阵110包括粘合树脂、光引发剂、小分子单体、溶剂、碳黑、及添加剂,不含有偶氮化合物,因而黑色矩阵110只具有遮光效果,当背光由下偏光片500射入后,所述黑色矩阵110利用碳黑成分对经过下偏光片500、液晶旋转后的偏振光进行吸收与遮挡,最终光线由上偏光片400射出,由于光透过彩色滤光基板的强度只取决于碳黑含量的多少,因此遮光性能较差,透光率相对较高。
请参阅图6,为本发明的液晶面板的入光示意图,本发明的液晶面板的黑色矩阵11中加入了具有偏光特性的偶氮化合物。当背光由下偏光片5射入后,黑色矩阵11除了利用碳黑等遮光材料对经过下偏光片5、液晶旋转后的偏振光进行吸收与遮挡外,还具有偏振功能,使得光传到黑色矩阵11时,下偏光片5与黑色矩阵11形成了偏光系统,最终光线由上偏光片4射出。所述黑色矩阵11兼具偏光特性与吸光特性,进一步增强了遮光性能,降低了透光率(最多可使透光率降到3.5%以内),从而提高了黑色矩阵11的光学密度值,同时由于偶氮化合物的加入,使得黑色矩阵11中遮光材料的用量减少,增加了黑色矩阵11的阻抗值。
请参阅图7,为本发明的黑色矩阵与现有的黑色矩阵的光学密度值与碳黑含量的关系图,其中,本发明的黑色矩阵中含有偶氮化合物,而现有的黑色矩阵中不含有偶氮化合物。由图7可以看出,在黑色矩阵具有相同的碳黑含量的情况下,本发明的黑色矩阵比现有的黑色矩阵的光学密度值更高,具有更强的遮光性能。同样的,在具有相同的光学密度值的情况下,本发明的黑色矩阵中碳黑的含量更低,因此与现有的黑色矩阵相比,本发明的黑色矩阵具有更高的阻抗值。
上述液晶面板,其CF基板上的黑色矩阵中含有具有偏光特性的偶氮化合物,兼具偏光特性与吸光特性,黑色矩阵除了利用遮光材料对经过下偏光片、液晶旋转后的偏振光进行吸收与遮挡外,还具有偏振功能,使得光传到黑色矩阵时,下偏光片、黑色矩阵形成了偏光系统,进一步增强了遮光性能,提高了黑色矩阵的光学密度值,同时由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值。
综上所述,本发明的黑色矩阵,含有具有偏光特性的偶氮化合物,遮光性能好,具有较高的光学密度值,并且黑色矩阵中遮光材料的用量较少,具有较大的阻抗值。本发明的黑色矩阵的制作方法,通过在黑色矩阵中加入具有偏光特性的偶氮化合物,增强了黑色矩阵的遮光性能,提高了黑色矩阵的光学密度值,并且由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值,同时使得在曝光过程中,紫外光更容易照射到膜的底部,从而减少了许多工程上的问题,增加了制程的稳定性。本发明的液晶面板,CF基板上的黑色矩阵中含有具有偏光特性的偶氮化合物,兼具偏光特性与吸光特性,黑色矩阵除了利用遮光材料对经过下偏光片、液晶旋转后的偏振光进行吸收与遮挡外,还具有偏振功能,使得光传到黑色矩阵时,下偏光片、黑色矩阵形成了偏光系统,进一步增强了遮光性能,提高了黑色矩阵的光学密度值,同时由于偶氮化合物的加入,使得黑色矩阵中遮光材料的用量减少,增加了黑色矩阵的阻抗值。
以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。
Claims (10)
1.一种黑色矩阵,其通过将混合树脂组合物涂布于基板上,干燥后通过光刻法进行图案化而制得,其特征在于,所述混合树脂组合物包括粘合树脂、光引发剂、小分子单体、溶剂、遮光材料、偶氮化合物、及添加剂,所述偶氮化合物具有偏光特性。
2.如权利要求1所述的黑色矩阵,其特征在于,所述偶氮化合物的结构为其中,R1为氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基,R2为酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基。
3.如权利要求1所述的黑色矩阵,其特征在于,所述遮光材料为黑色无机颜料或黑色有机颜料;所述粘合树脂为2-(甲基)丙烯酰氧乙基邻苯二甲酸;所述小分子单体为苯乙烯、丙烯酸脂或甲基丙烯酸脂;所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟);所述溶剂为丙二醇甲醚醋酸酯、环己酮、3-甲氧基丁基乙酸酯或二乙二醇丁醚醋酸酯。
4.如权利要求3所述的黑色矩阵,其特征在于,所述黑色无机颜料为碳黑、氧化铬、氧化铁、氧化钛或石墨,所述黑色有机颜料为二萘嵌苯黑、花青黑或苯胺黑。
5.如权利要求1所述的黑色矩阵,其特征在于,所述混合树脂组合物中,各组分的质量百分比为:粘合树脂5~10%、光引发剂0~1%、小分子单体0~1%、溶剂70~80%、遮光材料5-10%、偶氮化合物1-5%、添加剂0-0.5%。
6.一种黑色矩阵的制作方法,其特征在于,包括如下步骤:
步骤1、以所需制备的混合树脂组合物的总重量为基准,按照5~10wt%的比例称取粘合树脂、按照0~1wt%的比例称取光引发剂、按照0~1wt%的比例称取小分子单体、按照70~80wt%的比例称取溶剂、按照5-10wt%的比例称取遮光材料、按照1-5wt%的比例称取偶氮化合物、按照0-0.5wt%的比例称取添加剂,然后将上述准确称量的各组分混合均匀,制得混合树脂组合物;其中,所述偶氮化合物具有偏光特性;
步骤2、将上述混合树脂组合物涂布于基板上,通过软烤、曝光、显影、及硬烤制程制得具有偏光特性的黑色矩阵。
7.如权利要求6所述的黑色矩阵的制作方法,其特征在于,所述步骤1中,所述偶氮化合物的结构为其中,R1为氨基、羟基、烷氧基、酯基、氨酰基、胺醛基、苯基或烷基,R2为酰基、醛基、羧基、酰氨基、磺酸基、腈基、硝基、卤仿基或季胺基。
8.如权利要求6所述的黑色矩阵的制作方法,其特征在于,所述步骤1中,所述遮光材料为黑色无机颜料或黑色有机颜料;所述粘合树脂为2-(甲基)丙烯酰氧乙基邻苯二甲酸;所述小分子单体为苯乙烯、丙烯酸脂或甲基丙烯酸脂;所述光引发剂为乙烷酮或1-[9-乙基-6(2-甲基苯甲酰基)-9氢-咔唑-3-取代基]-,1-(氧-乙酰肟);所述溶剂为丙二醇甲醚醋酸酯、环己酮、3-甲氧基丁基乙酸酯或二乙二醇丁醚醋酸酯。
9.如权利要求8所述的黑色矩阵的制作方法,其特征在于,所述黑色无机颜料为碳黑、氧化铬、氧化铁、氧化钛或石墨,所述黑色有机颜料为二萘嵌苯黑、花青黑或苯胺黑。
10.一种液晶面板,其特征在于,包括CF基板(1)、与所述CF基板(1)相对设置的TFT基板(2)、及填充于所述CF基板(1)与TFT基板(2)之间的液晶层(3),所述CF基板(1)上设有黑色矩阵(11)与彩色光阻,所述黑色矩阵(11)为权利要求1-5任意一项所述的黑色矩阵。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105807479A (zh) * | 2016-05-24 | 2016-07-27 | 京东方科技集团股份有限公司 | 一种显示面板、其制作方法及显示装置 |
CN108490738A (zh) * | 2018-03-22 | 2018-09-04 | 深圳市华星光电技术有限公司 | 黑色矩阵材料组合物及黑色矩阵的制作方法 |
WO2020051964A1 (zh) * | 2018-09-11 | 2020-03-19 | 武汉华星光电半导体显示技术有限公司 | Oled显示装置 |
CN111522199A (zh) * | 2020-04-21 | 2020-08-11 | 武汉华星光电技术有限公司 | 光阻及其制备方法、显示装置 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1324452A (zh) * | 1998-10-28 | 2001-11-28 | 奥普逖娃公司 | 二色性偏光镜及其制造方法 |
CN1867637A (zh) * | 2003-10-14 | 2006-11-22 | 三菱化学株式会社 | 各向异性染料膜用染料、各向异性染料膜用染料组合物、各向异性染料膜和偏振元件 |
CN101016420A (zh) * | 2006-02-10 | 2007-08-15 | 明德国际仓储贸易(上海)有限公司 | 偶氮染料化合物与及其偏光膜 |
CN101075047A (zh) * | 2005-10-06 | 2007-11-21 | 京东方显示器科技公司 | 带有具备偏振功能的树脂黑色矩阵的液晶显示装置 |
CN101078779A (zh) * | 2006-05-24 | 2007-11-28 | 住友化学株式会社 | 染料基偏振膜 |
CN102736331A (zh) * | 2011-04-12 | 2012-10-17 | 凸版印刷株式会社 | 液晶显示装置及其制造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1020245C2 (nl) * | 2001-03-28 | 2002-10-30 | Sumitomo Chemical Co | Polarisatiefilm die een monoazo verbinding of zout daarvan bevat. |
EP1593713A1 (en) * | 2004-05-04 | 2005-11-09 | Rolic AG | Polymerizable dichromophoric dichroic azo dyes |
KR20080067816A (ko) * | 2007-01-17 | 2008-07-22 | 제일모직주식회사 | 블랙매트릭스용 감광성 수지 조성물 및 그로부터 제조되는블랙매트릭스 |
JP4959411B2 (ja) * | 2007-04-27 | 2012-06-20 | 富士フイルム株式会社 | 着色光重合性組成物並びにそれを用いたカラーフィルタ及びカラーフィルタの製造方法 |
JP2011186214A (ja) * | 2010-03-09 | 2011-09-22 | Asahi Kasei E-Materials Corp | 感光性樹脂組成物 |
KR101638669B1 (ko) * | 2010-12-28 | 2016-07-11 | 다이니치 세이카 고교 가부시키가이샤 | 흑색 아조 색소, 제조방법, 착색 조성물, 착색방법 및 착색 물품류 |
CN103890648B (zh) * | 2011-10-03 | 2019-06-18 | 罗利克有限公司 | 具有强uv-二色性的光定向层 |
TWI472877B (zh) * | 2012-11-20 | 2015-02-11 | Chi Mei Corp | 感光性樹脂組成物、彩色濾光片及其液晶顯示元件 |
-
2015
- 2015-03-23 CN CN201510128299.3A patent/CN104678642A/zh active Pending
- 2015-05-13 US US14/764,986 patent/US20180246368A1/en not_active Abandoned
- 2015-05-13 WO PCT/CN2015/078867 patent/WO2016149996A1/zh active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1324452A (zh) * | 1998-10-28 | 2001-11-28 | 奥普逖娃公司 | 二色性偏光镜及其制造方法 |
CN1867637A (zh) * | 2003-10-14 | 2006-11-22 | 三菱化学株式会社 | 各向异性染料膜用染料、各向异性染料膜用染料组合物、各向异性染料膜和偏振元件 |
CN101075047A (zh) * | 2005-10-06 | 2007-11-21 | 京东方显示器科技公司 | 带有具备偏振功能的树脂黑色矩阵的液晶显示装置 |
CN101016420A (zh) * | 2006-02-10 | 2007-08-15 | 明德国际仓储贸易(上海)有限公司 | 偶氮染料化合物与及其偏光膜 |
CN101078779A (zh) * | 2006-05-24 | 2007-11-28 | 住友化学株式会社 | 染料基偏振膜 |
CN102736331A (zh) * | 2011-04-12 | 2012-10-17 | 凸版印刷株式会社 | 液晶显示装置及其制造方法 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105807479A (zh) * | 2016-05-24 | 2016-07-27 | 京东方科技集团股份有限公司 | 一种显示面板、其制作方法及显示装置 |
WO2017202265A1 (zh) * | 2016-05-24 | 2017-11-30 | 京东方科技集团股份有限公司 | 显示面板、制作其的方法及包含其的显示装置 |
US20180188600A1 (en) * | 2016-05-24 | 2018-07-05 | Boe Technology Group Co., Ltd. | Display panel, method of producing the same, and display apparatus comprising the same |
US10816847B2 (en) | 2016-05-24 | 2020-10-27 | Boe Technology Group Co., Ltd. | Display panel, method of producing the same, and display apparatus comprising the same |
CN105807479B (zh) * | 2016-05-24 | 2021-02-19 | 京东方科技集团股份有限公司 | 一种显示面板、其制作方法及显示装置 |
CN108490738A (zh) * | 2018-03-22 | 2018-09-04 | 深圳市华星光电技术有限公司 | 黑色矩阵材料组合物及黑色矩阵的制作方法 |
WO2020051964A1 (zh) * | 2018-09-11 | 2020-03-19 | 武汉华星光电半导体显示技术有限公司 | Oled显示装置 |
CN111522199A (zh) * | 2020-04-21 | 2020-08-11 | 武汉华星光电技术有限公司 | 光阻及其制备方法、显示装置 |
CN111522199B (zh) * | 2020-04-21 | 2023-11-28 | 武汉华星光电技术有限公司 | 光阻及其制备方法、显示装置 |
CN112859409A (zh) * | 2021-02-09 | 2021-05-28 | 捷开通讯(深圳)有限公司 | 显示面板、显示面板组件及电子设备 |
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