CN104658836B - Electrode of electric insulation structure - Google Patents

Electrode of electric insulation structure Download PDF

Info

Publication number
CN104658836B
CN104658836B CN201310597646.8A CN201310597646A CN104658836B CN 104658836 B CN104658836 B CN 104658836B CN 201310597646 A CN201310597646 A CN 201310597646A CN 104658836 B CN104658836 B CN 104658836B
Authority
CN
China
Prior art keywords
electrode
support block
insulating ceramics
electrode tip
ceramic component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310597646.8A
Other languages
Chinese (zh)
Other versions
CN104658836A (en
Inventor
徐红兵
王明旭
王银翘
蔡立君
林涛
卢勇
韩伟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Southwestern Institute of Physics
Original Assignee
Southwestern Institute of Physics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Southwestern Institute of Physics filed Critical Southwestern Institute of Physics
Priority to CN201310597646.8A priority Critical patent/CN104658836B/en
Publication of CN104658836A publication Critical patent/CN104658836A/en
Application granted granted Critical
Publication of CN104658836B publication Critical patent/CN104658836B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/02Details
    • H01J17/04Electrodes; Screens
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/02Details
    • H01J17/04Electrodes; Screens
    • H01J17/10Anodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00Gas-filled discharge tubes
    • H01J2217/04Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00Gas-filled discharge tubes
    • H01J2217/04Electrodes
    • H01J2217/10Anodes

Landscapes

  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

The invention belongs to a glow discharge electrode and particularly relates to an electrode of an improved electric insulation structure. The electrode can be applied to glow discharge cleaning in large-size, middle-size and small-size fusion devices. The electrode comprises a re-deposition preventing support block and an electrode head. The re-deposition preventing support block, the electrode head, a first insulating ceramic component and a third insulating ceramic component are connected together by a bolt and a nut. Butterfly-shaped washers are placed on the first insulating ceramic component and the third insulating ceramic component. A second insulating ceramic component is mounted on the first insulating ceramic component. An electrode head cover plate is spot-welded on the surface of the electrode head. Vacuum chamber fixing bolts support the electrode in a vacuum chamber. The electrode has the advantages that 1, the number of sputtered impurity particles deposited on all surfaces of the electrode is decreased; 2, the performance of insulation between the electrode and the vacuum chamber is improved; 3, the electrode is simple in structure and convenient to mount and dissemble.

Description

A kind of electrode of electrically insulated structures
Technical field
The invention belongs to a kind of glow-discharge electrode, and in particular to a kind of electrode of improved electric insulation, can be applicable to big Glow Discharge Cleaning in middle-size and small-size fusion facility.
Background technology
In fusion field, Glow Discharge Cleaning, because it is simple to operate, energy consumption is little, and can be effectively reduced hydrogen concentration and Part carbon oxygen impurities, and extensively applied by each device.During glow discharge, as anode, vacuum chamber is as negative electrode, profit for electrode Positive ion bombardment vacuum chamber wall under being accelerated with cathode sheaths, foreign particle on wall for the absorption is bombarded out, then by Vacuum-pumping system withdrawing device, the purpose reach wall cleaning, tempering.But during aura, the foreign particle sputtering goes out After coming may redeposited on each surface of electrode, such as accumulation excessively can affect the insulating properties between electrode and vacuum chamber.This Bright be aiming at reducing foreign particle redeposited on each surface of electrode, a kind of electrode of improved electric insulation is proposed.
Content of the invention
It is an object of the invention to provide a kind of electrode of electrically insulated structures, it can reduce foreign particle redeposition in electrode Each surface, improves the insulating properties between electrode and vacuum chamber.
The present invention is achieved in that a kind of electrode of electrically insulated structures, and it includes anti-redeposition support block, electrode tip, By bolts and nuts, anti-redeposition support block, electrode tip, the first insulating ceramics assembly and the 3rd insulating ceramics assembly are connected Together, butterfly gasket is placed on the first insulating ceramics assembly and the 3rd insulating ceramics assembly, and the second insulating ceramics assembly is installed On the first insulating ceramics assembly, in electrode head surface, vacuum chamber fixing bolt is by electrode supporting true for electrode epicranial plate spot welding In empty room.
Described redeposited support block and electrode tip surrounding have the gap of 5mm, have necessarily continuous in its inner groovy lower plane The inclined plane of radian, forms greatest gradient 1.5mm gap with electrode tip bottom surface section contact surface.
Described entirely anti-redeposition support block inner fluted surface scribble the second insulative ceramic coatings and electrode tip surrounding and Lower surface is uniformly sprayed with the first insulative ceramic coatings.
It is an advantage of the invention that the foreign particle that 1, minimizing sputters is deposited on each surface of electrode;2nd, improve electrode with true Insulating properties between empty room;3rd, system structure is simple, install and convenient disassembly etc..
Brief description
Fig. 1 is the electrode structure schematic diagram for a kind of electric insulation provided by the present invention.
Wherein:1 anti-redeposition support block;2 electrode tips, 3 first insulating ceramics assemblies, 4 second insulating ceramics assemblies, 5 spiral shells Bolt, 6 butterfly gaskets, 7 electrode epicranial plates, 8 first insulative ceramic coatings, 9 second insulative ceramic coatings, 10 the 3rd insulating ceramics groups Part, 11 nuts, 12 vacuum chamber fixing bolts.
Specific embodiment
With reference to the accompanying drawings and examples the present invention is described in detail:
As shown in figure 1, a kind of electrode of the electrically insulated structures for glow-discharge electrode includes anti-redeposition support block 1, Electrode tip 2, insulating ceramics assembly 3,4,10, butterfly gasket 6, bolt 5, electrode epicranial plate 7, insulative ceramic coatings 8,9, nut 11, vacuum chamber fixing bolt 12.
Will be exhausted to anti-redeposition support block 1, electrode tip 2, the first insulating ceramics assembly 3 and the 3rd with nut 11 by bolt 5 Edge ceramic component 10 links together, and butterfly gasket 6 is placed on the first insulating ceramics assembly 3 and the 3rd insulating ceramics assembly 10, Second insulating ceramics assembly 4 is arranged on the first insulating ceramics assembly 3, and 7 points of electrode epicranial plate is welded in electrode tip 2 surface, vacuum Room fixing bolt 12 is indoor in vacuum by electrode supporting.
Redeposited support block 1 and electrode tip 2 surrounding have the gap of 5mm, have done certain continuous arc in its inner groovy lower plane The inclined plane of degree, forms, with electrode tip bottom surface section contact surface, the gap that greatest gradient is 1.5mm, entirely anti-redeposited support Block 1 inner fluted surface scribbles the second insulative ceramic coatings 9 and electrode tip 2 surrounding and lower surface is uniformly sprayed with the first insulating ceramics and applies Layer 8.During glow discharge, bombardment a large amount of foreign particles out only have small part can sink by the gap entrance of 5mm is anti-again Long-pending support block 1 and electrode tip 2 surrounding, most of foreign particle extracts vacuum chamber out by vacuum-pumping system.Due to anti-redeposition Support block 1 groove lower surface forms greatest gradient 1.5mm gap with electrode tip 2 lower surface, and finally major part can be deposited on and prevent Depositing support block 1 groove lower plane, so can effectively reduce the foreign particle sputtering and be deposited on each surface of electrode tip 2, improve Insulating properties between electrode and vacuum chamber.

Claims (2)

1. a kind of electrode of electrically insulated structures, it include anti-redeposition support block (1), electrode tip (2) it is characterised in that:Pass through Anti- redeposition support block (1), electrode tip (2), the first insulating ceramics assembly (3) and the 3rd are insulated by bolt (5) with nut (11) Ceramic component (10) links together, and butterfly gasket (6) is individually positioned in the first insulating ceramics assembly (3) and the 3rd insulating ceramics Inside assembly (10), the second insulating ceramics assembly (4) is arranged on the first insulating ceramics assembly (3), electrode epicranial plate (7) spot welding In electrode tip (2) surface, electrode supporting is indoor in vacuum, the described redeposited support block (1) of vacuum chamber fixing bolt (12) There is the gap of 5mm with electrode tip (2) surrounding, have the inclination of necessarily continuous radian in redeposited support block (1) inner groovy lower plane Face, forms, with electrode tip (2) bottom surface section contact surface, the gap that greatest gradient is 1.5mm.
2. as claimed in claim 1 a kind of electrode of electrically insulated structures it is characterised in that:Entirely described anti-redeposited support Block (1) inner fluted surface scribbles the second insulative ceramic coatings (9) and electrode tip (2) surrounding and lower surface is uniformly sprayed with the first insulation Ceramic coating (8).
CN201310597646.8A 2013-11-22 2013-11-22 Electrode of electric insulation structure Active CN104658836B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310597646.8A CN104658836B (en) 2013-11-22 2013-11-22 Electrode of electric insulation structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310597646.8A CN104658836B (en) 2013-11-22 2013-11-22 Electrode of electric insulation structure

Publications (2)

Publication Number Publication Date
CN104658836A CN104658836A (en) 2015-05-27
CN104658836B true CN104658836B (en) 2017-02-22

Family

ID=53249830

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310597646.8A Active CN104658836B (en) 2013-11-22 2013-11-22 Electrode of electric insulation structure

Country Status (1)

Country Link
CN (1) CN104658836B (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008202942A (en) * 2007-02-16 2008-09-04 Kyoto Univ Fusion neutron generator
US7639770B2 (en) * 2008-04-22 2009-12-29 The Regents Of The University Of California Cylindrical neutron generator
CN202034343U (en) * 2010-12-29 2011-11-09 中核(北京)核仪器厂 Boron proportional counter tube for out pile nuclear measuring detector
CN203026477U (en) * 2012-12-26 2013-06-26 核工业西南物理研究院 Glow discharge electrode with slot electrical insulation structure
CN203573941U (en) * 2013-11-22 2014-04-30 核工业西南物理研究院 Electrode of electric insulation structure

Also Published As

Publication number Publication date
CN104658836A (en) 2015-05-27

Similar Documents

Publication Publication Date Title
JP5824072B2 (en) Sputtering equipment
TW201214522A (en) Sputtering chamber, pre-clean chamber and plasma processing apparatus
US20130092533A1 (en) Sputter deposition apparatus
JP5725460B2 (en) Sputtering equipment
CN114658623A (en) Integrated magnetic screen anode structure for low-power Hall thruster
CN203573941U (en) Electrode of electric insulation structure
CN103887133B (en) A kind of magnetic-field-enhanced linear large-area ionic source
CN109192641B (en) Penning cold cathode ion source
CN104658836B (en) Electrode of electric insulation structure
WO2023040676A1 (en) Radio-frequency ion source
CN103695839B (en) A kind of ion gun cleaning device being applied in filming equipment
CN106884150B (en) Suspension anode and magnetron sputtering device with same
KR20100129427A (en) Ion pump with surface treated permanent magnet
KR101926676B1 (en) Target assembly
CN203582958U (en) Ion source cleaner used in coating equipment
CN209989458U (en) Circulating sputtering equipment
US20130306464A1 (en) Sputtering target and sputtering apparatus and sputtering method using the same
CN205839120U (en) A kind of vacuum furnace body and the impressed current anode of use thereof
JP2012515269A (en) Charged particle beam PVD apparatus, shield apparatus, coating chamber for coating a substrate, and coating method
CN115354283B (en) Target pretreatment device
CN219218135U (en) Cathode device of magnetron sputtering coating equipment and magnetron sputtering coating equipment
CN115522174B (en) Magnetic field adjustable active anode and magnetron sputtering equipment
CN113445013B (en) High-power magnetron sputtering film deposition device and method for inner wall of rotor bearing inner ring
CN202347090U (en) Vacuum magnetron sputtering film plating equipment with little dust fall
CN210314477U (en) Inner wall pollution protection device of PECVD (plasma enhanced chemical vapor deposition) equipment

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant