CN104651775A - Device for improving ion nitriding effect - Google Patents

Device for improving ion nitriding effect Download PDF

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Publication number
CN104651775A
CN104651775A CN201510120205.8A CN201510120205A CN104651775A CN 104651775 A CN104651775 A CN 104651775A CN 201510120205 A CN201510120205 A CN 201510120205A CN 104651775 A CN104651775 A CN 104651775A
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CN
China
Prior art keywords
ion nitriding
cylinder
nitriding
ion
nitriding effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510120205.8A
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Chinese (zh)
Inventor
张道达
张海军
尧登灿
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JIANGXI MACHINERY SCIENCE INST
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JIANGXI MACHINERY SCIENCE INST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIANGXI MACHINERY SCIENCE INST filed Critical JIANGXI MACHINERY SCIENCE INST
Priority to CN201510120205.8A priority Critical patent/CN104651775A/en
Publication of CN104651775A publication Critical patent/CN104651775A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

The invention discloses a cylindrical device for improving an ion nitriding effect. The cylindrical device is named as a porous assisted nitriding cylinder. The height of the cylinder is about 200cm, the internal diameter of the cylinder is about 45mm, the external diameter of the cylinder is about 75mm, a certain number of through holes with the diameters of smaller than 10mm are formed in the cylinder, and the density and arrangement conditions of the holes are determined according to actual demands. When being used for ion nitriding, the cylindrical device is placed on a cathode disc of an ion nitriding furnace; and relatively-high temperature is generated in the holes in the device by virtue of a hollow cathode effect of ion nitriding. The device can be filled with a catalyst, a compound, metals and other substances. By using the device, the uniformity of the furnace temperature can be improved, and the efficiency of the catalyst can be increased.

Description

A kind of device improving ion nitriding effect
Technical field
The present invention relates to technical field of heat treatment, especially a kind of device improving ion nitriding effect.
Background technology
Ionitriding is as a kind of Surface thermo-chemical treatment, and it not only can improve workpiece surface hardness and surface property, the more important thing is that the distortion of the workpiece after ion nitriding is minimum, need not reprocess.In addition, ion nitriding is pollution-free in addition, consumes energy low, is easy to the advantages such as control.So the application of ion nitriding technology constantly expands.But the shortcomings such as the time of ion nitriding is long, nitriding depth is thin govern its development.Although a lot of scientific worker, in order to improve alloying layer thickness and shorten nitriding time, also takes a lot of method.As: adopt catalyzer, carry out workpiece surface shot-peening, adopt temperature cycling technique etc.But these methods have certain limitation, poor effect, and actual application value is lower.
When using catalyzer to carry out ion nitriding, the temperature due to ion nitriding is lower and the mode difference of stove put into by catalyzer, thus makes the DeGrain of catalyzer.
Summary of the invention
The object of the invention is to improve ionitriding effect, improve the effect of catalyzer in ionitriding process, change the mode etc. of tufftride.
The invention provides a kind of device, this device is round shape, and material is can electro-conductive material.The body of cylinder has the aperture of some amount, aperture is through hole, and its diameter is all less than 10mm.About cylinder heights 200cm and internal diameter about 45mm, external diameter about 75mm, the both ends open of cylinder or one end open one end are closed.
When this device uses, can keep flat, vertically place, also can hang placement, best modes of emplacement is vertical placement.No matter which kind of modes of emplacement, this device all must be connected with negative electrode.
Owing to have employed technique scheme, the present invention has following beneficial effect compared with modern technologies: (1) the present invention utilizes hollow cathode effect, makes cylindrical wall temperature higher than surrounding environment, as boosting thermal source, thus can improve furnace temperature; (2) inside of this device can catalyst filling, metal and the material such as nonmetal.Because the temperature of this device is higher, the volatilization of its inner material can be accelerated, thus improve the effect of ion nitriding; (3) material of carbon containing is loaded onto in this device inside, thus changes the mode of tufftride, tufftride is simplified and reduces the cost of tufftride; (4) utilization of the present invention can speeding-up ion nitriding process.
Accompanying drawing explanation
Fig. 1 porous assists the front view schematic diagram of nitriding cylinder.
Fig. 2 porous assists nitriding cylinder photo in kind in nitriding process.
Embodiment
As shown in Figure 1, this device is vertically placed on cathode disc, and keeps suitable distance with other workpiece.Ready catalyzer or other desired material are put into cylinder (material put into will be tried one's best drying, pure, preferably particle dress, and the amount put into is that 1/3 of cylinder heights is advisable).Then, cover body of heater and be evacuated down to about 50pa, starting power supply, beating arc, intensification, logical ammonia.After arriving determined temperature, turn off pulse two hours, and then open pulse, after about two hours, then turn off pulse.Circulation like this.

Claims (2)

1. improve a device for ion nitriding effect, it is characterized in that: the cylinder that this device is made of metal, about cylinder heights 200cm and internal diameter about 45mm, external diameter about 75mm, remain silent in its upper and lower both ends open or one end open one end.
2. require described a kind of device improving ion nitriding effect according to right 1, it is characterized in that
The through hole of some amount on stack shell, its diameter is all less than 10mm.
3 require described a kind of device improving ion nitriding effect according to right 1, it is characterized in that when ionitriding, and according to actual needs, this device inside can be empty, also can load the material of the auxiliary nitridings such as catalyzer, metal, compound.
4 require described a kind of device improving ion nitriding effect according to right 1, it is characterized in that the modes of emplacement of this device on ion-nitriding furnace can be establish placement, fall to hang, place for flat time.
5require described a kind of device improving ion nitriding effect according to right 1, its this device of feature can be used in ion nitriding, ionitrocarburizing, Plasma Sulfo-nitriding, ion nitrogen sulphur common seeping etc.
CN201510120205.8A 2015-03-19 2015-03-19 Device for improving ion nitriding effect Pending CN104651775A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510120205.8A CN104651775A (en) 2015-03-19 2015-03-19 Device for improving ion nitriding effect

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510120205.8A CN104651775A (en) 2015-03-19 2015-03-19 Device for improving ion nitriding effect

Publications (1)

Publication Number Publication Date
CN104651775A true CN104651775A (en) 2015-05-27

Family

ID=53243409

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510120205.8A Pending CN104651775A (en) 2015-03-19 2015-03-19 Device for improving ion nitriding effect

Country Status (1)

Country Link
CN (1) CN104651775A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN86102217A (en) * 1986-04-08 1987-10-21 大连海运学院 Vacuum ionic carburization without external heat source
CN2258501Y (en) * 1995-12-19 1997-07-30 河北机电学院 Plastma metallizing device
CN202131357U (en) * 2011-06-21 2012-02-01 山东潍坊生建机械厂(集团) Novel glow ion nitriding equipment
JP5194288B2 (en) * 2007-09-28 2013-05-08 Dowaサーモテック株式会社 Plasma nitriding apparatus and continuous plasma nitriding method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN86102217A (en) * 1986-04-08 1987-10-21 大连海运学院 Vacuum ionic carburization without external heat source
CN2258501Y (en) * 1995-12-19 1997-07-30 河北机电学院 Plastma metallizing device
JP5194288B2 (en) * 2007-09-28 2013-05-08 Dowaサーモテック株式会社 Plasma nitriding apparatus and continuous plasma nitriding method
CN202131357U (en) * 2011-06-21 2012-02-01 山东潍坊生建机械厂(集团) Novel glow ion nitriding equipment

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Application publication date: 20150527