CN104616669A - 用于保护外涂层的粘合层 - Google Patents
用于保护外涂层的粘合层 Download PDFInfo
- Publication number
- CN104616669A CN104616669A CN201510079514.5A CN201510079514A CN104616669A CN 104616669 A CN104616669 A CN 104616669A CN 201510079514 A CN201510079514 A CN 201510079514A CN 104616669 A CN104616669 A CN 104616669A
- Authority
- CN
- China
- Prior art keywords
- atom
- bonding coat
- silicon
- carbon
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 title claims abstract description 5
- 238000005260 corrosion Methods 0.000 claims abstract description 36
- 230000007797 corrosion Effects 0.000 claims abstract description 36
- 239000000203 mixture Substances 0.000 claims abstract description 36
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical group [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 17
- 239000002184 metal Substances 0.000 claims abstract description 17
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 10
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims description 61
- 239000011248 coating agent Substances 0.000 claims description 60
- 229910052710 silicon Inorganic materials 0.000 claims description 49
- 239000010703 silicon Substances 0.000 claims description 48
- 229910052799 carbon Inorganic materials 0.000 claims description 35
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 34
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- 229910052757 nitrogen Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000000428 dust Substances 0.000 claims description 11
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 239000004615 ingredient Substances 0.000 claims description 2
- 239000011230 binding agent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 37
- 230000000052 comparative effect Effects 0.000 description 28
- 125000004429 atom Chemical group 0.000 description 18
- 238000000151 deposition Methods 0.000 description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000003969 polarography Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/40—Protective measures on heads, e.g. against excessive temperature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
Landscapes
- Magnetic Heads (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/400,957 US7495865B2 (en) | 2006-04-10 | 2006-04-10 | Adhesion layer for protective overcoat |
| US11/400,957 | 2006-04-10 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007100968883A Division CN101055723A (zh) | 2006-04-10 | 2007-04-09 | 用于保护外涂层的粘合层 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104616669A true CN104616669A (zh) | 2015-05-13 |
Family
ID=38574974
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510079514.5A Pending CN104616669A (zh) | 2006-04-10 | 2007-04-09 | 用于保护外涂层的粘合层 |
| CNA2007100968883A Pending CN101055723A (zh) | 2006-04-10 | 2007-04-09 | 用于保护外涂层的粘合层 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007100968883A Pending CN101055723A (zh) | 2006-04-10 | 2007-04-09 | 用于保护外涂层的粘合层 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7495865B2 (enExample) |
| JP (1) | JP5396597B2 (enExample) |
| CN (2) | CN104616669A (enExample) |
| SG (1) | SG136897A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100053817A1 (en) * | 2008-09-04 | 2010-03-04 | Robert Glenn Biskeborn | Coated magnetic head and methods for fabrication thereof |
| JP2010108532A (ja) * | 2008-10-28 | 2010-05-13 | Toshiba Storage Device Corp | ヘッドスライダ |
| US20110058279A1 (en) * | 2009-07-31 | 2011-03-10 | Flint Eric | Overcoat having a low silicon/carbon ratio |
| US20110032640A1 (en) * | 2009-08-10 | 2011-02-10 | Hitachi Global Storage Technologies Netherlands B.V. | Multi-layer, thin film overcoat for magnetic media disk |
| US8611043B2 (en) | 2011-06-02 | 2013-12-17 | International Business Machines Corporation | Magnetic head having polycrystalline coating |
| US8472134B2 (en) | 2011-08-02 | 2013-06-25 | HGST Netherlands B.V. | Air bearing surface overcoat with soft intermediate film, and methods of producing the same |
| WO2014017376A1 (ja) * | 2012-07-25 | 2014-01-30 | Nok株式会社 | フッ素樹脂製シールリング |
| US9093102B1 (en) | 2013-03-12 | 2015-07-28 | Western Digital Technologies, Inc. | Systems and methods for tuning seed layer hardness in components of magnetic recording systems |
| US9570101B2 (en) | 2013-08-28 | 2017-02-14 | Seagate Technology Llc | Magnetic adhesion layer and method of forming same |
| US9805748B1 (en) * | 2014-06-24 | 2017-10-31 | Western Digital (Fremont), Llc | System and method for providing a protective layer having a graded intermediate layer |
| CN110564334B (zh) * | 2018-06-05 | 2022-01-04 | 德莎欧洲股份公司 | 低温反应固化型粘合剂的耐湿热性和耐化学试剂腐蚀性的提高 |
| US10971176B2 (en) | 2019-02-21 | 2021-04-06 | International Business Machines Corporation | Tunnel magnetoresistive sensor with adjacent gap having chromium alloy seed layer and refractory material layer |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1331492A (zh) * | 2000-06-22 | 2002-01-16 | 德克萨斯仪器股份有限公司 | 对聚合材料具有增强的附着力的半导体器件保护层及其制造方法 |
| US6583953B1 (en) * | 1999-07-12 | 2003-06-24 | Mark Lauer | Silicon carbide overcoats for information storage systems and method of making |
| US20030235006A1 (en) * | 2002-06-24 | 2003-12-25 | Ameen Mohammad Mahbubul | Low friction, wear resistant coatings for high speed spindle motors in disk drive/storage applications |
| CN1675058A (zh) * | 2002-08-07 | 2005-09-28 | 株式会社丰田中央研究所 | 具有粘合层的层压产品和具有保护膜的层压产品 |
| CN1728374A (zh) * | 2004-07-15 | 2006-02-01 | 国际商业机器公司 | 以能量耗散层改进低介电常数电介质器件的稳定性 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4130847A (en) * | 1977-03-31 | 1978-12-19 | International Business Machines Corporation | Corrosion resistant thin film head assembly and method for making |
| US4647494A (en) * | 1985-10-31 | 1987-03-03 | International Business Machines Corporation | Silicon/carbon protection of metallic magnetic structures |
| US5271802A (en) * | 1990-12-27 | 1993-12-21 | International Business Machines Corporation | Method for making a thin film magnetic head having a protective coating |
| US5159508A (en) * | 1990-12-27 | 1992-10-27 | International Business Machines Corporation | Magnetic head slider having a protective coating thereon |
| US5175658A (en) * | 1990-12-27 | 1992-12-29 | International Buiness Machines Corporation | Thin film magnetic head having a protective coating and method for making same |
| DE69535861D1 (de) * | 1994-06-24 | 2008-11-27 | Sumitomo Electric Industries | Wafer und sein Herstellungsverfahren |
| CN1175317A (zh) * | 1994-12-19 | 1998-03-04 | 海门科技公司 | 盘驱动滑动触头的部分蚀刻的保护外敷层 |
| US5948532A (en) * | 1996-12-10 | 1999-09-07 | International Business Machines Corporation | Cermet adhesion layer with carbonaceous wear layer for head/disk interfaces |
| US5858182A (en) * | 1997-03-20 | 1999-01-12 | Headway Technoloies, Inc. | Bilayer carbon overcoating for magnetic data storage disks and magnetic head/slider constructions |
| US6184572B1 (en) * | 1998-04-29 | 2001-02-06 | Novellus Systems, Inc. | Interlevel dielectric stack containing plasma deposited fluorinated amorphous carbon films for semiconductor devices |
| US6136421A (en) * | 1998-07-21 | 2000-10-24 | Seagate Technology Llc | Magneto-resistance recording media comprising multilayered protective overcoats |
| US6638608B1 (en) * | 2001-03-16 | 2003-10-28 | Seagate Technology Llc | Protection overcoat for recording media |
| US6664685B2 (en) * | 2001-11-16 | 2003-12-16 | Seagate Technology Llc | High adhesion, wear resistant coatings for spindle motors in disk drive/storage applications |
| JP3585917B2 (ja) * | 2002-07-11 | 2004-11-10 | Ｔｄｋ株式会社 | 薄膜磁気ヘッド、その製造方法及びそれを用いた磁気ディスク装置 |
| WO2004075177A1 (ja) * | 2003-02-19 | 2004-09-02 | Fujitsu Limited | 磁気ヘッドスライダ |
| US7175926B2 (en) * | 2004-02-12 | 2007-02-13 | Seagate Technology Llc | Dual-layer carbon-based protective overcoats for recording media by filtered cathodic ARC deposition |
| JP2007523497A (ja) * | 2004-02-20 | 2007-08-16 | アクテル・コーポレイシヨン | 炭素含有アンチヒューズ材料を使用した再プログラム可能な金属−金属間のアンチヒューズ |
| JP2006107673A (ja) * | 2004-10-08 | 2006-04-20 | Shinka Jitsugyo Kk | 磁気ヘッド及びその製造方法、並びにヘッドサスペンションアセンブリ |
-
2006
- 2006-04-10 US US11/400,957 patent/US7495865B2/en active Active
-
2007
- 2007-03-26 SG SG200702706-3A patent/SG136897A1/en unknown
- 2007-04-09 CN CN201510079514.5A patent/CN104616669A/zh active Pending
- 2007-04-09 CN CNA2007100968883A patent/CN101055723A/zh active Pending
- 2007-04-09 JP JP2007101225A patent/JP5396597B2/ja not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6583953B1 (en) * | 1999-07-12 | 2003-06-24 | Mark Lauer | Silicon carbide overcoats for information storage systems and method of making |
| CN1331492A (zh) * | 2000-06-22 | 2002-01-16 | 德克萨斯仪器股份有限公司 | 对聚合材料具有增强的附着力的半导体器件保护层及其制造方法 |
| US20030235006A1 (en) * | 2002-06-24 | 2003-12-25 | Ameen Mohammad Mahbubul | Low friction, wear resistant coatings for high speed spindle motors in disk drive/storage applications |
| CN1675058A (zh) * | 2002-08-07 | 2005-09-28 | 株式会社丰田中央研究所 | 具有粘合层的层压产品和具有保护膜的层压产品 |
| CN1728374A (zh) * | 2004-07-15 | 2006-02-01 | 国际商业机器公司 | 以能量耗散层改进低介电常数电介质器件的稳定性 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101055723A (zh) | 2007-10-17 |
| JP2007299511A (ja) | 2007-11-15 |
| JP5396597B2 (ja) | 2014-01-22 |
| SG136897A1 (en) | 2007-11-29 |
| US7495865B2 (en) | 2009-02-24 |
| US20070236837A1 (en) | 2007-10-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150513 |