CN104576762B - 肖特基势垒二极管及其制造方法 - Google Patents
肖特基势垒二极管及其制造方法 Download PDFInfo
- Publication number
- CN104576762B CN104576762B CN201410822182.0A CN201410822182A CN104576762B CN 104576762 B CN104576762 B CN 104576762B CN 201410822182 A CN201410822182 A CN 201410822182A CN 104576762 B CN104576762 B CN 104576762B
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- China
- Prior art keywords
- epitaxial layer
- doped
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- highly doped
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims description 9
- 238000005468 ion implantation Methods 0.000 claims description 4
- 238000000407 epitaxy Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 77
- 238000005036 potential barrier Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/6606—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410822182.0A CN104576762B (zh) | 2014-12-25 | 2014-12-25 | 肖特基势垒二极管及其制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410822182.0A CN104576762B (zh) | 2014-12-25 | 2014-12-25 | 肖特基势垒二极管及其制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104576762A CN104576762A (zh) | 2015-04-29 |
CN104576762B true CN104576762B (zh) | 2018-08-28 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410822182.0A Active CN104576762B (zh) | 2014-12-25 | 2014-12-25 | 肖特基势垒二极管及其制造方法 |
Country Status (1)
Country | Link |
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CN (1) | CN104576762B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109461768A (zh) * | 2018-10-31 | 2019-03-12 | 秦皇岛京河科学技术研究院有限公司 | 一种SiC结势垒肖特基二极管及其制造方法 |
CN110350024A (zh) * | 2019-06-21 | 2019-10-18 | 泰科天润半导体科技(北京)有限公司 | 一种降低正向压降的肖特基二极管及制备方法 |
CN114122152A (zh) * | 2020-09-01 | 2022-03-01 | 珠海格力电器股份有限公司 | 一种制备肖特基结构二极管的方法、装置和二极管 |
CN113809072B (zh) * | 2021-07-26 | 2024-04-02 | 浙江芯国半导体有限公司 | 一种包含肖特基二极管的电路及相关应用 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4134123A (en) * | 1976-08-09 | 1979-01-09 | U.S. Philips Corporation | High voltage Schottky barrier diode |
CN103681883A (zh) * | 2012-09-14 | 2014-03-26 | 现代自动车株式会社 | 肖特基垫垒二极管及其制造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6012743B2 (ja) * | 2012-09-06 | 2016-10-25 | 三菱電機株式会社 | 炭化珪素半導体装置およびその製造方法 |
-
2014
- 2014-12-25 CN CN201410822182.0A patent/CN104576762B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4134123A (en) * | 1976-08-09 | 1979-01-09 | U.S. Philips Corporation | High voltage Schottky barrier diode |
CN103681883A (zh) * | 2012-09-14 | 2014-03-26 | 现代自动车株式会社 | 肖特基垫垒二极管及其制造方法 |
Also Published As
Publication number | Publication date |
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CN104576762A (zh) | 2015-04-29 |
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CP01 | Change in the name or title of a patent holder |
Address after: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee after: ZHUZHOU CRRC TIMES ELECTRIC Co.,Ltd. Address before: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee before: ZHUZHOU CSR TIMES ELECTRIC Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20201012 Address after: 412001 Room 309, floor 3, semiconductor third line office building, Tianxin hi tech park, Shifeng District, Zhuzhou City, Hunan Province Patentee after: Zhuzhou CRRC times Semiconductor Co.,Ltd. Address before: The age of 412001 in Hunan Province, Zhuzhou Shifeng District Road No. 169 Patentee before: ZHUZHOU CRRC TIMES ELECTRIC Co.,Ltd. |
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TR01 | Transfer of patent right |