CN104498882A - Method for coating varnishing layer and ITO layer on ink printed glass - Google Patents
Method for coating varnishing layer and ITO layer on ink printed glass Download PDFInfo
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- CN104498882A CN104498882A CN201410691285.8A CN201410691285A CN104498882A CN 104498882 A CN104498882 A CN 104498882A CN 201410691285 A CN201410691285 A CN 201410691285A CN 104498882 A CN104498882 A CN 104498882A
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Abstract
The invention provides a method for coating a varnishing layer and an ITO layer on ink printed glass, and relates to the technical field of production of electronic display panels. The method comprises the following steps: carrying out chemical strengthening treatment on well cut and ground touch control substrate glass; printing an ink frame on the treated substrate glass; removing organic matter residual in the ink on the surface of the substrate glass through an air plasma cleaning treatment technology; cleaning by using pure water; and sequentially coating an H film, an L film and a TIO film through a vacuum magnetron sputtering process at 210-250DEG C. The method coating the varnishing layer and the ITO layer on ink printed glass solves the defect of varnishing layer dropping due to insufficient adhesion of the varnishing layer directly coated on ink through the air plasma pre-cleaning treatment, solves the defect of high temperature requirement on the direct coating of the ITO film on the ink, and optimizes the varnishing effect.
Description
Technical field
The present invention relates to the dull and stereotyped production technical field of electronical display, be specifically related to a kind of processing method being coated with disappear shadow layer and ITO layer on printed ink glass.
Background technology
Along with flat pannel display industry development, the application of touch-control class obtains development at full speed in consumer electronics field in recent years, each producer all has higher requirement to display effect, simultaneously for promoting quality, cost-saving, the technical process such as TOL in recent years becomes more and more popular, by first carrying out cutting edging to glass, chemical enhanced, printed ink, be coated with ITO layer after carry out the operation such as silk-screen, development again and complete touch module, this kind of process flow be not owing to having follow-up cutting damage, can ensure higher-strength, development prospect is good in the market.Simultaneously in order to improve display effect, current many producers propose increases the scheme that the shadow layer that disappears improves display effect again on ink.
Currently available technology is coated with and is high temperature when disappearing shadow layer and is coated with (more than 300 DEG C), ink increase when disappearing shadow layer together, due to reasons such as ink pellet surface organic substance residues, ink non-refractories, temperature need be reduced during plated film, the too high ito film that causes of resistivity can be caused partially thick, affect the final shadow effect that disappears; Simultaneously ink pellet surface organic substance residues can cause and disappear shadow layer and ink pellet surface sticking power loosely, occurs falling film, rete reliability deficiency.
Summary of the invention
The object of the invention is the defect existed for prior art, propose a kind of processing method being coated with disappear shadow layer and ITO layer on printed ink glass.
Technical problem to be solved by this invention realizes by the following technical solutions:
Printed ink glass is coated with a processing method for disappear shadow layer and ITO layer, it is characterized in that, comprise the steps:
(1) adopt the touch base plate glass that cutting edging is good, carry out chemical intensification treatment;
(2) printed ink frame on base plate glass after treatment;
(3) adopt atmosphere low-temperature plasma jet (Air Plasma) clean technique to remove organic substance residues in base plate glass surface ink, change the performance on surface and can the long period be kept, can significantly promote IM sticking power;
(4) pure water is adopted to clean;
(5) adopt vacuum magnetic-control sputtering method to be coated with H rete, L rete, ito film layer successively, base plate glass coating temperature is 210-250 DEG C.
Described H rete is titanium dioxide
(thickness) or Niobium Pentxoxide
(thickness), is a kind of high refractive index film.
Described L rete is silicon-dioxide
(thickness) is a kind of low refractive index film.
The thickness of described ito film layer is
Described touch base plate thickness of glass is 0.4-2.0mm.
Described atmosphere low-temperature plasma jet (Air Plasma), for produce plasma jet in an atmosphere, removes organic substance residues in base plate glass surface ink.
Beneficial effect of the present invention is:
The processing method being coated with disappear shadow layer and ITO layer on printed ink glass provided by the invention, by atmosphere low-temperature plasma jet (Air Plasma) front clean, solve on ink, be directly coated with the shadow layer sticking power deficiency that disappears, cause the shadow layer that disappears to fall the defect of film;
Solve and directly on ink, be coated with the ito film layer defect higher to temperature requirement, optimize the shadow effect that disappears simultaneously.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention.
Wherein: 1. base plate glass; 2. ink; 3.H rete; 4.L rete; 5.ITO pattern interval; 6.ITO rete.
Embodiment
The technique means realized to make the present invention, creation characteristic, reaching object and effect is easy to understand, below in conjunction with specific embodiments and the drawings, set forth the present invention further, but following embodiment being only the preferred embodiments of the present invention, and not all.Based on the embodiment in embodiment, those skilled in the art under the prerequisite not making creative work obtain other embodiment, all belong to the protection domain of this patent.
Embodiment 1
As shown in Figure 1, structure of the present invention is:
Comprise base plate glass 1, the surperficial printed ink 2 of base plate glass 1, after atmosphere low-temperature plasma jet (Air Plasma) clean, then to be coated with successively in H rete 3, L rete 4, ito film layer 6, figure shown in 5 be ITO pattern interval.
Printed ink glass is coated with a processing method for disappear shadow layer and ITO layer, and concrete steps are:
(1) adopt the touch base plate glass that cutting edging is good, thickness is 0.4-2.0mm, carries out chemical intensification treatment;
(2) printed ink frame on base plate glass after treatment;
(3) atmosphere low-temperature plasma jet (Air Plasma) clean technique is adopted to remove organic substance residues in base plate glass surface ink;
(4) pure water is adopted to clean;
(5) vacuum magnetic-control sputtering method is adopted to be coated with titanium dioxide successively
silicon-dioxide
ito film
base plate glass coating temperature is 210-250 DEG C.
More than show and describe ultimate principle of the present invention, principal character and advantage of the present invention.The technician of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and specification sheets is only preference of the present invention; be not used for limiting the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection domain is defined by appending claims and equivalent thereof.
Claims (5)
1. on printed ink glass, be coated with a processing method for disappear shadow layer and ITO layer, it is characterized in that, comprise the steps:
(1) adopt the touch base plate glass that cutting edging is good, carry out chemical intensification treatment;
(2) printed ink frame on base plate glass after treatment;
(3) atmosphere low-temperature plasma jet flow cleaning treatment process is adopted to remove organic substance residues in base plate glass surface ink;
(4) pure water is adopted to clean;
(5) adopt vacuum magnetic-control sputtering method to be coated with H rete, L rete, ito film layer successively, base plate glass coating temperature is 210-250 DEG C.
2. the processing method being coated with disappear shadow layer and ITO layer on printed ink glass according to claim 1, is characterized in that: described H rete is titanium dioxide
or Niobium Pentxoxide
3. the processing method being coated with disappear shadow layer and ITO layer on printed ink glass according to claim 1, is characterized in that: described L rete is silicon-dioxide
4., according to the processing method being coated with disappear shadow layer and ITO layer on printed ink glass according to claim 1, it is characterized in that: the thickness of described ito film layer is
5. the processing method being coated with disappear shadow layer and ITO layer on printed ink glass according to claim 1, is characterized in that: described touch base plate thickness of glass is 0.4-2.0mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410691285.8A CN104498882A (en) | 2014-11-26 | 2014-11-26 | Method for coating varnishing layer and ITO layer on ink printed glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410691285.8A CN104498882A (en) | 2014-11-26 | 2014-11-26 | Method for coating varnishing layer and ITO layer on ink printed glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104498882A true CN104498882A (en) | 2015-04-08 |
Family
ID=52940332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410691285.8A Pending CN104498882A (en) | 2014-11-26 | 2014-11-26 | Method for coating varnishing layer and ITO layer on ink printed glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104498882A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104834420A (en) * | 2015-04-16 | 2015-08-12 | 张家港市铭斯特光电科技有限公司 | Conductive glass for capacitive touch screen and preparation process thereof |
| CN106710671A (en) * | 2017-03-30 | 2017-05-24 | 安徽立光电子材料股份有限公司 | ITO transparent conductive film used for ON-CELL and manufacturing technology thereof |
| CN106702323A (en) * | 2016-12-28 | 2017-05-24 | 深圳市三鑫精美特玻璃有限公司 | One-time film forming process for processing mobile phone cover plate coating film and mobile phone cover plate |
| CN109094227A (en) * | 2018-06-29 | 2018-12-28 | 东莞市晶博光电有限公司 | A kind of technique of the silk-screen IR on glass cover-plate |
| CN113651544A (en) * | 2021-08-20 | 2021-11-16 | 杭州美迪凯光电科技股份有限公司 | Strip-shaped optical glass multi-surface graphical optical coating processing technology |
-
2014
- 2014-11-26 CN CN201410691285.8A patent/CN104498882A/en active Pending
Non-Patent Citations (3)
| Title |
|---|
| （日）越石健司 黑沢理等: "《触摸屏技术与应用》", 30 April 2014 * |
| 张剑波等: "《清洗技术基础教程》", 31 July 2004 * |
| 罗玉峰等: "《光伏电池原理与工艺》", 31 August 2011 * |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104834420A (en) * | 2015-04-16 | 2015-08-12 | 张家港市铭斯特光电科技有限公司 | Conductive glass for capacitive touch screen and preparation process thereof |
| CN104834420B (en) * | 2015-04-16 | 2018-01-09 | 张家港市铭斯特光电科技有限公司 | A kind of capacitance touch screen electro-conductive glass and its preparation technology |
| CN106702323A (en) * | 2016-12-28 | 2017-05-24 | 深圳市三鑫精美特玻璃有限公司 | One-time film forming process for processing mobile phone cover plate coating film and mobile phone cover plate |
| CN106710671A (en) * | 2017-03-30 | 2017-05-24 | 安徽立光电子材料股份有限公司 | ITO transparent conductive film used for ON-CELL and manufacturing technology thereof |
| CN109094227A (en) * | 2018-06-29 | 2018-12-28 | 东莞市晶博光电有限公司 | A kind of technique of the silk-screen IR on glass cover-plate |
| CN113651544A (en) * | 2021-08-20 | 2021-11-16 | 杭州美迪凯光电科技股份有限公司 | Strip-shaped optical glass multi-surface graphical optical coating processing technology |
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Application publication date: 20150408 |
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