CN104216587A - Silver nanowire conductive film touch screen and method for producing conductive film thereof - Google Patents
Silver nanowire conductive film touch screen and method for producing conductive film thereof Download PDFInfo
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Abstract
The invention discloses a silver nanowire conductive film touch screen and a method for producing a conductive film thereof. The silver nanowire conductive film comprises a cover plate and a flexible circuit board, wherein a silver nanowire conductive film is arranged between the cover plate and the flexible circuit board, and the cover plate is adhered to the silver nanowire conductive film through an optical conductive adhesive; a signal pattern is arranged on the silver nanowire conductive film, and the silver nanowire conductive film is connected with the flexible circuit board; the silver nanowire conductive film is produced by a chemical etching process, a laser etching process and a screen printing process. The invention has the advantages that the silver nanowire conductive film touch screen with high light transmission, strong sense of touch, and flexibility, and the method for producing the conductive film thereof are provided, the method for producing the conductive film is various, the production process is simplified, and the cost is lower.
Description
Technical field
The present invention relates to a kind of conducting film touch screen, in particular to the method for making to a kind of nano-silver thread conducting film touch screen and conducting film thereof.
Background technology
Touch screen has been widely used in mobile phone, PDA, on the mass consumption products such as panel computer and GPS navigation, and because it is simple to operate, convenient and hommization forms the optimal selection into human-computer interaction, and obtained universal rapidly.Wherein capacitance type touch control screen is popular, the most the most frequently used at present a kind of touch screen.
Capacitive touch screen is four layers of compound glass screen; the inside surface of glass screen and interlayer respectively scribble one deck ITO, and outermost layer is skim silicon soil glassivation, and interlayer ITO coating is as workplace; on four angles, draw four electrodes, internal layer ITO is that screen layer is to ensure good working environment.In the time that finger touch is on metal level, due to people's bulk electric field, user and touch screen surface form with a coupling capacitance, and for high-frequency current, electric capacity is direct conductor, so finger siphons away a very little electric current from contact point.This electric current flows out in the electrode from four jiaos of touch-screen respectively, and the electric current of these four electrodes of flowing through is directly proportional to the distance of four jiaos to finger, and controller, by the accurate Calculation to these four current ratios, draws the position of touch point.
Indium tin oxide has the good transparency and electric conductivity is widely applied in touch screen inductor field because of it.But indium metal belongs to rare metal, the alternative material of finding indium metal is necessary.
Touch control capacitance screen sensor ITO used, its sheet resistance control is still undesirable, has the deviation of nearly 20 percent left and right, and this instability brings a lot of inconvenience to follow-up software debugging and the production of touch screen; On the other hand, its bendable folding endurance is poor, can not meet the requirement of pliability electronic product; Its tack, scratch resistance are poor, bury very large hidden danger to the stability of touch control capacitance screen, and its penetrability need to be done further lifting simultaneously.Along with the continuous expansion of application, the continuous lifting of application level, following touch screen will be to low-power consumption, high property thoroughly, lightening and pliability development.
Chinese patent notification number is CN102693772A, the day for announcing is on September 26th, 2012, name is in " flexible transparent conducting film and manufacture method thereof " patent document, a kind of flexible transparent conducting film and manufacture method thereof are announced, this conducting film comprises flexible transparent substrate, its surface is coated with transparent ink layer, and transparent ink layer is the conductive layer that is stained with nano-silver thread, and in conductive layer, nano-silver thread mutually overlaps and forms uniform two-dimensional nano dargyrome network.Its manufacture method is: through transparent ink printing or be coated in flexible transparent substrate, nano-silver thread dispersion liquid is uniformly coated on to another flexible transparent substrate surface and obtains nano-silver thread conducting film, by hot pressing or transfer printing mode, the top layer that film transfer is adhered to transparent ink obtains flexible transparent conducting film.
Although the conducting film resistance value that the method is made conducting film relatively is before this lower, contains transparent ink in its conducting film, nano-silver thread exists in nesa coating, conducting film overall performance is affected to some extent, and its manufacture method is more single.
Summary of the invention
The present invention aims to provide the method for making of a kind of nano-silver thread conducting film touch screen and conducting film thereof, and not wear-resisting to solve Touch Screen, touch-control deviation is large, bending property is bad, the problems such as material source is narrow, improve production technology, improve light transmission, stability, the flexible resistance of Touch Screen.
A kind of nano-silver thread conducting film touch screen, comprise cover plate and flexible PCB, between described cover plate and described flexible PCB, be provided with nano-silver thread conducting film, described cover plate is by photoconductive glue bond nano-silver thread conducting film, described nano-silver thread conducting film is provided with signal pattern, and described nano-silver thread conducting film is connected with flexible PCB by vertical conductive adhesive.
Further, described cover plate is tempered glass.
Nano-silver thread conducting film method for making, carving technology, silk screen printing process while having chemical etching process, laser, wherein:
The step of chemical etching process is as follows:
(1): nano-silver thread is uniformly coated on nesa coating, forms nano-silver thread conducting film;
(2): by the nano-silver thread conducting film of (1) gained clean, baking and curing;
(3): chemical etching signal pattern on the nano-silver thread conducting film of (2) gained;
(4): the nano-silver thread conducting film of (3) gained is moved back to China ink, cleaning, silk-screen protection glue, baking and curing, aging;
(5): the nano-silver thread conducting film of (4) gained is cut.
The step of laser-induced thermal etching technique is as follows:
(a): nano-silver thread is uniformly coated on nesa coating, forms nano-silver thread conducting film;
(b): by the nano-silver thread conducting film of (a) gained clean, baking and curing;
(c): laser-induced thermal etching signal pattern on the nano-silver thread conducting film of (b) gained;
(d): by the nano-silver thread conducting film of (c) gained clean, baking and curing, aging;
(e): the nano-silver thread conducting film of (d) gained is cut.
Silk screen printing process step is as follows:
(I): CAD signal pattern is imported in screen printer, and by nano-silver thread silk-screen, on nesa coating, forming silk-screen has the nano-silver thread conducting film of signal pattern;
(II): by the nano-silver thread conducting film of gained in (I) clean, baking and curing, aging;
(III): the nano-silver thread conducting film of gained in (II) is cut.
Further, described chemical etching, laser-induced thermal etching, its etch depth equals the thickness of described nano-silver thread.
Further, the thickness of described nano-silver thread is preferably 0.125mm.
Further, described chemical etching step has: first on the nano-silver thread conducting film of (2) gained, printing acid-proof ink, then it is carried out to energy according to signal pattern is 1,000mJ/cm
2, the UV that hardness reaches 2H solidifies, re-uses nitric acid and hydrochloric acid mixed solution spray.
Further, described laser-induced thermal etching step has: CAD signal pattern is imported in laser machine, and on the nano-silver thread conducting film of (b) gained, photetching goes out signal pattern.
Further, in described step (2) and described step (b), clean solution used and be water, the temperature of cleaning is 25 degree, baking and curing preferably adopts high temperature roaster, its temperature is preferably that 90 degree, humidity are preferably 60%, the time is preferably 10 minutes, moves back the solution preferred concentration 0.4mol/L that China ink uses, the sodium hydroxide solution that temperature 40 is spent in described step (4).
Further, the parameter of described laser-induced thermal etching is preferably set to: speed=2500mm/S, and frequency=300kHz, wavelength=3, electric current is 25%-30%.
Further, described aging process preferably adopts baking box, and its temperature is preferably 150 degree, and humidity is preferably 60%, and the time is preferably 30 minutes.
The benefit that the present invention brings is: in view of the excellent electric conductivity of silver, nano-silver thread conducting film resistance value is little; The reticulate texture of nano-silver thread makes nano-silver thread conducting film have low square resistance characteristic, makes touch screen control IC have the time of more abundant processing induced signal, can bring more perfectly touch screen experience effect to user; The reticulate texture of nano-silver thread makes nano-silver thread conducting film have good light transmission, makes color, the saturation degree of LED screen show that loss is little, and meanwhile, the power of LCD panel can control to lower; The tack that nano-silver thread is good makes nano-silver thread conducting film have splendid flexible resistance, and in order to realize, flexibility, bent LED show, touch-screen provides application foundation, adapt to electronic product and develop required touch screen demand.The storage capacity of silver is many compared with rare metal indium, and price is relatively also more cheap; The procedure for producing of nano-silver thread conducting film is simpler, and production efficiency is high.
Brief description of the drawings
In order to be illustrated more clearly in embodiment of the present invention technical scheme, will be briefly described embodiment accompanying drawing below.
Fig. 1 is a kind of structural representation of nano-silver thread conducting film touch screen;
Fig. 2 is the production technological process that chemical etching process is made nano-silver thread conducting film;
Fig. 3 is the production technological process that laser-induced thermal etching technique is made nano-silver thread conducting film;
Fig. 4 is the production technological process that silk screen printing process is made nano-silver thread conducting film.
Embodiment
Not wear-resisting in order to solve Touch Screen, touch-control deviation is large, and bending property is bad, the problem that production cost is high, realize and improve light transmission, the stability of Touch Screen, the object of flexible resistance, the method for making of a kind of nano-silver thread conducting film touch screen and conducting film thereof is now provided.
Below in conjunction with the accompanying drawing in the present invention, the technical scheme in the present invention is clearly and completely described, obviously, described is only the present invention's part embodiment, instead of whole embodiment.Based on the embodiment in the present invention, the every other embodiment that those of ordinary skill in the art obtain under the prerequisite of not making creative work, belongs to the scope of protection of the invention.
As shown in Figure 1; a kind of nano-silver thread conducting film touch screen provided by the invention; comprise cover plate 11, photoconductive glue 12, nano-silver thread conducting film 13 and flexible PCB 14; described cover plate 11 is by the bonding described nano-silver thread conducting film 13 of photoconductive glue 12; described cover plate 11 is tempered glass; because its good performance can be used for protecting described nano-silver thread conducting film 13; described nano-silver thread conducting film 13 is provided with signal pattern; described nano-silver thread conducting film 13 is connected with flexible PCB 14 by vertical conductive adhesive, for calculating touch point return to processor.
Embodiment 1:
As shown in Figure 2, the technological process of production of chemical etching process making nano-silver thread conducting film is as follows:
(1): by coating process, nano-silver thread is coated on nesa coating, obtains nano-silver thread conducting film;
(2): the nano-silver thread conducting film of step (1) gained is cleaned, then uses baking box to carry out temperature through the clear water of 25 degree is 90 degree, and humidity is the operation processing of the baking and curing of 60%, 10 minute;
(3): on the nano-silver thread conducting film of step (2) gained, print acid-proof ink according to signal pattern, obtain being printed with the nano-silver thread conducting film of acid-proof ink, be 1 described nano-silver thread conducting film by energy again, 000mJ/cm2, the UV that curing hardness reaches 2H solidifies, again the described nano-silver thread conducting film being cured is sprayed by nitre, hydrochloric acid mixed solution, etch away the conductive nano diaphragm area not covered by acid-proof ink;
(4): be 40 degree the preferred serviceability temperature of nano-silver thread conducting film of step (3) gained, concentration is that the sodium hydroxide solution of 0.4mol/L moves back China ink, then clean with the clear water of 25 degree, then silk-screen protection glue, re-using baking box, to carry out preferred temperature be 90 degree, humidity is 60%, the baking and curing operation of 10 minutes, carrying out preferred temperature is 150 degree again, humidity 60%, the aging series of processes processing of 30 minutes time baking box, obtaining etching has the nano-silver thread conducting film of signal pattern, the etched degree of depth preferably equals the thickness of described nano-silver thread, the thickness of nano-silver thread is preferably 0.125mm,
(5): thinly-sliced the cutting of nano-silver thread conduction of step (4) gained can be obtained to needed nano-silver thread conducting film.
Embodiment 2:
As shown in Figure 3, the technological process of production that laser-induced thermal etching technique is made nano-silver thread conducting film is as follows:
(a): by coating process, nano-silver thread is coated on nesa coating, obtains nano-silver thread conducting film;
(b): the nano-silver thread conducting film of step (a) gained is cleaned and uses baking box to carry out preferred temperature through the clear water of 25 degree is 90 degrees Celsius, and humidity is the oven dry of 60%, 10 minute;
(c): the CAD signal pattern designing is imported in laser machine, laser machine goes out corresponding pattern according to the CAD pattern laser-induced thermal etching on the nano-silver thread conducting film of step (b) gained designing, the parameter of described laser-induced thermal etching is preferably set to: speed=2500mm/S, frequency=300kHz, wavelength=3, electric current=25%-30%, obtain having through laser-induced thermal etching the nano-silver thread conducting film of signal pattern, the etched degree of depth preferably equals the thickness of described nano-silver thread, and the thickness of nano-silver thread is preferably 0.125mm;
(d): cleaning, use baking box to carry out temperature through the clear water of 25 degree the nano-silver thread conducting film of step (c) gained is 90 degree, humidity is 60%, the baking and curing of 10 minutes, then using baking box to carry out temperature is 150 degree, humidity 60%, the series of processes processing of time 30 points of clock agings, obtaining etching has the nano-silver thread conducting film of signal pattern;
(e): described to (d) nano-silver thread conducting film is obtained to needed nano-silver thread conducting film by cutting operation.
Embodiment 3:
As shown in Figure 4, the technological process of production of silk screen printing process making nano-silver thread conducting film is as follows:
(I) imports to the CAD signal pattern designing in screen printer, by silk screen printing process by nano-silver thread silk-screen on nesa coating, obtaining silk-screen has the nano-silver thread conducting film of signal pattern;
(II) cleans, uses baking box to carry out 90 degrees Celsius through the clear water of 25 degree the nano-silver thread conducting film of step (I) gained, humidity is 60%, the baking and curing of 10 minutes, then to use baking box to carry out temperature be 150 degree, humidity is 60%, the burin-in process of 10 minutes, obtaining silk-screen has the nano-silver thread conducting film of signal pattern;
(III) obtains needed nano-silver thread conducting film by the nano-silver thread conducting film of step (II) gained by cutting operation.
The invention has the advantages that: because the excellent electric conductivity of silver, nano-silver thread conducting film resistance value is little; The reticulate texture of nano-silver thread makes nano-silver thread conducting film have low square resistance characteristic, makes touch screen control IC have the time of more abundant processing induced signal, can bring more perfectly touch screen experience effect to user; The reticulate texture of nano-silver thread makes nano-silver thread conducting film have good light transmission, makes color, the saturation degree of LED screen show that loss is little, and meanwhile, the power of LCD panel can control to lower; This nano-silver thread conducting film touch screen is wear-resisting, sense of touch is strong, the tack that nano-silver thread is good makes nano-silver thread conducting film have splendid flexible resistance and stability, and in order to realize, flexibility, bent LED show, touch-screen provides application foundation, adapt to electronic product and develop required touch screen demand.
It should be noted that; what in the present invention, describe is a kind of product form of the touch screen that contains nano-silver thread conducting film; other meets the product of structure of the present invention; even if material, device name, outward appearance, device are put order etc., not affect the factor of product performance not identical; still belong to the scope of protection of the invention; the method for making embodiment of the nano-silver thread conducting film of in like manner, describing in the present invention is preferred implementation.
Above content is in conjunction with concrete preferred implementation further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.For general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, can also make some simple deduction or replace, all should be considered as belonging to protection scope of the present invention.
Claims (10)
1. a nano-silver thread conducting film touch screen, comprise cover plate and flexible PCB, it is characterized in that, between described cover plate and described flexible PCB, be provided with nano-silver thread conducting film, described cover plate is by nano-silver thread conducting film described in photoconductive glue bond, described nano-silver thread conducting film is provided with signal pattern, and described nano-silver thread conducting film is connected with flexible PCB by vertical conductive adhesive.
2. a kind of nano-silver thread conducting film touch screen according to claim 1, is characterized in that, described cover plate is tempered glass.
3. nano-silver thread conducting film method for making, is characterized in that, the method for making of nano-silver thread conducting film has chemical etching process, laser-induced thermal etching technique, silk screen printing process, wherein:
The step of chemical etching process is as follows:
(1): nano-silver thread is uniformly coated on nesa coating, forms nano-silver thread conducting film;
(2): by the nano-silver thread conducting film of (1) gained clean, baking and curing;
(3): chemical etching signal pattern on the nano-silver thread conducting film of (2) gained;
(4): the nano-silver thread conducting film of (3) gained is moved back to China ink, cleaning, silk-screen protection glue, baking and curing, aging;
(5): the nano-silver thread conducting film of (4) gained is cut;
The step of laser-induced thermal etching technique is as follows:
(a): nano-silver thread is uniformly coated on nesa coating, forms nano-silver thread conducting film;
(b): by the nano-silver thread conducting film of (a) gained clean, baking and curing;
(c): laser-induced thermal etching signal pattern on the nano-silver thread conducting film of (b) gained;
(d): by the nano-silver thread conducting film of (c) gained clean, baking and curing, aging;
(e): the nano-silver thread conducting film of (d) gained is cut;
The step of silk-screen etch process is as follows:
(I): CAD signal pattern is imported in screen printer, and nano-silver thread silk-screen, on nesa coating, forming silk-screen has the nano-silver thread conducting film of signal pattern;
(II): by the nano-silver thread conducting film of gained in (I) clean, baking and curing, aging;
(III): the nano-silver thread conducting film of gained in (II) is cut.
4. nano-silver thread conducting film method for making according to claim 3, is characterized in that, the etch depth of described chemical etching, laser-induced thermal etching preferably equals the thickness of described nano-silver thread.
5. nano-silver thread conducting film method for making according to claim 3, is characterized in that, the thickness of described nano-silver thread is preferably 0.125mm.
6. nano-silver thread conducting film method for making according to claim 3, it is characterized in that, described chemical etching step has: first on the nano-silver thread conducting film of (2) gained, printing acid-proof ink, then it is carried out to energy according to signal pattern is 1,000mJ/cm
2, the UV that hardness reaches 2H solidifies, re-uses nitric acid and hydrochloric acid mixed solution spray.
7. nano-silver thread conducting film method for making according to claim 3, is characterized in that, described laser-induced thermal etching step has: CAD signal pattern is imported in laser machine, and on the nano-silver thread conducting film of (b) gained, photetching goes out signal pattern.
8. nano-silver thread conducting film method for making according to claim 3, it is characterized in that, in described step (2) and described step (b), clean solution used and be water, the temperature of cleaning is preferably 25 degree, baking and curing preferably adopts high temperature roaster, its temperature is preferably that 90 degree, humidity are preferably 60%, the time is preferably 10 minutes, moves back the solution preferred concentration 0.4mol/L that China ink uses, the sodium hydroxide solution that temperature 40 is spent in described step (4).
9. nano-silver thread conducting film method for making according to claim 7, is characterized in that, the parameter of described laser-induced thermal etching is preferably set to: speed=2500mm/S, and frequency=300kHz, wavelength=3, electric current is 25%-30%.
10. nano-silver thread conducting film method for making according to claim 3, is characterized in that, described aging preferred employing baking box, and its temperature is preferably 150 degree, and humidity is preferably 60%, and the time is preferably 30 minutes.
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| CN108664172A (en) * | 2018-07-18 | 2018-10-16 | 牧东光电科技有限公司 | A kind of GF2 structures touch panel and preparation method thereof |
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| CN113710757A (en) * | 2019-04-30 | 2021-11-26 | 爱克发-格法特公司 | Method of manufacturing conductive pattern |
| CN111949153A (en) * | 2019-11-29 | 2020-11-17 | 合肥微晶材料科技有限公司 | Nano silver wire touch electrode capable of solving etching marks and manufacturing method thereof |
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