CN104488147B - 脉冲型co2激光输出脉冲形状和功率控制 - Google Patents
脉冲型co2激光输出脉冲形状和功率控制 Download PDFInfo
- Publication number
- CN104488147B CN104488147B CN201380019811.XA CN201380019811A CN104488147B CN 104488147 B CN104488147 B CN 104488147B CN 201380019811 A CN201380019811 A CN 201380019811A CN 104488147 B CN104488147 B CN 104488147B
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- Prior art keywords
- pulse
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- train
- laser
- pulses
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09705—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser with particular means for stabilising the discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
- H01S3/10046—Pulse repetition rate control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261624096P | 2012-04-13 | 2012-04-13 | |
| US61/624,096 | 2012-04-13 | ||
| US13/467,890 | 2012-05-09 | ||
| US13/467,890 US8687661B2 (en) | 2012-04-13 | 2012-05-09 | Pulsed CO2 laser output-pulse shape and power control |
| PCT/US2013/035530 WO2013154949A2 (en) | 2012-04-13 | 2013-04-05 | Pulsed co2 laser output-pulse shape and power control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104488147A CN104488147A (zh) | 2015-04-01 |
| CN104488147B true CN104488147B (zh) | 2017-07-07 |
Family
ID=49325030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380019811.XA Active CN104488147B (zh) | 2012-04-13 | 2013-04-05 | 脉冲型co2激光输出脉冲形状和功率控制 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8687661B2 (enExample) |
| JP (1) | JP6041977B2 (enExample) |
| KR (1) | KR101519516B1 (enExample) |
| CN (1) | CN104488147B (enExample) |
| DE (1) | DE112013002021B4 (enExample) |
| GB (1) | GB2515981B (enExample) |
| WO (1) | WO2013154949A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8995052B1 (en) * | 2013-09-09 | 2015-03-31 | Coherent Kaiserslautern GmbH | Multi-stage MOPA with first-pulse suppression |
| KR102251810B1 (ko) | 2014-09-30 | 2021-05-13 | 삼성전자주식회사 | 메모리 장치, 메모리 시스템 및 메모리 장치에 대한 제어 방법 |
| US9450369B2 (en) * | 2014-11-26 | 2016-09-20 | Convergent Dental, Inc. | Systems and methods for supplying power to and cooling dental laser systems |
| US20160204566A1 (en) * | 2015-01-09 | 2016-07-14 | Coherent, Inc. | Gas-discharge laser power and energy control |
| CN108141949B (zh) | 2015-10-12 | 2019-11-12 | 通快激光与系统工程有限公司 | 高频激励脉冲产生等离子或激光脉冲方法设备和控制单元 |
| DE102016212927B3 (de) | 2016-07-14 | 2017-09-07 | Trumpf Laser Gmbh | Laser-Taktsignalgenerator |
| CN109157747A (zh) * | 2017-10-30 | 2019-01-08 | 武汉奇致激光技术股份有限公司 | 一种强脉冲光治疗机的脉冲串输出控制方法 |
| WO2019145930A2 (en) | 2018-01-29 | 2019-08-01 | IDEA machine development design AND production ltd. | Compact coaxial laser |
| US11081855B2 (en) * | 2018-06-18 | 2021-08-03 | Coherent, Inc. | Laser-MOPA with burst-mode control |
| US11067809B1 (en) * | 2019-07-29 | 2021-07-20 | Facebook Technologies, Llc | Systems and methods for minimizing external light leakage from artificial-reality displays |
| US20220288720A1 (en) * | 2021-03-12 | 2022-09-15 | Ofuna Enterprise Japan Co., Ltd. | Laser processing method and laser processing machine |
| CN113231750B (zh) * | 2021-03-18 | 2022-07-19 | 武汉大学 | 一种脉冲激光打孔系统及打孔方法 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4539685A (en) * | 1982-09-02 | 1985-09-03 | United Technologies Corporation | Passively Q-switched laser having a variable pulse rate |
| WO2002090037A1 (en) * | 2001-05-09 | 2002-11-14 | Electro Scientific Industries, Inc. | Micromachining with high-energy, intra-cavity q-switched co2 laser pulses |
| JP2003188446A (ja) * | 2001-12-19 | 2003-07-04 | Sumitomo Heavy Ind Ltd | レーザ加工のパルス安定化方法 |
| US20060176917A1 (en) * | 2005-02-09 | 2006-08-10 | Ultratech, Inc. | CO2 laser stabilization systems and methods |
| WO2008091446A1 (en) * | 2007-01-26 | 2008-07-31 | Electro Scientific Industries, Inc. | Methods and systems for generating pulse trains for material processing |
| US20110085575A1 (en) * | 2009-10-13 | 2011-04-14 | Coherent, Inc. | Digital pulse-width-modulation control of a radio frequency power supply for pulsed laser |
| US20110182319A1 (en) * | 2010-01-22 | 2011-07-28 | Coherent, Inc. | Co2 laser output power control during warm-up |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186378A (en) * | 1981-05-11 | 1982-11-16 | Mitsubishi Electric Corp | Laser device |
| JPH06114582A (ja) * | 1992-10-06 | 1994-04-26 | Mitsui Petrochem Ind Ltd | メッキ鋼板のパルスレーザ照射方法 |
| US5345168A (en) | 1993-02-01 | 1994-09-06 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Burst-by-burst laser frequency monitor |
| US6463086B1 (en) * | 1999-02-10 | 2002-10-08 | Lambda Physik Ag | Molecular fluorine laser with spectral linewidth of less than 1 pm |
| JP2004153442A (ja) | 2002-10-29 | 2004-05-27 | Sony Corp | 光送信装置、光受信装置および光通信システム、並びにその送・受信方法 |
| EP1581128B1 (en) * | 2003-01-09 | 2007-05-30 | Gyrus Medical Limited | An electrosurgical generator |
| JP4493967B2 (ja) * | 2003-10-01 | 2010-06-30 | 日立ビアメカニクス株式会社 | Co2レーザ加工方法およびレーザ加工装置 |
| US7508850B2 (en) * | 2004-09-02 | 2009-03-24 | Coherent, Inc. | Apparatus for modifying CO2 slab laser pulses |
| US20070086495A1 (en) * | 2005-08-12 | 2007-04-19 | Sprague Randall B | Method and apparatus for stable laser drive |
| US7817686B2 (en) | 2008-03-27 | 2010-10-19 | Electro Scientific Industries, Inc. | Laser micromachining using programmable pulse shapes |
| US8391329B2 (en) * | 2009-01-26 | 2013-03-05 | Coherent, Inc. | Gas laser discharge pre-ionization using a simmer-discharge |
| JP5765730B2 (ja) * | 2010-03-11 | 2015-08-19 | ギガフォトン株式会社 | 極端紫外光生成装置 |
-
2012
- 2012-05-09 US US13/467,890 patent/US8687661B2/en active Active
-
2013
- 2013-04-05 DE DE112013002021.1T patent/DE112013002021B4/de active Active
- 2013-04-05 CN CN201380019811.XA patent/CN104488147B/zh active Active
- 2013-04-05 WO PCT/US2013/035530 patent/WO2013154949A2/en not_active Ceased
- 2013-04-05 GB GB1420217.0A patent/GB2515981B/en active Active
- 2013-04-05 KR KR1020147030522A patent/KR101519516B1/ko active Active
- 2013-04-05 JP JP2015505816A patent/JP6041977B2/ja active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4539685A (en) * | 1982-09-02 | 1985-09-03 | United Technologies Corporation | Passively Q-switched laser having a variable pulse rate |
| WO2002090037A1 (en) * | 2001-05-09 | 2002-11-14 | Electro Scientific Industries, Inc. | Micromachining with high-energy, intra-cavity q-switched co2 laser pulses |
| JP2003188446A (ja) * | 2001-12-19 | 2003-07-04 | Sumitomo Heavy Ind Ltd | レーザ加工のパルス安定化方法 |
| US20060176917A1 (en) * | 2005-02-09 | 2006-08-10 | Ultratech, Inc. | CO2 laser stabilization systems and methods |
| WO2008091446A1 (en) * | 2007-01-26 | 2008-07-31 | Electro Scientific Industries, Inc. | Methods and systems for generating pulse trains for material processing |
| US20110085575A1 (en) * | 2009-10-13 | 2011-04-14 | Coherent, Inc. | Digital pulse-width-modulation control of a radio frequency power supply for pulsed laser |
| US20110182319A1 (en) * | 2010-01-22 | 2011-07-28 | Coherent, Inc. | Co2 laser output power control during warm-up |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6041977B2 (ja) | 2016-12-14 |
| JP2015518657A (ja) | 2015-07-02 |
| KR101519516B1 (ko) | 2015-05-12 |
| KR20140132018A (ko) | 2014-11-14 |
| DE112013002021T5 (de) | 2015-03-05 |
| WO2013154949A2 (en) | 2013-10-17 |
| GB2515981A (en) | 2015-01-07 |
| CN104488147A (zh) | 2015-04-01 |
| GB2515981B (en) | 2015-02-18 |
| US20130272325A1 (en) | 2013-10-17 |
| DE112013002021B4 (de) | 2016-03-10 |
| US8687661B2 (en) | 2014-04-01 |
| WO2013154949A3 (en) | 2013-12-05 |
| GB201420217D0 (en) | 2014-12-31 |
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| C06 | Publication | ||
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| GR01 | Patent grant | ||
| GR01 | Patent grant |