CN104419913A - 一种激光化学气相沉积法制备高温超导带材的技术及设备 - Google Patents
一种激光化学气相沉积法制备高温超导带材的技术及设备 Download PDFInfo
- Publication number
- CN104419913A CN104419913A CN201310380560.XA CN201310380560A CN104419913A CN 104419913 A CN104419913 A CN 104419913A CN 201310380560 A CN201310380560 A CN 201310380560A CN 104419913 A CN104419913 A CN 104419913A
- Authority
- CN
- China
- Prior art keywords
- cavity
- raw material
- starting material
- band
- reaction cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 239000000463 material Substances 0.000 title claims abstract description 9
- 238000001182 laser chemical vapour deposition Methods 0.000 title abstract 2
- 239000007788 liquid Substances 0.000 claims abstract description 39
- 239000002994 raw material Substances 0.000 claims abstract description 30
- 238000006243 chemical reaction Methods 0.000 claims abstract description 27
- 239000010409 thin film Substances 0.000 claims abstract description 17
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 230000008021 deposition Effects 0.000 claims abstract description 11
- 239000007858 starting material Substances 0.000 claims description 31
- 238000012546 transfer Methods 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 15
- 235000008733 Citrus aurantifolia Nutrition 0.000 claims description 13
- 235000011941 Tilia x europaea Nutrition 0.000 claims description 13
- 239000004571 lime Substances 0.000 claims description 13
- 238000001704 evaporation Methods 0.000 claims description 11
- 230000008020 evaporation Effects 0.000 claims description 11
- 238000003860 storage Methods 0.000 claims description 11
- 238000005516 engineering process Methods 0.000 claims description 10
- 238000007086 side reaction Methods 0.000 claims description 10
- 208000002925 dental caries Diseases 0.000 claims description 6
- 239000000376 reactant Substances 0.000 claims description 6
- 238000000605 extraction Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 238000004804 winding Methods 0.000 claims description 3
- 229910002367 SrTiO Inorganic materials 0.000 claims description 2
- 238000013022 venting Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910001120 nichrome Inorganic materials 0.000 claims 1
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 238000000427 thin-film deposition Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 4
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 3
- 230000004913 activation Effects 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 16
- 239000010408 film Substances 0.000 description 10
- 239000002887 superconductor Substances 0.000 description 9
- 240000006909 Tilia x europaea Species 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000010924 continuous production Methods 0.000 description 4
- 238000004062 sedimentation Methods 0.000 description 4
- 239000011343 solid material Substances 0.000 description 4
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 241000954177 Bangana ariza Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 231100000004 severe toxicity Toxicity 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
Claims (33)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310380560.XA CN104419913B (zh) | 2013-08-29 | 2013-08-29 | 一种激光化学气相沉积法制备高温超导带材的技术及设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310380560.XA CN104419913B (zh) | 2013-08-29 | 2013-08-29 | 一种激光化学气相沉积法制备高温超导带材的技术及设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104419913A true CN104419913A (zh) | 2015-03-18 |
CN104419913B CN104419913B (zh) | 2018-02-16 |
Family
ID=52970022
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310380560.XA Expired - Fee Related CN104419913B (zh) | 2013-08-29 | 2013-08-29 | 一种激光化学气相沉积法制备高温超导带材的技术及设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104419913B (zh) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104975274A (zh) * | 2015-07-15 | 2015-10-14 | 武汉工程大学 | 一种激光微波磁场共同增强的化学气相沉积设备 |
CN105887046A (zh) * | 2016-06-29 | 2016-08-24 | 中国工程物理研究院激光聚变研究中心 | 激光诱导cvd设备 |
CN107607563A (zh) * | 2017-09-21 | 2018-01-19 | 上海剑度光电科技有限公司 | 一种可进行连续xrd在线监测的卷对卷mocvd设备 |
CN107881489A (zh) * | 2017-10-31 | 2018-04-06 | 浙江大学 | 一种激光辅助加热化学气相沉积镀膜装置及方法 |
CN108866509A (zh) * | 2017-05-10 | 2018-11-23 | 应用材料公司 | 用于腔室部件的金属氧氟化物膜 |
CN108963067A (zh) * | 2018-07-27 | 2018-12-07 | 武汉工程大学 | 一种ReBa2Cu3O7-x超导薄膜上制备钉扎层的方法 |
CN109023300A (zh) * | 2018-09-06 | 2018-12-18 | 上海大学 | 具有类柱状晶的锆酸钆薄膜及其制备方法 |
CN112813406A (zh) * | 2020-12-30 | 2021-05-18 | 武汉工程大学 | 基于cvd技术在异形件表面制备三维金属单质薄膜的设备及方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001073145A (ja) * | 1999-09-07 | 2001-03-21 | Tokyo Electron Ltd | 化学気相堆積装置、および化学気相堆積方法 |
JP2002155359A (ja) * | 2000-11-16 | 2002-05-31 | Fujikura Ltd | Cvd用液体原料および酸化物超電導体の製造方法 |
CN1441464A (zh) * | 2002-02-25 | 2003-09-10 | 联华电子股份有限公司 | 气相流体运送系统的流体加热注入装置 |
US20050223984A1 (en) * | 2004-04-08 | 2005-10-13 | Hee-Gyoun Lee | Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
CN102113092A (zh) * | 2008-08-04 | 2011-06-29 | 美国迅力光能公司 | 具有实时在线iv测量的卷对卷连续式薄膜pv制造工艺及设备 |
CN102189343A (zh) * | 2010-03-15 | 2011-09-21 | 欧姆龙株式会社 | 激光加工装置、激光光源装置及其控制方法 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
-
2013
- 2013-08-29 CN CN201310380560.XA patent/CN104419913B/zh not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001073145A (ja) * | 1999-09-07 | 2001-03-21 | Tokyo Electron Ltd | 化学気相堆積装置、および化学気相堆積方法 |
JP2002155359A (ja) * | 2000-11-16 | 2002-05-31 | Fujikura Ltd | Cvd用液体原料および酸化物超電導体の製造方法 |
CN1441464A (zh) * | 2002-02-25 | 2003-09-10 | 联华电子股份有限公司 | 气相流体运送系统的流体加热注入装置 |
US20050223984A1 (en) * | 2004-04-08 | 2005-10-13 | Hee-Gyoun Lee | Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
CN102113092A (zh) * | 2008-08-04 | 2011-06-29 | 美国迅力光能公司 | 具有实时在线iv测量的卷对卷连续式薄膜pv制造工艺及设备 |
CN102189343A (zh) * | 2010-03-15 | 2011-09-21 | 欧姆龙株式会社 | 激光加工装置、激光光源装置及其控制方法 |
CN102560378A (zh) * | 2010-12-21 | 2012-07-11 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104975274A (zh) * | 2015-07-15 | 2015-10-14 | 武汉工程大学 | 一种激光微波磁场共同增强的化学气相沉积设备 |
CN105887046A (zh) * | 2016-06-29 | 2016-08-24 | 中国工程物理研究院激光聚变研究中心 | 激光诱导cvd设备 |
CN105887046B (zh) * | 2016-06-29 | 2018-07-31 | 中国工程物理研究院激光聚变研究中心 | 激光诱导cvd设备 |
CN108866509A (zh) * | 2017-05-10 | 2018-11-23 | 应用材料公司 | 用于腔室部件的金属氧氟化物膜 |
CN107607563A (zh) * | 2017-09-21 | 2018-01-19 | 上海剑度光电科技有限公司 | 一种可进行连续xrd在线监测的卷对卷mocvd设备 |
CN107881489A (zh) * | 2017-10-31 | 2018-04-06 | 浙江大学 | 一种激光辅助加热化学气相沉积镀膜装置及方法 |
CN107881489B (zh) * | 2017-10-31 | 2019-12-24 | 浙江大学 | 一种激光辅助加热化学气相沉积镀膜装置及方法 |
CN108963067A (zh) * | 2018-07-27 | 2018-12-07 | 武汉工程大学 | 一种ReBa2Cu3O7-x超导薄膜上制备钉扎层的方法 |
CN108963067B (zh) * | 2018-07-27 | 2022-04-29 | 武汉工程大学 | 一种ReBa2Cu3O7-x超导薄膜上制备钉扎层的方法 |
CN109023300A (zh) * | 2018-09-06 | 2018-12-18 | 上海大学 | 具有类柱状晶的锆酸钆薄膜及其制备方法 |
CN112813406A (zh) * | 2020-12-30 | 2021-05-18 | 武汉工程大学 | 基于cvd技术在异形件表面制备三维金属单质薄膜的设备及方法 |
Also Published As
Publication number | Publication date |
---|---|
CN104419913B (zh) | 2018-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104419913A (zh) | 一种激光化学气相沉积法制备高温超导带材的技术及设备 | |
CN1798618B (zh) | 紫外(uv)和等离子体辅助金属有机化学气相沉积(mocvd)系统 | |
US12046467B2 (en) | Vapor phase transport systems for depositing perovskite semiconductors | |
US7736438B2 (en) | Method and apparatus for depositing a coating on a tape carrier | |
US7910155B2 (en) | Method for manufacturing high temperature superconducting conductor | |
US20190092635A1 (en) | Para-Orthohydrogen Conversion Using a Vortex Tube | |
CN104419911A (zh) | 一种新型高速制备各种功能、结构薄膜的技术及设备 | |
US10395799B2 (en) | Methods and systems for fabricating high quality superconducting tapes | |
US20120285380A1 (en) | Constant volume closure valve for vapor phase deposition source | |
CN117654849A (zh) | 一种闪烁体膜的喷涂制备工艺 | |
CN208150971U (zh) | 一种用于掺氮纳米碳管的合成装置 | |
JP5544271B2 (ja) | 酸化物超電導体薄膜の成膜方法および成膜装置 | |
EP2892643A1 (en) | Methods for generating hydrogen gas using plasma sources | |
KR102620660B1 (ko) | 펄스 레이저 증착에 의한 초전도층 박막 증착장치 | |
CN106435526A (zh) | 一种用于mocvd制备ybco带材的气体反应腔 | |
CN219037555U (zh) | 一种真空电弧炉 | |
WO2016059264A1 (es) | Cintas, capas o láminas superconductoras y su método de fabricación a partir de disoluciones precursoras sin flúor con elevadas velocidades de crecimiento | |
CN107893219A (zh) | 一种钆钐掺杂的钇钡铜氧超导层及其制备方法 | |
US8211229B2 (en) | Apparatus including column having hollow part filled with filler and solid film-formation material | |
JP2003036744A (ja) | 酸化物超電導導体及び酸化物超電導導体の製造方法 | |
Yagi et al. | Tritium monitoring for liquid lithium by permeation through iron window | |
JP2017191882A (ja) | HfN膜の製造方法およびHfN膜 | |
Mosiadz et al. | Inkjet printing, pyrolysis and crystallisation of YBa2Cu3O7-δ precursor layers for fully chemical solution deposited coated conductors | |
Wei et al. | Superwetting membrane-based strategy for high-flux enrichment of ethanol from ethanol/water mixture | |
KR101052119B1 (ko) | 세라믹 멤브레인을 이용한 수소 제조 방법 및 장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
DD01 | Delivery of document by public notice | ||
DD01 | Delivery of document by public notice |
Addressee: Zhao Pei Document name: payment instructions |
|
DD01 | Delivery of document by public notice | ||
DD01 | Delivery of document by public notice |
Addressee: Zhao Pei Document name: Notice of termination of patent right |
|
DD01 | Delivery of document by public notice | ||
DD01 | Delivery of document by public notice |
Addressee: Zhao Pei Document name: Notification of eligibility |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20220411 Address after: 433132 No. 37, West Yanhua 1st Road, Qianjiang Economic Development Zone, Qianjiang City, Hubei Province Patentee after: WUHAN XINGUI TECHNOLOGY QIANJIANG Co.,Ltd. Address before: 430033 1-4-1, No. 181, Hanzheng Street, Qiaokou District, Wuhan City, Hubei Province Patentee before: Zhao Pei Patentee before: Xu Yuanlai |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180216 |