CN104379815B - 弹性缓冲件和使用了该弹性缓冲件的离子交换膜电解槽 - Google Patents

弹性缓冲件和使用了该弹性缓冲件的离子交换膜电解槽 Download PDF

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Publication number
CN104379815B
CN104379815B CN201380031146.6A CN201380031146A CN104379815B CN 104379815 B CN104379815 B CN 104379815B CN 201380031146 A CN201380031146 A CN 201380031146A CN 104379815 B CN104379815 B CN 104379815B
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Prior art keywords
resilient snubber
mentioned
cathode
pair
corrosion
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CN201380031146.6A
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English (en)
Chinese (zh)
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CN104379815A (zh
Inventor
儿玉義之
川西孝治
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ThyssenKrupp Uhde Chlorine Engineers Japan Ltd
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Chlorine Engineers Corp Ltd
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C25B9/23—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms comprising ion-exchange membranes in or on which electrode material is embedded
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B13/00—Diaphragms; Spacing elements
    • C25B13/02—Diaphragms; Spacing elements characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/04—Regulation of the inter-electrode distance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/60—Constructional parts of cells
    • C25B9/63—Holders for electrodes; Positioning of the electrodes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CN201380031146.6A 2012-06-13 2013-05-30 弹性缓冲件和使用了该弹性缓冲件的离子交换膜电解槽 Active CN104379815B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-134271 2012-06-13
JP2012134271A JP5970250B2 (ja) 2012-06-13 2012-06-13 イオン交換膜電解槽用弾性クッション材
PCT/JP2013/065085 WO2013187242A1 (fr) 2012-06-13 2013-05-30 Matériau amortisseur élastique et cellule électrolytique à membrane échangeuse d'ions l'utilisant

Publications (2)

Publication Number Publication Date
CN104379815A CN104379815A (zh) 2015-02-25
CN104379815B true CN104379815B (zh) 2019-01-11

Family

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Family Applications (1)

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CN201380031146.6A Active CN104379815B (zh) 2012-06-13 2013-05-30 弹性缓冲件和使用了该弹性缓冲件的离子交换膜电解槽

Country Status (7)

Country Link
US (1) US10344386B2 (fr)
EP (1) EP2862961B1 (fr)
JP (1) JP5970250B2 (fr)
KR (1) KR101848339B1 (fr)
CN (1) CN104379815B (fr)
IN (1) IN2014MN02631A (fr)
WO (1) WO2013187242A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5913693B1 (ja) * 2015-07-03 2016-04-27 アクアエコス株式会社 電解装置及び電解オゾン水製造装置
US10815578B2 (en) * 2017-09-08 2020-10-27 Electrode Solutions, LLC Catalyzed cushion layer in a multi-layer electrode
EP3460101B1 (fr) * 2017-09-21 2020-04-22 Hymeth ApS Électrode pour un processus d'électrolyse
JP7122181B2 (ja) * 2018-07-06 2022-08-19 旭化成株式会社 電極構造体、電解セル及び電解槽
JP7022918B2 (ja) * 2018-07-13 2022-02-21 パナソニックＩｐマネジメント株式会社 電解水生成装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58133386A (ja) * 1982-02-02 1983-08-09 Chlorine Eng Corp Ltd イオン交換膜電解槽
CN1451786A (zh) * 2002-04-05 2003-10-29 氯工程公司 离子交换膜电解槽
JP2003313690A (ja) * 2002-02-20 2003-11-06 Chlorine Eng Corp Ltd イオン交換膜電解槽
CN1537973A (zh) * 2003-03-31 2004-10-20 ̹�� 电解电极和离子交换膜电解池
JP2012057199A (ja) * 2010-09-07 2012-03-22 Chlorine Engineers Corp Ltd 電解用陰極構造体およびそれを用いた電解槽
CN102459708A (zh) * 2009-05-26 2012-05-16 氯工程公司 安装有气体扩散电极的离子交换膜电解槽

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2967814A (en) * 1958-10-15 1961-01-10 Phelps Dodge Corp Helix wire anode
JPH0610352B2 (ja) 1986-08-22 1994-02-09 日本真空技術株式会社 Ｃｖｄ装置
US5231709A (en) * 1990-09-26 1993-08-03 Miller John E Support deck for mattress or seat
JP3686270B2 (ja) * 1998-12-10 2005-08-24 株式会社トクヤマ 電解槽
US7548881B2 (en) 2002-11-04 2009-06-16 Tradebeam, Inc. Systems and methods for producing documentary credit and conforming shipping documents
JP4246530B2 (ja) 2003-03-31 2009-04-02 クロリンエンジニアズ株式会社 電解用電極及びそれを使用するイオン交換膜電解槽
JP3869383B2 (ja) * 2003-03-31 2007-01-17 クロリンエンジニアズ株式会社 液透過型ガス拡散陰極を使用するイオン交換膜電解槽
JP3860132B2 (ja) * 2003-03-31 2006-12-20 クロリンエンジニアズ株式会社 水素発生陰極を使用するイオン交換膜電解槽
JP5493787B2 (ja) * 2009-12-04 2014-05-14 東ソー株式会社 イオン交換膜法電解槽
US8740196B2 (en) * 2011-03-18 2014-06-03 Jay Rodger Elrod Drawbar spring coupler

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58133386A (ja) * 1982-02-02 1983-08-09 Chlorine Eng Corp Ltd イオン交換膜電解槽
JP2003313690A (ja) * 2002-02-20 2003-11-06 Chlorine Eng Corp Ltd イオン交換膜電解槽
CN1451786A (zh) * 2002-04-05 2003-10-29 氯工程公司 离子交换膜电解槽
CN1537973A (zh) * 2003-03-31 2004-10-20 ̹�� 电解电极和离子交换膜电解池
CN102459708A (zh) * 2009-05-26 2012-05-16 氯工程公司 安装有气体扩散电极的离子交换膜电解槽
JP2012057199A (ja) * 2010-09-07 2012-03-22 Chlorine Engineers Corp Ltd 電解用陰極構造体およびそれを用いた電解槽

Also Published As

Publication number Publication date
KR101848339B1 (ko) 2018-04-12
IN2014MN02631A (fr) 2015-10-16
CN104379815A (zh) 2015-02-25
KR20150022802A (ko) 2015-03-04
EP2862961B1 (fr) 2018-04-18
EP2862961A1 (fr) 2015-04-22
US10344386B2 (en) 2019-07-09
US20150122641A1 (en) 2015-05-07
JP2013256706A (ja) 2013-12-26
JP5970250B2 (ja) 2016-08-17
WO2013187242A1 (fr) 2013-12-19
EP2862961A4 (fr) 2016-01-20

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