CN104349617B - 电子装置及其外壳的制造方法 - Google Patents
电子装置及其外壳的制造方法 Download PDFInfo
- Publication number
- CN104349617B CN104349617B CN201310324648.XA CN201310324648A CN104349617B CN 104349617 B CN104349617 B CN 104349617B CN 201310324648 A CN201310324648 A CN 201310324648A CN 104349617 B CN104349617 B CN 104349617B
- Authority
- CN
- China
- Prior art keywords
- shell
- thermal
- electronic installation
- heat conducting
- conductive zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/20—Cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/02—Details
- H05K5/0213—Venting apertures; Constructional details thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20409—Outer radiating structures on heat dissipating housings, e.g. fins integrated with the housing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Human Computer Interaction (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Abstract
Description
电子装置 | 100 |
外壳 | 10 |
底壳 | 11 |
顶盖 | 13 |
底壁 | 112 |
导热区 | 1121 |
导执孔 | 1124,1124’ |
周壁 | 114 |
主板 | 20 |
电池 | 30 |
Claims (7)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310324648.XA CN104349617B (zh) | 2013-07-30 | 2013-07-30 | 电子装置及其外壳的制造方法 |
TW102127892A TWI546012B (zh) | 2013-07-30 | 2013-08-02 | 電子裝置及其外殼之製造方法 |
US14/446,503 US9538673B2 (en) | 2013-07-30 | 2014-07-30 | Electronic device and method for manufacturing housing for same |
US15/348,946 US9921620B2 (en) | 2013-07-30 | 2016-11-10 | Method for manufacturing housing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310324648.XA CN104349617B (zh) | 2013-07-30 | 2013-07-30 | 电子装置及其外壳的制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104349617A CN104349617A (zh) | 2015-02-11 |
CN104349617B true CN104349617B (zh) | 2017-05-24 |
Family
ID=52427476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310324648.XA Active CN104349617B (zh) | 2013-07-30 | 2013-07-30 | 电子装置及其外壳的制造方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US9538673B2 (zh) |
CN (1) | CN104349617B (zh) |
TW (1) | TWI546012B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10356919B2 (en) * | 2017-09-15 | 2019-07-16 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Foldable module and flexible display device having the same |
CN110139537A (zh) * | 2019-05-11 | 2019-08-16 | 深圳市东丽华科技有限公司 | 散热玻璃及其制备方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1540714A (zh) * | 2003-04-21 | 2004-10-27 | ���ǵ�����ʽ���� | 制造自排序纳米管道阵列及纳米点的方法 |
CN1652021A (zh) * | 2005-02-07 | 2005-08-10 | 中国科学院光电技术研究所 | 光栅偏振掩模板及其在投影光刻系统中的应用 |
CN101295671A (zh) * | 2007-04-23 | 2008-10-29 | 联华电子股份有限公司 | 形成接触孔的方法 |
TW200850117A (en) * | 2007-06-08 | 2008-12-16 | Sutech Trading Ltd | Housing for electronic product and method of making the same |
CN101567288A (zh) * | 2009-06-04 | 2009-10-28 | 彩虹集团公司 | 一种碳纳米管场致发射显示器下基板结构的制作方法 |
CN101654221A (zh) * | 2009-06-10 | 2010-02-24 | 苏州纳米技术与纳米仿生研究所 | 绝缘体的硅材料上加工极限纳米图形的电子束曝光方法 |
TWM375238U (en) * | 2009-08-06 | 2010-03-01 | Beijing Avc Technology Res Ct Co Ltd | Cooling structure for loop heat pipe chamber |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2684334Y (zh) * | 2004-03-31 | 2005-03-09 | 陈益兴 | 活页式电子储存装置 |
CN100405254C (zh) * | 2004-07-23 | 2008-07-23 | 华硕电脑股份有限公司 | 电子装置 |
CN201039622Y (zh) * | 2007-04-20 | 2008-03-19 | 瀚斯宝丽股份有限公司 | 多向组合式显示器结构 |
CN201044545Y (zh) * | 2007-05-18 | 2008-04-02 | 深圳市同洲电子股份有限公司 | 固定支架及具有该固定支架的电子设备 |
WO2009017039A1 (ja) * | 2007-07-27 | 2009-02-05 | Mitsubishi Electric Corporation | 熱交換器およびその製造方法 |
CN101423188B (zh) * | 2007-10-31 | 2011-06-29 | 中国科学院半导体研究所 | 一种纳米尺寸空气槽的制作方法 |
JP5634805B2 (ja) * | 2010-09-07 | 2014-12-03 | スタンレー電気株式会社 | 金属含浸炭素系基板、これを含む放熱材料及び金属含浸炭素系基板の製造方法 |
KR101281974B1 (ko) * | 2011-09-07 | 2013-07-05 | 주식회사 팬택 | 냉각 구조를 갖는 휴대용 단말기 |
-
2013
- 2013-07-30 CN CN201310324648.XA patent/CN104349617B/zh active Active
- 2013-08-02 TW TW102127892A patent/TWI546012B/zh active
-
2014
- 2014-07-30 US US14/446,503 patent/US9538673B2/en active Active
-
2016
- 2016-11-10 US US15/348,946 patent/US9921620B2/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1540714A (zh) * | 2003-04-21 | 2004-10-27 | ���ǵ�����ʽ���� | 制造自排序纳米管道阵列及纳米点的方法 |
CN1652021A (zh) * | 2005-02-07 | 2005-08-10 | 中国科学院光电技术研究所 | 光栅偏振掩模板及其在投影光刻系统中的应用 |
CN101295671A (zh) * | 2007-04-23 | 2008-10-29 | 联华电子股份有限公司 | 形成接触孔的方法 |
TW200850117A (en) * | 2007-06-08 | 2008-12-16 | Sutech Trading Ltd | Housing for electronic product and method of making the same |
CN101567288A (zh) * | 2009-06-04 | 2009-10-28 | 彩虹集团公司 | 一种碳纳米管场致发射显示器下基板结构的制作方法 |
CN101654221A (zh) * | 2009-06-10 | 2010-02-24 | 苏州纳米技术与纳米仿生研究所 | 绝缘体的硅材料上加工极限纳米图形的电子束曝光方法 |
TWM375238U (en) * | 2009-08-06 | 2010-03-01 | Beijing Avc Technology Res Ct Co Ltd | Cooling structure for loop heat pipe chamber |
Also Published As
Publication number | Publication date |
---|---|
TWI546012B (zh) | 2016-08-11 |
US20150036295A1 (en) | 2015-02-05 |
US20170060200A1 (en) | 2017-03-02 |
CN104349617A (zh) | 2015-02-11 |
US9538673B2 (en) | 2017-01-03 |
US9921620B2 (en) | 2018-03-20 |
TW201519746A (zh) | 2015-05-16 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180223 Address after: 518109, Shenzhen City, Guangdong province Guanlan Foxconn hung Technology Park B district workshop 5, C09 building 4, C07 Building 2, C08 building 3, 4, C04, building 1 Patentee after: SHENZHENSHI YUZHAN PRECISION TECHNOLOGY Co.,Ltd. Address before: 518109 Guangdong city of Shenzhen province Baoan District Guanlan Street third community Guanlan Foxconn Technology Park B District, building 4, building 6, building 7, building 13, (I) Co-patentee before: HON HAI PRECISION INDUSTRY Co.,Ltd. Patentee before: FuTaiHua Industry (Shenzhen) Co.,Ltd. |
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CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 518109 Foxconn H5 plant 101, No. 2, Donghuan 2nd Road, Fukang community, Longhua street, Longhua District, Shenzhen, Guangdong Province; plant 5, building C09, 4th floor, building C07, 2nd floor, building C08, 3rd floor, 4th floor, building C04, zone B, Foxconn Hongguan science and Technology Park, Fucheng Dasan community, Guanlan street, Guangdong Province Patentee after: Fulian Yuzhan Technology (Shenzhen) Co.,Ltd. Address before: 518109 Shenzhen Guanlan Foxconn Science and Technology Park, Guangdong Province, District B workshop 5 C09 4 storeys, C07 2 storeys, C08 3 storeys 4 storeys, C04 1 Patentee before: SHENZHENSHI YUZHAN PRECISION TECHNOLOGY Co.,Ltd. |