CN104335096B - 分面反射镜 - Google Patents

分面反射镜 Download PDF

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Publication number
CN104335096B
CN104335096B CN201380026836.2A CN201380026836A CN104335096B CN 104335096 B CN104335096 B CN 104335096B CN 201380026836 A CN201380026836 A CN 201380026836A CN 104335096 B CN104335096 B CN 104335096B
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CN
China
Prior art keywords
pupil
mirror
facet mirror
facet
facets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380026836.2A
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English (en)
Chinese (zh)
Other versions
CN104335096A (zh
Inventor
S.比林
M.德冈瑟
J.万格勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of CN104335096A publication Critical patent/CN104335096A/zh
Application granted granted Critical
Publication of CN104335096B publication Critical patent/CN104335096B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/002—Arrays of reflective systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
CN201380026836.2A 2012-05-23 2013-05-07 分面反射镜 Active CN104335096B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261650568P 2012-05-23 2012-05-23
DE102012010093A DE102012010093A1 (de) 2012-05-23 2012-05-23 Facettenspiegel
DE102012010093.0 2012-05-23
US61/650,568 2012-05-23
PCT/EP2013/059427 WO2013174644A1 (en) 2012-05-23 2013-05-07 Facet mirror

Publications (2)

Publication Number Publication Date
CN104335096A CN104335096A (zh) 2015-02-04
CN104335096B true CN104335096B (zh) 2018-08-28

Family

ID=49546795

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380026836.2A Active CN104335096B (zh) 2012-05-23 2013-05-07 分面反射镜

Country Status (6)

Country Link
US (1) US10599041B2 (enExample)
JP (1) JP6504506B2 (enExample)
CN (1) CN104335096B (enExample)
DE (1) DE102012010093A1 (enExample)
TW (1) TWI639850B (enExample)
WO (1) WO2013174644A1 (enExample)

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DE102015209175A1 (de) * 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel
DE102015209453A1 (de) * 2015-05-22 2016-11-24 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel
JP2018527612A (ja) * 2015-08-25 2018-09-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のための抑制フィルタ、放射コレクタ及び放射源、並びに抑制フィルタの少なくとも２つの反射面レベル間の分離距離を決定する方法
DE102016205624B4 (de) * 2016-04-05 2017-12-28 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie, Beleuchtungssystem, Projektionsbelichtungsanlage und Verfahren zur Projektionsbelichtung
US10712671B2 (en) 2016-05-19 2020-07-14 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US11067900B2 (en) 2016-05-19 2021-07-20 Nikon Corporation Dense line extreme ultraviolet lithography system with distortion matching
US10890849B2 (en) * 2016-05-19 2021-01-12 Nikon Corporation EUV lithography system for dense line patterning
US10295911B2 (en) 2016-05-19 2019-05-21 Nikon Corporation Extreme ultraviolet lithography system that utilizes pattern stitching
DE102016209359A1 (de) 2016-05-31 2017-11-30 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102016225563A1 (de) 2016-12-20 2018-06-21 Carl Zeiss Smt Gmbh Hohlwellenleiter zur Führung von EUV-Licht mit einer Nutzwellenlänge
DE102017205548A1 (de) 2017-03-31 2018-10-04 Carl Zeiss Smt Gmbh Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers
US11934105B2 (en) 2017-04-19 2024-03-19 Nikon Corporation Optical objective for operation in EUV spectral region
TWI763834B (zh) * 2017-04-26 2022-05-11 日商尼康股份有限公司 反射系統、微影曝光工具、在工件上形成條紋圖案的方法及微器件的製造方法
US11054745B2 (en) 2017-04-26 2021-07-06 Nikon Corporation Illumination system with flat 1D-patterned mask for use in EUV-exposure tool
WO2018200536A2 (en) * 2017-04-26 2018-11-01 Nikon Corporation Illumination system with flat 1d-patterned mask for use in euv-exposure tool
WO2018208912A2 (en) * 2017-05-11 2018-11-15 Nikon Corporation Illumination system with curved 1d-patterned mask for use in euv-exposure tool
US11300884B2 (en) 2017-05-11 2022-04-12 Nikon Corporation Illumination system with curved 1d-patterned mask for use in EUV-exposure tool
DE102017217867A1 (de) * 2017-10-09 2018-07-26 Carl Zeiss Smt Gmbh EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage
DE102018216870A1 (de) * 2018-10-01 2020-04-02 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Beleuchtungssystems für eine EUV-Anlage
DE102018220629A1 (de) 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
TWI705910B (zh) * 2019-05-16 2020-10-01 怡利電子工業股份有限公司 標靶反射式擴散片抬頭顯示裝置
DE102019212017A1 (de) 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102019129135A1 (de) * 2019-10-29 2021-04-29 Zumtobel Lighting Gmbh 3D-Druckverfahren zur Herstellung eines Leuchtenelements mit optischem Teil
DE102020208665A1 (de) 2020-07-10 2022-01-13 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102020213837A1 (de) 2020-11-04 2021-08-19 Carl Zeiss Smt Gmbh Facettenspiegel-Vorrichtung
EP4092458A1 (en) * 2021-05-19 2022-11-23 Universität Stuttgart Grating mirror and radiation providing system comprising a grating mirror
DE102022207052A1 (de) 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Spiegel für eine Projektionsbelichtungsanlage
US20250216254A1 (en) * 2024-01-03 2025-07-03 Kla Corporation Diffractive euv spectral purity filters for optical systems

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US20030086524A1 (en) * 1998-05-05 2003-05-08 Carl Zeiss Semiconductor Manufacturing Technologies Ag Illumination system particularly for microlithography
TWI318776B (en) * 2002-08-26 2009-12-21 Zeiss Carl Semiconductor Mfg A projection exposure system
CN1985356A (zh) * 2004-09-22 2007-06-20 尼康股份有限公司 照明装置、曝光装置及微元件的制造方法
WO2009069815A1 (en) * 2007-11-27 2009-06-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and method for producing device
JP2010114344A (ja) * 2008-11-10 2010-05-20 Nikon Corp 露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
US20150049321A1 (en) 2015-02-19
CN104335096A (zh) 2015-02-04
DE102012010093A1 (de) 2013-11-28
WO2013174644A1 (en) 2013-11-28
JP6504506B2 (ja) 2019-04-24
TWI639850B (zh) 2018-11-01
US10599041B2 (en) 2020-03-24
JP2015519009A (ja) 2015-07-06
TW201415076A (zh) 2014-04-16

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