DE102012010093A1 - Facettenspiegel - Google Patents
Facettenspiegel Download PDFInfo
- Publication number
- DE102012010093A1 DE102012010093A1 DE102012010093A DE102012010093A DE102012010093A1 DE 102012010093 A1 DE102012010093 A1 DE 102012010093A1 DE 102012010093 A DE102012010093 A DE 102012010093A DE 102012010093 A DE102012010093 A DE 102012010093A DE 102012010093 A1 DE102012010093 A1 DE 102012010093A1
- Authority
- DE
- Germany
- Prior art keywords
- facet mirror
- facets
- mirror
- projection exposure
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000005286 illumination Methods 0.000 claims abstract description 43
- 230000005855 radiation Effects 0.000 claims description 57
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 238000003384 imaging method Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000013016 damping Methods 0.000 claims description 4
- 238000001393 microlithography Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 210000001747 pupil Anatomy 0.000 description 40
- 239000011295 pitch Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000001066 destructive effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005315 distribution function Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- GALOTNBSUVEISR-UHFFFAOYSA-N molybdenum;silicon Chemical compound [Mo]#[Si] GALOTNBSUVEISR-UHFFFAOYSA-N 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/002—Arrays of reflective systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
- G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/425—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012010093A DE102012010093A1 (de) | 2012-05-23 | 2012-05-23 | Facettenspiegel |
| PCT/EP2013/059427 WO2013174644A1 (en) | 2012-05-23 | 2013-05-07 | Facet mirror |
| JP2015513078A JP6504506B2 (ja) | 2012-05-23 | 2013-05-07 | ファセットミラー |
| CN201380026836.2A CN104335096B (zh) | 2012-05-23 | 2013-05-07 | 分面反射镜 |
| TW102117653A TWI639850B (zh) | 2012-05-23 | 2013-05-17 | 光瞳組合反射鏡、照明光學單元、照明系統、投射曝光設備、用於產生一微結構或奈米結構元件之方法以及微結構或奈米結構元件 |
| US14/529,844 US10599041B2 (en) | 2012-05-23 | 2014-10-31 | Facet mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012010093A DE102012010093A1 (de) | 2012-05-23 | 2012-05-23 | Facettenspiegel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012010093A1 true DE102012010093A1 (de) | 2013-11-28 |
Family
ID=49546795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012010093A Ceased DE102012010093A1 (de) | 2012-05-23 | 2012-05-23 | Facettenspiegel |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10599041B2 (enExample) |
| JP (1) | JP6504506B2 (enExample) |
| CN (1) | CN104335096B (enExample) |
| DE (1) | DE102012010093A1 (enExample) |
| TW (1) | TWI639850B (enExample) |
| WO (1) | WO2013174644A1 (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015209453A1 (de) * | 2015-05-22 | 2016-11-24 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel |
| DE102017217867A1 (de) * | 2017-10-09 | 2018-07-26 | Carl Zeiss Smt Gmbh | EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage |
| DE102018216870A1 (de) * | 2018-10-01 | 2020-04-02 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Beleuchtungssystems für eine EUV-Anlage |
| DE102018220629A1 (de) | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
| DE102020213837A1 (de) | 2020-11-04 | 2021-08-19 | Carl Zeiss Smt Gmbh | Facettenspiegel-Vorrichtung |
| WO2022008102A1 (de) | 2020-07-10 | 2022-01-13 | Carl Zeiss Smt Gmbh | Optisches beleuchtungssystem zur führung von euv-strahlung |
| DE102022207052A1 (de) | 2022-07-11 | 2024-01-11 | Carl Zeiss Smt Gmbh | Spiegel für eine Projektionsbelichtungsanlage |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102390697B1 (ko) * | 2013-01-28 | 2022-04-26 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템 |
| DE102015209175A1 (de) * | 2015-05-20 | 2016-11-24 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel |
| WO2017032569A1 (en) * | 2015-08-25 | 2017-03-02 | Asml Netherlands B.V. | Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter |
| DE102016205624B4 (de) * | 2016-04-05 | 2017-12-28 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie, Beleuchtungssystem, Projektionsbelichtungsanlage und Verfahren zur Projektionsbelichtung |
| US11067900B2 (en) | 2016-05-19 | 2021-07-20 | Nikon Corporation | Dense line extreme ultraviolet lithography system with distortion matching |
| US10295911B2 (en) | 2016-05-19 | 2019-05-21 | Nikon Corporation | Extreme ultraviolet lithography system that utilizes pattern stitching |
| US11099483B2 (en) * | 2016-05-19 | 2021-08-24 | Nikon Corporation | Euv lithography system for dense line patterning |
| US10712671B2 (en) | 2016-05-19 | 2020-07-14 | Nikon Corporation | Dense line extreme ultraviolet lithography system with distortion matching |
| DE102016209359A1 (de) | 2016-05-31 | 2017-11-30 | Carl Zeiss Smt Gmbh | EUV-Kollektor |
| DE102016225563A1 (de) | 2016-12-20 | 2018-06-21 | Carl Zeiss Smt Gmbh | Hohlwellenleiter zur Führung von EUV-Licht mit einer Nutzwellenlänge |
| DE102017205548A1 (de) | 2017-03-31 | 2018-10-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe zum Führen eines Ausgabestrahls eines Freie-Elektronen-Lasers |
| US11934105B2 (en) | 2017-04-19 | 2024-03-19 | Nikon Corporation | Optical objective for operation in EUV spectral region |
| CN110892328B (zh) * | 2017-04-26 | 2022-04-29 | 株式会社尼康 | 反射系统、极紫外线曝光工具、光刻曝光工具及光学系统 |
| US11054745B2 (en) | 2017-04-26 | 2021-07-06 | Nikon Corporation | Illumination system with flat 1D-patterned mask for use in EUV-exposure tool |
| TWI763834B (zh) * | 2017-04-26 | 2022-05-11 | 日商尼康股份有限公司 | 反射系統、微影曝光工具、在工件上形成條紋圖案的方法及微器件的製造方法 |
| WO2018208912A2 (en) * | 2017-05-11 | 2018-11-15 | Nikon Corporation | Illumination system with curved 1d-patterned mask for use in euv-exposure tool |
| US11300884B2 (en) | 2017-05-11 | 2022-04-12 | Nikon Corporation | Illumination system with curved 1d-patterned mask for use in EUV-exposure tool |
| TWI705910B (zh) * | 2019-05-16 | 2020-10-01 | 怡利電子工業股份有限公司 | 標靶反射式擴散片抬頭顯示裝置 |
| DE102019212017A1 (de) | 2019-08-09 | 2021-02-11 | Carl Zeiss Smt Gmbh | Optisches Beleuchtungssystem zur Führung von EUV-Strahlung |
| DE102019129135A1 (de) * | 2019-10-29 | 2021-04-29 | Zumtobel Lighting Gmbh | 3D-Druckverfahren zur Herstellung eines Leuchtenelements mit optischem Teil |
| EP4092458A1 (en) * | 2021-05-19 | 2022-11-23 | Universität Stuttgart | Grating mirror and radiation providing system comprising a grating mirror |
| US20250216254A1 (en) * | 2024-01-03 | 2025-07-03 | Kla Corporation | Diffractive euv spectral purity filters for optical systems |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| US7006595B2 (en) | 1998-05-05 | 2006-02-28 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Illumination system particularly for microlithography |
| EP1796147A1 (en) | 2004-09-22 | 2007-06-13 | Nikon Corporation | Lighting apparatus, exposure apparatus and maicrodevice manufacturing method |
| EP1811547A1 (en) | 2005-02-03 | 2007-07-25 | Nikon Corporation | Optical integrator, illumination optical device, exposure device, and exposure method |
| DE102006036064A1 (de) | 2006-08-02 | 2008-02-07 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| WO2009100856A1 (en) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102009044462A1 (de) | 2009-11-06 | 2011-01-05 | Carl Zeiss Smt Ag | Optisches Element, Beleuchtungssystem und Projektionsbelichtungsanlage |
| DE102011082065A1 (de) * | 2011-09-02 | 2012-09-27 | Carl Zeiss Smt Gmbh | Spiegel-Array |
| US20120262688A1 (en) * | 2011-04-15 | 2012-10-18 | Asml Netherlands B.V. | Optical Apparatus for Conditioning a Radiation Beam for Use by an Object, Lithography Apparatus and Method of Manufacturing Devices |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5581605A (en) * | 1993-02-10 | 1996-12-03 | Nikon Corporation | Optical element, production method of optical element, optical system, and optical apparatus |
| US5850300A (en) | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
| US6573978B1 (en) * | 1999-01-26 | 2003-06-03 | Mcguire, Jr. James P. | EUV condenser with non-imaging optics |
| KR100931335B1 (ko) * | 2000-09-29 | 2009-12-11 | 칼 짜이스 에스엠티 아게 | 격자 엘리먼트를 구비한 조명 시스템 |
| JP4387198B2 (ja) * | 2002-02-09 | 2009-12-16 | カール・ツァイス・エスエムティー・アーゲー | 多数の鏡面を有する面鏡 |
| EP1540423B1 (en) * | 2002-08-26 | 2007-03-28 | Carl Zeiss SMT AG | Grating based spectral filter for eliminating out of band radiation in an extreme ultra-violet lithography system |
| EP1496521A1 (en) * | 2003-07-09 | 2005-01-12 | ASML Netherlands B.V. | Mirror and lithographic apparatus with mirror |
| JP4508708B2 (ja) | 2004-04-12 | 2010-07-21 | キヤノン株式会社 | Ｅｕｖ光を用いた露光装置および露光方法 |
| JP2008544531A (ja) * | 2005-06-21 | 2008-12-04 | カール ツァイス エスエムテー アーゲー | 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系 |
| US7719661B2 (en) * | 2007-11-27 | 2010-05-18 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and method for producing device |
| JP5061069B2 (ja) * | 2008-05-20 | 2012-10-31 | ギガフォトン株式会社 | 極端紫外光を用いる半導体露光装置 |
| US8227778B2 (en) * | 2008-05-20 | 2012-07-24 | Komatsu Ltd. | Semiconductor exposure device using extreme ultra violet radiation |
| WO2009144117A1 (en) * | 2008-05-30 | 2009-12-03 | Asml Netherlands B.V. | Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter |
| JP2010114344A (ja) * | 2008-11-10 | 2010-05-20 | Nikon Corp | 露光装置、およびデバイス製造方法 |
| JP5637702B2 (ja) * | 2010-03-09 | 2014-12-10 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| DE102012209882A1 (de) * | 2012-06-13 | 2013-06-13 | Carl Zeiss Smt Gmbh | Spiegel für EUV-Projektionsbelichtungsanlage mit Streufunktion |
-
2012
- 2012-05-23 DE DE102012010093A patent/DE102012010093A1/de not_active Ceased
-
2013
- 2013-05-07 JP JP2015513078A patent/JP6504506B2/ja active Active
- 2013-05-07 CN CN201380026836.2A patent/CN104335096B/zh active Active
- 2013-05-07 WO PCT/EP2013/059427 patent/WO2013174644A1/en not_active Ceased
- 2013-05-17 TW TW102117653A patent/TWI639850B/zh active
-
2014
- 2014-10-31 US US14/529,844 patent/US10599041B2/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6859515B2 (en) | 1998-05-05 | 2005-02-22 | Carl-Zeiss-Stiftung Trading | Illumination system, particularly for EUV lithography |
| US7006595B2 (en) | 1998-05-05 | 2006-02-28 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Illumination system particularly for microlithography |
| EP1225481A2 (de) | 2001-01-23 | 2002-07-24 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Kollektor für Beleuchtungssysteme mit einer Wellenlänge 193 nm |
| EP1796147A1 (en) | 2004-09-22 | 2007-06-13 | Nikon Corporation | Lighting apparatus, exposure apparatus and maicrodevice manufacturing method |
| EP1811547A1 (en) | 2005-02-03 | 2007-07-25 | Nikon Corporation | Optical integrator, illumination optical device, exposure device, and exposure method |
| DE102006036064A1 (de) | 2006-08-02 | 2008-02-07 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Wellenlängen ≦ 193 nm |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| WO2009100856A1 (en) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
| US20110001947A1 (en) * | 2008-02-15 | 2011-01-06 | Carl Zeiss Smt Ag | Facet mirror for use in a projection exposure apparatus for microlithography |
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Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102015209453A1 (de) * | 2015-05-22 | 2016-11-24 | Carl Zeiss Smt Gmbh | Pupillenfacettenspiegel |
| WO2016188810A1 (en) * | 2015-05-22 | 2016-12-01 | Carl Zeiss Smt Gmbh | Pupil facet mirror |
| DE102017217867A1 (de) * | 2017-10-09 | 2018-07-26 | Carl Zeiss Smt Gmbh | EUV-Facettenspiegel für eine EUV-Projektionsbelichtungsanlage |
| DE102018216870A1 (de) * | 2018-10-01 | 2020-04-02 | Carl Zeiss Smt Gmbh | Verfahren zum Herstellen eines Beleuchtungssystems für eine EUV-Anlage |
| WO2020069870A1 (en) | 2018-10-01 | 2020-04-09 | Carl Zeiss Smt Gmbh | Method for producing an illumination system for an euv apparatus |
| TWI815984B (zh) * | 2018-10-01 | 2023-09-21 | 德商卡爾蔡司Ｓｍｔ有限公司 | 製造用於ｅｕｖ裝置的照明系統的方法 |
| WO2020109225A2 (en) | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror |
| DE102018220629A1 (de) | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
| US12111578B2 (en) | 2018-11-29 | 2024-10-08 | Carl Zeiss Smt Gmbh | Mirror for an illumination optical unit of a projection exposure apparatus comprising a spectral filter in the form of a grating structure and method for producing a spectral filter in the form of a grating structure on a mirror |
| WO2022008102A1 (de) | 2020-07-10 | 2022-01-13 | Carl Zeiss Smt Gmbh | Optisches beleuchtungssystem zur führung von euv-strahlung |
| DE102020208665A1 (de) | 2020-07-10 | 2022-01-13 | Carl Zeiss Smt Gmbh | Optisches Beleuchtungssystem zur Führung von EUV-Strahlung |
| DE102020213837A1 (de) | 2020-11-04 | 2021-08-19 | Carl Zeiss Smt Gmbh | Facettenspiegel-Vorrichtung |
| DE102022207052A1 (de) | 2022-07-11 | 2024-01-11 | Carl Zeiss Smt Gmbh | Spiegel für eine Projektionsbelichtungsanlage |
| WO2024012978A1 (en) | 2022-07-11 | 2024-01-18 | Carl Zeiss Smt Gmbh | Mirror for a projection exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104335096A (zh) | 2015-02-04 |
| US10599041B2 (en) | 2020-03-24 |
| JP2015519009A (ja) | 2015-07-06 |
| CN104335096B (zh) | 2018-08-28 |
| WO2013174644A1 (en) | 2013-11-28 |
| TWI639850B (zh) | 2018-11-01 |
| TW201415076A (zh) | 2014-04-16 |
| JP6504506B2 (ja) | 2019-04-24 |
| US20150049321A1 (en) | 2015-02-19 |
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