CN104297977B - Display substrate, manufacturing method of display substrate and liquid crystal display panel - Google Patents
Display substrate, manufacturing method of display substrate and liquid crystal display panel Download PDFInfo
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- CN104297977B CN104297977B CN201410592771.4A CN201410592771A CN104297977B CN 104297977 B CN104297977 B CN 104297977B CN 201410592771 A CN201410592771 A CN 201410592771A CN 104297977 B CN104297977 B CN 104297977B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133337—Layers preventing ion diffusion, e.g. by ion absorption
Abstract
The invention relates to the technical field of liquid crystal displaying and discloses a display substrate, a manufacturing method of the display substrate and a liquid crystal display panel. An ion barrier structure is arranged in a non-display area of the display substrate and used for preventing charged ions in the non-display area from being diffused to a display area, accordingly the problem that residual images are produced on the periphery of the display area can be effectively solved, and the display quality of a liquid crystal display device is improved.
Description
Technical field
The present invention relates to technical field of liquid crystal display, more particularly to a kind of display base plate and preparation method thereof, liquid crystal surface
Plate.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, referred to as
TFT-LCD) with small volume, low in energy consumption, radiationless, manufacturing cost is relatively low the features such as, in current flat faced display city
Field occupies leading position.Liquid crystal panel is the vitals of liquid crystal display, and which includes array base palte and color membrane substrates, and leads to
Crossing is carried out to box color membrane substrates and array base palte to form liquid crystal panel to box technique.Wherein, box technique is included：Pass through
Dispenser method on a substrate of the ODF techniques in array base palte or color membrane substrates, coats sealed plastic box on another substrate,
Array base palte and color membrane substrates are carried out to box, and cured is carried out to sealed plastic box so that sealed plastic box solidification, forms liquid crystal surface
Plate.Liquid crystal panel includes viewing area and the non-display area positioned at non-display area, is formed with the grid line of transverse and longitudinal intersection in viewing area
And data wire, multiple pixel cells are limited, each pixel cell includes thin film transistor (TFT) (Thin Film Transistor, letter
Claim TFT), pixel electrode and public electrode, the drain electrode of TFT and pixel electrode be electrically connected with, and source electrode and data wire electrically connect
Connect, gate electrode and grid line are electrically connected with.TFT is opened by grid line, the pixel voltage transmitted on data wire by TFT export to
Pixel electrode, forms the electric field for driving liquid crystal molecule to deflect, so as to realize specific ash between pixel electrode and public electrode
The display of rank.
At present, a subject matter of small size liquid crystal panel is image retention, keeps a picture to show for a long time in panel
In the case of, because the impact of long-time electric field, when other pictures are switched to, picture has residual.Cause the main of image retention
Reason be panel processing technology in and panel in material in, a part of subband electron ion can be introduced and enter viewing area,
When long-time shows a picture, charged ion can be attached in the presence of electric field on the electrode of panel, form internal electric field,
When image switching, the presence of internal electric field causes liquid crystal panel to remain in that original picture, forms image retention.
The image retention of liquid crystal panel occurs mainly in the periphery of viewing area, one reason for this is that：One master of charged ion
Originate the pollution that to be sealed plastic box produced with liquid crystal, and pollute the charged ion for producing and be distributed in around sealed plastic box first, in face
In plate work, charged ion diffuses into the viewing area of panel, and is distributed over the periphery of viewing area at first；Another reason
It is：The fringing field of panel electrode is stronger so that charged ion is gathered in the periphery of viewing area, so as to the periphery in viewing area is produced
Raw image retention.
The content of the invention
The present invention provides a kind of display base plate and preparation method thereof, liquid crystal panel, ionizes to the band for solving non-display area
Son diffuses to viewing area, causes the periphery of viewing area to produce the problem of image retention.
To solve above-mentioned technical problem, the present invention provides a kind of display base plate, for liquid crystal panel, including viewing area and position
In the non-display area of non-display area, wherein, the display base plate includes：
Positioned at the ion barrier structure of non-display area, for stopping that the charged ion of non-display area diffuses to viewing area.
The present invention also provides a kind of liquid crystal panel, including display base plate as above.
The present invention also provides a kind of manufacture method of display base plate, and the display base plate is used for liquid crystal panel, including display
Area and the non-display area positioned at non-display area, the manufacture method include：
Ion barrier structure is formed in non-display area, for stopping that the charged ion of non-display area diffuses to viewing area.
The above-mentioned technical proposal of the present invention has the beneficial effect that：
In above-mentioned technical proposal, ion barrier structure is arranged by the non-display area in display base plate, it is non-aobvious for stopping
Show that the charged ion in area diffuses to viewing area, the problem of image retention is produced such that it is able to effectively solving viewing area periphery, improve liquid
The display quality of LCD.
Description of the drawings
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
Accompanying drawing to be used needed for having technology description is briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 represents the structural representation of liquid crystal panel in the embodiment of the present invention；
Fig. 2 represents the structural representation of array base palte in the embodiment of the present invention.
Specific embodiment
During the present invention is directed to the processing technology of liquid crystal display device, (especially the sealed plastic box of liquid crystal panel is coated and liquid
It is brilliant to instil) charged ion that introduces diffuses to viewing area, causes the periphery of viewing area to produce the problem of image retention, there is provided a kind of to show
Substrate and preparation method thereof, by forming ion barrier structure in non-display area, for stopping that the charged ion of non-display area expands
Viewing area is dissipated to, and the problem of image retention is produced such that it is able to effectively solving viewing area periphery, is improve the display of liquid crystal display device
Quality.
Wherein, the ion barrier structure is may be located on the array base palte of liquid crystal panel, it is also possible to positioned at liquid crystal panel
Color membrane substrates on, and be formed in array base palte or color membrane substrates near the side of liquid crystal.It is of course also possible in array base palte and
The ion barrier structure is made simultaneously on color membrane substrates.
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following reality
Example is applied for illustrating the present invention, but is not limited to the scope of the present invention.
Embodiment one
A kind of display base plate is provided in the embodiment of the present invention, for liquid crystal panel.The display base plate is specially liquid crystal surface
The array base palte or color membrane substrates of plate, including viewing area and the non-display area positioned at non-display area, in the display base plate
Non-display area is provided with ion barrier structure, for stopping that the charged ion of non-display area diffuses to viewing area.
Display base plate with the ion barrier structure can be obviously improved the problem that the periphery of viewing area produces image retention,
Improve the display quality of liquid crystal display device.
In the processing technology of liquid crystal panel, charged ion is mainly drawn by sealed plastic box coating and two techniques of liquid crystal drip-injection
Enter, based on this, further, the ion barrier structure can be arranged between the seal area of non-display area and viewing area, had
Effect stops that the charged ion that sealed plastic box coating and liquid crystal drip-injection are introduced diffuses to viewing area.
In a specific embodiment, the ion barrier structure includes multiple electrodes group, and each electrode group includes
First electrode and second electrode, by the applied voltage in the first electrode and second electrode, form electric field powered to adsorb
Ion, so as to the charged ion for stopping non-display area diffuses to viewing area.The ion barrier structure is inhaled by Electric Field Mode
Electron ion is attached, specific operation principle is：When positive electricity is applied on the first electrode, apply negative electricity on the second electrode, band is just
Electron ion is adsorbed on the second electrode, and electronegative ion is adsorbed on the first electrode.
Certainly, the ion barrier structure can also adsorb charged ion by other means, for example：The ion resistance
Gear structure is colloidal materials, and here do not limit.
When the display base plate is thin-film transistor array base-plate, the display base plate also includes the grid line that transverse and longitudinal is intersected
And data wire, for limiting multiple pixel cells, the pixel cell is located at the viewing area of the display base plate, each pixel list
Unit includes thin film transistor (TFT) and pixel electrode, gate electrode and grid line electric connection, source electrode and the data of the thin film transistor (TFT)
Line is electrically connected with, and drain electrode is electrically connected with pixel electrode.The non-display area of the display base plate be formed with gate signal line and
Data signal line, the gate signal line are electrically connected with grid line, for opening corresponding thin film transistor (TFT), the data signal line
With electrode data line is electrically connected with, pixel voltage is transmitted to pixel electrode by thin film transistor (TFT).Wherein, the gate signal line is usual
For the extended line of grid line, the data line signal line is usually the extended line of data wire, to simplify processing technology.
As data signal line is located at non-display area, what is transmitted thereon is pixel voltage, voltage stabilization.Further, may be used
To arrange in each electrode group of the ion barrier structure, first electrode and second electrode be respectively two adjacent numbers it is believed that
Number line, and accommodating structure is formed on the surface of the data signal line region, for housing the charged ion for stopping.So as to
The data signal line of first electrode and second electrode multiplexed arrays substrate, it is not necessary to first electrode and second electrode is fabricated separately.
The accommodating structure is specifically as follows the groove positioned at data signal line region surface, or position
In the barricade on data signal line region surface.
In the embodiment of the present invention, it is also possible to make described on array base palte and/or color membrane substrates by single technique
The first electrode and second electrode of ion barrier structure.In order to the charged ion for effectively stopping non-display area diffuses to viewing area,
Preferably, the driving electric field intensity that the electric field intensity formed between the first electrode and second electrode is more than viewing area is set,
The adsorption of the ion barrier structure is improved, reduces diffusing to viewing area charged ion as far as possible.Wherein, the driving of viewing area
Electric field is formed by the public electrode and pixel electrode positioned at viewing area, drives liquid crystal molecule to deflect for forming driving electric field.
With reference to shown in Fig. 1 and Fig. 2, when the display base plate in the embodiment of the present invention is array base palte, the display base plate
Specifically include：
First substrate 1；
Form the gate electrode of grid line 10, gate signal line (not shown) and thin film transistor (TFT) 3 on first substrate 1
(not shown)；
The gate insulation layer 101 being formed on the gate electrode of grid line 10, gate signal line and thin film transistor (TFT) 3；
The active layer pattern (not shown) of the thin film transistor (TFT) 3 being formed on gate insulation layer 101；
The source electrode and drain electrode of the thin film transistor (TFT) 3 being formed on active layer, and data wire 20, data signal line
30；
The passivation layer being formed in the source electrode and drain electrode of thin film transistor (TFT) 3, and data wire 20, data signal line 30
102, passivation layer 102 includes passivation layer via hole (not shown) and groove 7.Wherein, the passivation layer via hole correspondence thin film
The region that the drain electrode of transistor 3 is located, groove 7 are located at the surface of 30 region of data signal line.Adjacent data signal
Line 30 is multiplexed with the first electrode in each electrode group of embodiment of the present invention intermediate ion barrier structure and second electrode, groove 7
For housing the charged ion that first electrode and second electrode stop.Groove 7 is further located at viewing area 100 and non-display area
Between 200 seal area 201；
The pixel electrode (not shown) being formed on passivation layer 102, it is brilliant with thin film by the via in passivation layer 102
The drain electrode of body pipe 3 is electrically connected with.
So far complete the making of array base palte.
For driving electric field is the liquid crystal panel of transverse electric field, public electrode, Yi Jiwei are also formed with array base palte
Interlayer insulating film between pixel electrode and public electrode.
Further, after the making for completing color membrane substrates, dispenser method 5 on array base palte, in the close of color membrane substrates
Envelope area coating sealed plastic box, to box array base palte and color membrane substrates, forms liquid crystal panel, and the box of liquid crystal panel is thick by chock insulator matter 6
Support, as shown in Figure 1.
Wherein, color membrane substrates include second substrate 2, are formed with black matrix 8 on second substrate 2, for limiting multiple pictures
Plain region, is formed with color blocking layer 9 in pixel region, and flatness layer 103 is coated with color blocking layer 9.Color blocking layer 9 can specifically be wrapped
Red color resistance layer, green color blocking layer and blue color blocking layer are included, here is not limited.
Embodiment two
Based on same inventive concept, a kind of manufacture method of display base plate, the display base in the embodiment of the present invention, are provided
Plate is used for liquid crystal panel, including viewing area and the non-display area positioned at non-display area.
The manufacture method includes：
Ion barrier structure is formed in non-display area, for stopping that the charged ion of non-display area diffuses to viewing area.
By making the ion barrier structure in display base plate, the periphery that can be obviously improved viewing area produces image retention
Problem, improves the display quality of liquid crystal display device.
Preferably, the ion barrier structure is located between the seal area and viewing area of display base plate, effectively can be stopped
The charged ion that sealed plastic box is coated and liquid crystal drip-injection is introduced diffuses to viewing area.Wherein, seal area is located at the non-aobvious of display base plate
Show area.
In a specific embodiment, formed ion barrier structure the step of include：
Form multiple electrodes group, each electrode group includes first electrode and second electrode, by the first electrode and
Second electrode applied voltage, forms electric field to adsorb charged ion, so as to the charged ion for stopping non-display area diffuses to display
Area.
, by Electric Field Mode adsorbing charged ion, specific work is former for the ion barrier structure formed by above-mentioned steps
Manage and be：When positive electricity is applied on the first electrode, apply negative electricity on the second electrode, positive charged ions are attracted to second electrode
On, electronegative ion is adsorbed on the first electrode.
Certainly, the ion barrier structure can also adsorb charged ion by other means, for example：The ion resistance
Gear structure is colloidal materials, and here do not limit.
When display base plate is thin-film transistor array base-plate, the manufacture method also includes：
Grid line and the data wire that transverse and longitudinal is intersected is formed in viewing area, for limiting multiple pixel cells；
Data signal line, the data signal line and electrode data line is electrically connected with are formed in non-display area, for data wire
Transmission pixel voltage；
Accommodating structure is formed on the surface of the data signal line region, for housing the charged ion for stopping, institute
The first electrode and second electrode for stating each electrode group is respectively two adjacent data signal lines.
Wherein, the data signal line and electrode data line is electrically connected with, are transmitted pixel voltage to picture by thin film transistor (TFT)
Plain electrode.In actual fabrication technique, the data line signal line is usually the extended line of data wire, to simplify processing technology.
The first electrode and the data of second electrode multiplexed arrays substrate of the ion barrier structure formed by above-mentioned steps
Holding wire, it is not necessary to first electrode and second electrode is fabricated separately.
The accommodating structure is specifically as follows the groove for being formed in data signal line region surface.
In the embodiment of the present invention, it is also possible to make described on array base palte and/or color membrane substrates by single technique
First electrode and second electrode.In order to the charged ion for effectively stopping non-display area diffuses to viewing area, it is preferable that arrange described
Driving electric field intensity of the electric field intensity formed between first electrode and second electrode more than viewing area, improves the ion barrier
The adsorption of structure, reduces as far as possible and diffuses to viewing area charged ion.Wherein, the driving electric field of viewing area is by positioned at viewing area
Public electrode and pixel electrode formed, drive liquid crystal molecule to deflect for forming driving electric field.
With reference to shown in Fig. 1 and Fig. 2, when the display base plate in the embodiment of the present invention is array base palte, the system of display base plate
Specifically include as method：
Step S1, offer first substrate 1, form grid metal film on first substrate 1, the grid metal film are carried out
Patterning processes form the gate electrode (not shown) of grid line 10, gate signal line (not shown) and thin film transistor (TFT) 3；
Wherein, first substrate 1 is transparency carrier, for example：Quartz base plate, glass substrate, organic resin substrate.
Specifically, can adopt sputtering or thermal evaporation method deposit a layer thickness on first substrate 1 forGrid metal film, barrier metal layer can be Cu, the gold such as Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, Ta, W
The alloy of category and these metals, barrier metal layer can be single layer structure or multiple structure, multiple structure such as Cu Mo, Ti
Cu Ti, Mo Al Mo etc..
One layer of photoresist is coated in grid metal film, photoresist is exposed using mask plate, developed, make photoresist
Photoresist not reservation region and photoresist reservation region are formed, wherein, photoresist reservation region corresponds to grid line 10, gate signal line
With the region of the gate electrode of thin film transistor (TFT) 3, reservation region does not correspond to other regions to photoresist；It is complete by etching technics
Full etching falls the grid metal film of photoresist not reservation region, peels off remaining photoresist, forms grid line 10, gate signal line and thin
The gate electrode of film transistor 3.
Grid line 10 is electrically connected with the gate electrode of thin film transistor (TFT), positioned at the viewing area 100 of array base palte.Gate signal line position
In the non-display area 200 of array base palte, for 10 transmitting switch signal of grid line, to open or close corresponding film crystal
Pipe.
Gate signal line specifically can be with the extended line of grid line 10.
Step S2, on the first substrate 1 for complete step S1 formed gate insulation layer 101；
101 material of gate insulation layer can select oxide, nitride or nitrogen oxides, can be monolayer, bilayer or many
Rotating fields.Specifically, gate insulation layer 101 can be SiNx, SiOx or Si (ON) x.
Step S3, on the first substrate 1 for complete step S2 formed thin film transistor (TFT) 3 active layer pattern；
Wherein, the material of active layer can be silicon semiconductor, or metal-oxide semiconductor (MOS).
Step S4, form drain metallic film on the first substrate 1 for completing step S3, the drain metallic film is entered
Row patterning processes, form the source electrode and drain electrode of thin film transistor (TFT) 3, and data wire 20, data signal line 30；
Specifically, magnetron sputtering, thermal evaporation or other film build methods can be adopted on the first substrate 1 for complete step S3
Deposition a layer thickness is aboutDrain metallic film, drain metallic film can be Cu, Al, Ag, Mo, Cr,
The alloy of the metals such as Nd, Ni, Mn, Ti, Ta, W and these metals.Source and drain metal level can be single layer structure or multilamellar knot
Structure, multiple structure such as Cu Mo, Ti Cu Ti, Mo Al Mo etc..
Wherein, the source electrode of thin film transistor (TFT) 3 is electrically connected with data wire 20, positioned at the viewing area 100 of array base palte.Number
Non-display area 200 is located at according to holding wire 30, for pixel voltage being transmitted to data wire 20.
Data signal line 30 is specifically as follows the extended line of data wire 20.
Step S5, on the first substrate 1 for complete step S4 formed passivation layer 102, technique is patterned to passivation layer 102
Passivation layer via hole (not shown) and groove 7 are formed, wherein, the drain electrode of the passivation layer via hole correspondence thin film transistor (TFT) 3
The region at place, groove 7 are located at the surface of 30 region of data signal line；
102 material of passivation layer can select oxide, nitride or nitrogen oxides, can be monolayer, double-deck or multilamellar
Structure.Specifically, passivation layer 102 can be SiNx, SiOx or Si (ON) x.
Adjacent data signal line 30 is multiplexed with each electrode group of embodiment of the present invention intermediate ion barrier structure
One electrode and second electrode, groove 7 are used to house the charged ion that first electrode and second electrode stop.
Groove 7 is particularly located between viewing area 100 and the seal area 201 of non-display area 200.
Step S6, form transparent conductive film on the first substrate 1 for completing step S5, the transparent conductive film is entered
Row patterning processes, form pixel electrode 4.Wherein, electric leakage of the pixel electrode 4 by the passivation layer via hole and thin film transistor (TFT) 3
It is extremely in electrical contact.
Specifically, deposited using magnetron sputtering, thermal evaporation or other film build methods on the first substrate 1 for complete step S5
Thickness isTransparent conductive film, transparent conductive film can be ITO or IZO.
So far complete the making of array base palte.
For driving electric field is the liquid crystal panel of transverse electric field, transparent common electrode is also formed with array base palte, is had
The processing technology of body is same as the prior art, will not be described in detail herein.
It should be noted that above-mentioned processing technology process is the system of for example array base palte in the bright embodiment of the present invention
Make method, be not a kind of restriction, for example：Halftoning or gray tone mask exposure can be adopted so that above-mentioned step S3 and
S4 is completed by a patterning processes.Groove 7 in step S5 can also be re-formed after forming pixel electrode in step s 6.
Further, after the making for completing color membrane substrates, dispenser method 5 on array base palte, in the close of color membrane substrates
Envelope area coating sealed plastic box, to box array base palte and color membrane substrates, forms liquid crystal panel, and the box of liquid crystal panel is thick by chock insulator matter 6
Support, as shown in Figure 1.
Wherein, the manufacturing process of color membrane substrates is specifically as follows：
Second substrate 2 is provided；
Black matrix 8 is formed with second substrate 2, for limiting multiple pixel regions；
Color blocking layer 9 is formed with the pixel region, can specifically include red color resistance layer, green color blocking layer and blueness
Color blocking layer；
Flatness layer 103 is formed in color blocking layer 9.
Embodiment three
A kind of liquid crystal panel is provided in the embodiment of the present invention also, which includes the display base plate in embodiment one.
By using the liquid crystal panel, the problem of image retention being produced with effectively solving viewing area periphery, liquid crystal is improved
Show the display quality of device.
Technical scheme, arranges ion barrier structure by the non-display area in display base plate, non-for stopping
The charged ion of viewing area diffuses to viewing area, produces the problem of image retention such that it is able to effectively solving viewing area periphery, improves
The display quality of liquid crystal display device.
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, on the premise of without departing from the technology of the present invention principle, some improvement and replacement can also be made, these improve and replace
Also should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of display base plate, for liquid crystal panel, including viewing area and the non-display area positioned at non-display area, its feature exists
In the display base plate includes：
Positioned at the ion barrier structure of non-display area, for stopping that the charged ion of non-display area diffuses to viewing area；
The ion barrier structure includes multiple electrodes group, and each electrode group includes first electrode and second electrode, by institute
Applied voltage in first electrode and second electrode is stated, forms electric field to adsorb charged ion, so as to stop the powered of non-display area
Ion diffuses to viewing area；
The first electrode of each electrode group and the surface of second electrode region are formed with accommodating structure, for accommodating resistance
The charged ion of gear.
2. display base plate according to claim 1, it is characterised in that the non-display area includes seal area, the ion
Barrier structure is located between the seal area and viewing area.
3. display base plate according to claim 1, it is characterised in that the display base plate is thin film transistor (TFT) array base
Plate, the display base plate also include：
Grid line and data wire that transverse and longitudinal is intersected, for limiting multiple pixel cells, the pixel cell is located at viewing area；
The non-display area of the display base plate includes data signal line, the data signal line and electrode data line is electrically connected with, is used for
To data line transfer pixel voltage；
The first electrode and second electrode of each electrode group is respectively two adjacent data signal lines.
4. display base plate according to claim 3, it is characterised in that the accommodating structure is positioned at the data signal line
The groove on region surface.
5. display base plate according to claim 1, it is characterised in that the viewing area of the display base plate includes public electrode
And pixel electrode, drive liquid crystal molecule to deflect for forming driving electric field；
Driving electric field intensity of the electric field intensity formed between the first electrode and second electrode more than viewing area.
6. display base plate according to claim 1, it is characterised in that the display base plate is color membrane substrates.
7. the display base plate described in any one of a kind of liquid crystal panel, including claim 1-6.
8. a kind of manufacture method of display base plate, the display base plate are used for liquid crystal panel, including viewing area and are located at viewing area
The non-display area of periphery, it is characterised in that the manufacture method includes：
Ion barrier structure is formed in non-display area, for stopping that the charged ion of non-display area diffuses to viewing area；
The step of forming ion barrier structure includes：
Multiple electrodes group is formed, each electrode group includes first electrode and second electrode, by the first electrode and second
Electrode applied voltage, forms electric field to adsorb charged ion, so as to the charged ion for stopping non-display area diffuses to viewing area；
Accommodating structure is formed on the surface of the first electrode and second electrode region, for housing the band for stopping ionization
Son.
9. manufacture method according to claim 8, it is characterised in that the non-display area includes seal area, the ion
Barrier structure is located between the seal area and viewing area.
10. manufacture method according to claim 8, it is characterised in that the display base plate is thin film transistor (TFT) array base
Plate, the manufacture method also include：
Grid line and the data wire that transverse and longitudinal is intersected is formed in viewing area, for limiting multiple pixel cells；
Data signal line, the data signal line and electrode data line is electrically connected with are formed in non-display area, for data line transfer
Pixel voltage；
The first electrode and second electrode of each electrode group is respectively two adjacent data signal lines.
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| CN201410592771.4A CN104297977B (en) | 2014-10-29 | 2014-10-29 | Display substrate, manufacturing method of display substrate and liquid crystal display panel |
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| CN105487312B (en) * | 2015-12-31 | 2018-09-11 | 京东方科技集团股份有限公司 | A kind of array substrate, display device and its driving method |
| CN106646968B (en) * | 2016-11-15 | 2020-05-08 | 上海中航光电子有限公司 | Display substrate, manufacturing method, liquid crystal display panel and liquid crystal display device |
| CN106483729B (en) * | 2017-01-04 | 2019-06-07 | 京东方科技集团股份有限公司 | Display base plate and display equipment |
| CN106681044B (en) * | 2017-03-27 | 2020-02-18 | 厦门天马微电子有限公司 | Touch display panel and touch display device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1849549A (en) * | 2003-08-28 | 2006-10-18 | 皇家飞利浦电子股份有限公司 | Lateral ion pumping in liquid crystal displays |
| CN101697044A (en) * | 2009-06-24 | 2010-04-21 | 深超光电（深圳）有限公司 | Liquid crystal display device and manufacturing method thereof |
| CN102023447A (en) * | 2008-04-08 | 2011-04-20 | 友达光电股份有限公司 | Electrode substrate and liquid crystal display panel |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1797139A (en) * | 2004-12-30 | 2006-07-05 | 鸿富锦精密工业（深圳）有限公司 | Switch inside plane type LCD device |
-
2014
- 2014-10-29 CN CN201410592771.4A patent/CN104297977B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1849549A (en) * | 2003-08-28 | 2006-10-18 | 皇家飞利浦电子股份有限公司 | Lateral ion pumping in liquid crystal displays |
| CN102023447A (en) * | 2008-04-08 | 2011-04-20 | 友达光电股份有限公司 | Electrode substrate and liquid crystal display panel |
| CN101697044A (en) * | 2009-06-24 | 2010-04-21 | 深超光电（深圳）有限公司 | Liquid crystal display device and manufacturing method thereof |
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