CN104297977A - Display substrate, manufacturing method of display substrate and liquid crystal display panel - Google Patents
Display substrate, manufacturing method of display substrate and liquid crystal display panel Download PDFInfo
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- CN104297977A CN104297977A CN201410592771.4A CN201410592771A CN104297977A CN 104297977 A CN104297977 A CN 104297977A CN 201410592771 A CN201410592771 A CN 201410592771A CN 104297977 A CN104297977 A CN 104297977A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133337—Layers preventing ion diffusion, e.g. by ion absorption
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- Optics & Photonics (AREA)
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Abstract
The invention relates to the technical field of liquid crystal displaying and discloses a display substrate, a manufacturing method of the display substrate and a liquid crystal display panel. An ion barrier structure is arranged in a non-display area of the display substrate and used for preventing charged ions in the non-display area from being diffused to a display area, accordingly the problem that residual images are produced on the periphery of the display area can be effectively solved, and the display quality of a liquid crystal display device is improved.
Description
Technical field
The present invention relates to technical field of liquid crystal display, particularly relate to a kind of display base plate and preparation method thereof, liquid crystal panel.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, be called for short TFT-LCD) there is the features such as volume is little, low in energy consumption, radiationless, manufacturing cost is relatively low, occupy leading position in current flat panel display market.Liquid crystal panel is the vitals of liquid crystal display, and it comprises array base palte and color membrane substrates, and by color membrane substrates and array base palte being carried out box to form liquid crystal panel to box technique.Wherein, box technique is comprised: by dispenser method on the substrate of ODF technique in array base palte or color membrane substrates, another substrate applies sealed plastic box, array base palte and color membrane substrates are carried out box, and process is cured to make sealed plastic box solidify to sealed plastic box, form liquid crystal panel.Liquid crystal panel comprises viewing area and is positioned at the non-display area of periphery, viewing area, grid line and the data line of transverse and longitudinal intersection is formed in viewing area, limit multiple pixel cell, each pixel cell comprises thin film transistor (TFT) (Thin Film Transistor, be called for short TFT), pixel electrode and public electrode, the drain electrode of TFT and pixel electrode are electrically connected, and source electrode and data line are electrically connected, and gate electrode and grid line are electrically connected.Open TFT by grid line, the pixel voltage that data line transmits exports pixel electrode to by TFT, forms the electric field for driving liquid crystal deflecting element, thus realize the display of specific grey-scale between pixel electrode and public electrode.
At present, a subject matter of small size liquid crystal panel is image retention, and when panel keeps a picture display for a long time, because the impact of long-time electric field, when being switched to other pictures, picture has residual.The main cause of image retention is caused to be in the material in the manufacture craft of panel and in panel, a part of subband electron ion can be introduced and enter viewing area, when a long-time display picture, charged ion can be attached on the electrode of panel under the effect of electric field, form internal electric field, when image switching, the picture that the existence of internal electric field makes liquid crystal panel still keep original, forms image retention.
The image retention of liquid crystal panel mainly occurs in the periphery of viewing area, one of them reason is: a main source of charged ion is the pollution that sealed plastic box and liquid crystal produce, and first the charged ion polluting generation is distributed in around sealed plastic box, in panel work, charged ion diffuses into the viewing area of panel, and is just distributed in the periphery of viewing area at first; Another reason is: the fringing field of panel electrode is comparatively strong, makes charged ion be gathered in the periphery of viewing area, thus the periphery in viewing area produces image retention.
Summary of the invention
The invention provides a kind of display base plate and preparation method thereof, liquid crystal panel, diffuse to viewing area in order to the charged ion solving non-display area, cause the periphery of viewing area to produce the problem of image retention.
For solving the problems of the technologies described above, the invention provides a kind of display base plate, for liquid crystal panel, comprise viewing area and the non-display area being positioned at periphery, viewing area, wherein, described display base plate comprises:
Be positioned at the ion barrier structure of non-display area, for stopping that the charged ion of non-display area diffuses to viewing area.
The present invention also provides a kind of liquid crystal panel, comprises display base plate as above.
The present invention also provides a kind of method for making of display base plate, and described display base plate is used for liquid crystal panel, and comprise viewing area and the non-display area being positioned at periphery, viewing area, described method for making comprises:
Ion barrier structure is formed, for stopping that the charged ion of non-display area diffuses to viewing area at non-display area.
The beneficial effect of technique scheme of the present invention is as follows:
In technique scheme, by arranging ion barrier structure at the non-display area of display base plate, for stopping that the charged ion of non-display area diffuses to viewing area, thus effectively can solve the problem that viewing area periphery produces image retention, improve the display quality of liquid crystal display device.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 represents the structural representation of liquid crystal panel in the embodiment of the present invention;
Fig. 2 represents the structural representation of array base palte in the embodiment of the present invention.
Embodiment
The present invention is directed to the charged ion that in the manufacture craft process of liquid crystal display device, (especially the sealed plastic box of liquid crystal panel applies and liquid crystal drip-injection) introduces and diffuse to viewing area, the periphery of viewing area is caused to produce the problem of image retention, a kind of display base plate and preparation method thereof is provided, by forming ion barrier structure at non-display area, for stopping that the charged ion of non-display area diffuses to viewing area, thus effectively can solve the problem that viewing area periphery produces image retention, improve the display quality of liquid crystal display device.
Wherein, described ion barrier structure can be positioned on the array base palte of liquid crystal panel, also can be positioned on the color membrane substrates of liquid crystal panel, and is formed in array base palte or color membrane substrates near the side of liquid crystal.Certainly, also can make described ion barrier structure on array base palte and color membrane substrates simultaneously.
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
Embodiment one
A kind of display base plate is provided, for liquid crystal panel in the embodiment of the present invention.Described display base plate is specially array base palte or the color membrane substrates of liquid crystal panel, comprise viewing area and the non-display area being positioned at periphery, viewing area, the non-display area of described display base plate is provided with ion barrier structure, for stopping that the charged ion of non-display area diffuses to viewing area.
The display base plate with described ion barrier structure obviously can improve the problem of the periphery generation image retention of viewing area, improves the display quality of liquid crystal display device.
In the manufacture craft of liquid crystal panel, charged ion is introduced mainly through sealed plastic box coating and liquid crystal drip-injection two techniques, based on this, further, described ion barrier structure can be arranged between the seal area of non-display area and viewing area, effectively stops that the charged ion that sealed plastic box coating and liquid crystal drip-injection are introduced diffuses to viewing area.
In a concrete embodiment, described ion barrier structure comprises multiple electrode group, each electrode group comprises the first electrode and the second electrode, by applying voltage on described first electrode and the second electrode, form electric field and adsorb charged ion, thus stop that the charged ion of non-display area diffuses to viewing area.Described ion barrier structure adsorbs charged ion by Electric Field Mode, concrete principle of work is: when applying positive electricity on the first electrode, apply negative electricity on the second electrode, positive charged ions is attracted on the second electrode, and electronegative ion is attracted on the first electrode.
Certainly, described ion barrier structure also can adsorb charged ion by other means, such as: described ion barrier structure is colloidal materials, does not limit at this.
When described display base plate is thin-film transistor array base-plate, described display base plate also comprises grid line and the data line of transverse and longitudinal intersection, for limiting multiple pixel cell, described pixel cell is positioned at the viewing area of described display base plate, each pixel cell comprises thin film transistor (TFT) and pixel electrode, the gate electrode of described thin film transistor (TFT) and grid line are electrically connected, and source electrode and data line are electrically connected, and drain electrode and pixel electrode are electrically connected.Gate signal line and data signal line is formed at the non-display area of described display base plate, described gate signal line and grid line are electrically connected, for opening corresponding thin film transistor (TFT), described data signal line and data line are electrically connected, and by thin film transistor (TFT), pixel voltage are transferred to pixel electrode.Wherein, described gate signal line is generally the extended line of grid line, and described data line signal line is generally the extended line of data line, to simplify manufacture craft.
Because data signal line is positioned at non-display area, on it, transmission is pixel voltage, voltage stabilization.Further, can arrange in each electrode group of described ion barrier structure, first electrode and the second electrode are respectively two adjacent data signal lines, and form accommodating structure, for the charged ion of accommodating stop on the surface of described data signal line region.Thus the data signal line of the first electrode and the second electrode multiplexed arrays substrate, do not need to make the first electrode and the second electrode separately.
Described accommodating structure is specifically as follows the groove being positioned at surface, described data signal line region, also can for being positioned at the barricade on surface, described data signal line region.
In the embodiment of the present invention, also can be made the first electrode and second electrode of described ion barrier structure by independent technique on array base palte and/or color membrane substrates.In order to effectively stop that the charged ion of non-display area diffuses to viewing area, preferably, the driving electric field intensity that the electric field intensity formed between described first electrode and the second electrode is greater than viewing area is set, improve the suction-operated of described ion barrier structure, minimizing diffuses to viewing area charged ion as far as possible.Wherein, the driving electric field of viewing area is formed by the public electrode and pixel electrode being positioned at viewing area, drives liquid crystal deflecting element for the formation of driving electric field.
Shown in composition graphs 1 and Fig. 2, when the display base plate in the embodiment of the present invention is array base palte, described display base plate specifically comprises:
First substrate 1;
Form the gate electrode (not shown) of grid line 10, gate signal line (not shown) and thin film transistor (TFT) 3 on first substrate 1;
Be formed in the gate insulation layer 101 on the gate electrode of grid line 10, gate signal line and thin film transistor (TFT) 3;
Be formed in the active layer pattern (not shown) of the thin film transistor (TFT) 3 on gate insulation layer 101;
Be formed in source electrode and the drain electrode of the thin film transistor (TFT) 3 on active layer, and data line 20, data signal line 30;
Be formed in source electrode and the drain electrode of thin film transistor (TFT) 3, and data line 20, passivation layer 102 on data signal line 30, passivation layer 102 comprises passivation layer via hole (not shown) and groove 7.Wherein, the region at the drain electrode place of the corresponding thin film transistor (TFT) 3 of described passivation layer via hole, groove 7 is positioned at the surface of data signal line 30 region.Adjacent data signal line 30 is multiplexed with the first electrode in each electrode group of embodiment of the present invention intermediate ion barrier structure and the second electrode, and groove 7 is for the charged ion of accommodating first electrode and the second electrode obstructs.Groove 7 is further between viewing area 100 and the seal area 201 of non-display area 200;
Be formed in the pixel electrode (not shown) on passivation layer 102, be electrically connected by the drain electrode of the via hole in passivation layer 102 and thin film transistor (TFT) 3.
So far the making of array base palte is completed.
For driving electric field to be the liquid crystal panel of transverse electric field, array base palte is also formed with public electrode, and the interlayer insulating film between pixel electrode and public electrode.
Further, after the making completing color membrane substrates, dispenser method 5 on array base palte, in the seal area coating sealed plastic box of color membrane substrates, to box array base palte and color membrane substrates, form liquid crystal panel, the box of liquid crystal panel is thick to be supported by chock insulator matter 6, as shown in Figure 1.
Wherein, color membrane substrates comprises second substrate 2, is formed with black matrix 8 on second substrate 2, for limiting multiple pixel region, is formed with color blocking layer 9 in pixel region, color blocking layer 9 is coated with flatness layer 103.Color blocking layer 9 specifically can comprise red color resistance layer, green color blocking layer and blue color blocking layer, does not limit at this.
Embodiment two
Based on same inventive concept, provide a kind of method for making of display base plate in the embodiment of the present invention, described display base plate is used for liquid crystal panel, comprises viewing area and the non-display area being positioned at periphery, viewing area.
Described method for making comprises:
Ion barrier structure is formed, for stopping that the charged ion of non-display area diffuses to viewing area at non-display area.
By making described ion barrier structure at display base plate, the periphery that obviously can improve viewing area produces the problem of image retention, improves the display quality of liquid crystal display device.
Preferably, described ion barrier structure, between the seal area and viewing area of display base plate, effectively can stop that the charged ion that sealed plastic box coating and liquid crystal drip-injection are introduced diffuses to viewing area.Wherein, seal area is positioned at the non-display area of display base plate.
In a concrete embodiment, the step forming ion barrier structure comprises:
Form multiple electrode group, each electrode group comprises the first electrode and the second electrode, by described first electrode and the second electrode application voltage, forms electric field and adsorbs charged ion, thus stop that the charged ion of non-display area diffuses to viewing area.
The ion barrier structure formed by above-mentioned steps adsorbs charged ion by Electric Field Mode, concrete principle of work is: when applying positive electricity on the first electrode, apply negative electricity on the second electrode, positive charged ions is attracted on the second electrode, and electronegative ion is attracted on the first electrode.
Certainly, described ion barrier structure also can adsorb charged ion by other means, such as: described ion barrier structure is colloidal materials, does not limit at this.
When display base plate is thin-film transistor array base-plate, described method for making also comprises:
Grid line and the data line of transverse and longitudinal intersection is formed, for limiting multiple pixel cell in viewing area;
Form data signal line at non-display area, described data signal line and data line are electrically connected, for data line transfer pixel voltage;
Form accommodating structure on the surface of described data signal line region, for the charged ion of accommodating stop, the first electrode of described each electrode group and the second electrode are respectively two adjacent data signal lines.
Wherein, described data signal line and data line are electrically connected, and by thin film transistor (TFT), pixel voltage are transferred to pixel electrode.In actual fabrication technique, described data line signal line is generally the extended line of data line, to simplify manufacture craft.
First electrode of the ion barrier structure formed by above-mentioned steps and the data signal line of the second electrode multiplexed arrays substrate, do not need to make the first electrode and the second electrode separately.
Described accommodating structure is specifically as follows the groove being formed in surface, described data signal line region.
In the embodiment of the present invention, also can make described first electrode and the second electrode by independent technique on array base palte and/or color membrane substrates.In order to effectively stop that the charged ion of non-display area diffuses to viewing area, preferably, the driving electric field intensity that the electric field intensity formed between described first electrode and the second electrode is greater than viewing area is set, improve the suction-operated of described ion barrier structure, minimizing diffuses to viewing area charged ion as far as possible.Wherein, the driving electric field of viewing area is formed by the public electrode and pixel electrode being positioned at viewing area, drives liquid crystal deflecting element for the formation of driving electric field.
Shown in composition graphs 1 and Fig. 2, when the display base plate in the embodiment of the present invention is array base palte, the method for making of display base plate specifically comprises:
Step S1, provide first substrate 1, form grid metallic film on first substrate 1, the gate electrode (not shown) that patterning processes forms grid line 10, gate signal line (not shown) and thin film transistor (TFT) 3 is carried out to described grid metallic film;
Wherein, first substrate 1 is transparency carrier, such as: quartz base plate, glass substrate, organic resin substrate.
Particularly, sputtering or the method for thermal evaporation can be adopted to deposit a layer thickness to be on first substrate 1
grid metallic film, grid metal level can be Cu, Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, Ta, the alloy of the metals such as W and these metals, grid metal level can be single layer structure or sandwich construction, and sandwich construction is Cu Mo such as, Ti Cu Ti, Mo Al Mo etc.
Grid metallic film applies one deck photoresist, mask plate is adopted to expose photoresist, development, photoresist is made to form photoresist not reserve area and photoresist reserve area, wherein, photoresist reserve area corresponds to the region of the gate electrode of grid line 10, gate signal line and thin film transistor (TFT) 3, and photoresist not reserve area corresponds to other regions; Etched away the grid metallic film of photoresist not reserve area by etching technics completely, peel off remaining photoresist, form the gate electrode of grid line 10, gate signal line and thin film transistor (TFT) 3.
Grid line 10 is electrically connected with the gate electrode of thin film transistor (TFT), is positioned at the viewing area 100 of array base palte.Gate signal line is positioned at the non-display area 200 of array base palte, for grid line 10 transmitting switch signal, to open or close corresponding thin film transistor (TFT).
Gate signal line specifically can the extended line of grid line 10.
Step S2, on the first substrate 1 of completing steps S1, form gate insulation layer 101;
Gate insulation layer 101 material can select oxide, nitride or oxides of nitrogen, can be individual layer, bilayer or sandwich construction.Particularly, gate insulation layer 101 can be SiNx, SiOx or Si (ON) x.
Step S3, on the first substrate 1 of completing steps S2, form the active layer pattern of thin film transistor (TFT) 3;
Wherein, the material of active layer can be silicon semiconductor, also can be metal-oxide semiconductor (MOS).
Step S4, on the first substrate 1 of completing steps S3, form source and drain metallic film, patterning processes is carried out to described source and drain metallic film, form source electrode and the drain electrode of thin film transistor (TFT) 3, and data line 20, data signal line 30;
Particularly, can on the first substrate 1 of completing steps S3, adopt magnetron sputtering, thermal evaporation or other film build method to deposit a layer thickness to be about
source and drain metallic film, source and drain metallic film can be the alloy of the metals such as Cu, Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, Ta, W and these metals.Source and drain metal level can be single layer structure or sandwich construction, sandwich construction such as Cu Mo, Ti Cu Ti, Mo Al Mo etc.
Wherein, source electrode and the data line 20 of thin film transistor (TFT) 3 are electrically connected, and are positioned at the viewing area 100 of array base palte.Data signal line 30 is positioned at non-display area 200, for transmitting pixel voltage to data line 20.
Data signal line 30 is specifically as follows the extended line of data line 20.
Step S5, on the first substrate 1 of completing steps S4, form passivation layer 102, patterning processes is carried out to passivation layer 102 and forms passivation layer via hole (not shown) and groove 7, wherein, the region at the drain electrode place of the corresponding thin film transistor (TFT) 3 of described passivation layer via hole, groove 7 is positioned at the surface of data signal line 30 region;
Passivation layer 102 material can select oxide, nitride or oxides of nitrogen, can be individual layer, bilayer or sandwich construction.Particularly, passivation layer 102 can be SiNx, SiOx or Si (ON) x.
Adjacent data signal line 30 is multiplexed with the first electrode in each electrode group of embodiment of the present invention intermediate ion barrier structure and the second electrode, and groove 7 is for the charged ion of accommodating first electrode and the second electrode obstructs.
Groove 7 is specifically between viewing area 100 and the seal area 201 of non-display area 200.
Step S6, on the first substrate 1 of completing steps S5, form transparent conductive film, patterning processes is carried out to described transparent conductive film, form pixel electrode 4.Wherein, pixel electrode 4 is in electrical contact by the drain electrode of described passivation layer via hole and thin film transistor (TFT) 3.
Particularly, the first substrate 1 of completing steps S5 adopt magnetron sputtering, thermal evaporation or other film build method deposit thickness to be
transparent conductive film, transparent conductive film can be ITO or IZO.
So far the making of array base palte is completed.
For driving electric field to be the liquid crystal panel of transverse electric field, array base palte is also formed with transparent common electrode, and concrete manufacture craft is same as the prior art, is not described in detail in this.
It should be noted that, the above-mentioned manufacture craft process just for example method for making of array base palte in the bright embodiment of the present invention, be not a kind of restriction, such as: shadow tone or gray tone mask exposure can be adopted, above-mentioned step S3 and S4 completed by a patterning processes.Groove 7 in step S5 is formed after also can forming pixel electrode in step s 6 again.
Further, after the making completing color membrane substrates, dispenser method 5 on array base palte, in the seal area coating sealed plastic box of color membrane substrates, to box array base palte and color membrane substrates, form liquid crystal panel, the box of liquid crystal panel is thick to be supported by chock insulator matter 6, as shown in Figure 1.
Wherein, the manufacturing process of color membrane substrates is specifically as follows:
Second substrate 2 is provided;
Be formed with black matrix 8 on second substrate 2, for limiting multiple pixel region;
In described pixel region, be formed with color blocking layer 9, specifically can comprise red color resistance layer, green color blocking layer and blue color blocking layer;
Color blocking layer 9 is formed flatness layer 103.
Embodiment three
Also provide a kind of liquid crystal panel in the embodiment of the present invention, it comprises the display base plate in embodiment one.
By adopting described liquid crystal panel, effectively can solve the problem that viewing area periphery produces image retention, improving the display quality of liquid crystal display device.
Technical scheme of the present invention, by arranging ion barrier structure at the non-display area of display base plate, for stopping that the charged ion of non-display area diffuses to viewing area, thus effectively can solve the problem that viewing area periphery produces image retention, improve the display quality of liquid crystal display device.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the prerequisite not departing from the technology of the present invention principle; can also make some improvement and replacement, these improve and replace and also should be considered as protection scope of the present invention.
Claims (12)
1. a display base plate, for liquid crystal panel, comprise viewing area and the non-display area being positioned at periphery, viewing area, it is characterized in that, described display base plate comprises:
Be positioned at the ion barrier structure of non-display area, for stopping that the charged ion of non-display area diffuses to viewing area.
2. display base plate according to claim 1, is characterized in that, described non-display area comprises seal area, and described ion barrier structure is between described seal area and viewing area.
3. display base plate according to claim 1, it is characterized in that, described ion barrier structure comprises multiple electrode group, each electrode group comprises the first electrode and the second electrode, by applying voltage on described first electrode and the second electrode, form electric field and adsorb charged ion, thus stop that the charged ion of non-display area diffuses to viewing area.
4. display base plate according to claim 3, is characterized in that, described display base plate is thin-film transistor array base-plate, and described display base plate also comprises:
The grid line that transverse and longitudinal is intersected and data line, for limiting multiple pixel cell, described pixel cell is positioned at viewing area;
The non-display area of described display base plate comprises data signal line, and described data signal line and data line are electrically connected, for data line transfer pixel voltage;
First electrode of described each electrode group and the second electrode are respectively two adjacent data signal lines, and the surface of described data signal line region is formed with accommodating structure, for the charged ion of accommodating stop.
5. display base plate according to claim 4, is characterized in that, described accommodating structure is the groove being positioned at surface, described data signal line region.
6. display base plate according to claim 3, is characterized in that, the viewing area of described display base plate comprises public electrode and pixel electrode, drives liquid crystal deflecting element for the formation of driving electric field;
The electric field intensity formed between described first electrode and the second electrode is greater than the driving electric field intensity of viewing area.
7. display base plate according to claim 3, is characterized in that, described display base plate is color membrane substrates.
8. a liquid crystal panel, comprises the display base plate described in any one of claim 1-7.
9. a method for making for display base plate, described display base plate is used for liquid crystal panel, and comprise viewing area and the non-display area being positioned at periphery, viewing area, it is characterized in that, described method for making comprises:
Ion barrier structure is formed, for stopping that the charged ion of non-display area diffuses to viewing area at non-display area.
10. method for making according to claim 9, is characterized in that, described non-display area comprises seal area, and described ion barrier structure is between described seal area and viewing area.
11. method for makings according to claim 9, is characterized in that, the step forming ion barrier structure comprises:
Form multiple electrode group, each electrode group comprises the first electrode and the second electrode, by described first electrode and the second electrode application voltage, forms electric field and adsorbs charged ion, thus stop that the charged ion of non-display area diffuses to viewing area.
12. method for makings according to claim 11, is characterized in that, described display base plate is thin-film transistor array base-plate, and described method for making also comprises:
Grid line and the data line of transverse and longitudinal intersection is formed, for limiting multiple pixel cell in viewing area;
Form data signal line at non-display area, described data signal line and data line are electrically connected, for data line transfer pixel voltage;
Form accommodating structure on the surface of described data signal line region, for the charged ion of accommodating stop, the first electrode of described each electrode group and the second electrode are respectively two adjacent data signal lines.
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| CN105487312A (en) * | 2015-12-31 | 2016-04-13 | 京东方科技集团股份有限公司 | Array substrate, display device and driving method of display device |
| CN106483729A (en) * | 2017-01-04 | 2017-03-08 | 京东方科技集团股份有限公司 | Display base plate and display device |
| CN106646968A (en) * | 2016-11-15 | 2017-05-10 | 上海中航光电子有限公司 | Display base board and production method, LED panel and LED device |
| CN106681044A (en) * | 2017-03-27 | 2017-05-17 | 厦门天马微电子有限公司 | Touch control display panel and touch control display device |
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| CN105487312A (en) * | 2015-12-31 | 2016-04-13 | 京东方科技集团股份有限公司 | Array substrate, display device and driving method of display device |
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| CN105487312B (en) * | 2015-12-31 | 2018-09-11 | 京东方科技集团股份有限公司 | A kind of array substrate, display device and its driving method |
| US10089944B2 (en) | 2015-12-31 | 2018-10-02 | Boe Technology Group Co., Ltd. | Array substrate and display device for reduction of peripheral residual images, and driving method thereof |
| CN106646968A (en) * | 2016-11-15 | 2017-05-10 | 上海中航光电子有限公司 | Display base board and production method, LED panel and LED device |
| CN106646968B (en) * | 2016-11-15 | 2020-05-08 | 上海中航光电子有限公司 | Display substrate, manufacturing method, liquid crystal display panel and liquid crystal display device |
| CN106483729A (en) * | 2017-01-04 | 2017-03-08 | 京东方科技集团股份有限公司 | Display base plate and display device |
| CN106483729B (en) * | 2017-01-04 | 2019-06-07 | 京东方科技集团股份有限公司 | Display base plate and display equipment |
| CN106681044A (en) * | 2017-03-27 | 2017-05-17 | 厦门天马微电子有限公司 | Touch control display panel and touch control display device |
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