CN104246230A - Method and apparatus for warming up a vacuum pump arrangement - Google Patents

Method and apparatus for warming up a vacuum pump arrangement Download PDF

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Publication number
CN104246230A
CN104246230A CN201380022974.3A CN201380022974A CN104246230A CN 104246230 A CN104246230 A CN 104246230A CN 201380022974 A CN201380022974 A CN 201380022974A CN 104246230 A CN104246230 A CN 104246230A
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CN
China
Prior art keywords
suction booster
forepressure
speed
vacuum pump
fore pump
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Granted
Application number
CN201380022974.3A
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Chinese (zh)
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CN104246230B (en
Inventor
J.R.塔特萨尔
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BOC Group Ltd
Edwards Ltd
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BOC Group Ltd
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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/02—Stopping, starting, unloading or idling control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B23/00—Pumping installations or systems
    • F04B23/04—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B41/00—Pumping installations or systems specially adapted for elastic fluids
    • F04B41/06—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/20—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00 by changing the driving speed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation
    • F04C28/065—Capacity control using a multiplicity of units or pumping capacities, e.g. multiple chambers, individually switchable or controllable
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F04D27/02—Surge control
    • F04D27/0261—Surge control by varying driving speed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
    • F04D27/02—Surge control
    • F04D27/0292—Stop safety or alarm devices, e.g. stop-and-go control; Disposition of check-valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/08—Cylinder or housing parameters
    • F04B2201/0801—Temperature
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/30—Use in a chemical vapor deposition [CVD] process or in a similar process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2270/00—Control; Monitoring or safety arrangements
    • F04C2270/70—Safety, emergency conditions or requirements
    • F04C2270/701—Cold start
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
    • F05D2260/00—Function
    • F05D2260/85—Starting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B30/00—Energy efficient heating, ventilation or air conditioning [HVAC]
    • Y02B30/70—Efficient control or regulation technologies, e.g. for control of refrigerant flow, motor or heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)

Abstract

A method for warming up a vacuum pump arrangement having a booster pump and a backing pump downstream of the booster pump for evacuating a process chamber includes setting the booster pump at a first speed higher than an idle speed of the booster pump when the same is in an idle mode; and controlling a backing pressure at an outlet of the booster pump within a range from 0.1mbar to 10 mbar at least for a period of time from when the vacuum pump arrangement is activated from the idle mode to when the booster pump reaches a temperature equal to or exceeding a first predetermined threshold value. Such method is implemented in system where a controlled is configured to carry out the above-motioned actions.

Description

For the method and apparatus of preheating vacuum pump apparatus
Technical field
The present invention relates to a kind of method for preheating (warm up) this vacuum pump apparatus after entering idle mode at vacuum pump apparatus and/or equipment.
Background technique
When manufacturing semiconductor device the system that uses typically comprise handling implement inter alia, the vacuum pump apparatus of there is suction booster (booster pump) and fore pump (backing pump) and cancellation element.Handling implement typically comprises process chamber, and semiconductor wafer is processed into predetermined structure in the process chamber.Vacuum pump apparatus is connected to handling implement, for evacuation processes room to form vacuum environment in the process chamber, thus various semiconductor processing techniques occurs.The gas extracted out from process chamber by vacuum pump apparatus can be directed to cancellation element, and this cancellation element was removed or being harmful to or toxic component in decomposition gas before air release to environment.
It is expected that the power utilization (utility) of the such as electric power, fuel and the water that manage and consumed by vacuum pump and cancellation element during being reduced in semiconductor fabrication process.When manufacturing semiconductor wafer, represented a large portion of the total output consumed by whole system by the power of vacuum pump and cancellation element consumption.The efficiency that the power utilization having carried out much making great efforts to improve vacuum pump in semiconductor industry consumes, to reduce the manufacture cost of semiconductor wafer.Except cost savings, new environmental legislation also can often be exerted pressure to semiconductor maker, to improve the energy efficiency of their manufacturing process.
, when handling implement does not need vacuum pump apparatus and cancellation element operates with its normal capacity, vacuum pump apparatus and cancellation element are placed in idle mode for improving a conventional method of efficiency.Term " idle mode " is used interchangeably with other terms herein, and sleep pattern such as often accustomed to using in various industry, green model, dormancy, reduction energy/low energy model, active power utilize control mode.Such as, when semiconductor wafer is just being passed in process chamber or when passing out from process chamber, vacuum pump apparatus and cancellation element can be placed in idle mode, the resource that their consume in this mode is less than them when being under normal manipulation mode.When handling implement needs vacuum pump apparatus and cancellation element operates with its normal capacity, them can be made to get back to its normal manipulation mode from idle mode.
A shortcoming of conventional method be it when usually spending long chien shih vacuum pump apparatus and cancellation element get back to its normal manipulation mode from idle mode.When vacuum pump apparatus is in idle mode, it can be cooled to low temperature.Vacuum pump apparatus can normal conditions operation under before, need it to be preheating to uniform temperature, this can spend for a long time.The time of preheating cost is longer, and handling implement is set to idle running, waits for that the vacuum pump apparatus ready time is longer.This is converted into cap loss and production declining.
Therefore, required is for making vacuum pump apparatus from idle mode rapidly pre-warming, thus shortens processing system gets back to the time required for normal manipulation mode method from idle mode.
Summary of the invention
The present invention relates to a kind of method for this vacuum pump apparatus of preheating after entering idle mode at vacuum pump apparatus and/or equipment.In some embodiments of the invention, the method for preheating with the vacuum pump apparatus for evacuation processes room of suction booster and the fore pump in this suction booster downstream comprises the following steps: suction booster is set in First Speed place, and this First Speed is higher than the idling speed of suction booster when it is in idle mode; And in time period when at least being reached to suction booster the temperature equaling or exceeding the first predetermined threshold when starting from vacuum pump apparatus from idle mode, the forepressure (backing pressure) in the outlet port of suction booster is controlled, from the scope of 0.1 millibar to 10 millibars, wherein needs are selected suitable forepressure according to the size of suction booster.
In some embodiments of the invention, a kind of equipment comprises: process chamber; Suction booster, its inlet fluid is connected to the outlet of process chamber; Fore pump, its inlet fluid is connected to supercharging delivery side of pump, and described fore pump is used for evacuation processes room together with suction booster; And controller, itself and suction booster and fore pump electrically connect, this controller is configured in time period when at least being reached the temperature equaling or exceeding the first predetermined threshold to suction booster when starting from suction booster and fore pump from idle mode, is controlled by the forepressure in the outlet port of suction booster from the scope of 0.1 millibar to 10 millibars.
But, when read in conjunction with the accompanying drawings, the following description from specific embodiment is understood best structure of the present invention and operating method and its additional object and advantage.
Accompanying drawing explanation
Fig. 1 illustrates the schematic diagram of the system according to some embodiments of the present invention, and wherein process chamber, suction booster and fore pump are connected in series inter alia.
Fig. 2 A and 2B illustrates the flow chart of display according to the various processes for preheating vacuum pump apparatus of some embodiments of the present invention.
Fig. 3 illustrates the flow chart of display according to the process for preheating vacuum pump apparatus of some embodiments of the present invention.
Fig. 4 is for showing the chart of the time required for disclosed method and/or equipment shortening preheating vacuum pump apparatus.
Embodiment
The disclosure relates to a kind of method for this vacuum pump apparatus of preheating after entering idle mode at vacuum pump apparatus and/or equipment.Vacuum pump apparatus has suction booster and the fore pump in its downstream in its structure simplified.The entrance of suction booster is connected to the outlet of process chamber, and process chamber for a part for semiconductor processing tools or can need inner vacuum environment so that any other equipment correctly worked.Supercharging delivery side of pump is connected to the entrance of fore pump, and prime delivery side of pump is typically connected with cancellation element fluid or is directly connected with atmosphere environment in some cases.When vacuum pump apparatus is preheated, the speed of suction booster is elevated to and maintains the level higher than the idling speed of suction booster when it is in idle mode.Compared with the forepressure under the idle mode adopted by conventional method under normal manipulation mode or in certain situation, the forepressure (pressure for the outlet port of suction booster) of suction booster is also elevated to and maintains relatively high level.As a result, compress during preheating cycle and can be increased by the power required for the gas of suction booster, therefore make the temperature of suction booster raise more quickly.Because suction booster typically will spend the complete preheating of longer time than fore pump, therefore method of the present disclosure and/or equipment can shorten whole vacuum pump apparatus from the time required for idle mode preheating.This then add the output of handling implement.
Fig. 1 illustrates the schematic diagram of the system 10 according to some embodiments of the present invention, and wherein inter alia, process chamber 12 and vacuum pump apparatus 20 are connected in series.Gas is extracted out from process chamber 12 by vacuum pump apparatus 20, and forms vacuum environment within it to perform some process, such as deposit, etch, ion implantation, epitaxy etc.Gas can be introduced in process chamber 12 from one or more gas source (gas source such as indicated by 14a and 14b in this figure).Gas source 14a and 14b can be connected to process chamber 12 via control valve 16a and 16b respectively.Various gas being incorporated into timing in process chamber 12 can by optionally to open or closed control valve 16a and 16b controls.The flow velocity being incorporated into the gas process chamber 12 from gas source 14a and 14b can be controlled by the fluid conductivity of adjusting control valve 16a and 16b.
Vacuum pump apparatus 20 comprises the suction booster 22 and fore pump 24 that are connected in series.The entrance of suction booster 22 is connected to the outlet of process chamber 12.The outlet of suction booster 22 is connected to the entrance of fore pump 24.The outlet of fore pump 24 can be connected to cancellation element (not shown in FIG.), and in this cancellation element, process the waste gas discharged from fore pump 24 may to the adverse effect of environment to reduce waste gas.Sensor (not shown in FIG.) can be used in vacuum pump apparatus, to collect the data of various measurement, the temperature, power consumpiton, pump speed etc. of such as suction booster 22 and fore pump 24.Also sensor can be used with the gas pressure of the entrance and/or outlet port of measuring suction booster 22 and/or fore pump 24.Controller 30 is configured in response to the data by sensor collection to control the various parameters of suction booster 22 and fore pump 24.Such as, suction booster 22 and fore pump 24 can be placed in low dynamics when receiving instruction and immediately not processing the signal being desirably in and performing in process chamber 12 and utilize consumption state, such as idle mode by controller 30.Such signal can by process chamber 12 or the handling implement be incorporated directly in controller 30 provides by process chamber 12.Alternatively, such signal can be supplied to controller 30 by the central unit of semiconductor manufacturing facility.
When receiving wake-up signal, controller 30 affects the increase supplied the electric power of vacuum pump apparatus 20, and the speed of suction booster 22 and fore pump 24 is elevated to higher level from their respective idling speeds.In time period when at least being reached to suction booster 22 temperature equaling or exceeding predetermined threshold when vacuum pump apparatus 20 starts from idle mode (this for make suction booster operate under normal operation be need), controller 30 control and raise suction booster 22 outlet port forepressure and this forepressure is maintained from the scope of 0.1 millibar to 10 millibars.Pressure range disclosed herein is higher than the forepressure of suction booster 22 in typical conventional warm.
Mathematically, the compression horsepower (W) of suction booster 22 equals its swept volume (V) and is multiplied by the pressure difference (dP) striding across it.Assuming that the swept volume of suction booster 22 is constant, then carrys out the higher power of raised pressure missionary society needs with the gas of compression by suction booster 22 by raising forepressure, therefore consequently producing more heat.Temperature when this can cause the temperature of suction booster 22 to be in idle mode from suction booster 22 reaches very rapidly and is suitable for normally pump operated predetermined threshold.
In some embodiments of invention, the forepressure of suction booster 22 can control by regulating the speed of fore pump 24.The speed of fore pump 24 is slower, and the forepressure of suction booster 22 is higher.The example process of the forepressure for controlling suction booster 22 is illustrated in Fig. 2 A.This process starts in step 200.In step 202, determine whether vacuum pump apparatus 20 has received the signal waken up from idle mode.If determine that vacuum pump apparatus 20 does not receive such signal, then vacuum pump apparatus 20 still will be in idle mode.If determine that vacuum pump apparatus 20 has received such signal, then process will proceed to step 204, in step 204, by the Speed Setting of suction booster 22 at the First Speed higher than its idling speed.In step 206, by the Speed Setting of fore pump 24 in the second speed higher than its idling speed.Although it should be noted that step 204 and 206 is illustrated as two actions separated in fig. 2, the speed of suction booster 22 and fore pump 24 can set in some embodiments of the invention simultaneously.
In step 208, whether the forepressure determining suction booster 22 is from the prespecified range of 0.1 millibar to 10 millibars.If forepressure is not in this prespecified range, then process proceeds to step 210, in step 210, the speed of fore pump 24 is reduced to make the forepressure of suction booster 22 drop into rapidly in prespecified range.In some embodiments of the invention, the speed of fore pump 24 reduces once, and process waits for that the forepressure of suction booster 22 moves in prespecified range.In other embodiments of the present invention, the speed of fore pump 24 little by little reduces through plenty of time interval, until the forepressure of suction booster 22 moves in prespecified range.In also some embodiments of the present invention, the second speed of fore pump 24 sets enough low in step 206, for making the forepressure of suction booster 22 rise rapidly, makes it possible to remove step 210 together.All these embodiments within the scope of the invention.
If determine that the forepressure of suction booster 22 is in prespecified range, then process proceeds to step 212.In step 212, determine whether the temperature of suction booster 22 and fore pump 24 equals or exceeds their respective threshold temperatures.If so, then vacuum pump apparatus 20 will be set as being ready for evacuation processes room 12 in a normal operation mode.Thitherto, vacuum pump apparatus 20 will remain in warm, and waiting temperature is elevated to proper level.It should be noted that the value of suction booster 22 and the predetermined threshold of fore pump 24 can be identical or can not be identical.Afterwards, process terminates in step 214.
In some embodiments of the invention, the forepressure of suction booster 22 can by regulating pump speed and contrasting the temperature of suction booster 22 and threshold temperature controls, without the need to directly measuring forepressure.Fig. 2 B illustrates the flow chart of the example process that the forepressure controlling suction booster 22 is shown, this process is without the need to directly measuring forepressure.Process in Fig. 2 B is similar to the process in Fig. 2 A, and difference is the forepressure not measuring suction booster 22.In step 248, the temperature of suction booster 22 is tested to be measured, and contrasts with the threshold temperature of suction booster.If the temperature measured lower than threshold temperature, then increases the speed of fore pump 24 in step 250.Step 248 and 250 periodically repeats until the temperature of measurement of suction booster 22 equals or exceeds threshold temperature.Afterwards, process proceeds to step 252, in step 252, determines whether the temperature of fore pump 24 equals or exceeds the threshold temperature of fore pump 24.If so, then vacuum pump apparatus 20 will be set as being ready for evacuation processes room 12 in a normal operation mode.Thitherto, vacuum pump apparatus 20 will remain in warm, and waiting temperature is elevated to proper level.Afterwards, process terminates in step 254.
In other embodiments of the present invention, can inject by the position in the outlet port of suction booster 22 or the conduit between suction booster 22 and fore pump 24 forepressure that purge gas raises suction booster 22.As shown in Figure 1, purge gas source 32 and control valve 34 can be provided alternatively.Control valve 34 can be placed between source 32 and the conduit between suction booster 22 and fore pump 24.Controller 30 is configured to the conductivity of adjusting control valve 34, thus control purge gas from source 32 flow velocity to outlet port or the adjacent place in its downstream to suction booster 22.Like this then the forepressure in the outlet port of suction booster 22 can be changed.Advantageously, select the stable and gas do not reacted with the process gas flowing through vacuum pump apparatus 20 as purge gas.The example of purge gas comprises nitrogen, helium or other inert gases.
Fig. 3 show according to some embodiments of the present invention for by the process of vacuum pump apparatus 20 from idle mode preheating.Process in Fig. 3 in illustrated process and Fig. 2 is similar, be desirably in the latter by regulating the speed of fore pump 24 control and maintain the forepressure of suction booster 22, and control and maintain the forepressure of suction booster 22, described by step 300 by injecting purge gas in the outlet port of suction booster 22 in the former.In step 302, determine that the forepressure of suction booster 22 is whether in prespecified range.If not, then controller 30 can increase the conductivity of control valve 34, to increase the flow velocity of purge gas, until the forepressure of suction booster 22 moves in prespecified range.As the process in Fig. 2, in step 300, the flow velocity of purge gas little by little or suddenly can be adjusted to predeterminated level through plenty of time interval.If determine that the forepressure of suction booster 22 is in prespecified range, then process will proceed to step 304.
In step 304, determine whether the temperature of suction booster 22 equals or exceeds predetermined threshold.If not, then process is by wait until the temperature of suction booster 22 equals or exceeds predetermined threshold, then proceeds to step 306, in step 306, cuts off flow of purge gas.In step 308, determine whether the temperature of fore pump 24 equals or exceeds predetermined threshold.If not, then process is by wait until the temperature of fore pump 24 equals or exceeds predetermined threshold, and then process terminates in step 310.As the process in Fig. 2, can be identical or can not be identical at the threshold temperature of this suction booster and fore pump.
Fig. 4 is for showing the chart of disclosed method and/or the time of equipment shortening after vacuum pump apparatus enters idle mode required for this vacuum pump apparatus of preheating.The left side of figure illustrate according to conventional methods or equipment for the time shaft of preheating vacuum pump apparatus.The right diagram of figure to be used for the time shaft of preheating vacuum pump apparatus according to method of the present disclosure or equipment.Contrast between time shaft shows disclosed method or equipment can be preheating to than conventional method or equipment the temperature that their expect more rapidly by suction booster and fore pump, its reason is the forepressure adding suction booster in warm.Shortening preheating cycle means that handling implement can be ordered at vacuum pump apparatus and enter operation more rapidly after idle mode wakes up.For handling implement, this then be converted into higher output.
Although the present invention illustrated in this article and describe is embodied in one or more particular example, but be not intended to be not limited to shown details, because when not departing from spirit of the present invention and in the scope of the equivalent of claim, various amendment and structural change can be carried out wherein.So, scrutable, should broadly understand appended claim, and in the mode consistent with the scope of the present invention set forth in claims to understand claim.

Claims (16)

1., for a method for preheating vacuum pump apparatus, described vacuum pump apparatus has suction booster and the fore pump in described suction booster downstream, and for evacuation processes room, described method comprises:
Described suction booster is set in First Speed place, and described First Speed is higher than the idling speed of described suction booster when it is in idle mode; And
In time period when at least being reached to described suction booster the temperature equaling or exceeding the first predetermined threshold when starting from described vacuum pump apparatus from described idle mode, the forepressure in the outlet port of described suction booster is controlled from the scope of 0.1 millibar to 10 millibars.
2. the method for claim 1, wherein described control forepressure comprises: the speed regulating described fore pump, and the entrance of described fore pump is connected to described supercharging delivery side of pump.
3. method as claimed in claim 2, wherein, when described vacuum pump apparatus is started from described idle mode, is set in second speed place by described fore pump.
4. method as claimed in claim 3, wherein, the described second speed of described fore pump is reduced to predeterminated level, to make the forepressure of described suction booster drop into from the scope of 0.1 millibar to 10 millibars.
5. method as claimed in claim 4, wherein, described second speed is little by little reduced to described predeterminated level through plenty of time interval.
6. the method for claim 1, wherein described control forepressure comprises: inject purge gas in the outlet port of described suction booster.
7. method as claimed in claim 6, wherein, to be adjusted to the forepressure of described suction booster from the mode in the scope of 0.1 millibar to 10 millibars to control the flow velocity of described purge gas.
8. the method for claim 1, wherein, described vacuum pump apparatus is set as being ready for described process chamber of finding time in a normal operation mode, now the temperature of described suction booster equals or exceeds described first predetermined threshold, and the temperature of described fore pump equals or exceeds the second predetermined threshold, wherein, described first predetermined threshold and described second predetermined threshold can be identical or can not be identical.
9. an equipment, comprising:
Process chamber;
Suction booster, its inlet fluid is connected to the outlet of described process chamber;
Fore pump, its inlet fluid is connected to described supercharging delivery side of pump, and described fore pump is used for finding time described process chamber together with described suction booster; And
Controller, itself and described suction booster and described fore pump electrically connect, described controller is configured in time period when at least being reached to described suction booster the temperature equaling or exceeding the first predetermined threshold when starting from described suction booster and described fore pump from idle mode, is controlled by the forepressure in the outlet port of described suction booster from the scope of 0.1 millibar to 10 millibars.
10. equipment as claimed in claim 9, wherein, the forepressure of described controller by regulating the speed of described fore pump to control described suction booster.
11. equipment as claimed in claim 10, wherein, when described vacuum pump apparatus is started from described idle mode, described fore pump is set in predetermined speed place by described controller.
12. equipment as claimed in claim 11, wherein, the predetermined speed of described fore pump is reduced to predeterminated level by described controller, to make the forepressure of described suction booster drop into from the scope of 0.1 millibar to 10 millibars.
13. equipment as claimed in claim 12, wherein, described controller makes described predetermined speed little by little be reduced to described predeterminated level through plenty of time interval.
14. equipment as claimed in claim 9, comprise the purge gas source that fluid is connected to the outlet port of described suction booster further.
15. equipment as claimed in claim 14, wherein, the flow velocity of the purge gas that the outlet port that described controller controls described suction booster is injected, thus the forepressure of described suction booster is controlled from the scope of 0.1 millibar to 10 millibars.
16. equipment as claimed in claim 9, wherein, described suction booster and described fore pump are set to be ready for described process chamber of finding time in a normal operation mode, now the temperature of described suction booster equals or exceeds described first predetermined threshold, and the temperature of described fore pump equals or exceeds the second predetermined threshold, wherein, described first predetermined threshold and described second predetermined threshold can be identical or can not be identical.
CN201380022974.3A 2012-05-02 2013-04-24 For the method and apparatus preheating vacuum pump apparatus Expired - Fee Related CN104246230B (en)

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GB2501735B (en) 2015-07-22
EP2844879A2 (en) 2015-03-11
CN104246230B (en) 2016-10-26
TWI640687B (en) 2018-11-11
WO2013164571A3 (en) 2013-12-27
TW201407037A (en) 2014-02-16
JP2015516044A (en) 2015-06-04
JP6208219B2 (en) 2017-10-04
GB2501735A (en) 2013-11-06
KR20150005945A (en) 2015-01-15
WO2013164571A2 (en) 2013-11-07
US20150086387A1 (en) 2015-03-26

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