CN104195558B - Film-stripping liquid - Google Patents

Film-stripping liquid Download PDF

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Publication number
CN104195558B
CN104195558B CN201410383022.0A CN201410383022A CN104195558B CN 104195558 B CN104195558 B CN 104195558B CN 201410383022 A CN201410383022 A CN 201410383022A CN 104195558 B CN104195558 B CN 104195558B
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China
Prior art keywords
film
weight
stripping
weight portion
taking
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Application number
CN201410383022.0A
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Chinese (zh)
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CN104195558A (en
Inventor
韩盛光
张吉林
聂玉林
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Jinhua Xinci Technology Co.,Ltd.
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Dongguan Kechenda Electronic Technology Co Ltd
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Priority to CN201410383022.0A priority Critical patent/CN104195558B/en
Publication of CN104195558A publication Critical patent/CN104195558A/en
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Abstract

The invention discloses a film-stripping liquid. The film-stripping liquid comprises the following raw materials in percentage by weight: 80%-85% of potassium hydroxide, 8.5%-15% of triethanolamine, 1%-2% of emulsifier OP21, 0.3%-0.5% of ethylene glycol butyl ether, 2%-3% of methanol and 0.5%-1% of acetone. By virtue of the film-stripping liquid prepared from the formula disclosed by the invention, the film-stripping speed and the film-stripping capability are nearly five times of those of sodium hydroxide so that the production efficiency is greatly improved and the problems that the copper surface is not clean and the stripped film is not complete when the film stripping is carried out are effectively solved.

Description

One kind takes off film liquid
Technical field
The present invention relates to taking off film liquid art, refer in particular to a kind of take off that film effect is good, to take off the film time short takes off film liquid.
Background technology
Taking off film is to take off film liquid using alkalescence the resin containing acidic group is neutralized, thus being dissolved out, makes dry film depart from copper face, Often using to taking off film liquid in the making of electronic product circuit and in the middle of producing.
At present widespread practice is to adopt NaOH, common NaOH when taking off film, because of dry film blocked up (80 μm), Liquid medicine attack erosion dry film ability is weaker, needs to take off clean so that production efficiency reduces by dry film in more than 20 minutes.And And, because slice, thin piece invades bubble for a long time in sodium hydroxide solution in taking off membrane process, easily oxidant and takes off film being difficult in copper face, from And lead to etching unclean.
Content of the invention
In view of this, the present invention is directed to the disappearance of prior art presence, and its main purpose is to provide one kind to take off film liquid, its energy Effectively solving existing using NaOH take off film exist take off film time length, take off the sordid problem of film.
For achieving the above object, the present invention is using following technical scheme:
One kind takes off film liquid, is made up of the raw material of following weight proportion:
Potassium hydroxide 80%~85%;
Triethanolamine 8.5%~15%;
Emulsifying agent op21 1%~2%;
Ethylene glycol monobutyl ether 0.3%~0.5%;
Methyl alcohol 2%~3%;
Acetone 0.5%~1%.
The present invention compared with prior art has clear advantage and beneficial effect, specifically, by technique scheme Understand:
Film liquid taken off using inventive formulation, it takes off film speed and takes off nearly five times that film ability is NaOH, thus Substantially increase production efficiency, and effectively improve when taking off film copper face and take off film net the problems such as.
Specific embodiment
The open one kind of the present invention takes off film liquid, is made up of the raw material of following weight proportion:
Potassium hydroxide 80%~85%;
Triethanolamine 8.5%~15%;
Emulsifying agent op21 1%~2%;
Ethylene glycol monobutyl ether 0.3%~0.5%;
Methyl alcohol 2%~3%;
Acetone 0.5%~1%.
The present invention will be described to use specific embodiment below, and " part " that following examples use is based on weight.
Embodiment 1
By 80 weight portion potassium hydroxide, 14 weight portion triethanolamines, 1.8 parts by weight Emulsifier op21,0.4 weight portion second two Alcohol monobutyl ether, 2.8 parts by weight Methanol and 1.0 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film liquid.
Embodiment 2
By 81 weight portion potassium hydroxide, 15 weight portion triethanolamines, 1.0 parts by weight Emulsifier op21,0.5 weight portion second two Alcohol monobutyl ether, 2.0 parts by weight Methanol and 0.5 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film liquid.
Embodiment 3
By 82 weight portion potassium hydroxide, 13 weight portion triethanolamines, 2.0 parts by weight Emulsifier op21,0.4 weight portion second two Alcohol monobutyl ether, 2.1 parts by weight Methanol and 0.5 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film liquid.
Embodiment 4
By 82.5 weight portion potassium hydroxide, 11.6 weight portion triethanolamines, 1.5 parts by weight Emulsifier op21,0.5 weight portion Ethylene glycol monobutyl ether, 3.0 parts by weight Methanol and 0.9 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film Liquid.
Embodiment 5
By 83 weight portion potassium hydroxide, 12 weight portion triethanolamines, 1.7 parts by weight Emulsifier op21,0.45 weight portion second Glycol monobutyl ether, 2.0 parts by weight Methanol and 0.85 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film Liquid.
Embodiment 6
By 83.5 weight portion potassium hydroxide, 10.2 weight portion triethanolamines, 2.0 parts by weight Emulsifier op21,0.3 weight portion Ethylene glycol monobutyl ether, 3.0 parts by weight Methanol and 1.0 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film Liquid.
Embodiment 7
By 84 weight portion potassium hydroxide, 9.9 weight portion triethanolamines, 1.6 parts by weight Emulsifier op21,0.5 weight portion second Glycol monobutyl ether, 3.0 parts by weight Methanol and 1.0 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film Liquid.
Embodiment 8
By 85 weight portion potassium hydroxide, 8.5 weight portion triethanolamines, 2.0 parts by weight Emulsifier op21,0.5 weight portion second Glycol monobutyl ether, 3.0 parts by weight Methanol and 1.0 pbw acetone are sequentially placed in container to stir and can be prepared by taking off film Liquid.
Above example 1~8 take off film liquid formula as shown in table 1 below.
Table 1 embodiment 1~8 take off film liquid formula
To thickness, the small size figure less than 0.1mm carries out taking off film the film liquid that takes off that each embodiment above-mentioned is obtained respectively, In the present embodiment, select the dry film that thickness is 80 μm to illustrate, take off film temperature and select at 60 degree, survey to taking off the film time Fixed, and adopt micro- sem observation residue, specific experiment data is as shown in table 2 below.
The film liquid that takes off of table 2 embodiment 1~8 takes off film time and residual
Embodiment 1 2 3 4 5 6 7 8
Take off the film time (min) 5.0 4.8 4.9 5.0 5.0 4.8 5.1 4.7
Residue No No No No No No No No
As shown in Table 2: film liquid taken off using inventive formulation, its take off film speed and take off film ability be NaOH nearly Five times, thus substantially increasing production efficiency, and effectively improve when taking off film copper face and take off film net the problems such as.
The above, be only presently preferred embodiments of the present invention, not the technical scope of the present invention imposed any restrictions, Therefore any trickle amendment, equivalent variations and modification that every technical spirit according to the present invention is made to above example, all still Belong in the range of technical solution of the present invention.

Claims (1)

1. one kind take off film liquid it is characterised in that: be made up of the raw material of following weight proportion:
Potassium hydroxide 80%~85%;
Triethanolamine 8.5%~15%;
Emulsifying agent op21 1%~2%;
Ethylene glycol monobutyl ether 0.3%~0.5%;
Methyl alcohol 2%~3%;
Acetone 0.5%~1%;
During making, potassium hydroxide, triethanolamine, emulsifying agent op21, ethylene glycol monobutyl ether, methyl alcohol and acetone are sequentially placed into appearance Stir in device and can be prepared by taking off film liquid.
CN201410383022.0A 2014-08-06 2014-08-06 Film-stripping liquid Active CN104195558B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410383022.0A CN104195558B (en) 2014-08-06 2014-08-06 Film-stripping liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410383022.0A CN104195558B (en) 2014-08-06 2014-08-06 Film-stripping liquid

Publications (2)

Publication Number Publication Date
CN104195558A CN104195558A (en) 2014-12-10
CN104195558B true CN104195558B (en) 2017-01-18

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CN201410383022.0A Active CN104195558B (en) 2014-08-06 2014-08-06 Film-stripping liquid

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104465903B (en) * 2014-12-16 2017-05-17 马鞍山太时芯光科技有限公司 Film uncovering agent, film uncovering agent preparation method and LED chip film pouring loss reduction method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4081977B2 (en) * 2000-12-11 2008-04-30 富士通株式会社 Method for manufacturing printed wiring board
CN101041794B (en) * 2006-03-24 2012-02-22 达兴材料股份有限公司 Cleaning fluid composition and usage thereof
CN101430510A (en) * 2008-11-26 2009-05-13 苏州苏电微电子信息化学品研发中心有限公司 Stripping liquid used for removing colorful photoresist and protection layer in colorful filter production
CN102163011A (en) * 2011-04-29 2011-08-24 西安东旺精细化学有限公司 Stripping liquid composition of photoresist
CN103389627A (en) * 2012-05-11 2013-11-13 安集微电子科技(上海)有限公司 Photoresist cleaning liquid

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Effective date of registration: 20200922

Address after: 710000 unit 1707, building 1, Wanke hi tech living Plaza, No.56 Xifeng Road, Yanta District, Xi'an, Shaanxi Province

Patentee after: Xi'an Boxin Chuangda Electronic Technology Co.,Ltd.

Address before: No. two Tangxia Zhen Gu Liao 523000 Guangdong city of Dongguan province No. 2 Dongguan kaichangde electronic Polytron Technologies Inc

Patentee before: DONGGUAN KECHENDA ELECTRONIC TECHNOLOGY Co.,Ltd.

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Effective date of registration: 20240429

Address after: 321000 No. 828 Jinshi Road, Jiangdong Town, Jindong District, Jinhua City, Zhejiang Province (self declared)

Patentee after: Jinhua Xinci Technology Co.,Ltd.

Country or region after: China

Address before: Unit 1707, unit 1, building 1, Vanke hi tech living Plaza, 56 Xifeng Road, Yanta District, Xi'an City, Shaanxi Province, 710000

Patentee before: Xi'an Boxin Chuangda Electronic Technology Co.,Ltd.

Country or region before: China

TR01 Transfer of patent right