CN104152855A - Film thickness detecting mechanism - Google Patents
Film thickness detecting mechanism Download PDFInfo
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- CN104152855A CN104152855A CN201410328077.1A CN201410328077A CN104152855A CN 104152855 A CN104152855 A CN 104152855A CN 201410328077 A CN201410328077 A CN 201410328077A CN 104152855 A CN104152855 A CN 104152855A
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- film
- film thickness
- thickness
- probe
- supporting mechanism
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- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Abstract
The invention discloses a film thickness detecting mechanism which comprises a film thickness probe (1), a water-cooling protective cover (3) and a supporting mechanism (4), wherein the film thickness probe (1) is arranged on a film (2) and used for inducting and detecting the thickness of the film (2); the water-cooling protective cover (3) is covered on the film thickness probe (1) and used for lowering a local temperature; the supporting mechanism (4) is arranged below the film (2) and used for supporting the film (2); and a sputtering cathode is arranged below the supporting mechanism (4). The film thickness detecting mechanism can be used for measuring the thickness of a vacuum sputtering film which is continuously produced online under a vacuum state.
Description
Technical field
The present invention relates to thickness detection mechanism, be specially a kind of film thickness feeler mechanism.
Background technology
In the relevant manufacturing processed of semi-conductor, many processing procedures must carry out under vacuum state, and vacuum splashing and plating technology is an application important technology quite widely in vacuum thin film manufacture process, replace spray gradually in recent years and lead the mode of paint and metallide, widely apply in industries such as photoelectricity, communication, semi-conductors, become important process for treating surface.And under vacuum state quantity-produced film, general being difficult to carried out the measurement of thickness to it when the continous vacuum sputter coating, and hot environment in the cavity of vacuum sputtering apparatus, be also difficult to realize thickness accurately, measure in real time.
Summary of the invention
For above-mentioned technical problem, the present invention discloses a kind of film thickness feeler mechanism, comprising: film thickness probe 1, and it is arranged on film 2, for responding to the thickness that detects described film 2; Water-cooling protective cover 3, it covers on described film thickness probe 1, for reducing local temperature; Supporting mechanism 4, it is arranged on the below of described film 2, and for bracketing film 2, the below of described supporting mechanism 4 arranges sputter cathode 5.
The invention has the beneficial effects as follows by controlling water-cooling protective cover, realized the on-line measurement of the film thickness to quantity-produced vacuum splashing and plating under vacuum state.
Brief description of the drawings
Fig. 1 is the structure front view of film thickness of the present invention feeler mechanism.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail, to make those skilled in the art can implement according to this with reference to specification sheets word.
As shown in the figure, the present invention discloses a kind of film thickness feeler mechanism, comprising: film thickness probe 1, and it is arranged on film 2, for responding to the thickness that detects described film 2; Water-cooling protective cover 3, it covers on described film thickness probe 1, for reducing local temperature; Supporting mechanism 4, it is arranged on the below of described film 2, and for bracketing film 2, the below of described supporting mechanism 4 arranges sputter cathode 5.
In the course of the work; the continuous flow procedure of film 2 all completes in vacuum cavity; described film 2 transmits under the support effect of supporting mechanism 4; be arranged on the thickness of the film thickness probe 1 induction testing film 2 on film 2 simultaneously; and cover the water-cooling protective cover 3 on described film thickness probe 1; in time heat is taken away by water cycle, reduced local temperature, ensure the normal work of film thickness probe 1.
Although embodiment of the present invention are open as above, but it is not restricted to listed utilization in specification sheets and embodiment, it can be applied to various applicable the field of the invention completely, for those skilled in the art, can easily realize other amendment, therefore do not deviating under the universal that claim and equivalency range limit, the present invention is not limited to specific details and illustrates here and the legend of describing.
Claims (1)
1. a film thickness feeler mechanism, is characterized in that, comprising:
Film thickness probe (1), it is upper that it is arranged on film (2), for responding to the thickness that detects described film (2);
Water-cooling protective cover (3), it is upper that it covers described film thickness probe (1), for reducing local temperature;
Supporting mechanism (4), it is arranged on the below of described film (2), and for bracketing film (2), the below of described supporting mechanism (4) arranges sputter cathode (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410328077.1A CN104152855A (en) | 2014-07-11 | 2014-07-11 | Film thickness detecting mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410328077.1A CN104152855A (en) | 2014-07-11 | 2014-07-11 | Film thickness detecting mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104152855A true CN104152855A (en) | 2014-11-19 |
Family
ID=51878475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410328077.1A Pending CN104152855A (en) | 2014-07-11 | 2014-07-11 | Film thickness detecting mechanism |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104152855A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000161923A (en) * | 1998-11-24 | 2000-06-16 | Sony Corp | Film thickness observing device for film-forming apparatus |
| CN1546722A (en) * | 2003-12-04 | 2004-11-17 | 湖南三才光电信息材料有限公司 | Flexible low radiation window film and real time control method for producing the same |
| JP2005241282A (en) * | 2004-02-24 | 2005-09-08 | Matsushita Electric Ind Co Ltd | Film thickness detection method and apparatus and film deposition method and apparatus |
| CN101078613A (en) * | 2006-05-10 | 2007-11-28 | 住友电气工业株式会社 | Coating layer thickness measurement mechanism and coating layer forming apparatus using the same |
| CN201731771U (en) * | 2010-07-29 | 2011-02-02 | 常州宝仪机电设备有限公司 | Special high temperature television monitoring system for vitreous tin baths |
| CN204039491U (en) * | 2014-07-11 | 2014-12-24 | 苏州诺耀光电科技有限公司 | A kind of film thickness feeler mechanism |
-
2014
- 2014-07-11 CN CN201410328077.1A patent/CN104152855A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000161923A (en) * | 1998-11-24 | 2000-06-16 | Sony Corp | Film thickness observing device for film-forming apparatus |
| CN1546722A (en) * | 2003-12-04 | 2004-11-17 | 湖南三才光电信息材料有限公司 | Flexible low radiation window film and real time control method for producing the same |
| JP2005241282A (en) * | 2004-02-24 | 2005-09-08 | Matsushita Electric Ind Co Ltd | Film thickness detection method and apparatus and film deposition method and apparatus |
| CN101078613A (en) * | 2006-05-10 | 2007-11-28 | 住友电气工业株式会社 | Coating layer thickness measurement mechanism and coating layer forming apparatus using the same |
| CN201731771U (en) * | 2010-07-29 | 2011-02-02 | 常州宝仪机电设备有限公司 | Special high temperature television monitoring system for vitreous tin baths |
| CN204039491U (en) * | 2014-07-11 | 2014-12-24 | 苏州诺耀光电科技有限公司 | A kind of film thickness feeler mechanism |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20141119 |
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| RJ01 | Rejection of invention patent application after publication |