CN104110561B - A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism - Google Patents
A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism Download PDFInfo
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- CN104110561B CN104110561B CN201410290269.8A CN201410290269A CN104110561B CN 104110561 B CN104110561 B CN 104110561B CN 201410290269 A CN201410290269 A CN 201410290269A CN 104110561 B CN104110561 B CN 104110561B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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Abstract
The invention discloses a kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform, the moving platform being placed on fixed platform and the transmission mechanism for driving moving platform to move, transmission mechanism includes three two-stage lever enlargers in parallel, and it is that hexagonal angle is distributed in around moving platform along fixed platform center.Transmitting movement is carried out, it is achieved that moving platform stroke is big, precision is high, respond the advantages such as fast, effectively extends the work space of moving platform by two-stage lever enlarger.Be detachably connected with assembly can quick-replaceable moving platform, the moving platform needing design ad hoc structure according to actual location space, and it is in combination to design specific bottom fixed platform.Adopt submissive hinge as revolute pair, it is ensured that the gapless of motion transmission, nothing rub, exempt from lubrication, high accuracy and high stability degree.Can be widely applied to the association areas such as precision positioning, precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.
Description
Technical field
The present invention relates to plane three-freedom precision positioning platform, particularly relate to a kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism.
Background technology
Precisely locating platform is the key component of the technology such as micro-nano operation, micro-nano measurement and minute manufacturing, plays an important role in the association areas such as precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.Tradition precisely locating platform is generally adopted motor and drives, and carries out transmission, positioning precision and repetitive positioning accuracy by precise ball screw and is subject to the serious restriction of the non-linear factor such as gap, friction.Compliant mechanism relies on the elastic deformation of flexible hinge to realize main movement and the function of mechanism, it is ensured that the gapless of motion transmission, nothing rub, exempt from lubrication, high accuracy and high stability.Compliant mechanism can be divided into planar flexible mechanism and space compliant mechanism by space, can be divided into again serial mechanism, parallel institution and hybrid mechanism by mechanism's connection type, and wherein plane parallel mechanism has better stability and dynamic characteristic and higher precision.
Driver can be divided into mechanical type and electromechanical by driving principle, and the latter can be divided into again piezoelectric-actuated, thermic dynamic formula, electrostatically actuated formula, Electromagnetically actuated formula, magnetostriction type and voice coil motor etc..Wherein piezoelectric ceramic actuator has the resolution of Subnano-class and the response speed of Millisecond, and bigger driving force, linear range of movement and rigidity etc., and the closed-loop control system of drive end can be built by built-in SGS (StrainGaugeSensor) sensor, and then overcome self hysteresis characteristic, realize high accuracy and metastable output, be a kind of desirable driver of precision positioning.Precisely locating platform can be divided into, by forms of motion, the driving two kinds that directly drives and wriggle.The former can realize high-resolution, but stroke device driven limits (general only tens microns);The latter can realize big stroke, but resolution is relatively low, and power output is not high yet.
Summary of the invention
It is an object of the invention to overcome the shortcoming and defect of above-mentioned prior art, it is provided that a kind of stroke is big, precision is high, respond the fast large-range plane three-freedom degree precision locating platform based on compliant mechanism.Relative to prior art, have that moving platform is replaceable, full closed loop control, high-resolution, compact conformation, without friction, exempt from the advantages such as lubrication.
The present invention is achieved through the following technical solutions:
A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform 9, the moving platform 6 being placed on fixed platform 9 and the transmission mechanism for driving moving platform 6 to move;
Described transmission mechanism, including three two-stage lever enlargers in parallel, it is that hexagonal angle is distributed in moving platform 6 around along fixed platform 9 center.
In three two-stage lever enlargers in parallel, each two-stage lever enlarger includes 11, two grades of driving levers 22 of one-level driving lever, 33, two grades of follower levers 44 of one-level follower lever;
Described one-level driving lever 11 and two grades of driving levers 22, be respectively provided with by submissive hinged support end 11-1,22-1 and force entering end 11-2,22-2 and exert oneself end 11-3,22-3;
The support end 11-1 of described one-level driving lever 11 is connected with fixed platform 9, and the force entering end 11-2 of one-level driving lever 11 is adjacent with the support end 11-1 of one-level driving lever 11;
The support end 22-1 of described two grades of driving levers 22 is connected with fixed platform 9, and the force entering end 22-2 of two grades of driving levers 22 is arranged on middle part;
The one end of described one-level follower lever 33 the end 11-3 that exerts oneself, the other end force entering end 22-2 by submissive two grades of driving levers 22 of chain connection by submissive chain connection one-level driving lever 11;
Submissive chain connection moving platform 6 is passed through in one end of described two grades of follower levers 44, and the other end is provided with and is detachably connected with assembly 21, is detachably connected with assembly 21 and is even connected with the end 22-3 that exerts oneself of two grades of driving levers 22 by submissive hinge.
Three capacitance sensors 4 for measuring moving platform 6 three degree of freedom coordinate figure it are additionally provided with on fixed platform 9, around moving platform 6.
Described fixed platform 9 is additionally provided with three piezoelectric ceramic actuators 5 for driving moving platform 6.
Described piezoelectric ceramic actuator 5 is arranged in the gathering sill that fixed platform 9 three is 120 ° of arrangements along fixed platform 9 center.
Capacitance sensor 4, by the circular guide in measurement bracket 3, is fixed on fixed platform 9.
The present invention, relative to prior art, has such advantages as and effect:
Transmitting movement is carried out, it is achieved that moving platform stroke is big, precision is high, respond the advantages such as fast, effectively extends the work space of moving platform by three two-stage lever enlargers in parallel.
Employing is detachably connected with assembly, it is possible to quick-replaceable moving platform, can according to the moving platform needing design ad hoc structure in actual location space, and it is in combination to design specific bottom fixed platform.
All adopt submissive hinge as revolute pair, it is ensured that the gapless of motion transmission, without friction, exempt from lubrication, high accuracy and high stability degree.
Adopt there is the resolution of Subnano-class and the response speed of Millisecond and be built-in with the piezoelectric ceramic actuator of SGS sensor and three there is nanometer resolution and nanoscale is static and the capacitance sensors of dynamic response precision, capacitance sensor is respectively connected in controller, realize the combination of full closed loop control and drive end closed loop control, apply different intelligent control algorithms, it is achieved nano level positioning precision, repetitive positioning accuracy and trajectory track essence.
Precision of the present invention is high, stroke is big, moving platform is replaceable, full closed loop control, resolution height, compact conformation, without friction, exempt from lubrication, response soon.The present invention can meet the association area needs to large stroke and high precision plane three-freedom precision positioning platform such as precision positioning, precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.
Accompanying drawing explanation
Fig. 1 is present configuration schematic diagram.
Fig. 2 is Fig. 1 two-stage lever enlarger partial structurtes schematic diagram.
Fig. 3 is the rough schematic view of two-stage lever enlarger of the present invention.
Detailed description of the invention
Below in conjunction with specific embodiment, the present invention is more specifically described in detail.
Embodiment
As shown in Figures 1 to 3.A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism of the present invention, including fixed platform 9, the moving platform 6 being placed on fixed platform 9 and the transmission mechanism for driving moving platform 6 to move;Described fixed platform 9 has pad 8 with moving platform 6 junction, makes the two keep certain interval.Fixed platform 9 and moving platform 6 are centrally located on same vertical curve.
Described transmission mechanism, including three two-stage lever enlargers in parallel, it is that hexagonal angle is distributed in moving platform 6 around along fixed platform 9 center, and shape depends on that its stress intensity born in power transmittance process is distributed.
In three two-stage lever enlargers in parallel, each two-stage lever enlarger includes 11, two grades of driving levers 22 of one-level driving lever, 33, two grades of follower levers 44 of one-level follower lever;
Described one-level driving lever 11 and two grades of driving levers 22, be respectively provided with by submissive hinged support end 11-1,22-1 and force entering end 11-2,22-2 and exert oneself end 11-3,22-3;
The center of the submissive hinge in three two-stage lever enlargers in parallel is conllinear respectively.
The support end 11-1 of described one-level driving lever 11 is connected with fixed platform 9, the force entering end 11-2 of one-level driving lever 11 is adjacent (namely with the support end 11-1 of one-level driving lever 11, the force entering end 11-2 of one-level driving lever 11 holds 11-3 near support end 11-1, the force entering end 11-2 of one-level driving lever 11 away from exerting oneself);
The support end 22-1 of described two grades of driving levers 22 is connected with fixed platform 9, and the force entering end 22-2 of two grades of driving levers 22 is arranged on middle part;
The one end of described one-level follower lever 33 the end 11-3 that exerts oneself, the other end force entering end 22-2 by submissive two grades of driving levers 22 of chain connection by submissive chain connection one-level driving lever 11;
Submissive chain connection moving platform 6 is passed through in one end of described two grades of follower levers 44, and the other end is provided with and is detachably connected with assembly 21, is detachably connected with assembly 21 and is even connected with the end 22-3 that exerts oneself of two grades of driving levers 22 by submissive hinge.
Fig. 3 constitutes 3-RRR (Revolute-Revolute-Revolute) mechanism, makes moving platform 6 realize orthogonal translational degree of freedom and a rotational freedom vertical with this plane in two planes.
It is detachably connected with the application of assembly 21, also achieve the convenient replacing of moving platform 6, can according to the moving platform needing design ad hoc structure and size in actual location space, and design the use in combination of specific fixed platform, both are connected by screw and pin, and middle connection by pad makes the two keep fixed interval (FI).
Three capacitance sensors 4 (there is nanometer resolution) for measuring moving platform 6 three degree of freedom coordinate figure it are additionally provided with on fixed platform 9, around moving platform 6.
Distance between capacitance sensor 4 and measured of moving platform 6 is initialized by clearance gauge.
When capacitance sensor 4 is installed, being arranged on fixed platform 9 by measurement bracket 3, capacitance sensor 4 can not produce movement interference with fixed platform 9 moving part.
The measured value of capacitance sensor 4 can be converted into the coordinate figure of moving platform three degree of freedom by geometric transformation, the analog voltage signal that its voltage signal passes through three A/D mouth access controller (not shown) SGS sensors built-in with piezoelectric ceramic actuator 5 and derives coordinates, calculate three driving voltage values by intelligent control algorithm in controller, put on piezoelectric ceramic actuator by A/D mouth.Being so a cycle, single response can at Millisecond.
Described fixed platform 9 is additionally provided with three piezoelectric ceramic actuators 5 for driving moving platform 6.
Piezoelectric ceramic actuator 5 is built-in with SGS sensor, for Real-time Collection piezoelectric ceramic actuator elongation, the value of capacitance sensor Real-time Collection moving platform 6 three degree of freedom, the two feeds back to (not shown) in controller respectively, it is achieved full closed loop control combines with drive end closed loop control.
Piezoelectric ceramic actuator 5, has the resolution of Subnano-class and the response speed of Millisecond.
Described piezoelectric ceramic actuator 5 is arranged in the gathering sill that fixed platform 9 three is 120 ° of arrangements along fixed platform 9 center (cross section is square).
Each piezoelectric ceramic actuator 5 in gathering sill, by a pair voussoir pretension (not shown), voussoir inclination angle of inclined plane is not more than Self-locking angle, the adjustment of pretension amount can be carried out by the screw that pressure voussoir down or rotation voussoir upper surface embed, obtain the pretension displacement of concrete correspondence by reading the built-in SGS sensing data of piezoelectric ceramic actuator 5.
Capacitance sensor 4, by the circular guide in measurement bracket 3, is fixed on fixed platform 9.
Three pads are had between fixed platform 9 and vibration isolation table (not shown), pad is positioned at below piezoelectric ceramic actuator 5, width is more than more than piezoelectric ceramic actuator 5 diameter twice, length more than piezoelectric ceramic actuator 5 more than half, simultaneously can not produce movement interference with the parts of the transmitting movement such as two-stage lever enlarger.
As it has been described above, the present invention just can be realized preferably.
Embodiments of the present invention are also not restricted to the described embodiments; the change made under other any spirit without departing from the present invention and principle, modification, replacement, combination, simplification; all should be the substitute mode of equivalence, be included within protection scope of the present invention.
Claims (2)
1. the large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform, the moving platform being placed on fixed platform and the transmission mechanism for driving moving platform to move, it is characterized in that: described transmission mechanism includes three two-stage lever enlargers in parallel, and it is that hexagonal angle is distributed in around moving platform along fixed platform center;
In described three two-stage lever enlargers in parallel, each two-stage lever enlarger includes one-level driving lever, two grades of driving levers, one-level follower lever, two grades of follower levers;
Described one-level driving lever and two grades of driving levers, be respectively provided with by submissive hinged support end and force entering end and end of exerting oneself;
The support end of described one-level driving lever is connected with fixed platform, and the force entering end of one-level driving lever is adjacent with the support end of one-level driving lever;
The support end of described two grades of driving levers is connected with fixed platform, and the force entering end of two grades of driving levers is arranged on middle part;
One end of described one-level follower lever is by the end of exerting oneself of submissive chain connection one-level driving lever, the other end force entering end by submissive two grades of driving levers of chain connection;
Submissive chain connection moving platform is passed through in one end of described two grades of follower levers, and the other end is provided with and is detachably connected with assembly, is detachably connected with assembly and is even connected with the end of exerting oneself of two grades of driving levers by submissive hinge;
Three capacitance sensors for measuring moving platform three degree of freedom coordinate figure it are additionally provided with on fixed platform, around moving platform;
Described fixed platform is additionally provided with three piezoelectric ceramic actuators for driving moving platform;Described piezoelectric ceramic actuator is arranged in the gathering sill that three on fixed platform are 120 ° of arrangements along fixed platform center.
2. the large-range plane three-freedom degree precision locating platform based on compliant mechanism according to claim 1, it is characterised in that: capacitance sensor, by the circular guide in measurement bracket, is fixed on fixed platform.
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5204712A (en) * | 1991-03-08 | 1993-04-20 | U.S. Philips Corp. | Support device with a tiltable object table, and optical lithographic device provided with such a support device |
CN1645518A (en) * | 2004-12-28 | 2005-07-27 | 华南理工大学 | Planar three freedom meek precisively positioning platform |
CN2758935Y (en) * | 2004-12-28 | 2006-02-15 | 华南理工大学 | Plane three-freedom precision positioning platform |
CN101435690A (en) * | 2008-12-03 | 2009-05-20 | 中国科学院合肥物质科学研究院 | Strain type micro-nano-scale micro-nano displacement sensor |
CN201680123U (en) * | 2010-04-20 | 2010-12-22 | 郑福胜 | Two-freedom-degree large-stroke high-speed high-precision positioning platform |
CN102794664A (en) * | 2012-07-17 | 2012-11-28 | 广东工业大学 | Bridge-type flexible hinge based high-frequency ultra-precision machining lathe saddle driving platform |
CN103672317A (en) * | 2013-06-27 | 2014-03-26 | 江西理工大学 | Accuracy-adjustable lamination-type space three-horizontal-moving-flexibility precision positioning platform |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008058306B4 (en) * | 2008-11-17 | 2012-03-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Aerostatic table system for vacuum application |
-
2014
- 2014-06-25 CN CN201410290269.8A patent/CN104110561B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5204712A (en) * | 1991-03-08 | 1993-04-20 | U.S. Philips Corp. | Support device with a tiltable object table, and optical lithographic device provided with such a support device |
CN1645518A (en) * | 2004-12-28 | 2005-07-27 | 华南理工大学 | Planar three freedom meek precisively positioning platform |
CN2758935Y (en) * | 2004-12-28 | 2006-02-15 | 华南理工大学 | Plane three-freedom precision positioning platform |
CN101435690A (en) * | 2008-12-03 | 2009-05-20 | 中国科学院合肥物质科学研究院 | Strain type micro-nano-scale micro-nano displacement sensor |
CN201680123U (en) * | 2010-04-20 | 2010-12-22 | 郑福胜 | Two-freedom-degree large-stroke high-speed high-precision positioning platform |
CN102794664A (en) * | 2012-07-17 | 2012-11-28 | 广东工业大学 | Bridge-type flexible hinge based high-frequency ultra-precision machining lathe saddle driving platform |
CN103672317A (en) * | 2013-06-27 | 2014-03-26 | 江西理工大学 | Accuracy-adjustable lamination-type space three-horizontal-moving-flexibility precision positioning platform |
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