CN104110561B - A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism - Google Patents

A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism Download PDF

Info

Publication number
CN104110561B
CN104110561B CN201410290269.8A CN201410290269A CN104110561B CN 104110561 B CN104110561 B CN 104110561B CN 201410290269 A CN201410290269 A CN 201410290269A CN 104110561 B CN104110561 B CN 104110561B
Authority
CN
China
Prior art keywords
platform
moving platform
fixed platform
grades
lever
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410290269.8A
Other languages
Chinese (zh)
Other versions
CN104110561A (en
Inventor
张宪民
王瑞洲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
South China University of Technology SCUT
Original Assignee
South China University of Technology SCUT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by South China University of Technology SCUT filed Critical South China University of Technology SCUT
Priority to CN201410290269.8A priority Critical patent/CN104110561B/en
Publication of CN104110561A publication Critical patent/CN104110561A/en
Application granted granted Critical
Publication of CN104110561B publication Critical patent/CN104110561B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Robotics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)

Abstract

The invention discloses a kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform, the moving platform being placed on fixed platform and the transmission mechanism for driving moving platform to move, transmission mechanism includes three two-stage lever enlargers in parallel, and it is that hexagonal angle is distributed in around moving platform along fixed platform center.Transmitting movement is carried out, it is achieved that moving platform stroke is big, precision is high, respond the advantages such as fast, effectively extends the work space of moving platform by two-stage lever enlarger.Be detachably connected with assembly can quick-replaceable moving platform, the moving platform needing design ad hoc structure according to actual location space, and it is in combination to design specific bottom fixed platform.Adopt submissive hinge as revolute pair, it is ensured that the gapless of motion transmission, nothing rub, exempt from lubrication, high accuracy and high stability degree.Can be widely applied to the association areas such as precision positioning, precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.

Description

A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism
Technical field
The present invention relates to plane three-freedom precision positioning platform, particularly relate to a kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism.
Background technology
Precisely locating platform is the key component of the technology such as micro-nano operation, micro-nano measurement and minute manufacturing, plays an important role in the association areas such as precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.Tradition precisely locating platform is generally adopted motor and drives, and carries out transmission, positioning precision and repetitive positioning accuracy by precise ball screw and is subject to the serious restriction of the non-linear factor such as gap, friction.Compliant mechanism relies on the elastic deformation of flexible hinge to realize main movement and the function of mechanism, it is ensured that the gapless of motion transmission, nothing rub, exempt from lubrication, high accuracy and high stability.Compliant mechanism can be divided into planar flexible mechanism and space compliant mechanism by space, can be divided into again serial mechanism, parallel institution and hybrid mechanism by mechanism's connection type, and wherein plane parallel mechanism has better stability and dynamic characteristic and higher precision.
Driver can be divided into mechanical type and electromechanical by driving principle, and the latter can be divided into again piezoelectric-actuated, thermic dynamic formula, electrostatically actuated formula, Electromagnetically actuated formula, magnetostriction type and voice coil motor etc..Wherein piezoelectric ceramic actuator has the resolution of Subnano-class and the response speed of Millisecond, and bigger driving force, linear range of movement and rigidity etc., and the closed-loop control system of drive end can be built by built-in SGS (StrainGaugeSensor) sensor, and then overcome self hysteresis characteristic, realize high accuracy and metastable output, be a kind of desirable driver of precision positioning.Precisely locating platform can be divided into, by forms of motion, the driving two kinds that directly drives and wriggle.The former can realize high-resolution, but stroke device driven limits (general only tens microns);The latter can realize big stroke, but resolution is relatively low, and power output is not high yet.
Summary of the invention
It is an object of the invention to overcome the shortcoming and defect of above-mentioned prior art, it is provided that a kind of stroke is big, precision is high, respond the fast large-range plane three-freedom degree precision locating platform based on compliant mechanism.Relative to prior art, have that moving platform is replaceable, full closed loop control, high-resolution, compact conformation, without friction, exempt from the advantages such as lubrication.
The present invention is achieved through the following technical solutions:
A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform 9, the moving platform 6 being placed on fixed platform 9 and the transmission mechanism for driving moving platform 6 to move;
Described transmission mechanism, including three two-stage lever enlargers in parallel, it is that hexagonal angle is distributed in moving platform 6 around along fixed platform 9 center.
In three two-stage lever enlargers in parallel, each two-stage lever enlarger includes 11, two grades of driving levers 22 of one-level driving lever, 33, two grades of follower levers 44 of one-level follower lever;
Described one-level driving lever 11 and two grades of driving levers 22, be respectively provided with by submissive hinged support end 11-1,22-1 and force entering end 11-2,22-2 and exert oneself end 11-3,22-3;
The support end 11-1 of described one-level driving lever 11 is connected with fixed platform 9, and the force entering end 11-2 of one-level driving lever 11 is adjacent with the support end 11-1 of one-level driving lever 11;
The support end 22-1 of described two grades of driving levers 22 is connected with fixed platform 9, and the force entering end 22-2 of two grades of driving levers 22 is arranged on middle part;
The one end of described one-level follower lever 33 the end 11-3 that exerts oneself, the other end force entering end 22-2 by submissive two grades of driving levers 22 of chain connection by submissive chain connection one-level driving lever 11;
Submissive chain connection moving platform 6 is passed through in one end of described two grades of follower levers 44, and the other end is provided with and is detachably connected with assembly 21, is detachably connected with assembly 21 and is even connected with the end 22-3 that exerts oneself of two grades of driving levers 22 by submissive hinge.
Three capacitance sensors 4 for measuring moving platform 6 three degree of freedom coordinate figure it are additionally provided with on fixed platform 9, around moving platform 6.
Described fixed platform 9 is additionally provided with three piezoelectric ceramic actuators 5 for driving moving platform 6.
Described piezoelectric ceramic actuator 5 is arranged in the gathering sill that fixed platform 9 three is 120 ° of arrangements along fixed platform 9 center.
Capacitance sensor 4, by the circular guide in measurement bracket 3, is fixed on fixed platform 9.
The present invention, relative to prior art, has such advantages as and effect:
Transmitting movement is carried out, it is achieved that moving platform stroke is big, precision is high, respond the advantages such as fast, effectively extends the work space of moving platform by three two-stage lever enlargers in parallel.
Employing is detachably connected with assembly, it is possible to quick-replaceable moving platform, can according to the moving platform needing design ad hoc structure in actual location space, and it is in combination to design specific bottom fixed platform.
All adopt submissive hinge as revolute pair, it is ensured that the gapless of motion transmission, without friction, exempt from lubrication, high accuracy and high stability degree.
Adopt there is the resolution of Subnano-class and the response speed of Millisecond and be built-in with the piezoelectric ceramic actuator of SGS sensor and three there is nanometer resolution and nanoscale is static and the capacitance sensors of dynamic response precision, capacitance sensor is respectively connected in controller, realize the combination of full closed loop control and drive end closed loop control, apply different intelligent control algorithms, it is achieved nano level positioning precision, repetitive positioning accuracy and trajectory track essence.
Precision of the present invention is high, stroke is big, moving platform is replaceable, full closed loop control, resolution height, compact conformation, without friction, exempt from lubrication, response soon.The present invention can meet the association area needs to large stroke and high precision plane three-freedom precision positioning platform such as precision positioning, precise and ultraprecise machining, accurate operation, accurate measurement and MEMS.
Accompanying drawing explanation
Fig. 1 is present configuration schematic diagram.
Fig. 2 is Fig. 1 two-stage lever enlarger partial structurtes schematic diagram.
Fig. 3 is the rough schematic view of two-stage lever enlarger of the present invention.
Detailed description of the invention
Below in conjunction with specific embodiment, the present invention is more specifically described in detail.
Embodiment
As shown in Figures 1 to 3.A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism of the present invention, including fixed platform 9, the moving platform 6 being placed on fixed platform 9 and the transmission mechanism for driving moving platform 6 to move;Described fixed platform 9 has pad 8 with moving platform 6 junction, makes the two keep certain interval.Fixed platform 9 and moving platform 6 are centrally located on same vertical curve.
Described transmission mechanism, including three two-stage lever enlargers in parallel, it is that hexagonal angle is distributed in moving platform 6 around along fixed platform 9 center, and shape depends on that its stress intensity born in power transmittance process is distributed.
In three two-stage lever enlargers in parallel, each two-stage lever enlarger includes 11, two grades of driving levers 22 of one-level driving lever, 33, two grades of follower levers 44 of one-level follower lever;
Described one-level driving lever 11 and two grades of driving levers 22, be respectively provided with by submissive hinged support end 11-1,22-1 and force entering end 11-2,22-2 and exert oneself end 11-3,22-3;
The center of the submissive hinge in three two-stage lever enlargers in parallel is conllinear respectively.
The support end 11-1 of described one-level driving lever 11 is connected with fixed platform 9, the force entering end 11-2 of one-level driving lever 11 is adjacent (namely with the support end 11-1 of one-level driving lever 11, the force entering end 11-2 of one-level driving lever 11 holds 11-3 near support end 11-1, the force entering end 11-2 of one-level driving lever 11 away from exerting oneself);
The support end 22-1 of described two grades of driving levers 22 is connected with fixed platform 9, and the force entering end 22-2 of two grades of driving levers 22 is arranged on middle part;
The one end of described one-level follower lever 33 the end 11-3 that exerts oneself, the other end force entering end 22-2 by submissive two grades of driving levers 22 of chain connection by submissive chain connection one-level driving lever 11;
Submissive chain connection moving platform 6 is passed through in one end of described two grades of follower levers 44, and the other end is provided with and is detachably connected with assembly 21, is detachably connected with assembly 21 and is even connected with the end 22-3 that exerts oneself of two grades of driving levers 22 by submissive hinge.
Fig. 3 constitutes 3-RRR (Revolute-Revolute-Revolute) mechanism, makes moving platform 6 realize orthogonal translational degree of freedom and a rotational freedom vertical with this plane in two planes.
It is detachably connected with the application of assembly 21, also achieve the convenient replacing of moving platform 6, can according to the moving platform needing design ad hoc structure and size in actual location space, and design the use in combination of specific fixed platform, both are connected by screw and pin, and middle connection by pad makes the two keep fixed interval (FI).
Three capacitance sensors 4 (there is nanometer resolution) for measuring moving platform 6 three degree of freedom coordinate figure it are additionally provided with on fixed platform 9, around moving platform 6.
Distance between capacitance sensor 4 and measured of moving platform 6 is initialized by clearance gauge.
When capacitance sensor 4 is installed, being arranged on fixed platform 9 by measurement bracket 3, capacitance sensor 4 can not produce movement interference with fixed platform 9 moving part.
The measured value of capacitance sensor 4 can be converted into the coordinate figure of moving platform three degree of freedom by geometric transformation, the analog voltage signal that its voltage signal passes through three A/D mouth access controller (not shown) SGS sensors built-in with piezoelectric ceramic actuator 5 and derives coordinates, calculate three driving voltage values by intelligent control algorithm in controller, put on piezoelectric ceramic actuator by A/D mouth.Being so a cycle, single response can at Millisecond.
Described fixed platform 9 is additionally provided with three piezoelectric ceramic actuators 5 for driving moving platform 6.
Piezoelectric ceramic actuator 5 is built-in with SGS sensor, for Real-time Collection piezoelectric ceramic actuator elongation, the value of capacitance sensor Real-time Collection moving platform 6 three degree of freedom, the two feeds back to (not shown) in controller respectively, it is achieved full closed loop control combines with drive end closed loop control.
Piezoelectric ceramic actuator 5, has the resolution of Subnano-class and the response speed of Millisecond.
Described piezoelectric ceramic actuator 5 is arranged in the gathering sill that fixed platform 9 three is 120 ° of arrangements along fixed platform 9 center (cross section is square).
Each piezoelectric ceramic actuator 5 in gathering sill, by a pair voussoir pretension (not shown), voussoir inclination angle of inclined plane is not more than Self-locking angle, the adjustment of pretension amount can be carried out by the screw that pressure voussoir down or rotation voussoir upper surface embed, obtain the pretension displacement of concrete correspondence by reading the built-in SGS sensing data of piezoelectric ceramic actuator 5.
Capacitance sensor 4, by the circular guide in measurement bracket 3, is fixed on fixed platform 9.
Three pads are had between fixed platform 9 and vibration isolation table (not shown), pad is positioned at below piezoelectric ceramic actuator 5, width is more than more than piezoelectric ceramic actuator 5 diameter twice, length more than piezoelectric ceramic actuator 5 more than half, simultaneously can not produce movement interference with the parts of the transmitting movement such as two-stage lever enlarger.
As it has been described above, the present invention just can be realized preferably.
Embodiments of the present invention are also not restricted to the described embodiments; the change made under other any spirit without departing from the present invention and principle, modification, replacement, combination, simplification; all should be the substitute mode of equivalence, be included within protection scope of the present invention.

Claims (2)

1. the large-range plane three-freedom degree precision locating platform based on compliant mechanism, including fixed platform, the moving platform being placed on fixed platform and the transmission mechanism for driving moving platform to move, it is characterized in that: described transmission mechanism includes three two-stage lever enlargers in parallel, and it is that hexagonal angle is distributed in around moving platform along fixed platform center;
In described three two-stage lever enlargers in parallel, each two-stage lever enlarger includes one-level driving lever, two grades of driving levers, one-level follower lever, two grades of follower levers;
Described one-level driving lever and two grades of driving levers, be respectively provided with by submissive hinged support end and force entering end and end of exerting oneself;
The support end of described one-level driving lever is connected with fixed platform, and the force entering end of one-level driving lever is adjacent with the support end of one-level driving lever;
The support end of described two grades of driving levers is connected with fixed platform, and the force entering end of two grades of driving levers is arranged on middle part;
One end of described one-level follower lever is by the end of exerting oneself of submissive chain connection one-level driving lever, the other end force entering end by submissive two grades of driving levers of chain connection;
Submissive chain connection moving platform is passed through in one end of described two grades of follower levers, and the other end is provided with and is detachably connected with assembly, is detachably connected with assembly and is even connected with the end of exerting oneself of two grades of driving levers by submissive hinge;
Three capacitance sensors for measuring moving platform three degree of freedom coordinate figure it are additionally provided with on fixed platform, around moving platform;
Described fixed platform is additionally provided with three piezoelectric ceramic actuators for driving moving platform;Described piezoelectric ceramic actuator is arranged in the gathering sill that three on fixed platform are 120 ° of arrangements along fixed platform center.
2. the large-range plane three-freedom degree precision locating platform based on compliant mechanism according to claim 1, it is characterised in that: capacitance sensor, by the circular guide in measurement bracket, is fixed on fixed platform.
CN201410290269.8A 2014-06-25 2014-06-25 A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism Active CN104110561B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410290269.8A CN104110561B (en) 2014-06-25 2014-06-25 A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410290269.8A CN104110561B (en) 2014-06-25 2014-06-25 A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism

Publications (2)

Publication Number Publication Date
CN104110561A CN104110561A (en) 2014-10-22
CN104110561B true CN104110561B (en) 2016-06-29

Family

ID=51707477

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410290269.8A Active CN104110561B (en) 2014-06-25 2014-06-25 A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism

Country Status (1)

Country Link
CN (1) CN104110561B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6552649B2 (en) * 2015-07-09 2019-07-31 エーエスエムエル ネザーランズ ビー.ブイ. Movable support and lithographic apparatus
CN106430088B (en) * 2016-08-30 2018-08-17 上海交通大学 A kind of six-freedom-degree magnetic suspension magnetic drive nanopositioning stage
CN109079766B (en) * 2018-11-12 2023-08-22 广东工业大学 Three-degree-of-freedom motion platform based on flexible amplifying mechanism
CN109079767B (en) * 2018-11-12 2023-09-12 广东工业大学 Three-dimensional high-speed precise micro-motion platform capable of deflecting
CN109848932A (en) * 2019-04-09 2019-06-07 中国科学院宁波材料技术与工程研究所 A kind of planar three freedom Grazing condition parallel connection locating platform
CN110155935A (en) * 2019-05-13 2019-08-23 天津大学 The XY θ three freedom meek precisively positioning platform of second level displacement equations
CN110421553B (en) * 2019-08-29 2023-10-20 华南理工大学 Three-degree-of-freedom macro-micro motion parallel structure device and control method
CN114913913B (en) * 2022-03-28 2023-06-13 山东大学 Two-dimensional high-precision piezoelectric positioning platform and method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204712A (en) * 1991-03-08 1993-04-20 U.S. Philips Corp. Support device with a tiltable object table, and optical lithographic device provided with such a support device
CN1645518A (en) * 2004-12-28 2005-07-27 华南理工大学 Planar three freedom meek precisively positioning platform
CN2758935Y (en) * 2004-12-28 2006-02-15 华南理工大学 Plane three-freedom precision positioning platform
CN101435690A (en) * 2008-12-03 2009-05-20 中国科学院合肥物质科学研究院 Strain type micro-nano-scale micro-nano displacement sensor
CN201680123U (en) * 2010-04-20 2010-12-22 郑福胜 Two-freedom-degree large-stroke high-speed high-precision positioning platform
CN102794664A (en) * 2012-07-17 2012-11-28 广东工业大学 Bridge-type flexible hinge based high-frequency ultra-precision machining lathe saddle driving platform
CN103672317A (en) * 2013-06-27 2014-03-26 江西理工大学 Accuracy-adjustable lamination-type space three-horizontal-moving-flexibility precision positioning platform

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008058306B4 (en) * 2008-11-17 2012-03-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Aerostatic table system for vacuum application

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5204712A (en) * 1991-03-08 1993-04-20 U.S. Philips Corp. Support device with a tiltable object table, and optical lithographic device provided with such a support device
CN1645518A (en) * 2004-12-28 2005-07-27 华南理工大学 Planar three freedom meek precisively positioning platform
CN2758935Y (en) * 2004-12-28 2006-02-15 华南理工大学 Plane three-freedom precision positioning platform
CN101435690A (en) * 2008-12-03 2009-05-20 中国科学院合肥物质科学研究院 Strain type micro-nano-scale micro-nano displacement sensor
CN201680123U (en) * 2010-04-20 2010-12-22 郑福胜 Two-freedom-degree large-stroke high-speed high-precision positioning platform
CN102794664A (en) * 2012-07-17 2012-11-28 广东工业大学 Bridge-type flexible hinge based high-frequency ultra-precision machining lathe saddle driving platform
CN103672317A (en) * 2013-06-27 2014-03-26 江西理工大学 Accuracy-adjustable lamination-type space three-horizontal-moving-flexibility precision positioning platform

Also Published As

Publication number Publication date
CN104110561A (en) 2014-10-22

Similar Documents

Publication Publication Date Title
CN104110561B (en) A kind of large-range plane three-freedom degree precision locating platform based on compliant mechanism
CN104088871B (en) A kind of precision positioning drive end pre-tightening apparatus
US10507560B2 (en) Apparatus movable by a coordinate measuring machine for positioning a measuring instrument with respect to a workpiece
CN104317218B (en) Accurate grand dynamic parallel positioning system and method under a kind of micro-nano operating environment
CN103543010B (en) A kind of high-speed guide screw and lead screw pair Integrated Checkout testing table
CN103353431B (en) In-situ indentation mechanical testing device based on tensile compression and fatigue combined load mode
CN101118377B (en) Air pressure semi-suspending two freedom degree common basal surface movement workstation
CN203337493U (en) In-site indentation mechanical testing device based on pulling-and-pressing and fatigue combined load mode
CN108962336A (en) A kind of two-dimensional parallel flexible micro platform based on Piezoelectric Driving
CN105006254B (en) Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification
CN101441106A (en) Four-freedom degree clamping device of laser vibration measurer
JP2020537151A (en) Coordinate positioning device
CN104467526B (en) Inertia stick-slip cross-scale motion platform capable of achieving unidirectional movement
CN101226121A (en) Precision charger for material nano metric bending mechanical properties test
CN107990859B (en) Micro-displacement sensor calibration device and application thereof
CN101567223A (en) Pneumatic semi-suspension two-freedom co-baseplane motion workbench with high speed and large stroke
CN102069201B (en) Two-degree-of-freedom dynamic error counteracting device for free-form surface ultra-precision turning
CN104362890B (en) Inertia stick-slip trans-scale precision movement platform capable of achieving bidirectional movement
US9109966B2 (en) Two dimension external force sensor
CN102608359B (en) Nanomanipulator
CN103575203B (en) A kind of plant leaf blade thickness nondestructive measurement instrument and measuring method of adjusting prepressing power
CN103680641B (en) A kind of precisely locating platform based on compliant structure six degree of freedom
CN101769731B (en) Gravity balance device and method of flexible coordinate measuring machine based on magnetic rheologic fluid
KR101340033B1 (en) 3 axes out-of-plane motion stage using flexure mechanism
CN100515324C (en) Dynamic pedal device of human body balance function testing system

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant