CN107990859B - Micro-displacement sensor calibration device and application thereof - Google Patents

Micro-displacement sensor calibration device and application thereof Download PDF

Info

Publication number
CN107990859B
CN107990859B CN201610957068.8A CN201610957068A CN107990859B CN 107990859 B CN107990859 B CN 107990859B CN 201610957068 A CN201610957068 A CN 201610957068A CN 107990859 B CN107990859 B CN 107990859B
Authority
CN
China
Prior art keywords
sensor
rod piece
side rod
calibration
calibration device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610957068.8A
Other languages
Chinese (zh)
Other versions
CN107990859A (en
Inventor
郭抗
葛川
陈华男
倪明阳
隋永新
杨怀江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Original Assignee
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun Institute of Optics Fine Mechanics and Physics of CAS filed Critical Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority to CN201610957068.8A priority Critical patent/CN107990859B/en
Publication of CN107990859A publication Critical patent/CN107990859A/en
Application granted granted Critical
Publication of CN107990859B publication Critical patent/CN107990859B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The invention relates to the technical field of high-precision displacement detection calibration, and particularly discloses a micro-displacement sensor calibration device and application thereof, wherein the calibration device comprises a calibrated sensor, a laser interferometer, a four-bar mechanism, a piezoelectric stack, a measured target and a fixed base; the four-bar mechanism comprises an upper side rod piece, a lower side rod piece, a left side rod piece and a right side rod piece, and the lower side rod piece is arranged on the fixed base; one end of the piezoelectric stack is connected with the lower side rod piece; the other end of the piezoelectric stack is connected with one of the upper side rod piece, the left side rod piece or the right side rod piece; the calibrated sensor is arranged on the upper side rod piece; the measured target object is a measuring target of the calibrated sensor and is arranged on the fixed base. The calibration device has simple structure and good expansibility, and can realize the calibration of the micro-displacement sensor with high frequency and high precision.

Description

Micro-displacement sensor calibration device and application thereof
Technical Field
The invention relates to the technical field of high-precision displacement detection and calibration, in particular to a micro-displacement sensor calibration device and application thereof.
Background
Micro-displacement sensors such as capacitive sensors, inductive sensors, eddy current sensors, grating sensors, capacitive grating sensors, laser displacement sensors, etc. have wide application in precision testing and control situations. In more and more occasions, micro-displacement sensors with nanometer-scale resolution and kilohertz-scale frequency response are required, such as microscope working tables, precision machining machine tool motion guide rails, semiconductor equipment scanning workpiece tables and the like. In these situations, the micro displacement sensor is a reference for testing and controlling, and is a basic guarantee for realizing the performance of the equipment, so that the micro displacement sensor generally needs to be calibrated before being installed on the equipment.
The chinese patent with application number CN201210313119.5 discloses a technical scheme of a calibration method and device for a laser displacement sensor, the device is driven by a stepping motor and a precision lead screw, and is guided by double guide rails, and a length grating ruler is used as a calibration reference. The structural mode of the device is not high, the higher motion frequency is difficult to achieve, the displacement resolution of the device is in a micron level, and the device is not suitable for the calibration of a micro-displacement sensor with a nano-level resolution and a kilohertz response frequency.
Chinese patent application No. CN201310675883.1 discloses a technical solution entitled "a calibration device for micro displacement sensor". Chinese patent application No. CN201310675863.4 discloses a technical solution entitled "calibration device for micro-displacement sensor based on single-degree-of-freedom flexible micro-motion adjustment mechanism". The two technical schemes are similar, a piezoelectric driver is adopted as a drive, a composite double-parallelogram structure is used for guiding, and a grating ruler is adopted as a calibration reference. The two devices have high motion precision, but in order to realize larger stroke, the device has low rigidity and low structural mode, and cannot realize high-frequency motion.
Chinese patent application No. CN201410290740.3 discloses a technical solution named "calibration apparatus for a flat capacitive displacement sensor". The device is driven by a piezoelectric driver, guided by a parallelogram structure and takes a single-frequency laser interferometer as a calibration reference. The device can realize higher precision, but the structural rigidity is low, and high-frequency calibration cannot be realized.
Chinese patent application No. CN201410314100.1 discloses a technical solution named "calibration apparatus for capacitance displacement sensor". The device adopts three piezoelectric drivers to drive, and three single-frequency laser interferometers are used as displacement feedback, and the parallelism between a measured capacitance sensor and a measured surface can be adjusted. The structural rigidity of the device is lower than 100Hz, and high-frequency calibration cannot be realized.
Chinese patent application No. CN201410711419.8 discloses a technical solution entitled "a dynamic calibration method for displacement sensor". The scheme adopts a motor to drive, a crank arm connecting rod sliding block mechanism provides reciprocating motion, and a non-contact displacement sensor is used as a calibration reference. The working frequency range of the device is within 30Hz, and high-precision and high-frequency calibration cannot be realized.
Chinese patent application No. CN201510085166.2 discloses a technical solution entitled "calibration apparatus for multi-degree-of-freedom differential capacitive displacement sensor". The device adopts a multi-degree-of-freedom micro-displacement platform to drive a movable polar plate of a differential capacitance displacement sensor to move, and adopts laser interference ranging as a calibration reference. The device can realize higher calibration precision, but cannot realize high-frequency calibration.
Therefore, it is an urgent problem to be solved in the art to develop a device capable of calibrating a high-precision and high-frequency micro-displacement sensor.
Disclosure of Invention
The invention provides a micro-displacement sensor calibration device, aiming at solving the problem of detection and calibration of a micro-displacement sensor with resolution ratio superior to 10nm under the high-frequency condition of more than 1 kHz.
In order to achieve the purpose, the invention adopts the following technical scheme:
on one hand, the invention provides a micro-displacement sensor calibration device which is characterized by comprising a calibrated sensor, a laser interferometer, a four-bar mechanism, a piezoelectric stack, a measured target and a fixed base; the four-bar mechanism comprises an upper side rod piece, a lower side rod piece, a left side rod piece and a right side rod piece, and the lower side rod piece is arranged on the fixed base; one end of the piezoelectric stack is connected with the lower side rod piece; the other end of the piezoelectric stack is connected with one of the upper side rod piece, the left side rod piece or the right side rod piece; the calibrated sensor is arranged on the upper side rod piece; the measured target is a measuring target of the calibrated sensor and is arranged on the fixed base.
Preferably, the four-bar mechanism is a parallelogram four-bar mechanism.
Preferably, the laser interferometer is a dual-frequency laser interferometer.
Preferably, the dual-frequency laser interferometer comprises a mirror, and the mirror is mounted on the upper side rod piece.
Preferably, the reflecting direction of the reflector is parallel to the length direction of the upper side rod piece; the measuring direction of the calibrated sensor is parallel to the length direction of the upper side rod piece.
Preferably, a connecting line between the center of the reflector and the center of the calibrated sensor is parallel to the length direction of the upper side rod piece.
Preferably, the fixed base and the housing of the calibrated sensor are made of the same material.
Preferably, the linear expansion coefficient of the material of the fixed base is approximately equal to the linear expansion coefficient of the material of the shell of the calibrated sensor.
Preferably, the natural frequency of the structure of the four-bar mechanism is above 1 kHz.
On the other hand, the invention provides an application of the micro-displacement sensor calibration device, and the calibration device is used for detecting and calibrating a capacitive sensor, an inductive sensor, an eddy current sensor, a grating sensor, a capacitive grating sensor or a laser displacement sensor.
The invention has the beneficial effects that: the device adopts a double-frequency laser interferometer as a calibration reference, adopts a piezoelectric stack as a drive, adopts a parallelogram four-bar mechanism, can realize nanoscale calibration precision and sub-nanoscale motion output, and simultaneously improves the structure mode to kilohertz level. The micro-displacement sensor calibration device provided by the invention can realize the calibration of the high-frequency high-precision micro-displacement sensor with nano-scale resolution and kilohertz response frequency, has a simple structure, can be provided with various mounting interfaces of the micro-displacement sensor on a mounting platform of a parallelogram four-bar mechanism, and has good expansibility.
Drawings
Fig. 1 is a schematic diagram of the connection between the piezoelectric stack and the right side bar of the parallelogram four-bar linkage in the calibration apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of the connection between the piezoelectric stack and the left side bar of the parallelogram four-bar linkage in the calibration device according to another embodiment of the present invention.
Fig. 3 is a schematic diagram of the connection between the piezoelectric stack and the upper side bar of the parallelogram four-bar linkage in the calibration device according to another embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a parallelogram four-bar linkage in the calibration device according to an embodiment of the invention.
Fig. 5 is a cross-sectional view of a pre-tensioned structure of a piezoelectric stack in a calibration device in accordance with an embodiment of the invention.
Fig. 6 is a partial structural schematic diagram of a calibration device according to an embodiment of the present invention.
Fig. 7 is a schematic structural diagram of a calibration apparatus according to an embodiment of the present invention.
Fig. 8 is a schematic structural diagram of a calibration apparatus according to another embodiment of the present invention.
Fig. 9 is a schematic structural diagram of a calibration device according to yet another embodiment of the present invention.
Reference numerals:
1. calibrated sensor 11, calibrated sensor mounting block 12 and calibrated sensor moving end
13. The fixed end 2 of the calibrated sensor, the dual-frequency laser interferometer 21 and the reflecting mirror
22. Mirror mount 23, interferometer 24, interferometer mount 25, and laser
26. Base 3, parallelogram four-bar mechanism 4, piezoelectric stack 41 and pre-tightening guide block
42. Pre-tightening wedge block 5, measured target block 6 and fixed base
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not to be construed as limiting the invention.
As shown in fig. 1 to 9, the present invention provides several different embodiments of calibration devices for micro-displacement sensors. The calibration device comprises a calibrated sensor 1, a reference sensor, a parallelogram four-bar mechanism 3, a piezoelectric stack 4, a measured target block (measured target) 5 and a fixed base 6.
The parallelogram four-bar mechanism 3 comprises an upper side rod piece, a lower side rod piece, a left side rod piece and a right side rod piece, the calibrated sensor 1 and the reference sensor are arranged on the upper side rod piece of the parallelogram four-bar mechanism 3, the lower side rod piece of the parallelogram four-bar mechanism 3 is connected with the fixed base 6, the measured target of the calibrated sensor 1 is a measured target block 5, and the measured target block 5 is connected with the fixed base 6.
In one embodiment, the piezoelectric stack 4 has one end connected to the lower side bar of the parallelogram four-bar linkage 3 and the other end connected to the right side bar of the parallelogram four-bar linkage 3 (as shown in fig. 1); in another embodiment, one end of the piezoelectric stack 4 is connected to the lower side bar of the parallelogram four-bar linkage 3, and the other end is connected to the left side bar of the parallelogram four-bar linkage 3 (as shown in fig. 2); in yet another embodiment, the piezoelectric stack 4 is connected at one end to the lower side bar of the parallelogram four-bar linkage 3 and at the other end to the upper side bar of the parallelogram four-bar linkage 3 (as shown in fig. 3).
The parallelogram four-bar mechanism 3 can move the upper side rod piece relative to the lower side rod piece in parallel under the pushing of the piezoelectric stack 4. If the piezoelectric stack 4 is connected to the upper side bar of the parallelogram four-bar linkage 3, the displacement of the upper side bar of the parallelogram four-bar linkage 3 will be equal to the output displacement of the piezoelectric stack. If the piezoelectric stack 4 is connected with the right side rod piece of the parallelogram four-bar mechanism 3 or the left side rod piece of the parallelogram four-bar mechanism 3, the output displacement of the piezoelectric stack can be amplified, and the displacement of the upper side rod piece of the parallelogram four-bar mechanism 3 is larger than the output displacement of the piezoelectric stack. After the upper side rod piece of the parallelogram four-bar mechanism 3 moves, the calibrated sensor 1 mounted on the upper side rod piece can be driven to synchronously move with the reference sensor, and the displacement values of the calibrated sensor 1 and the reference sensor are equal.
In the preferred embodiment, the reference sensor adopts a double-frequency laser interferometer 2, the sampling frequency can reach more than 10kHz, and the measurement resolution can reach sub-nanometer level. The piezoelectric stack 4 can be operated at a frequency of motion above 10 kHz. The structural mode of the parallelogram four-bar mechanism 3 can reach more than 1kHz, and the motion range is dozens of micrometers. Therefore, the measured value of the reference sensor is used as feedback to control the movement of the piezoelectric stack 4, so that the parallelogram four-bar mechanism 3 can realize the nano-scale movement precision under the movement frequency of 1 kHz. The parallelogram four-bar mechanism 3 continuously moves in a stepping way, and a plurality of groups of measured values can be measured by the reference sensor and the calibrated sensor 1. The measured values of the reference sensor and the calibrated sensor 1 are compared, the measured value of the reference sensor is used as a reference, the measured value of the calibrated sensor 1 is corrected, and the performance of the calibrated sensor 1 can be improved.
As shown in fig. 4 to 5, the piezoelectric stack 4 is pre-tensioned when being mounted on the parallelogram four-bar mechanism 3. The pre-tightening structure part is arranged on the lower side rod piece of the parallelogram four-bar mechanism 3. The screw in the pre-tightening structure is screwed downwards, the force on the screw is transmitted to the piezoelectric stack 4 through the pre-tightening guide block 41 and the pre-tightening wedge block 42, and the piezoelectric stack 4 can be applied with positive pressure through the pre-tightening wedge block 42. The transformation of the downward screwing force of the screw to the right positive pressure of the pre-tightening wedge block 42 is a wedge-shaped contact surface between the pre-tightening guide block 41 and the pre-tightening wedge block 42, and the included angle between the wedge-shaped contact surface and the vertical direction is about 1 degree.
In this embodiment, as shown in FIG. 6, the reference sensor employs a dual-frequency laser interferometer 2, and a mirror 21 in the dual-frequency laser interferometer 2 is attached to the upper side bar of the parallelogram four-bar linkage 3 through a mirror mount 22. The calibrated sensor 1 is a columnar capacitance sensor and is connected to the upper side rod piece of the parallelogram four-bar mechanism 3 through a calibrated sensor mounting block 11. The measuring target block 5 of the calibrated sensor 1 is connected to the fixed base 6. The central line of the calibrated sensor 1 and the central line of the reflector 21 are on the same horizontal line, so that the influence of the Abbe arm on the measurement can be eliminated. The material of the fixed base 6 is the same as that of the shell of the calibrated sensor 1, or the linear expansion coefficient of the material of the fixed base 6 is approximately equal to that of the shell of the calibrated sensor 1, so as to reduce the influence of the temperature on the measurement.
According to the micro-displacement sensor calibration device provided by the invention, the double-frequency laser interferometer is used as a calibration reference, the piezoelectric stack is used as a drive, and the parallelogram four-bar mechanism is adopted, so that the nano-scale calibration precision and the sub-nano-scale motion output can be realized, and the structure mode is improved to the kilohertz level. The micro-displacement sensor calibration device provided by the invention can realize the calibration of the high-frequency high-precision micro-displacement sensor with nano-resolution and kilohertz response frequency, has a simple structure, can be provided with various mounting interfaces of the micro-displacement sensor on a mounting platform of a parallelogram four-bar mechanism, and has good expansibility.
The calibration device provided by the invention can be used for detecting and calibrating various sensors such as a capacitive sensor, an inductive sensor, an eddy current sensor, a grating sensor, a capacitive grating sensor or a laser displacement sensor. The present invention cannot be exhaustive for each application, and the following description will be given by taking the detection calibration for the pillar-shaped capacitive sensor, the chip-shaped capacitive sensor, and the grating-type sensor as an example.
Fig. 7 shows an embodiment of the calibration device provided by the present invention for calibrating a cylindrical capacitive sensor. The fixed base 6 is connected to a base 26, the interferometer 23 in the dual-frequency laser interferometer 2 is connected to the base 26 via an interferometer mounting base 24, and the laser 25 in the dual-frequency laser interferometer 2 is connected to the base 26. In order to reduce the environmental impact on the measurement, the spacing between the interferometer 23 and the mirror 21 should be as small as possible. During calibration, the piezoelectric stack 4 pushes the parallelogram four-bar mechanism 3 to make continuous stepping motion, and the dual-frequency laser interferometer 2 and the cylindrical capacitance sensor (calibrated sensor) 1 measure the motion displacement values of a plurality of groups of parallelogram four-bar mechanisms 3 simultaneously. The measured values of the dual-frequency laser interferometer 2 and the columnar capacitive sensor 1 are compared, the measured value of the columnar capacitive sensor 1 is corrected by taking the measured value of the dual-frequency laser interferometer 2 as a reference, the performance of the columnar capacitive sensor 1 can be improved, and high-frequency and high-precision calibration of the columnar capacitive sensor 1 is achieved. Fig. 8 shows an embodiment of the calibration device provided by the present invention for calibrating a chip capacitive sensor. The arrangement of the device is the same as that of the device when the columnar capacitive sensor is calibrated, and the columnar capacitive sensor is replaced by the flaky capacitive sensor only by utilizing the mounting interface of the flaky capacitive sensor on the calibrated sensor mounting block 11, and the working distance from the distance between the calibrated sensor 1 and the measured target block 5 to the calibrated sensor 1 is adjusted. During calibration, the piezoelectric stack 4 pushes the parallelogram four-bar mechanism 3 to make continuous stepping motion, and the dual-frequency laser interferometer 2 and the chip capacitance sensor (calibrated sensor) 1 measure the motion displacement values of a plurality of groups of parallelogram four-bar mechanisms 3 simultaneously. The measured values of the double-frequency laser interferometer 2 and the chip capacitive sensor 1 are compared, the measured value of the chip capacitive sensor 1 is corrected by taking the measured value of the double-frequency laser interferometer 2 as a reference, the performance of the chip capacitive sensor 1 can be improved, and high-frequency and high-precision calibration of the chip capacitive sensor 1 is achieved.
Fig. 9 shows an embodiment of the present invention when the calibration device is used to calibrate a grating sensor (grating ruler). Unlike a capacitive sensor, a grating ruler comprises two parts, namely a grating ruler and a reading head. In order to reduce the influence of the cable on the reading head on the movement, during calibration, the reading head is fixed to serve as a fixed end 13 of a calibrated sensor, and a grating ruler is installed on an upper side rod of the parallelogram four-bar mechanism 3 to serve as a moving end 12 of the calibrated sensor.
The fixed end 13 of the calibrated sensor is connected with the fixed base 6 through the measured object block 5, and the moving end 12 of the calibrated sensor is connected with the upper side rod piece of the parallelogram four-bar mechanism 3 through the calibrated sensor mounting block 11. The height of the calibrated sensor mounting block 11 is reasonably set, so that the upper surface of the grating ruler and the central line of the reflector 21 are in the same horizontal plane. During calibration, the piezoelectric stack 4 pushes the parallelogram four-bar mechanism 3 to make continuous stepping motion, and the dual-frequency laser interferometer 2 and the grating sensor (calibrated sensor) 1 measure the motion displacement values of a plurality of groups of parallelogram four-bar mechanisms 3 simultaneously. The measured values of the dual-frequency laser interferometer 2 and the grating sensor 1 are compared, the measured value of the grating sensor 1 is corrected by taking the measured value of the dual-frequency laser interferometer 2 as a reference, the performance of the grating sensor 1 can be improved, and high-frequency and high-precision calibration of the grating sensor 1 is realized.
The above-described embodiments of the present invention should not be construed as limiting the scope of the present invention. Any other corresponding changes and modifications made according to the technical idea of the present invention should be included in the protection scope of the claims of the present invention.

Claims (10)

1. A micro-displacement sensor calibration device is characterized by comprising a calibrated sensor, a reference sensor, a four-bar mechanism, a piezoelectric stack, a measured target and a fixed base;
the four-bar mechanism comprises an upper side rod piece, a lower side rod piece, a left side rod piece and a right side rod piece, and the lower side rod piece is arranged on the fixed base;
one end of the piezoelectric stack is connected with the lower side rod piece; the other end of the piezoelectric stack is connected with one of the upper side rod piece, the left side rod piece or the right side rod piece;
the calibrated sensor and the reference sensor are arranged on the upper side rod piece;
the measured target is a measuring target of the calibrated sensor and is arranged on the fixed base.
2. The calibration device according to claim 1, wherein the four-bar mechanism is a parallelogram four-bar mechanism.
3. The calibration apparatus according to claim 1, wherein the reference sensor is a dual-frequency laser interferometer.
4. The calibration apparatus according to claim 3, wherein the dual-frequency laser interferometer comprises a mirror, the mirror being mounted on the upper rod.
5. The calibration device as claimed in claim 4, wherein the reflection direction of the reflector is parallel to the length direction of the upper rod; the measuring direction of the calibrated sensor is parallel to the length direction of the upper side rod piece.
6. The calibration device according to claim 4, wherein a line connecting the center of the reflector and the center of the sensor to be calibrated is parallel to the length direction of the upper rod.
7. The calibration device as claimed in claim 1, wherein the fixing base and the housing of the sensor to be calibrated are made of the same material.
8. The calibration apparatus according to claim 1, wherein the linear expansion coefficient of the material of the fixing base is approximately equal to the linear expansion coefficient of the material of the housing of the sensor to be calibrated.
9. The calibration device according to claim 1, wherein the natural frequency of the four-bar mechanism is above 1 kHz.
10. Use of a calibration device according to any one of claims 1-9, wherein the calibration device is used for calibration of a capacitive sensor, an inductive sensor, an eddy current sensor, a grating sensor, a capacitive grating sensor or a laser displacement sensor.
CN201610957068.8A 2016-10-27 2016-10-27 Micro-displacement sensor calibration device and application thereof Active CN107990859B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610957068.8A CN107990859B (en) 2016-10-27 2016-10-27 Micro-displacement sensor calibration device and application thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610957068.8A CN107990859B (en) 2016-10-27 2016-10-27 Micro-displacement sensor calibration device and application thereof

Publications (2)

Publication Number Publication Date
CN107990859A CN107990859A (en) 2018-05-04
CN107990859B true CN107990859B (en) 2021-04-13

Family

ID=62028535

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610957068.8A Active CN107990859B (en) 2016-10-27 2016-10-27 Micro-displacement sensor calibration device and application thereof

Country Status (1)

Country Link
CN (1) CN107990859B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110328666A (en) * 2019-07-16 2019-10-15 汕头大学 Identifying system and material mechanism for picking
CN111692976B (en) * 2020-06-08 2022-09-09 中国科学院合肥物质科学研究院 Digital display length reference device with temperature deformation self-compensation function
CN112378326B (en) * 2020-10-10 2022-03-15 中国科学院苏州生物医学工程技术研究所 Single-end type eddy current micro-displacement sensor calibration device and method, computer equipment and storage medium
CN112729087B (en) * 2020-12-16 2022-03-22 中国科学院苏州生物医学工程技术研究所 Differential eddy current micro-displacement sensor calibration device, method, computer equipment and storage medium
CN114252002B (en) * 2022-02-25 2022-06-21 国科大杭州高等研究院 Sub-nanometer level high-precision micro-displacement device capable of being calibrated
CN116428955A (en) * 2023-03-14 2023-07-14 中国科学院深圳先进技术研究院 Three-degree-of-freedom Hall displacement sensor calibration system and method

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0599582A2 (en) * 1992-11-20 1994-06-01 Topometrix Scanning apparatus linearization and calibration system
WO1999067652A1 (en) * 1998-06-25 1999-12-29 Lci/Smartpen, N.V. Systems and methods for measuring forces using piezoelectric transducers
CN201225999Y (en) * 2008-12-09 2009-04-22 中国人民解放军国防科学技术大学 Connection device for measuring electromechanical property of piezoelectric ceramic stack
CN201247077Y (en) * 2008-06-27 2009-05-27 东莞市敏达测控技术有限公司 Calibration instrument for testing linear sensor
CN201306996Y (en) * 2008-10-07 2009-09-09 无锡康华钢构安全监测科技有限公司 High-precision micro-displacement detection device for calibrating mechanical deformation variables
CN101769814A (en) * 2008-12-26 2010-07-07 中国航空工业第一集团公司北京长城计量测试技术研究所 Dynamic pressure calibrator based on piezoelectric ceramic technology
CN201697936U (en) * 2010-05-21 2011-01-05 中国计量科学研究院 Piezoelectric high-frequency vibration table
CN202305330U (en) * 2011-10-11 2012-07-04 吉林大学 Mechanics testing platform for in-situ high frequency fatigue materials under scanning electron microscope based on stretching/compressing mode
CN103697819A (en) * 2013-12-12 2014-04-02 中国科学院长春光学精密机械与物理研究所 Calibration device of micro-displacement sensor
CN103759814A (en) * 2014-01-25 2014-04-30 浙江大学 Method for multi-frequency hybrid calibration of vibration measuring sensor
CN104201931A (en) * 2014-09-28 2014-12-10 郑州轻工业学院 Micro-displacement driver based on piezoelectric stack
CN205091357U (en) * 2015-08-13 2016-03-16 福建宁德核电有限公司 Pick up calibration shaking platform and transducer sensitivity calibration system
CN105606847A (en) * 2016-03-01 2016-05-25 清华大学 Vibration station for transverse sensitivity calibration of piezoelectric acceleration sensor

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0599582A2 (en) * 1992-11-20 1994-06-01 Topometrix Scanning apparatus linearization and calibration system
WO1999067652A1 (en) * 1998-06-25 1999-12-29 Lci/Smartpen, N.V. Systems and methods for measuring forces using piezoelectric transducers
CN201247077Y (en) * 2008-06-27 2009-05-27 东莞市敏达测控技术有限公司 Calibration instrument for testing linear sensor
CN201306996Y (en) * 2008-10-07 2009-09-09 无锡康华钢构安全监测科技有限公司 High-precision micro-displacement detection device for calibrating mechanical deformation variables
CN201225999Y (en) * 2008-12-09 2009-04-22 中国人民解放军国防科学技术大学 Connection device for measuring electromechanical property of piezoelectric ceramic stack
CN101769814A (en) * 2008-12-26 2010-07-07 中国航空工业第一集团公司北京长城计量测试技术研究所 Dynamic pressure calibrator based on piezoelectric ceramic technology
CN201697936U (en) * 2010-05-21 2011-01-05 中国计量科学研究院 Piezoelectric high-frequency vibration table
CN202305330U (en) * 2011-10-11 2012-07-04 吉林大学 Mechanics testing platform for in-situ high frequency fatigue materials under scanning electron microscope based on stretching/compressing mode
CN103697819A (en) * 2013-12-12 2014-04-02 中国科学院长春光学精密机械与物理研究所 Calibration device of micro-displacement sensor
CN103759814A (en) * 2014-01-25 2014-04-30 浙江大学 Method for multi-frequency hybrid calibration of vibration measuring sensor
CN104201931A (en) * 2014-09-28 2014-12-10 郑州轻工业学院 Micro-displacement driver based on piezoelectric stack
CN205091357U (en) * 2015-08-13 2016-03-16 福建宁德核电有限公司 Pick up calibration shaking platform and transducer sensitivity calibration system
CN105606847A (en) * 2016-03-01 2016-05-25 清华大学 Vibration station for transverse sensitivity calibration of piezoelectric acceleration sensor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
侧壁压阻式力传感器的研制与标定;陈涛等;《纳米技术与精密工程》;20100531;第8卷(第3期);全文 *

Also Published As

Publication number Publication date
CN107990859A (en) 2018-05-04

Similar Documents

Publication Publication Date Title
CN107990859B (en) Micro-displacement sensor calibration device and application thereof
USRE45211E1 (en) Surface sensing device with optical sensor
US8281648B2 (en) Material testing apparatus with non-contact sensor
CN100350213C (en) Probe for high speed scanning
CN100432618C (en) Two-dimensional displacement sensor and applied large-measuring range surface figure measuring device
CN107393599B (en) Integrate the quick deflection platform of two dimension and method of sensing unit and confinement element
CN101059381A (en) Piezoelectric film cantilever beam type micro-force sensor micro-force loading device
US6571589B1 (en) Bending machine and its operation method
CN104730293A (en) Calibration device and calibration method of white light interference atomic-power scanning probe
CN115388771A (en) Ultra-precise form and position error measuring instrument based on reflector measuring head integrated design
KR101699111B1 (en) Scanning probe microscope having support stage incorporating a kinematic flexure arrangement
CN103884270A (en) Device for measuring two-dimensional micro angle generated in installation of circular grating and method thereof
CN211855257U (en) Multifunctional detection device based on linear displacement sensor
CN102878933A (en) Comparator based on white light interference positioning principle and detection method thereof
CN106441196B (en) A kind of shaft hole matching gap measuring apparatus and method based on frictional force
CN209727045U (en) Piezoelectric ceramic d15 parameter measuring device based on spectrum confocal
CN111457875A (en) Multifunctional detection method and device based on linear displacement sensor
CN102735880B (en) Scanning probe measuring system and method for large-range micro-nano structure
RU2306621C1 (en) Two-coordinate micro-positioner
CN201016702Y (en) Bidimensional displacement transducer and big-range surface morphology measuring apparatus employing the same
CN115388772A (en) Ultra-precise form and position error measuring instrument with cross motion surface and dynamic state conforming to Abbe principle
CN204988208U (en) Big stroke screw thread measuring apparatu of high accuracy
CN212379431U (en) Measuring device based on atomic force microscope
CN109870107B (en) Device for mutual calibration among multiple nano displacement sensors
CN110285778B (en) Detection device of curved surface type mobile platform, working method and cutting method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant