CN104084849B - The magnetic rheological polishing method of deliquescent crystal - Google Patents

The magnetic rheological polishing method of deliquescent crystal Download PDF

Info

Publication number
CN104084849B
CN104084849B CN201410288335.8A CN201410288335A CN104084849B CN 104084849 B CN104084849 B CN 104084849B CN 201410288335 A CN201410288335 A CN 201410288335A CN 104084849 B CN104084849 B CN 104084849B
Authority
CN
China
Prior art keywords
water
crystal
polishing method
polishing liquid
mrf
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201410288335.8A
Other languages
Chinese (zh)
Other versions
CN104084849A (en
Inventor
戴一帆
胡皓
陈少山
石峰
彭小强
关朝亮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National University of Defense Technology
Original Assignee
National University of Defense Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National University of Defense Technology filed Critical National University of Defense Technology
Priority to CN201410288335.8A priority Critical patent/CN104084849B/en
Publication of CN104084849A publication Critical patent/CN104084849A/en
Application granted granted Critical
Publication of CN104084849B publication Critical patent/CN104084849B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/005Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The invention discloses the magnetic rheological polishing method of a kind of deliquescent crystal, prepare non-water-base magnetic rheology polishing liquid including (1); (2) non-water-base magnetic rheology polishing liquid is added in magnetorheological lathe blood circulation and perform twice at MRF processing; After (3) twice MRF machine, adopting aromatic hydrocarbon that gained deliquescent crystal is carried out rapidly, the MRF completing deliquescent crystal processes. The method technological process of the present invention is simple, workable, can process and meet high light optical system to the high accuracy of the high, normal, basic each band requirement of crystal, ultra-smooth deliquescent crystal.

Description

The magnetic rheological polishing method of deliquescent crystal
Technical field
The present invention relates to a kind of magnetic rheological polishing method, be specifically related to the magnetic rheological polishing method of a kind of deliquescent crystal, it is achieved the polishing of deliquescent crystal element.
Background technology
Technique of Magnetorheological Finishing (MRF) is a kind of novel optical manufacturing method, and it utilizes Magnetorheologicai polishing liquid rheological characteristic in magnetic field that workpiece is polished, it may be achieved definitiveness is removed and Subnano-class surface roughness.
In the processing of current MRF, the material of processing is mainly the optical materials such as fused quartz, pottery and carborundum, these materials do not have deliquescent behaviours, therefore polishing uses water-base magnetic rheology polishing liquid, its base load liquid is water, and material is carried out shear removal by the polishing powder that the removal of material relies primarily in Magnetorheologicai polishing liquid. but, for deliquescent crystal such as KDP crystalline material, it is not appropriate for utilizing this water-base magnetic rheology polishing liquid to be processed: there is the characteristics such as quality soft (Mohs' hardness about 2.4), fragility deliquescence high, easy and easy anneal crack on the one hand due to this crystalloid, traditional Magnetorheologicai polishing liquid is utilized to carry out shear removal, it is easy to produce to be difficult to clean after the carbonyl iron dust in obvious cut, Magnetorheologicai polishing liquid easily embeds plane of crystal and embeds at plane of crystal, on the other hand, the water capacity in Magnetorheologicai polishing liquid easily causes the atomization of crystal, for easy deliquescence crystalloid material, once there is surface deliquescence, it will Surface Quality produces irreversible destruction. this series of problems causes that current MRF technique is inapplicable on processing deliquescent crystal such as KDP/DKDP crystal, and currently the KDP crystal photoelement of high surface figure accuracy is had urgent demand by high light optical system, simultaneously, each index of KDP crystal is included by high light optical system: bore, surface figure accuracy, gradient error, PSD1, PSD2, surface roughness has high requirement, ultraprecise Diamond Cutting temporarily cannot process the KDP crystal photoelement meeting all these index requests for various reasons, therefore, need to study new processing technique to solve these technical problems.
Summary of the invention
The technical problem to be solved in the present invention is to overcome the deficiencies in the prior art, it is provided that a kind of technological process is simple, workable, can process the magnetic rheological polishing method meeting high light optical system to the high accuracy of the high, normal, basic each band requirement of crystal, ultra-smooth deliquescent crystal.
For solving above-mentioned technical problem, the technical solution used in the present invention is the magnetic rheological polishing method of a kind of deliquescent crystal, comprises the following steps:
(1) preparation non-water-base magnetic rheology polishing liquid, described non-water-base magnetic rheology polishing liquid includes alkoxyl alcohol, magnetosensitive granule, surfactant and deionized water;
(2) non-water-base magnetic rheology polishing liquid is added in magnetorheological lathe blood circulation, deliquescent crystal to be processed is carried out first time MRF processing (when generally processing is to plane of crystal close to aimed at precision stopping), after aromatic hydrocarbon cleans, then carry out second time MRF processing;
(3) after second time MRF machines, adopting rapidly aromatic hydrocarbon that gained deliquescent crystal is carried out, the MRF completing deliquescent crystal processes. The surface roughness of the deliquescent crystal finally given is typically smaller than 1.5nm.
In above-mentioned magnetic rheological polishing method, preferably, in described step (2), the technological parameter of described first time MRF processing is: the relative velocity (can be controlled by the rotating speed of buff wheel) of buff wheel and deliquescent crystal to be processed is 1m/s~3m/s, the maximum magnetic field strength of machining area is 210mT~230mT, pressure is 0.1mm~0.3mm deeply, and the flow of non-water-base magnetic rheology polishing liquid is 100L/h~130L/h.
In above-mentioned magnetic rheological polishing method, preferably, in described step (2), the technological parameter of described second time MRF processing is: the relative velocity of buff wheel and deliquescent crystal to be processed is 1m/s~3m/s, the maximum magnetic field strength of machining area is 210mT~230mT, pressure is 0.1mm~0.3mm deeply, and the flow of non-water-base magnetic rheology polishing liquid is 100L/h~130L/h.
In above-mentioned magnetic rheological polishing method, it is preferred that described non-water-base magnetic rheology polishing liquid is obtained by following methods preparation:
A () formula according to non-water-base magnetic rheology polishing liquid, weighs alkoxyl alcohol, magnetosensitive granule, surfactant and deionized water, in parts by weight respectively, alkoxyl alcohol is 30%~60%, magnetosensitive granule is 30%~60%, and surfactant is 3%~8%, and deionized water is 3%~6%;
B alkoxyl alcohol is placed in a container tank by (), first heat to 65 DEG C~75 DEG C and be always held at this temperature, is subsequently adding surfactant, blended formation complex liquid, then adds magnetosensitive granule in complex liquid, after agitated, obtains mixed liquor;
C mixed liquor is poured in ball grinder by (), with the rotating speed ball milling 2h~5h of 150r/min~250r/min, be subsequently adding deionized water then the rotating speed ball milling 2h~5h with 50r/min~100r/min, obtain non-water-base magnetic rheology polishing liquid.
In above-mentioned magnetic rheological polishing method, it is preferred that the described non-water-base magnetic rheology polishing liquid viscosity when 20 DEG C is 0.35Pa s~0.55Pa s.
In above-mentioned magnetic rheological polishing method, it is preferred that described alkoxyl alcohol includes diethylene glycol monobutyl ether or ethylene glycol monoethyl ether.
In above-mentioned magnetic rheological polishing method, it is preferred that described magnetosensitive granule is carbonyl iron dust; The granularity of described carbonyl iron dust is 1 μm~10 μm, and containing Fe purity more than 97%, relative quality factor is more than 1.75, and Effective permeability is more than 3.
In above-mentioned magnetic rheological polishing method, it is preferred that described surfactant is one or more in phosphate ester, fatty acid, Span, tween.
In above-mentioned magnetic rheological polishing method, it is preferred that described surfactant is the mixture of fatty acid, Span and tween, described fatty acid is stearic acid; Described stearic acid, Span, tween mass ratio be 1: 1: 1.
In above-mentioned magnetic rheological polishing method, it is preferred that in described step (b), the speed of described stirring is 20r/min~60r/min, and the time of described stirring is 10min~30min.
In above-mentioned magnetic rheological polishing method, it is preferred that in described step (c), the mass ratio of the mixed liquor in described ball grinder and steel ball is 8~12: 1, and the diameter of described steel ball is 2mm~4mm.
In the present invention, needs are processed according to reality, the technological parameter of first time MRF processing and the desirable identical value of technological parameter of second time MRF processing, also desirable different value, the process time of first time MRF processing and second time MRF processing can determine according to processing stage needed for deliquescent crystal, and twice processing intermediate demand sets apart and do simple cleaning.
In the present invention, twice MRF adds the air humidity in man-hour generally 45%~55%.
In the present invention, there is the residual of magnetic flow liquid in the plane of crystal after polishing, need after polishing to adopt rapidly aromatic hydrocarbon to clean, the general hardness of deliquescent crystal is low, it is easy to cut occur, in the process of cleaning, add appropriate aromatic hydrocarbon to plane of crystal, use absorbent cotton wiping 2 to 3 times gently, can clean up, obtain the crystal of the high accuracy ultra-smooth of the clean no marking in surface.
Compared with prior art, it is an advantage of the current invention that:
1. the non-water-base magnetic rheology liquid in the present invention has that good rheological property, zero magnetic field viscosity is low, excellent in stability, does not precipitate and non-caking feature, and its main component is magnetosensitive granule, surfactant, base load liquid, deionized water. In order to meet the requirement of MRF, magnetosensitive granule must have the property that pcrmeability is high, magnetic hysteresis loss is few, purity is high, and material will not be produced removal effect by the shape of magnetosensitive granule in polishing process. The magnetosensitive granule of the present invention has selected carbonyl iron dust, the granularity of single microgranule of carbonyl iron dust to be 1 μm~10 μm, is more than 97% containing Fe purity, and relative quality factor is more than 1.75, and Effective permeability is more than 3, it is possible to meet the requirement to magnetosensitive granule. Surfactant is generally made up of nonpolar oleophilic moiety and polar hydrophilic part, and the present invention utilizes the chemical action of surfactant, makes hydrophilic magnetosensitive granule can be uniformly dispersed in oil loving base load liquid. The base load liquid of the present invention adopts stable chemical performance, alkoxyl alcohol non-volatile, avirulent, magnetorheological processing is processed as definitiveness, blood circulation is needed to keep Long-term stability, since it is desired that each component chemical stable in properties of magnetic flow liquid, and between each component, there is not chemical reaction, alkoxyl alcohol stable chemical nature, chemical reaction is there is not with the crystal in the various compositions of magnetic flow liquid and polishing, meanwhile, alkoxyl alcohol avirulence, it is simple to process operation.
2. the magnetic rheological polishing method technological process of the present invention is simple, workable, can process the high accuracy ultra-smooth deliquescent crystal optical element meeting high light optical system to the high, normal, basic each band requirement of crystal. This magnetic rheological polishing method have employed non-water-base magnetic rheology polishing liquid, when polishing deliquescent crystal, due to the quality of deliquescent crystal soft (Mohs' hardness 2.4), the embedding and the surface that easily cause iron powder during polishing produce cut, the dissolution utilizing hydrone in non-water-base magnetic rheology polishing liquid replaces traditional shearing force to realize the removal of material, crystal pro cessing in conjunction with the definitiveness correction of the flank shape technology realization high accuracy ultra-smooth of magnetorheological processing, carbonyl iron dust can be prevented effectively from and embed the surface of crystal under the effect of the pressure, also be avoided that cut occurs in surface simultaneously.Meeting the water capacity due to deliquescent crystal and surface atomizing easily occur, the water content in Magnetorheologicai polishing liquid needs accurately to control. in the present invention, the water content of non-water-base magnetic rheology polishing liquid is relatively low, in polishing process, owing to Magnetorheologicai polishing liquid is constantly in the state of circulating, will soon be pulled away with the moisture of crystal contact, it is to avoid the atomization of plane of crystal. water content in Magnetorheologicai polishing liquid is very low, dissolve the efficiency removed also relatively low, when processing bigbore crystal, if efficiency is on the low side, process time is just long, therefore, the present invention can pass through to control different machined parameters in preliminary working (first time polishing) with later stage high accuracy processing (second time polishing), the parameter that initial stage processing service efficiency is higher, this can cause that plane of crystal quality has slight decline, in precision close to after target call, use low removal efficiency, improve the surface quality of crystal, thus process time can be avoided long while ensureing machining accuracy.
3. present invention deliquescent crystal surface after MRF has Magnetorheologicai polishing liquid residual, under the microscope it can be seen that due to the residual of iron powder, plane of crystal has substantial amounts of " pore ", and subregion presents dusky a piece of, it is therefore desirable to reasonably abluent and cleaning. General abluent, such as ethanol is owing to having hydrophilic, absorbing the hydrone in air, cause the atomization on deliquescent crystal surface, the present invention adopts volatile aromatic hydrocarbon as abluent, due to aromatic hydrocarbon stable chemical nature, with crystal generation chemical reaction, volatile will not absorb water meanwhile, ensure that the plane of crystal after not destroying polishing, and effectively clean the pollutant of plane of crystal. Common napkin is easy to clash obvious cut at plane of crystal, the present invention can the high-quality lens paper of adapted, constant temperature, low humidity environment under, achieve the surface clean of deliquescent crystal after polishing, eliminate the impurity component such as Magnetorheologicai polishing liquid of residual, obtain the deliquescent crystal of surface no marking iron powder residual.
Accompanying drawing explanation
Fig. 1 is the photo that KDP crystal carries out in the embodiment of the present invention MRF processing.
Fig. 2 is the primary face shape of KDP crystal before magnetorheological correction of the flank shape in the embodiment of the present invention. Adopt the non-water-base magnetic rheology polishing liquid in the present invention to make a call to one on KDP crystal every 1 hour and remove speckle, utilize the result that wavefront interferometer measurement obtains, PV represents surface figure accuracy peak-to-valley value, rms represents the mean square error of surface figure accuracy, Power represents spherical aberration, and wave represents wavelength X (λ=632.8nm).
Fig. 3 is the initial surface roughness of KDP crystal before magnetorheological correction of the flank shape in the embodiment of the present invention. Wherein, PV represents surface roughness peak-to-valley value, and rms represents the mean square error of surface roughness, and Ra represents the profile arithmetic average error of surface roughness.
Fig. 4 is the face shape of KDP crystal after first time MRF processing in the embodiment of the present invention.
Fig. 5 is the surface roughness of KDP crystal after first time MRF processing in the embodiment of the present invention.
Fig. 6 is the face shape of KDP crystal after the processing of second time MRF in the embodiment of the present invention.
Fig. 7 is the surface roughness of KDP crystal after the processing of second time MRF in the embodiment of the present invention.
Fig. 8 is gained KDP plane of crystal microphotograph before cleaning after the processing of twice MRF in the embodiment of the present invention.
Fig. 9 is gained KDP plane of crystal microphotograph after cleaning after the processing of twice MRF in the embodiment of the present invention.
Detailed description of the invention
Below in conjunction with Figure of description and concrete preferred embodiment, the invention will be further described, but protection domain not thereby limiting the invention.
Embodiment:
A kind of magnetic rheological polishing method of the deliquescent crystal of the present invention, processing object is the square KDP crystal of one piece of 47mm × 47mm, primary face shape is the surface after ultra-precise cutting, initial surface figure accuracy is 1.481 λ (PV) (λ=632.8nm), surface no marking, surface roughness is 1.58nm(RMS). This magnetic rheological polishing method comprises the following steps:
(1) preparation non-water-base magnetic rheology polishing liquid, in parts by weight, this non-water-base magnetic rheology polishing liquid include 31% diethylene glycol monobutyl ether (477g, 500ml), the carbonyl iron dust (900g) of 59%, the surfactant (75g) of 5% and 5% deionized water (75g, 75ml) composition. Wherein, the diethylene glycol monobutyl ether viscosity when 20 DEG C is 6.49mPa s; The granularity of carbonyl iron dust is mainly at 1 μm~10 μ m, and mean diameter is 5 μm, and containing Fe purity more than 97%, relative quality factor is more than 1.75, and Effective permeability is more than 3, and this carbonyl iron dust can be commercially available in market; Surfactant is the mixture of stearic acid, Span 60 and polysorbate60, and the mass ratio of three is 1: 1: 1. This non-water-base magnetic rheology polishing liquid viscosity when 20 DEG C is 0.5Pa s.
The preparation method of the non-water-base magnetic rheology polishing liquid of the present embodiment comprises the following steps:
A () formula according to above-mentioned non-water-base magnetic rheology polishing liquid, weighs diethylene glycol monobutyl ether base load liquid 500ml(477g), magnetosensitive granule carbonyl iron dust 900g, stearic acid 25g, Span 60 is 25g, and polysorbate60 is 25g, deionized water 75ml(75g).
B diethylene glycol monobutyl ether (alkoxyl alcohol) is placed in the container tank of stainless steel by (), it is heated uniformly to 70 DEG C and is always held at this temperature, it is subsequently adding the surfactant configured, it is mixed to form complex liquid, adding in complex liquid by carbonyl iron dust again, stir 20min with mechanical agitator, rotating speed is 30r/min, obtaining mixed liquor, now the temperature of this mixed liquor is still 70 DEG C.
C above-mentioned mixed liquor is poured in ball grinder by (), put into ball milling steel ball according to the ratio that steel ball (diameter 2mm) mass ratio is 10: 1 in mixed liquor and ball grinder, ball sealer grinding jar, and ball mill is with the rotating speed ball milling 3 hours of 200r/min; Then opening ball grinder, add 75ml deionized water, stir by stirring rod, ball sealer grinding jar, ball mill, with the rotating speed ball milling 2 hours of 100r/min, after ball milling completes, takes out ball grinder, separates steel ball, obtain non-water-base magnetic rheology polishing liquid.
(2) non-water-base magnetic rheology polishing liquid step (1) prepared adds in conventional magnetorheological lathe blood circulation, as shown in Figure 1, KDP crystal is performed twice at taste stream and becomes polishing (air humidity is 45%): during twice polishing, the relative velocity of buff wheel and KDP crystal is 1.5m/s, the maximum magnetic field strength of machining area is 230mT, the flow of non-water-base magnetic rheology polishing liquid is 130L/h, the deep respectively 0.2mm of the pressure of twice polishing, 0.15mm, process time is 50min respectively, 34min, KDP crystal is cleaned with dimethylbenzene after first time polishing, carry out second time polishing again, processing through twice MRF, after processing, the face shape of KDP crystal converges to 0.494 λ (PV), and surface roughness is 0.99nm(RMS).
Fig. 2,4,6 are the surface figure accuracy of initial, the MRF KDP crystal once, after MRF twice respectively, Fig. 3,5,7 are the surface roughness of initial, the MRF KDP crystal once, after MRF twice respectively, from result, through twice MRF correction of the flank shape, the surface figure accuracy of KDP crystal has converged to 0.494 λ from 1.481 λ, surface roughness rises to 0.99nm, surface figure accuracy and surface quality from 1.58nm and is all largely increased. Fig. 8,9 respectively be clean before and after surface quality, from result, through cleaning, the clean no marking of plane of crystal, it is achieved that high accuracy ultra-smooth KDP crystal pro cessing.
After (3) twice MRF machine, there is the residual of Magnetorheologicai polishing liquid in KDP plane of crystal, as shown in Figure 8, under the microscope, surface is unclean, present a part of dusky a piece of and part " pore ", after the cleaning of dimethylbenzene, use absorbent cotton wiping 2 times gently, can clean up, as it is shown in figure 9, KDP plane of crystal iron powder embeds, no marking, obtain intended high accuracy ultra-smooth no marking KDP crystal.
The above is only the preferred embodiment of the present invention, and protection scope of the present invention is not limited merely to above-described embodiment. All technical schemes belonged under thinking of the present invention belong to protection scope of the present invention. Iting is noted that for those skilled in the art, improvements and modifications under the premise without departing from the principles of the invention, these improvements and modifications also should be regarded as protection scope of the present invention.

Claims (10)

1. a magnetic rheological polishing method for deliquescent crystal, comprises the following steps:
(1) preparation non-water-base magnetic rheology polishing liquid, described non-water-base magnetic rheology polishing liquid includes alkoxyl alcohol, magnetosensitive granule, surfactant and deionized water, in parts by weight, alkoxyl alcohol is 30%~60%, magnetosensitive granule is 30%~60%, surfactant is 3%~8%, and deionized water is 3%~6%;
(2) non-water-base magnetic rheology polishing liquid is added in magnetorheological lathe blood circulation, deliquescent crystal to be processed is carried out first time MRF processing, after aromatic hydrocarbon cleans, then carry out second time MRF processing;
(3) after second time MRF machines, adopting rapidly aromatic hydrocarbon that gained deliquescent crystal is carried out, the MRF completing deliquescent crystal processes.
2. magnetic rheological polishing method according to claim 1, it is characterized in that, in described step (2), the technological parameter of described first time MRF processing is: the relative velocity of buff wheel and deliquescent crystal to be processed is 1m/s~3m/s, the maximum magnetic field strength of machining area is 210mT~230mT, pressure is 0.1mm~0.3mm deeply, and the flow of non-water-base magnetic rheology polishing liquid is 100L/h~130L/h.
3. magnetic rheological polishing method according to claim 1, it is characterized in that, in described step (2), the technological parameter of described second time MRF processing is: the relative velocity of buff wheel and deliquescent crystal to be processed is 1m/s~3m/s, the maximum magnetic field strength of machining area is 210mT~230mT, pressure is 0.1mm~0.3mm deeply, and the flow of non-water-base magnetic rheology polishing liquid is 100L/h~130L/h.
4. the magnetic rheological polishing method according to any one of claims 1 to 3, it is characterised in that described non-water-base magnetic rheology polishing liquid is obtained by following methods preparation:
A () formula according to non-water-base magnetic rheology polishing liquid, weighs alkoxyl alcohol, magnetosensitive granule, surfactant and deionized water respectively;
B alkoxyl alcohol is placed in a container tank by (), first heat to 65 DEG C~75 DEG C and be always held at this temperature, is subsequently adding surfactant, blended formation complex liquid, then adds magnetosensitive granule in complex liquid, after agitated, obtains mixed liquor;
C mixed liquor is poured in ball grinder by (), with the rotating speed ball milling 2h~5h of 150r/min~250r/min, be subsequently adding deionized water then the rotating speed ball milling 2h~5h with 50r/min~100r/min, obtain non-water-base magnetic rheology polishing liquid.
5. magnetic rheological polishing method according to claim 4, it is characterised in that the described non-water-base magnetic rheology polishing liquid viscosity when 20 DEG C is 0.35Pa s~0.55Pa s.
6. magnetic rheological polishing method according to claim 4, it is characterised in that described alkoxyl alcohol includes diethylene glycol monobutyl ether or ethylene glycol monoethyl ether.
7. magnetic rheological polishing method according to claim 4, it is characterised in that described magnetosensitive granule is carbonyl iron dust; The granularity of described carbonyl iron dust is 1 μm~10 μm, and containing Fe purity more than 97%, relative quality factor is more than 1.75, and Effective permeability is more than 3.
8. magnetic rheological polishing method according to claim 4, it is characterised in that described surfactant is one or more in phosphate ester, fatty acid, Span, tween.
9. magnetic rheological polishing method according to claim 8, it is characterised in that described surfactant is the mixture of fatty acid, Span and tween, described fatty acid is stearic acid; Described stearic acid, Span, tween mass ratio be 1: 1: 1.
10. magnetic rheological polishing method according to claim 4, it is characterised in that in described step (b), the speed of described stirring is 20r/min~60r/min, and the time of described stirring is 10min~30min; In described step (c), the mass ratio of the mixed liquor in described ball grinder and steel ball is 8~12: 1, and the diameter of described steel ball is 2mm~4mm.
CN201410288335.8A 2014-06-25 2014-06-25 The magnetic rheological polishing method of deliquescent crystal Active CN104084849B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410288335.8A CN104084849B (en) 2014-06-25 2014-06-25 The magnetic rheological polishing method of deliquescent crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410288335.8A CN104084849B (en) 2014-06-25 2014-06-25 The magnetic rheological polishing method of deliquescent crystal

Publications (2)

Publication Number Publication Date
CN104084849A CN104084849A (en) 2014-10-08
CN104084849B true CN104084849B (en) 2016-06-15

Family

ID=51632666

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410288335.8A Active CN104084849B (en) 2014-06-25 2014-06-25 The magnetic rheological polishing method of deliquescent crystal

Country Status (1)

Country Link
CN (1) CN104084849B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104588353B (en) * 2015-01-15 2016-06-22 山东大学 Large scale KDP plane of crystal magnetic-jet cleaning device and cleaning
CN105252375A (en) * 2015-10-14 2016-01-20 中国人民解放军国防科学技术大学 Method for increasing laser-damaged threshold through ion beam elastic domain etching
CN107791104B (en) * 2016-08-31 2019-05-14 中国人民解放军国防科学技术大学 A kind of processing method promoting magnetorheological water dissolution polishing deliquescent crystal processing efficiency
CN108161583B (en) * 2017-12-29 2019-09-17 中国人民解放军国防科技大学 Magnetorheological preparation method of surface phase structure of deliquescent crystal
CN116120839B (en) * 2023-04-04 2023-08-29 中国科学技术大学 Magnetorheological fluid for perovskite semiconductor material and magnetorheological polishing method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101139504A (en) * 2007-10-30 2008-03-12 西安工业大学 Magnetorheologicai polishing liquid and preparation method thereof
CN101250380A (en) * 2008-03-25 2008-08-27 中国人民解放军国防科学技术大学 Water-based magneto-rheological polishing liquid for optical processing and preparation method thereof
CN101260279A (en) * 2008-04-24 2008-09-10 中国人民解放军国防科学技术大学 Low viscosity stability non-water-base magnetic rheology polishing liquid and preparation method thereof
CN101457172A (en) * 2009-01-09 2009-06-17 中国科学技术大学 Stabilizing type magnetic rheological fluid
CN101481586A (en) * 2009-01-20 2009-07-15 大连理工大学 Nonaqueous non-abrasive polishing solution for soft, crisp and deliquescent crystal
CN102615555A (en) * 2012-04-16 2012-08-01 大连理工大学 Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture
CN102990480A (en) * 2012-12-19 2013-03-27 中国人民解放军国防科学技术大学 Optical component surface cleaning method based on ion beam polishing

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101139504A (en) * 2007-10-30 2008-03-12 西安工业大学 Magnetorheologicai polishing liquid and preparation method thereof
CN101250380A (en) * 2008-03-25 2008-08-27 中国人民解放军国防科学技术大学 Water-based magneto-rheological polishing liquid for optical processing and preparation method thereof
CN101260279A (en) * 2008-04-24 2008-09-10 中国人民解放军国防科学技术大学 Low viscosity stability non-water-base magnetic rheology polishing liquid and preparation method thereof
CN101457172A (en) * 2009-01-09 2009-06-17 中国科学技术大学 Stabilizing type magnetic rheological fluid
CN101481586A (en) * 2009-01-20 2009-07-15 大连理工大学 Nonaqueous non-abrasive polishing solution for soft, crisp and deliquescent crystal
CN102615555A (en) * 2012-04-16 2012-08-01 大连理工大学 Kindle direct publishing crystal micro-nano hygroscopic ultraprecision polishing method based on ultrasonic atomization moisture
CN102990480A (en) * 2012-12-19 2013-03-27 中国人民解放军国防科学技术大学 Optical component surface cleaning method based on ion beam polishing

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
KDP晶体的磁流变抛光工艺研究;曾育伟等;《航空精密制造技术》;20120815;第48卷(第4期);第6-8,31页 *

Also Published As

Publication number Publication date
CN104084849A (en) 2014-10-08

Similar Documents

Publication Publication Date Title
CN104084849B (en) The magnetic rheological polishing method of deliquescent crystal
CN103992743B (en) Polishing fluid and its preparation process containing cerium dioxide powder Yu colloidal silicon dioxide compound abrasive
US9133366B2 (en) Polishing liquid composition for wafers
JP5860587B2 (en) Polishing silica sol, polishing composition, and method for producing polishing silica sol
CN108239484A (en) A kind of sapphire polishing alumina polishing solution and preparation method thereof
CN106044786A (en) Polydisperse large-particle-size silica sol and preparing method thereof
CN104209879B (en) Method for manufacturing soluble fixed soft abrasive-polishing film
JP6655354B2 (en) Polishing composition for silicon wafer or polishing composition kit for silicon wafer
CN106867413A (en) A kind of high concentration cerium oxide polishing slurry and preparation method thereof
CN101481586B (en) Nonaqueous non-abrasive polishing solution for soft, crisp and deliquescent crystal
CN104530987B (en) A kind of silicon wafer finishing polish compositionss and preparation method
JP6489690B2 (en) Polishing liquid composition for silicon wafer
JP5036374B2 (en) Paste material
CN103692294B (en) The superhigh precision processing method of rice magnitude optical element
JP2007061989A (en) Polishing composite-oxide particle and slurry abrasive
CN102220087A (en) Porous nano-alumina polishing solution for polishing computer hard disk substrate
CN103880296A (en) Preparation method of soft optical glass zirconium-based polishing solution
CN108997940A (en) Chemical mechanical polishing liquid suitable for sapphire polishing
CN108642498A (en) A kind of rapid wax removing agent and preparation method thereof
CN107177315A (en) A kind of Precision Machining chemical mechanical polishing liquid
JP6436018B2 (en) Polishing slurry for oxide single crystal substrate and method for producing the same
CN109913133A (en) A kind of high-effect high-quality chemical mechanical polishing liquid of yag crystal
JP6086725B2 (en) Polishing liquid composition for silicon wafer
CN106281219A (en) A kind of double dissolubility diamond multiple grinding cream of water oil and preparation method thereof
Guo et al. Technical performance of zirconia-coated carbonyl-iron-particles based magnetic compound fluid slurry in ultrafine polishing of PMMA

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant