CN103981509A - Vertical-layout single-array hot wire device for preparing diamond film - Google Patents
Vertical-layout single-array hot wire device for preparing diamond film Download PDFInfo
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- CN103981509A CN103981509A CN201410239843.7A CN201410239843A CN103981509A CN 103981509 A CN103981509 A CN 103981509A CN 201410239843 A CN201410239843 A CN 201410239843A CN 103981509 A CN103981509 A CN 103981509A
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- heated filament
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- diamond film
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Abstract
The invention discloses a vertical-layout single-array hot wire device for preparing a diamond film, belongs to the coating technical field and particularly relates to a hot wire device for preparing a diamond film. The device comprises a vacuum chamber upper wall plate and a vacuum chamber lower wall plate, and is characterized in that an upper electrode plate is fixedly connected with the vacuum chamber upper wall plate; the single-row hot wires are vertically distributed, the upper ends of the hot wires are fixedly connected with the upper electrode plate, the lower ends of the hot wires are fixedly connected with the lower electrode plate; the lower end of the lower electrode plate is fixed on a hot wire force-regulating mechanism; the hot wire force-regulating mechanism is fixed on the vacuum chamber lower wall plate. The vertical-layout single-array hot wire device disclosed by the invention adopts single-ray hot wire vertical distribution, can be used for large-area coating on both surfaces, and reduces cost of hot wires; the vertically-distributed hot wires guarantee that samples are taken out on the condition that the hot wires are not damaged, so that cost of the hot wires is further lowered; the hot wire force-regulating mechanism at the lower ends of the hot wires can tighten the hot wires and limit the hot wires from swinging, so that uniform coating is realized.
Description
Technical field
The invention belongs to coating technique field, particularly a kind of heated filament device of preparing diamond film.
Background technology
Diamond has excellent power, heat, sound, the properties such as optical, electrical, chemical.The performance of artificial diamond film has approached natural diamond substantially, and excellent performance makes it in high-tech area, be with a wide range of applications.At present, thin diamond membrane technique is at cutter, high-performance electric sub-element, and numerous occasions such as space material are applied, and receive fabulous effect, and it is applied in high-tech area and is extraordinarily paid close attention to by people.
At present, the preparation method of industrialization CVD diamond thin mainly contains two kinds, and the one, hot filament CVD (HFCVD), the 2nd, microwave plasma CVD method (MPCVD).Microwave method can be prepared the diamond wafer that high-quality diamond thin and thickness reach millimeter magnitude, but equipment cost is high, and depositional area is less, and sedimentation velocity is slow.Hot wire process is simple to operate, and sedimentation rate is fast, and cost is low, easily controls the underlayer temperature of deposition, can obtain the diamond thin that quality is higher, area size is larger.Adopting HFCVD legal system is indoor by passing into vacuum reaction after reactant gases mixing for diamond thin, and mixed gas is after the cracking of high temperature heated filament, and the active atoms of carbon in its gas will be deposited on matrix surface, thereby grows diamond thin.
Heated filament device in diamond coated equipment is the device for cutter head Mass production diamond film, traditional heated filament device is generally horizontally disposed, namely heated filament is that horizontal cross is arranged, this structure can only utilize a side of heated filament to carry out heating film-coated, efficiency is very low, and for example US Patent No. 5997650.
At present, the heated filament device of some company's invention, for being arranged vertically, can utilize two sides of heated filament to generate stone film, efficiency is improved significantly, but in these devices, heated filament is arranged vertically, adopt counterweight hanging in the lower end of heated filament simultaneously, because heated filament has elasticity, and counterweight is free suspension, can causes lower electrode plate to rock, thereby further cause heated filament to rock, the unstable meeting of heated filament makes plated film inhomogeneous, and the diamond film that affects cutter generates quality.
Summary of the invention
The object of the invention is to overcome above the deficiencies in the prior art, provide a kind of vertical layout to prepare single array thermal silk device of diamond film, this device adopts single array heated filament vertically to distribute, can two-sided large-area coating film, reduce the cost of heated filament, the hot wire structure vertically distributing has guaranteed in the situation that not destroying heated filament, to take out sample, has further reduced the cost of heated filament, the heated filament of heated filament lower end adjusts the force mechanisms can tensioning heated filament and limit heated filament and swing, and realizes uniform coated.
The technical scheme that the present invention adopted is for achieving the above object: a kind of vertical layout is prepared single array thermal silk device of diamond film, comprises vacuum chamber wainscot and vacuum chamber lower wall panels, it is characterized in that: electric pole plate is fixedly connected with vacuum chamber wainscot; Single-row heated filament vertically distributes, and its upper end is fixedly connected with electric pole plate, and its lower end is fixedly connected with lower electrode plate; Lower electrode plate lower end is fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels.
Described electric pole plate is fixedly connected with vacuum chamber wainscot by fixed support.
Being distributed as of described single-row heated filament:
In electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, the parallel equidistant 10-30 root heated filament of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is half of distance between the heated filament on mid-way.It is dystectic that heater material is generally, and energy and carbon form the metal of carbide, and as tungsten, tantalum etc., its diameter is generally no more than 0.6mm.
Described heated filament adjusts force mechanisms to comprise protection bell jar, and described protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing.
Described heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing successively, then is connected with counterweight.
Described heated filament adjusts power slide plate upper end to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing successively, then is connected with the power of tune spring, adjusts the power spring the other end to be connected with vacuum chamber lower wall panels or protection bell jar diapire.
It is linear pattern slide plate that described heated filament is adjusted power slide plate, and it is inner that roller bearing is fixedly installed in protection bell jar.
It is bending type slide plate that described heated filament is adjusted power slide plate, and roller bearing is fixedly installed on pillar stiffener, and pillar stiffener is fixed on vacuum chamber lower wall panels.
The beneficial effect of apparatus of the present invention is:
(1) heated filament adopts single array vertically to distribute, and all can arrange that sample carries out plated film in heated filament both sides, can realize two-sided large-area coating film, and heated filament once can plated film area change, has relatively improved the service efficiency of heated filament, has reduced the cost of heated filament;
(2), in the device that heated filament vertically distributes, sample can be installed on the both sides of heated filament, after completing plated film, can in the situation that not destroying heated filament, take out sample, can repeatedly use heated filament, has further reduced heated filament cost;
(3) heated filament is installed on the lower electrode plate of heated filament lower end and adjusts force mechanisms, heated filament adjusts the heated filament of force mechanisms lower end to adjust power slide plate and protection bell jar to have position-limiting action, and heated filament adjusts power slide plate to make heated filament tensioning by its deadweight, additional counterweight or the power of tune spring, restriction heated filament swings, protection heated filament, prevent that heated filament from destroying, and is beneficial to uniform coated simultaneously;
(4) heated filament adjusts the heated filament of force mechanisms to adjust power slide plate can be designed to bending shape, avoids heated filament to adjust force mechanisms inside to be subject to coating influence, guarantees to adjust effective, the safe and reliable life-time service of force mechanisms, improves its work-ing life.
Accompanying drawing explanation
Fig. 1 is single array thermal silk device structural representation that a kind of vertical layout is prepared diamond film.
Fig. 2 is the A-A schematic cross-section that a kind of vertical layout is prepared single array thermal silk device of diamond film.
In figure: 11, vacuum chamber wainscot, 12, vacuum chamber lower wall panels, 2, electric pole plate, 3, lower electrode plate, 4, heated filament adjusts power slide plate, 5, protection bell jar, 6, counterweight, 7, heated filament, 8, fixed support, 9, pillar stiffener, 10, roller bearing
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described, but the present invention is not limited to specific embodiment.
Embodiment 1
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared single array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Single-row heated filament 7 vertically distributes, and its upper end is fixedly connected with electric pole plate 2, and its lower end is fixedly connected with lower electrode plate 3; Lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels 12.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support.
Being distributed as of single-row heated filament 7:
In electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 10 heated filaments of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is half of distance between the heated filament on mid-way, heater material is tungsten (W), and heated filament diameter is 0.4mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing 10.
It is linear pattern slide plate that heated filament is adjusted power slide plate 4, and it is inner that roller bearing 10 is fixedly installed in protection bell jar.
Embodiment 2
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared single array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Single-row heated filament 7 vertically distributes, and its upper end is fixedly connected with electric pole plate 2, and its lower end is fixedly connected with lower electrode plate 3; Lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support.
Being distributed as of single-row heated filament 7: in electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 30 heated filaments of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is half of distance between the heated filament on mid-way, heater material is tantalum (Ta), and heated filament diameter is 0.3mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing 10 successively, then is connected with counterweight 6.
It is bending type slide plate that heated filament is adjusted power slide plate 4, and roller bearing 10 is fixedly installed on pillar stiffener 9, and pillar stiffener is fixed on vacuum chamber lower wall panels.
Embodiment 3
A kind of vertical layout is as illustrated in fig. 1 and 2 prepared single array thermal silk device of diamond film, comprises vacuum chamber wainscot 11 and vacuum chamber lower wall panels 12, and electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11; Single-row heated filament 7 vertically distributes, and its upper end is fixedly connected with electric pole plate 2, and its lower end is fixedly connected with lower electrode plate 3; Lower electrode plate 3 lower ends are fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels.
Electric pole plate 2 is fixedly connected with vacuum chamber wainscot 11 by fixed support.
Being distributed as of single-row heated filament 7: in electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, parallel equidistant 30 heated filaments of arranging on position therebetween, and the distance between the heated filament in end positions is half of distance between the heated filament on mid-way, heater material is tungsten (W), and heated filament diameter is 0.3mm.
Heated filament adjusts force mechanisms to comprise protection bell jar 5, and affiliated protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate 4 upper ends to be fixed on lower electrode plate, and its lower end is passed after limiting through hole and roller bearing 10 successively, then is connected with the power of tune spring, adjusts the power spring the other end to be connected with vacuum chamber lower wall panels.
It is bending type slide plate that heated filament is adjusted power slide plate 4, and roller bearing 10 is fixedly installed on pillar stiffener 9, and pillar stiffener is fixed on vacuum chamber lower wall panels.
Claims (8)
1. vertical layout is prepared a single array thermal silk device for diamond film, comprises vacuum chamber wainscot (11) and vacuum chamber lower wall panels (12), it is characterized in that: electric pole plate (2) is fixedly connected with vacuum chamber wainscot (11); Single-row heated filament (7) vertically distributes, and its upper end is fixedly connected with electric pole plate (2), and its lower end is fixedly connected with lower electrode plate (3); Lower electrode plate (3) lower end is fixed on heated filament tune force mechanisms, and heated filament adjusts force mechanisms to be fixed on vacuum chamber lower wall panels (12).
2. a kind of vertical layout according to claim 1 is prepared single array thermal silk device of diamond film, it is characterized in that: described electric pole plate (2) is fixedly connected with vacuum chamber wainscot (11) by fixed support.
3. a kind of vertical layout according to claim 1 is prepared single array thermal silk device of diamond film, it is characterized in that: being distributed as of described single-row heated filament (7):
In electric pole plate and lower electrode plate end positions, perpendicular to electric pole plate and lower electrode plate, parallel equidistant 4 heated filaments of arranging respectively, the parallel equidistant 10-30 root heated filament of arranging on electric pole plate and lower electrode plate mid-way, and the distance between the heated filament in end positions is half of distance between the heated filament on mid-way.
4. a kind of vertical layout according to claim 1 is prepared single array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts force mechanisms to comprise protection bell jar (5), described protection bell jar lower end is fixed on vacuum chamber lower wall panels, and protection bell jar upper end is provided with limiting through hole; Heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate, and its lower end is successively through limiting through hole and roller bearing (10).
5. a kind of vertical layout according to claim 4 is prepared single array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate, its lower end is passed after limiting through hole and roller bearing (10) successively, then is connected with counterweight (6).
6. a kind of vertical layout according to claim 4 is prepared single array thermal silk device of diamond film; it is characterized in that: described heated filament adjusts power slide plate (4) upper end to be fixed on lower electrode plate; its lower end is successively through after limiting through hole and roller bearing (10); be connected with the power of tune spring again, adjust the power spring the other end to be connected with vacuum chamber lower wall panels (12) or protection bell jar (5) diapire.
7. according to claim 4,5 or 6 arbitrary described a kind of vertical layouts, prepare single array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts power slide plate (4) for linear pattern slide plate, and it is inner that roller bearing (10) is fixedly installed in protection bell jar.
8. according to claim 4,5 or 6 arbitrary described a kind of vertical layouts, prepare single array thermal silk device of diamond film, it is characterized in that: described heated filament adjusts power slide plate (4) for bending type slide plate, it is upper that roller bearing (10) is fixedly installed in pillar stiffener (9), and pillar stiffener is fixed on vacuum chamber lower wall panels.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410239843.7A CN103981509B (en) | 2014-05-30 | 2014-05-30 | A kind of vertical layout is prepared single array thermal silk device of diamond film |
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| CN201410239843.7A CN103981509B (en) | 2014-05-30 | 2014-05-30 | A kind of vertical layout is prepared single array thermal silk device of diamond film |
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| CN103981509A true CN103981509A (en) | 2014-08-13 |
| CN103981509B CN103981509B (en) | 2016-05-18 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108505019A (en) * | 2018-06-12 | 2018-09-07 | 深圳先进技术研究院 | Heated filament fixture and hot filament deposit equipment and its application and the utensil obtained using it |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1831187A (en) * | 2006-03-27 | 2006-09-13 | 南京航空航天大学 | Heater array electrode system used for stable growth of diamond membrane with large area |
| CN101280422A (en) * | 2008-04-02 | 2008-10-08 | 四川中物超硬材料有限公司 | Device for lot manufactureof diamond coating drawing die |
| CN102383113A (en) * | 2011-10-25 | 2012-03-21 | 武汉工程大学 | Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness |
| CN203890436U (en) * | 2014-05-30 | 2014-10-22 | 大连理工常州研究院有限公司 | One-array hot wire device for preparing diamond membrane by vertical layout |
-
2014
- 2014-05-30 CN CN201410239843.7A patent/CN103981509B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1831187A (en) * | 2006-03-27 | 2006-09-13 | 南京航空航天大学 | Heater array electrode system used for stable growth of diamond membrane with large area |
| CN101280422A (en) * | 2008-04-02 | 2008-10-08 | 四川中物超硬材料有限公司 | Device for lot manufactureof diamond coating drawing die |
| CN102383113A (en) * | 2011-10-25 | 2012-03-21 | 武汉工程大学 | Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness |
| CN203890436U (en) * | 2014-05-30 | 2014-10-22 | 大连理工常州研究院有限公司 | One-array hot wire device for preparing diamond membrane by vertical layout |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108505019A (en) * | 2018-06-12 | 2018-09-07 | 深圳先进技术研究院 | Heated filament fixture and hot filament deposit equipment and its application and the utensil obtained using it |
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| CN103981509B (en) | 2016-05-18 |
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Effective date of registration: 20171106 Address after: 225600 Yangzhou City, Gaoyou Province, South City Economic Zone, the outer ring road Patentee after: Gaoyou Institute of Dalian University of Technology Co., Ltd. Address before: 213164 Changzhou science and Education City, No. 801 middle Wu Road, Wujin District, Jiangsu, Changzhou Patentee before: Changzhou Institute Co., Ltd. of Daian University of Technology |