CN103979483B - 制造包括至少两个不同的功能性高度的一体式微机械构件的方法 - Google Patents

制造包括至少两个不同的功能性高度的一体式微机械构件的方法 Download PDF

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Publication number
CN103979483B
CN103979483B CN201410049720.7A CN201410049720A CN103979483B CN 103979483 B CN103979483 B CN 103979483B CN 201410049720 A CN201410049720 A CN 201410049720A CN 103979483 B CN103979483 B CN 103979483B
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CN
China
Prior art keywords
silicon substrate
photosensitive resin
metal parts
mechanical component
micro
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CN201410049720.7A
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English (en)
Chinese (zh)
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CN103979483A (zh
Inventor
A·弗辛格
M·斯特兰策尔
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Nivarox Far SA
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Nivarox Far SA
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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/008—Manufacture of substrate-free structures separating the processed structure from a mother substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/03—Microengines and actuators
    • B81B2201/035—Microgears
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201410049720.7A 2013-02-13 2014-02-13 制造包括至少两个不同的功能性高度的一体式微机械构件的方法 Active CN103979483B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP20130155068 EP2767869A1 (fr) 2013-02-13 2013-02-13 Procédé de fabrication d'une pièce de micromécanique monobloc comportant au moins deux niveaux distincts
EP13155068.3 2013-02-13

Publications (2)

Publication Number Publication Date
CN103979483A CN103979483A (zh) 2014-08-13
CN103979483B true CN103979483B (zh) 2017-01-18

Family

ID=47877759

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410049720.7A Active CN103979483B (zh) 2013-02-13 2014-02-13 制造包括至少两个不同的功能性高度的一体式微机械构件的方法

Country Status (5)

Country Link
US (1) US9197183B2 (https=)
EP (2) EP2767869A1 (https=)
JP (1) JP5899252B2 (https=)
CN (1) CN103979483B (https=)
IN (1) IN2014CH00562A (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3232277B1 (en) * 2014-12-12 2021-04-21 Citizen Watch Co., Ltd. Timepiece component and method for manufacturing timepiece component
EP3034461B1 (fr) * 2014-12-19 2020-07-01 Rolex Sa Fabrication d'un composant horloger multi-niveaux
EP3035125B1 (fr) * 2014-12-19 2018-01-10 Rolex Sa Procédé de fabrication d'un composant horloger multi-niveaux
EP3168057A1 (fr) * 2015-11-11 2017-05-17 Nivarox-FAR S.A. Procede de fabrication d'une piece metallique avec au moins un motif a illusion d'optique
EP3171229A1 (fr) * 2015-11-19 2017-05-24 Nivarox-FAR S.A. Composant d' horlogerie
EP3171230B1 (fr) * 2015-11-19 2019-02-27 Nivarox-FAR S.A. Composant d'horlogerie a tribologie amelioree
EP3602197B1 (fr) * 2017-03-24 2022-11-09 Richemont International SA Procédé de fabrication d'un composant horloger en métal-céramique
EP3453787B1 (fr) 2017-09-11 2020-02-19 Patek Philippe SA Genève Procede de fabrication d'un lot de pieces de micromecanique multi-niveau en metal
EP3614205A1 (fr) 2018-08-22 2020-02-26 Nivarox-FAR S.A. Procede de fabrication d'un composant horloger et composant obtenu selon ce procede
US11860801B2 (en) 2019-01-15 2024-01-02 Christoph HELDEIS Method for implicit addressing of electronic units and corresponding units
WO2023012035A1 (fr) * 2021-08-02 2023-02-09 Rolex Sa Procédé de fabrication d'un composant horloger

Citations (4)

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CN1691970A (zh) * 2003-11-10 2005-11-02 新加坡科技研究局 微型针以及微型针的制造
CN1728017A (zh) * 2004-07-02 2006-02-01 尼瓦洛克斯-法尔股份有限公司 双材料自补偿游丝
CN101038440A (zh) * 2006-03-15 2007-09-19 岛尼尔公司 以liga工艺制造单层或多层金属结构体的方法及获得的结构体
JP2007240416A (ja) * 2006-03-10 2007-09-20 Citizen Holdings Co Ltd 足付指標及びその製造方法とその足付指標を用いた表示板

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US6458263B1 (en) * 2000-09-29 2002-10-01 Sandia National Laboratories Cantilevered multilevel LIGA devices and methods
JP4840756B2 (ja) * 2005-01-14 2011-12-21 セイコーインスツル株式会社 電鋳型とその製造方法及び電鋳部品の製造方法
JP4834426B2 (ja) * 2006-03-06 2011-12-14 キヤノン株式会社 インクジェット記録ヘッドの製造方法
CN100441388C (zh) * 2006-04-06 2008-12-10 上海交通大学 基于多层加工技术的微针制备方法
EP2157476A1 (fr) * 2008-08-20 2010-02-24 Nivarox-FAR S.A. Procédé de fabrication de pièces métalliques multi-niveaux par la technique LIGA-UV
CH699416A2 (fr) * 2008-08-20 2010-02-26 Nivarox Sa Procédé de fabrication de pièces métalliques multi-niveaux par la technique LIGA-UV
EP2182096A1 (fr) 2008-10-28 2010-05-05 Nivarox-FAR S.A. Procédé LIGA hétérogène
EP2230206B1 (fr) * 2009-03-13 2013-07-17 Nivarox-FAR S.A. Moule pour galvanoplastie et son procédé de fabrication
EP2230207A1 (fr) * 2009-03-13 2010-09-22 Nivarox-FAR S.A. Moule pour galvanoplastie et son procédé de fabrication
EP2263971A1 (fr) * 2009-06-09 2010-12-22 Nivarox-FAR S.A. Pièce de micromécanique composite et son procédé de fabrication
EP2263972A1 (fr) * 2009-06-12 2010-12-22 Nivarox-FAR S.A. Procédé de fabrication d'une microstructure métallique et microstructure obtenue selon ce procédé
JP5366318B2 (ja) * 2009-09-14 2013-12-11 セイコーインスツル株式会社 デテント脱進機およびデテント脱進機の作動レバーの製造方法
JP5620083B2 (ja) * 2009-10-22 2014-11-05 セイコーインスツル株式会社 電鋳体、その製造方法、及び時計部品
EP2400351B1 (fr) 2010-06-22 2013-09-25 Omega SA Mobile monobloc pour une pièce d'horlogerie
US8562206B2 (en) * 2010-07-12 2013-10-22 Rolex S.A. Hairspring for timepiece hairspring-balance oscillator, and method of manufacture thereof
JP2012198041A (ja) * 2011-03-18 2012-10-18 Seiko Instruments Inc 時計用車のスリップ構造及びこれを用いた時計

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1691970A (zh) * 2003-11-10 2005-11-02 新加坡科技研究局 微型针以及微型针的制造
CN1728017A (zh) * 2004-07-02 2006-02-01 尼瓦洛克斯-法尔股份有限公司 双材料自补偿游丝
JP2007240416A (ja) * 2006-03-10 2007-09-20 Citizen Holdings Co Ltd 足付指標及びその製造方法とその足付指標を用いた表示板
CN101038440A (zh) * 2006-03-15 2007-09-19 岛尼尔公司 以liga工艺制造单层或多层金属结构体的方法及获得的结构体

Also Published As

Publication number Publication date
JP2014152400A (ja) 2014-08-25
EP2767870A2 (fr) 2014-08-20
EP2767870A3 (fr) 2015-07-08
CN103979483A (zh) 2014-08-13
HK1200799A1 (en) 2015-08-14
US9197183B2 (en) 2015-11-24
JP5899252B2 (ja) 2016-04-06
EP2767869A1 (fr) 2014-08-20
EP2767870B1 (fr) 2019-06-05
US20140226449A1 (en) 2014-08-14
IN2014CH00562A (https=) 2015-04-10

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