IN2014CH00562A - - Google Patents

Info

Publication number
IN2014CH00562A
IN2014CH00562A IN562CH2014A IN2014CH00562A IN 2014CH00562 A IN2014CH00562 A IN 2014CH00562A IN 562CH2014 A IN562CH2014 A IN 562CH2014A IN 2014CH00562 A IN2014CH00562 A IN 2014CH00562A
Authority
IN
India
Prior art keywords
fabricating
micromechanical component
liga
distinct functional
functional levels
Prior art date
Application number
Inventor
Alexandre Fussinger
Marc Stranczl
Original Assignee
Nivarox Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nivarox Sa filed Critical Nivarox Sa
Publication of IN2014CH00562A publication Critical patent/IN2014CH00562A/en

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/0072—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of microelectro-mechanical resonators or networks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/008—Manufacture of substrate-free structures separating the processed structure from a mother substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B15/00—Escapements
    • G04B15/14—Component parts or constructional details, e.g. construction of the lever or the escape wheel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/03—Microengines and actuators
    • B81B2201/035—Microgears
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Micromachines (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

Method of fabricating a single-piece micromechanical component including at least two distinct functional levels The invention relates to a method (1) of fabricating a single-piece micromechanical component (31, 41, 61, 91) including at least two distinct functional levels. According to the invention, the method (1) includes a LIGA process on a single level combined with the machining of the LIGA deposition directly on the substrate (2). Figure 15
IN562CH2014 2013-02-13 2014-02-07 IN2014CH00562A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20130155068 EP2767869A1 (en) 2013-02-13 2013-02-13 Method for manufacturing a one-piece micromechanical part comprising at least two separate levels

Publications (1)

Publication Number Publication Date
IN2014CH00562A true IN2014CH00562A (en) 2015-04-10

Family

ID=47877759

Family Applications (1)

Application Number Title Priority Date Filing Date
IN562CH2014 IN2014CH00562A (en) 2013-02-13 2014-02-07

Country Status (6)

Country Link
US (1) US9197183B2 (en)
EP (2) EP2767869A1 (en)
JP (1) JP5899252B2 (en)
CN (1) CN103979483B (en)
HK (1) HK1200799A1 (en)
IN (1) IN2014CH00562A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107003641B (en) * 2014-12-12 2021-02-19 西铁城时计株式会社 Timepiece component and method of manufacturing timepiece component
EP3035125B1 (en) * 2014-12-19 2018-01-10 Rolex Sa Method for manufacturing a multi-level clock component
EP3168057A1 (en) * 2015-11-11 2017-05-17 Nivarox-FAR S.A. Method for manufacturing a metal part with at least one optical illusion pattern
EP3171230B1 (en) * 2015-11-19 2019-02-27 Nivarox-FAR S.A. Timepiece component with improved tribology
EP3171229A1 (en) * 2015-11-19 2017-05-24 Nivarox-FAR S.A. Clock component
EP3602197B1 (en) * 2017-03-24 2022-11-09 Richemont International SA Process for manufacturing a metal-ceramic timepiece component
EP3453787B1 (en) 2017-09-11 2020-02-19 Patek Philippe SA Genève Method for manufacturing a batch of multi-level micromechanical metal parts
EP3614205A1 (en) * 2018-08-22 2020-02-26 Nivarox-FAR S.A. Method for manufacturing a timepiece component and component produced by this method
EP3912048B1 (en) 2019-01-15 2023-07-19 Heldeis, Christoph Method for implicit addressing of electronic units and corresponding units
JP2024527133A (en) * 2021-08-02 2024-07-19 ロレックス・ソシエテ・アノニム Manufacturing method for watch parts

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6458263B1 (en) * 2000-09-29 2002-10-01 Sandia National Laboratories Cantilevered multilevel LIGA devices and methods
WO2005044364A1 (en) * 2003-11-10 2005-05-19 Agency For Science, Technology And Research Microneedles and microneedle fabrication
DE602004020982D1 (en) * 2004-07-02 2009-06-18 Nivarox Sa tion
JP4840756B2 (en) * 2005-01-14 2011-12-21 セイコーインスツル株式会社 Electroforming mold, manufacturing method thereof, and manufacturing method of electroformed part
JP4834426B2 (en) * 2006-03-06 2011-12-14 キヤノン株式会社 Method for manufacturing ink jet recording head
JP2007240416A (en) * 2006-03-10 2007-09-20 Citizen Holdings Co Ltd Index with foot, manufacturing method therefor, and display panel using the index with foot
EP1835339B1 (en) 2006-03-15 2012-05-16 Rolex S.A. Fabrication process by LIGA type technology, of a monolayer or multilayer metallic structure, and structure obtained therewith
CN100441388C (en) * 2006-04-06 2008-12-10 上海交通大学 Microneedle preparation method based on multiplayer processing technology
EP2157476A1 (en) * 2008-08-20 2010-02-24 Nivarox-FAR S.A. Method of manufacturing multi-level metal parts using the LIGA-UV technique
CH699416A2 (en) * 2008-08-20 2010-02-26 Nivarox Sa Fabricating multi-level metallic e.g. steel microstructure by UV photolithography and galvanic deposition, comprises covering conductive surface of substrate by first layer of photosensitive resin, and irradiating first layer through mask
EP2182096A1 (en) * 2008-10-28 2010-05-05 Nivarox-FAR S.A. Heterogeneous LIGA method
EP2230206B1 (en) * 2009-03-13 2013-07-17 Nivarox-FAR S.A. Electroplating mould and method for manufacturing same
EP2230207A1 (en) * 2009-03-13 2010-09-22 Nivarox-FAR S.A. Electroplating mould and method for manufacturing the same
EP2263971A1 (en) * 2009-06-09 2010-12-22 Nivarox-FAR S.A. Composite micromechanical part and method for manufacturing same
EP2263972A1 (en) * 2009-06-12 2010-12-22 Nivarox-FAR S.A. Method for manufacturing a metal microstructure and microstructure obtained according to this method
JP5366318B2 (en) * 2009-09-14 2013-12-11 セイコーインスツル株式会社 Detent escapement and method of manufacturing detent escapement operating lever
JP5620083B2 (en) * 2009-10-22 2014-11-05 セイコーインスツル株式会社 Electroformed body, manufacturing method thereof, and watch part
EP2400351B1 (en) 2010-06-22 2013-09-25 Omega SA Single-piece mobile element for a clock piece
US8562206B2 (en) 2010-07-12 2013-10-22 Rolex S.A. Hairspring for timepiece hairspring-balance oscillator, and method of manufacture thereof
JP2012198041A (en) * 2011-03-18 2012-10-18 Seiko Instruments Inc Slip structure for watch wheel and watch using the same

Also Published As

Publication number Publication date
CN103979483B (en) 2017-01-18
EP2767870B1 (en) 2019-06-05
EP2767870A2 (en) 2014-08-20
JP5899252B2 (en) 2016-04-06
CN103979483A (en) 2014-08-13
US9197183B2 (en) 2015-11-24
EP2767870A3 (en) 2015-07-08
JP2014152400A (en) 2014-08-25
EP2767869A1 (en) 2014-08-20
HK1200799A1 (en) 2015-08-14
US20140226449A1 (en) 2014-08-14

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