CN103974896A - 用于垂直集成的堆叠式通孔 - Google Patents

用于垂直集成的堆叠式通孔 Download PDF

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Publication number
CN103974896A
CN103974896A CN201280059040.2A CN201280059040A CN103974896A CN 103974896 A CN103974896 A CN 103974896A CN 201280059040 A CN201280059040 A CN 201280059040A CN 103974896 A CN103974896 A CN 103974896A
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CN
China
Prior art keywords
metal layer
via structure
layer
substrate
implementations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN201280059040.2A
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English (en)
Chinese (zh)
Inventor
潘耀玲
赵李霞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nujira Ltd
Original Assignee
Qualcomm MEMS Technologies Inc
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Filing date
Publication date
Application filed by Qualcomm MEMS Technologies Inc filed Critical Qualcomm MEMS Technologies Inc
Priority to CN201910414865.5A priority Critical patent/CN110228785A/zh
Publication of CN103974896A publication Critical patent/CN103974896A/zh
Pending legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0006—Interconnects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00222—Integrating an electronic processing unit with a micromechanical structure
    • B81C1/00246—Monolithic integration, i.e. micromechanical structure and electronic processing unit are integrated on the same substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
CN201280059040.2A 2011-10-20 2012-10-17 用于垂直集成的堆叠式通孔 Pending CN103974896A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910414865.5A CN110228785A (zh) 2011-10-20 2012-10-17 用于通孔结构的系统、方法及设备

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/278,080 2011-10-20
US13/278,080 US10131534B2 (en) 2011-10-20 2011-10-20 Stacked vias for vertical integration
PCT/US2012/060648 WO2013059345A1 (en) 2011-10-20 2012-10-17 Stacked vias for vertical integration

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201910414865.5A Division CN110228785A (zh) 2011-10-20 2012-10-17 用于通孔结构的系统、方法及设备

Publications (1)

Publication Number Publication Date
CN103974896A true CN103974896A (zh) 2014-08-06

Family

ID=47138180

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201910414865.5A Pending CN110228785A (zh) 2011-10-20 2012-10-17 用于通孔结构的系统、方法及设备
CN201280059040.2A Pending CN103974896A (zh) 2011-10-20 2012-10-17 用于垂直集成的堆叠式通孔

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201910414865.5A Pending CN110228785A (zh) 2011-10-20 2012-10-17 用于通孔结构的系统、方法及设备

Country Status (7)

Country Link
US (1) US10131534B2 (enExample)
EP (1) EP2768767A1 (enExample)
JP (1) JP2014534470A (enExample)
KR (1) KR20140083042A (enExample)
CN (2) CN110228785A (enExample)
IN (1) IN2014CN02998A (enExample)
WO (1) WO2013059345A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108231747A (zh) * 2016-12-21 2018-06-29 中芯国际集成电路制造(上海)有限公司 半导体器件及其制作方法、电子装置
CN109867258A (zh) * 2017-12-05 2019-06-11 英特尔公司 封装衬底集成器件
TWI706233B (zh) * 2018-07-18 2020-10-01 荷蘭商Ａｓｍｌ荷蘭公司 用以判定關於藉由一微影程序形成之一基板上之一結構的一所關注特性之方法、圖案化器件、微影系統、及非暫時性電腦程式產品

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180123245A1 (en) * 2016-10-28 2018-05-03 Broadcom Corporation Broadband antenna array for wireless communications

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5798283A (en) * 1995-09-06 1998-08-25 Sandia Corporation Method for integrating microelectromechanical devices with electronic circuitry
EP1695937A2 (en) * 2005-02-25 2006-08-30 Hitachi, Ltd. Integrated micro electro-mechanical system and manufacturing method thereof
CN101479781A (zh) * 2006-06-29 2009-07-08 高通Mems科技公司 用于对显示器输入进行解多路复用的无源电路
CN101636344A (zh) * 2007-03-21 2010-01-27 高通Mems科技公司 微机电系统腔涂层及方法
CN101728355A (zh) * 2008-11-03 2010-06-09 巨擘科技股份有限公司 多层基板的导孔结构及其制造方法
CN101772467A (zh) * 2007-08-07 2010-07-07 高通Mems科技公司 微机电系统装置及其互连
CN102001613A (zh) * 2009-09-02 2011-04-06 原相科技股份有限公司 微电子装置及制造方法、微机电封装结构及封装方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5917645A (en) * 1997-03-28 1999-06-29 Daewoo Electronics Co., Ltd. Thin film actuated mirror array in an optical projection system and method for manufacturing the same
US6320244B1 (en) * 1999-01-12 2001-11-20 Agere Systems Guardian Corp. Integrated circuit device having dual damascene capacitor
US6562656B1 (en) 2001-06-25 2003-05-13 Thin Film Module, Inc. Cavity down flip chip BGA
US20030234415A1 (en) * 2002-06-24 2003-12-25 Hwey-Ching Chien Scalable three-dimensional fringe capacitor with stacked via
JP4289005B2 (ja) 2003-04-30 2009-07-01 日本ビクター株式会社 多層プリント配線板
US20050041405A1 (en) 2003-08-22 2005-02-24 Intel Corporation Stacked via structure that includes a skip via
US7081647B2 (en) 2003-09-29 2006-07-25 Matsushita Electric Industrial Co., Ltd. Microelectromechanical system and method for fabricating the same
JP4776197B2 (ja) 2004-09-21 2011-09-21 日本特殊陶業株式会社 配線基板の検査装置
JP4608294B2 (ja) 2004-11-30 2011-01-12 日亜化学工業株式会社 樹脂成形体及び表面実装型発光装置並びにそれらの製造方法
KR20080098692A (ko) * 2005-11-02 2008-11-11 이비덴 가부시키가이샤 반도체 장치용 다층 프린트 배선판 및 그 제조 방법
TWI298608B (en) 2006-05-19 2008-07-01 Foxconn Advanced Tech Inc Method for manufacturing stack via of hdi printed circuit board
US20080029898A1 (en) 2006-08-01 2008-02-07 Farooq Mukta G Via stack structures
US8022896B2 (en) * 2007-08-08 2011-09-20 Qualcomm Mems Technologies, Inc. ESD protection for MEMS display panels
JP5016449B2 (ja) 2007-11-13 2012-09-05 ローム株式会社 半導体装置
JP5125531B2 (ja) 2008-01-16 2013-01-23 富士通セミコンダクター株式会社 配線基板及び半導体装置
US8242593B2 (en) 2008-01-27 2012-08-14 International Business Machines Corporation Clustered stacked vias for reliable electronic substrates
US20090194861A1 (en) 2008-02-04 2009-08-06 Mathias Bonse Hermetically-packaged devices, and methods for hermetically packaging at least one device at the wafer level
JP5102726B2 (ja) * 2008-09-08 2012-12-19 ラピスセミコンダクタ株式会社 半導体装置の製造方法
CN102379037B (zh) * 2009-03-30 2015-08-19 高通股份有限公司 使用顶部后钝化技术和底部结构技术的集成电路芯片
JP2010283189A (ja) 2009-06-05 2010-12-16 Shinko Electric Ind Co Ltd 配線基板及びその製造方法
TW201102340A (en) * 2009-07-10 2011-01-16 Nat Univ Tsing Hua A method for fabricating a multilayer microstructure with balancing residual stress capability
JP5134027B2 (ja) * 2010-02-18 2013-01-30 北陸電気工業株式会社 圧電型三軸加速度センサ

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5798283A (en) * 1995-09-06 1998-08-25 Sandia Corporation Method for integrating microelectromechanical devices with electronic circuitry
EP1695937A2 (en) * 2005-02-25 2006-08-30 Hitachi, Ltd. Integrated micro electro-mechanical system and manufacturing method thereof
CN101479781A (zh) * 2006-06-29 2009-07-08 高通Mems科技公司 用于对显示器输入进行解多路复用的无源电路
CN101636344A (zh) * 2007-03-21 2010-01-27 高通Mems科技公司 微机电系统腔涂层及方法
CN101772467A (zh) * 2007-08-07 2010-07-07 高通Mems科技公司 微机电系统装置及其互连
CN101728355A (zh) * 2008-11-03 2010-06-09 巨擘科技股份有限公司 多层基板的导孔结构及其制造方法
CN102001613A (zh) * 2009-09-02 2011-04-06 原相科技股份有限公司 微电子装置及制造方法、微机电封装结构及封装方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108231747A (zh) * 2016-12-21 2018-06-29 中芯国际集成电路制造(上海)有限公司 半导体器件及其制作方法、电子装置
CN109867258A (zh) * 2017-12-05 2019-06-11 英特尔公司 封装衬底集成器件
TWI706233B (zh) * 2018-07-18 2020-10-01 荷蘭商Ａｓｍｌ荷蘭公司 用以判定關於藉由一微影程序形成之一基板上之一結構的一所關注特性之方法、圖案化器件、微影系統、及非暫時性電腦程式產品

Also Published As

Publication number Publication date
WO2013059345A1 (en) 2013-04-25
JP2014534470A (ja) 2014-12-18
IN2014CN02998A (enExample) 2015-07-03
US10131534B2 (en) 2018-11-20
CN110228785A (zh) 2019-09-13
US20130100143A1 (en) 2013-04-25
EP2768767A1 (en) 2014-08-27
KR20140083042A (ko) 2014-07-03

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PB01 Publication
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SE01 Entry into force of request for substantive examination
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TA01 Transfer of patent application right

Effective date of registration: 20161026

Address after: American California

Applicant after: NUJIRA LTD.

Address before: American California

Applicant before: Qualcomm MEMS Technology Corp.

RJ01 Rejection of invention patent application after publication

Application publication date: 20140806

RJ01 Rejection of invention patent application after publication