CN103917035B - Device for handling particles and gaseous material using non equilibrium plasma - Google Patents
Device for handling particles and gaseous material using non equilibrium plasma Download PDFInfo
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- CN103917035B CN103917035B CN201410134595.XA CN201410134595A CN103917035B CN 103917035 B CN103917035 B CN 103917035B CN 201410134595 A CN201410134595 A CN 201410134595A CN 103917035 B CN103917035 B CN 103917035B
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Abstract
The invention discloses a device for handling particles and gaseous material using non equilibrium plasma. The device comprises a pre-level charger and a plasma generator. The pre-level charger comprises a direct current power source and a resonant charging circuit. The direct current power source is used for supplying direct current voltage for the resonant charging circuit, and the resonant charging circuit is used for supplying alternating current impulse voltage for the plasma generator. The plasma generator is of a cylindrical structure with a reacting cavity in the center and comprises an external shielding layer, a primary low voltage winding, an external insulating layer, a secondary high voltage winding, an internal insulating layer, an internal shielding layer, a secondary capacitor, trigger electrode resistance, a gas clearance steepening switch, an electrode support, a high voltage electrode, a direct line electrode and a metal plate. Particle or gaseous material handling is conducted directly in the reacting cavity. The device discharging can be conducted under the atmospheric pressure opening air environment without blocking media, the energy of electrons and active particles in the plasma is stronger, concentration is higher, and the device is compact in structure, small in size and high in stability.
Description
Technical field
The invention belongs to plasma-generating technologies field, is processed with nonequilibrium plasma more particularly, to one kind
The device of granule and gaseous matter.
Background technology
Nonequilibrium plasma be the temperature difference of a kind of partially ionized low temperature plasma, its electronics and ion very
Greatly.Contain the substantial amounts of active particle with high reactivity in this plasma, such as：High energy electron, metastable state ion,
Free radical etc..At the same time, its bulk temperature is very low, therefore, it is widely used at materials processing and surface treatment, pollutant
The numerous areas such as the sterilizing in terms of reason, medical science.
Particulate matter is processed with nonequilibrium plasma includes physical action and chemical action.Physical action refers to plasma
High energy electron and active particle in body collides and corrodes some organic granular material surfaces, forms speckle, changes the thick of surface
Rugosity and surface area（Such as polyethylene terephthalate granule）, or generate less particulate matter（Such as aerosol form thing
Matter）, while the pollutant for removing material surface and the low molecular compound for evaporating, reach cleaning sterilization, strengthen antibiotic property
Purpose.Chemical action refers to that the energetic particle hits particle surface in plasma can generate substantial amounts of living radical, this
A little free radicals interact to form a kind of cross-linked layer of densification, and act on forming active group with the other compositions in plasma
Group, such as oxygen-containing group, hydroxyl, carbonyl etc., change the chemical composition of particle surface（Such as carbon black pellet thing）.Nonequilibrium plasma
Can also be used to process organic gas material, decomposing organic gas material is reached by destroying the chemical bond of organic gas molecule
Purpose.
At present, processed with nonequilibrium plasma in the device of particulate matter, nonequilibrium plasma is mainly with exchange
Or DC voltage is driving source, it is obtained using the method for dielectric impedance or manufacture noble gas discharge atmosphere.These methods are present
Following defect：（1）Discharge environment is usually needed using rare gas, low pressure or vacuum, and plasma device needs to be equipped with
The complicated equipment such as rare gas bottle, vacuum pump, and be difficult to obtain large-area nonequilibrium plasma.（2）It is situated between due to stopping
The use of matter greatly reduces the density of ionizing efficiency and high energy electron, and the easily chemical composition of change plasma environment,
Pollute.（3）The weak point of atmospheric pressure corona discharge is that ionization is concentrated mainly near electrode, is equally difficult to obtain big face
Long-pending nonequilibrium plasma.（4）The nonequilibrium plasma for being obtained as excitaton source using exchange or direct current at present is to gas
Body has significantly heating, and capacity usage ratio is very low.Above-mentioned reason significantly limit the range of application of nonequilibrium plasma.
Further, since nonequilibrium plasma generator is separated with the reaction chamber for processing granule and gaseous matter, device volume is big and steady
Qualitative difference.
The content of the invention
For the disadvantages described above or Improvement requirement of prior art, the invention provides one kind is processed with nonequilibrium plasma
The device of granule and gaseous matter, using repetition nanosecond pulse mode of excitation, allow electric discharge in atmospheric pressure open air and
Carry out without in the environment of block media, it is to avoid use the corollary apparatus such as complicated vacuum pump and rare gas bottle, and plasma
In body, the energy of electronics and active particle is bigger, concentration is higher, sparking electrode spacing is bigger, with higher capacity usage ratio.
Additionally, by plasma generator and the reaction chamber effective integration for processing granule and gaseous matter, highly shortened and electrically return
The wire length on road, reduces line inductance and other stray parameters, is easy to the standardized and popularized of product, and device volume it is little,
Lightweight, stability is high, compact conformation.
For achieving the above object, the invention provides a kind of dress that granule and gaseous matter are processed with nonequilibrium plasma
Put, it is characterised in that including prime charger and plasma generator；
The prime charger includes DC source and resonance charging circuit, wherein, the DC source is used to be described
Resonant charging circuit provides DC voltage, and the resonant charging circuit is used to provide alternating-current pulse for the plasma generator
Voltage；
It is provided with the cylindrical-shaped structure of reaction chamber centered on the plasma generator, including external shielding layer, original side is low
Pressure winding, external insulation layer, assistant formula high pressure winding, inner insulating layer, internal shield, assistant formula electric capacity, triggering electrode resistance, gas gap are steep
Switching, electrode suppor, high-field electrode, linear electrode and metallic plate；
The electrode suppor is cylindrical structure, is arranged on reaction chamber side wall, and its inner surface is carved with helical groove, the height
Piezoelectricity extremely helicoidal structure, is embedded in groove, and the metallic plate is arranged on reaction chamber bottom and is grounded, and the linear electrode sets
Put in the axle center of reaction chamber, closely weld with the metallic plate, the outer layer of the electrode suppor coats the internal shield successively
With the inner insulating layer, the assistant formula high pressure winding is arranged on the periphery of the inner insulating layer, and one end connects the gas gap
The input of steepness switch, other end ground connection, the external insulation layer coats the assistant formula high pressure winding completely, to ensure described
Good electrical isolation is formed between original side's low pressure winding and the assistant formula high pressure winding, original side's low pressure winding is arranged on institute
The periphery of external insulation layer is stated, one end connects the high-pressure side of the resonant charging circuit, and other end ground connection, the external shielding layer are complete
Cladding original side's low pressure winding, to prevent the prime charger from being disturbed by the plasma generator；
One end of the assistant formula electric capacity connects the input of the gas gap steepness switch, and other end ground connection is described to touch
The one end for sending out electrode resistance connects the trigger electrode of the gas gap steepness switch, and other end ground connection, the gas gap steepness are opened
The outfan of pass connects the high-field electrode；
The two ends of the plasma generator are coated by an insulating material, wherein, with the metallic plate just to one end
Position corresponding with reaction chamber center be provided with opening, for the input port as granule or gaseous matter.
Preferably, also including product catcher, the product catcher and reaction chamber UNICOM, for collecting after reaction
Product.
Preferably, the assistant formula electric capacity, the triggering electrode resistance, gas gap steepness switch and the product are received
During storage is embedded in the insulant of the plasma generator end and it is exposed outside, in order to checking or changing.
Preferably, the prime charger also includes function display floater, arranges multiple controls on the function display floater
System switch and display lamp, for the electric state of control and characterization apparatus according to actual needs.
Preferably, also including flow speed controller, the flow speed controller is arranged at the opening of reaction chamber, for regulation
Grain or gaseous matter flow into the speed of reaction chamber.
Preferably, also including pedestal, the pedestal is arranged on the side of the column structure of the plasma generator, uses
In the support plasma generator；The prime charger is arranged on the side of the column structure of the plasma generator
Face, it is just right with the pedestal.
In general, by the contemplated above technical scheme of the present invention compared with prior art, with following beneficial effect
Really：
（1）By prime charger produce low pressure repetition microsecond pulse voltage, then Jing transformer boosts and steepness gap it is steep
Change, obtain high pressure repetition nanosecond pulse voltage.As a result of repetition nanosecond pulse mode of excitation, electric discharge can be pressed off in air
Drop a hint and no block media in the environment of carry out, it is to avoid using complicated vacuum pump and rare gas bottle etc. with suit
Put, and in plasma electronics and active particle energy it is bigger, concentration is higher, sparking electrode spacing is bigger, with higher
Capacity usage ratio.
（2）Dexterously using the hollow parts of air-core transformer as the reaction chamber for processing granule and gaseous matter, and by phase
Close electrical equipment to be embedded in crust of the device, by plasma generator and the reaction chamber active set for processing granule and gaseous matter
Into highly shortened the wire length of electric loop, reduce line inductance and other stray parameters, be easy to the standard of product
Change and promote.Moreover, the device has the advantages that small volume, lightweight, stability be high, compact conformation, contributes to practical
And expand the new application of plasma.
（3）Multiple controlling switches and display lamp can be provided with function display floater, can be controlled according to actual needs and table
Levy the electric state of device.
Description of the drawings
Fig. 1 is the structural representation of the device that granule and gaseous matter are processed with nonequilibrium plasma of the embodiment of the present invention
Figure；
Fig. 2 is the electrical connection schematic diagram of the plasma generator of the embodiment of the present invention.
In all of the figs, identical reference be used for represent identical element or structure, wherein：101- external shields
Layer, 102- original sides low pressure winding, 103- external insulation layers, 104- assistant formula high pressure windings, 105- inner insulating layers, 106- internal shields,
107- assistant formula electric capacity, 108- triggering electrode resistances, 109- gas gaps steepness switch, 111- product catchers, 113- quoits,
114- pedestals, 201- electrode suppors, 202- high-field electrodes, 203- flow speed controllers, 204- linear electrodes, 205- metallic plates,
301- DC sources, 302- function display floaters, 303- resonant charging circuits.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, it is below in conjunction with drawings and Examples, right
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only to explain the present invention, and
It is not used in the restriction present invention.As long as additionally, technical characteristic involved in invention described below each embodiment
Do not constitute conflict each other can just be mutually combined.
The device that granule and gaseous matter are processed with nonequilibrium plasma of the embodiment of the present invention include prime charger,
Plasma generator and product catcher 111.Fig. 1 be the embodiment of the present invention with nonequilibrium plasma process granule and
The structural representation of the device of gaseous matter, Fig. 2 are the electrical connection schematic diagrams of the plasma generator of the embodiment of the present invention,
Technical scheme is described in detail with reference to Fig. 1 and Fig. 2.
Reaction chamber is provided with centered on plasma generator（The process of granule or gaseous matter is directly entered in reaction intracavity
OK）Cylindrical-shaped structure, including external shielding layer 101, original side's low pressure winding 102, external insulation layer 103, assistant formula high pressure winding 104,
Inner insulating layer 105, internal shield 106, assistant formula electric capacity 107, triggering electrode resistance 108, gas gap steepness switch 109, electrode
Frame 201, high-field electrode 202, linear electrode 204 and metallic plate 205.
Electrode suppor 201 is cylindrical structure, is arranged on reaction chamber side wall, and its inner surface is carved with helical groove.High-tension electricity
Pole 202 is helicoidal structure, is embedded in groove.Metallic plate 205 is arranged on reaction chamber bottom, is grounded by quoit 113.Straight line
Electrode 204 is arranged on the axle center of reaction chamber, closely welds with metallic plate 205.The outer layer of electrode suppor 201 coats inner shield successively
Layer 106 and inner insulating layer 105.Assistant formula high pressure winding 104 is entwined by enamel-covered wire, is arranged on the periphery of inner insulating layer 105, and one
End connection gas gap steepness switchs 109 input, and the other end is grounded by quoit 113.External insulation layer 103 is coated completely
Assistant formula high pressure winding 104, with ensure to be formed between original side's low pressure winding 102 and assistant formula high pressure winding 104 it is good it is electric every
From.Original side's low pressure winding 102 is made up of metal forming, is arranged on the periphery of external insulation layer 103, one end connection resonant charging circuit
303 high-pressure side, the other end are grounded by quoit 113.External shielding layer 101 coats original side's low pressure winding 102 completely, to prevent
Prime charger is disturbed by plasma generator.Internal shield 106 and external shielding layer 101 adopt metal material system
Make.
The two ends of plasma generator are coated by an insulating material, wherein, with metallic plate 205 just to one end with it is anti-
The corresponding position in Ying Qiang centers is provided with opening, used as granule or the input port of gaseous matter.Preferably, it is embedded at opening
Flow speed controller 203, flows into the speed of reaction chamber for adjusting granule or gaseous matter.Assistant formula electric capacity 107, triggering electrode resistance
108th, gas gap steepness switch 109 and product catcher 111 are embedded in the insulant of end, wherein, assistant formula electric capacity
107 one end connection gas gap steepness switchs 109 input, and the other end is grounded by quoit 113, triggers electrode resistance
108 one end connection gas gap steepness switchs 109 trigger electrode, and the other end is grounded by quoit 113, gas gap steepness
The outfan connection high-field electrode 202 of switch 109.Biological collector 111 and reaction chamber UNICOM, for collecting reacted generation
Thing.Preferably, assistant formula electric capacity 107, triggering electrode resistance 108, gas gap steepness switch 109 and product catcher 111 are naked
Expose outside, be easy to check or change.
Pedestal 114 is arranged on the side of the column structure of plasma generator, for supporting plasma generator.
Prime charger is arranged on the side of the column structure of plasma generator, just right with pedestal 114, including direct current
Power supply 301 and resonance charging circuit 303.DC source 301 can be bridge rectifier, for resonant charging circuit 303
DC voltage is provided, for safety, using isolating transformer and there should be ground wire to the primary power of the power supply of DC source 301.
Resonant charging circuit 303 is used to charge to original side's low pressure winding 102, by the structure and parameter for adjusting resonant charging circuit 303
Obtain the ac pulse voltage of different wave.Preferably, prime charger also includes function display floater 302, can set thereon
Multiple controlling switches and display lamp are put, for the electric state of control and characterization apparatus according to actual needs.
The plasma generator of the present invention can be realized using the cylinder type structure similar to air-core transformer, ingenious
Using the hollow parts with air-core transformer as granule or gaseous matter reaction chamber so that apparatus structure is compact, small volume, and
The wire length of electric loop is highly shortened, line inductance and other stray parameters are reduced.
The operation principle of the above-mentioned device that granule and gaseous matter are processed with nonequilibrium plasma is as follows.Original side's low pressure around
Group 102 provides low pressure repetition microsecond pulse voltage by prime charger, is acted on by the electromagnetic coupled of transformator, with assistant formula high pressure
104 coupled boost of winding obtains high pressure repetition microsecond pulse voltage.Meanwhile, the assistant formula electric capacity in parallel with assistant formula high pressure winding 104
107 will also produce high-voltage pulse, then switch 109 steepness through gas gap steepness, just can form high pressure on high-field electrode 202
Repetition nanosecond pulse.Atmospheric air of the high pressure repetition nanosecond pulse between spiral high-field electrode 202 and linear electrode 204
In complete gas breakdown, so as to form large-area nonequilibrium plasma in the reactor chamber, for processing particulate matter or having
Machine gas.
As it will be easily appreciated by one skilled in the art that the foregoing is only presently preferred embodiments of the present invention, not to
The present invention, all any modification, equivalent and improvement made within the spirit and principles in the present invention etc. are limited, all should be included
Within protection scope of the present invention.
Claims (3)
1. a kind of device that granule and gaseous matter are processed with nonequilibrium plasma, it is characterised in that including prime charger
And plasma generator；
The prime charger includes DC source (301) and resonance charging circuit (303), wherein, the DC source (301)
For providing DC voltage for the resonant charging circuit (303), the resonant charging circuit (303) is for for the plasma
Body generator provides ac pulse voltage；
It is provided with the cylindrical-shaped structure of reaction chamber centered on the plasma generator, including external shielding layer (101), original side is low
Pressure winding (102), external insulation layer (103), assistant formula high pressure winding (104), inner insulating layer (105), internal shield (106), assistant formula
Electric capacity (107), triggering electrode resistance (108), gas gap steepness switch (109), electrode suppor (201), high-field electrode (202),
Linear electrode (204) and metallic plate (205)；
The electrode suppor (201) is cylindrical structure, is arranged on reaction chamber side wall, and its inner surface is carved with helical groove, described
High-field electrode (202) is helicoidal structure, is embedded in groove, and the metallic plate (205) is arranged on reaction chamber bottom and is grounded, institute
The axle center that linear electrode (204) is arranged on reaction chamber is stated, is closely welded with the metallic plate (205), the electrode suppor (201)
Outer layer coat the internal shield (106) and the inner insulating layer (105) successively, the assistant formula high pressure winding (104) is arranged
In the periphery of the inner insulating layer (105), one end connects the input of gas gap steepness switch (109), another termination
Ground, the external insulation layer (103) coats the assistant formula high pressure winding (104) completely, to ensure in original side's low pressure winding
(102) good electrical isolation is formed and the assistant formula high pressure winding (104) between, original side's low pressure winding (102) is arranged
In the periphery of the external insulation layer (103), one end connects the high-pressure side of the resonant charging circuit (303), other end ground connection, institute
State external shielding layer (101) and coat original side's low pressure winding (102) completely, with prevent the prime charger be subject to the grade from
The interference of daughter generator；
One end of the assistant formula electric capacity (107) connects the input of gas gap steepness switch (109), and the other end is grounded,
One end of triggering electrode resistance (108) connects the trigger electrode of gas gap steepness switch (109), other end ground connection, institute
The outfan for stating gas gap steepness switch (109) connects the high-field electrode (202)；
The two ends of the plasma generator are coated by an insulating material, wherein, with the metallic plate (205) just to one end
Position corresponding with reaction chamber center be provided with opening, for the input port as granule or gaseous matter；
Also include product catcher (111), the product catcher (111) and reaction chamber UNICOM, for collecting after reaction
Product；
Also include flow speed controller (203), the flow speed controller (203) is arranged at the opening of reaction chamber, for regulation
Grain or gaseous matter flow into the speed of reaction chamber；
Also include pedestal (114), the pedestal (114) is arranged on the side of the column structure of the plasma generator, uses
In the support plasma generator；The prime charger is arranged on the side of the column structure of the plasma generator
Face, it is just right with the pedestal (114).
2. the device of granule and gaseous matter is processed with nonequilibrium plasma as claimed in claim 1, it is characterised in that institute
State assistant formula electric capacity (107), triggering electrode resistance (108), gas gap steepness switch (109) and the product to collect
Device (111) be embedded in the plasma generator end insulant in and it is exposed outside, in order to checking or changing.
3. the device of granule and gaseous matter is processed with nonequilibrium plasma as claimed in claim 1, it is characterised in that institute
State prime charger also include function display floater (302), arrange on the function display floater (302) multiple controlling switches and
Display lamp, for the electric state of control and characterization apparatus according to actual needs.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410134595.XA CN103917035B (en) | 2014-04-03 | 2014-04-03 | Device for handling particles and gaseous material using non equilibrium plasma |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410134595.XA CN103917035B (en) | 2014-04-03 | 2014-04-03 | Device for handling particles and gaseous material using non equilibrium plasma |
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| Publication Number | Publication Date |
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| CN103917035A CN103917035A (en) | 2014-07-09 |
| CN103917035B true CN103917035B (en) | 2017-04-19 |
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| CN201410134595.XA Expired - Fee Related CN103917035B (en) | 2014-04-03 | 2014-04-03 | Device for handling particles and gaseous material using non equilibrium plasma |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI788390B (en) | 2017-08-10 | 2023-01-01 | 美商應用材料股份有限公司 | A distributed electrode array for plasma processing |
| CN108990248B (en) * | 2018-10-11 | 2024-03-26 | 南京苏曼等离子科技有限公司 | Plasma generating device and application thereof |
| EP3934389A1 (en) * | 2020-07-03 | 2022-01-05 | terraplasma emission control GmbH | Plasma source apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102307425A (en) * | 2011-06-24 | 2012-01-04 | 北京大学 | Combinable array plasma generating device |
| CN203167413U (en) * | 2012-12-10 | 2013-08-28 | 中国科学院等离子体物理研究所 | Atmospheric-pressure dispersion-type cold plasma generator |
| CN103458600A (en) * | 2013-07-31 | 2013-12-18 | 华中科技大学 | System producing atmospheric pressure dispersion discharging non-equilibrium plasma |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001118697A (en) * | 1999-10-18 | 2001-04-27 | Tadahiro Sakuta | Induction plasma generating apparatus |
| DE102009015510B4 (en) * | 2009-04-02 | 2012-09-27 | Reinhausen Plasma Gmbh | Method and beam generator for generating a collimated plasma jet |
| EP2854268B1 (en) * | 2011-09-15 | 2018-11-07 | Cold Plasma Medical Technologies, Inc. | Cold plasma treatment devices and associated methods |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102307425A (en) * | 2011-06-24 | 2012-01-04 | 北京大学 | Combinable array plasma generating device |
| CN203167413U (en) * | 2012-12-10 | 2013-08-28 | 中国科学院等离子体物理研究所 | Atmospheric-pressure dispersion-type cold plasma generator |
| CN103458600A (en) * | 2013-07-31 | 2013-12-18 | 华中科技大学 | System producing atmospheric pressure dispersion discharging non-equilibrium plasma |
Non-Patent Citations (1)
| Title |
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| 利用重复频率纳秒脉冲和线电极产生常温常压下的大气压弥散放电;李黎等;《中国电机工程学报》;20140125;第34卷(第3期);第461-466页的第1-2部分，图1-7 * |
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