CN100358198C - Method for uniform glow discharge in atmosphere air - Google Patents
Method for uniform glow discharge in atmosphere air Download PDFInfo
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- CN100358198C CN100358198C CNB2005100113725A CN200510011372A CN100358198C CN 100358198 C CN100358198 C CN 100358198C CN B2005100113725 A CNB2005100113725 A CN B2005100113725A CN 200510011372 A CN200510011372 A CN 200510011372A CN 100358198 C CN100358198 C CN 100358198C
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- barrier discharge
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Abstract
The present invention belongs to the technical field of gas discharge, which relates to a method for realizing the uniform glow discharge in the air under the atmospheric pressure. The present invention provides a method which utilizes an additional plasma source which is not connected with a capacitor type dielectric barrier discharge device with high frequency (1khz to 100khz) in a circuit mode to fill a primary plasma into a discharge space to increase the electric charge concentration of the discharge space and realize the uniform glow discharge in the air under the atmospheric pressure. When the distance of an air gap of the dielectric barrier discharge is from 2mm to 6mm, the uniform glow discharge can be generated, the filament phenomenon of the discharge is eliminated, and the effect and the degree of uniformity are not affected by the frequency and the power of a dielectric barrier discharge power supply and the shape and the area of a dielectric barrier electrode.
Description
Technical field
The invention belongs to the gas discharge technical field, relate to a kind of method that is used for realizing the atmosphere air uniform glow discharge.
Background technology
The low temperature plasma surface treatment can make material surface that multiple physics, chemical change take place, and changes its hydrophily, cementability, stainability and electrical property or the like, has wide prospect in industrial application.The low temperature plasma that glow discharge produces is because its power density is moderate and be evenly distributed, on processing some fibre material, has special advantage, but be that glow discharge under the low pressure or the atmospheric pressure glow discharge of realizing in some special gas such as helium all be unable to do without vacuum plant, influence the realization of continuous productive process and the raising of production efficiency greatly, increased operating cost.High frequency (1 KHz～100 KHz) capacitor type dielectric barrier discharge is one of glow discharge form of using always, because the complicated component of air, disruptive field intensity is higher, be difficult to realize glow discharge, airborne dielectric barrier discharge occurs with filamentous streamer form usually, the inhomogeneous local overheating that causes of discharge has limited its application on some material surfaces are handled.Theoretical research shows, if do not take adequate measures to increase the required initiating electron concentration of discharge, just can not cause discharge under low electric field strength, realizes uniform glow discharge in the atmosphere air.
Patent of invention 96117213.4 discloses a kind of method of the utilization rate of electrical that adopts main and auxiliary discharge to combine to improve this class electric discharge device, and it to the power output of main and auxiliary discharge power supply and the requirement of frequency is: 1) P
Main＞＞P
Auxilliary2) f
Main＜f
Auxilliary(P: power, f: frequency), and along with the development of high frequency electric source technology, by the improvement and design to power supply itself overcome that the high-power high-frequency power-efficient is low, complex structure, shortcoming that cost is high, need not auxiliary discharge, the utilization rate of electrical of this class electric discharge device can reach very high level.But multinomial experimental study has been carried out in the glow discharge in utilizing high frequency capacitance type dielectric barrier discharge realization atmosphere air both at home and abroad at present, still can not solve the problem of non-uniform of atmospherical discharges, use the auxiliary discharge method can not change the filament phenomenon of atmosphere air medium barrier discharge at present.
Summary of the invention
In order to improve the deficiencies in the prior art, eliminate the filament phenomenon of atmosphere air medium-high frequency (1 KHz～100 KHz) capacitor type dielectric barrier discharge, make the spatial distribution of discharge more even, the present invention proposes a kind of method that is used for realizing the atmosphere air uniform glow discharge.Utilize that not have the plasma source that adds that circuit gets in touch with the dielectric barrier discharge device be that initial plasma is injected in high frequency capacitance type dielectric barrier discharge space, increase the concentration of electric charges of discharge space, reduce the required electric field strength of gas discharge, eliminate the filament phenomenon of discharge, to realize the purpose of uniform glow discharge in the atmosphere air.
To achieve these goals, the method that the present invention adopts is: at first, utilization adds plasma source and prepares plasma, the described plasma source that adds is that 20 KHz AC power and metal electrode connect to form by frequency, add the alternating voltage on the aerial metal electrode by progressively raising, make it produce airborne arc discharge, prepare plasma; Secondly, with the parallel gas gap near high frequency capacitance type dielectric barrier discharge device of the plasma spout that adds plasma source, the distance that makes itself and dielectric barrier is smaller or equal to 1 centimetre; The injection direction of described plasma is aimed at the center of gas gap, at at least 4 atmospheric pressure of stream pressure, under the effect of the air-flow of gas flow at least 3 cubic meters per minute, described plasma sprays into the gas gap of high frequency capacitance type dielectric barrier discharge device by the plasma spout, the gas gap distance of described high frequency capacitance type dielectric barrier discharge device is 2 millimeters～6 millimeters, for dielectric barrier discharge continues to provide initial plasma; At last, voltage to the gas gap of rising high frequency capacitance type dielectric barrier discharge device punctures, and injects under the influence at this pressure plasma, and the required electric field strength of dielectric barrier discharge can reduce, and it is all even stable that interelectrode discharge also can become.
The invention has the beneficial effects as follows to produce uniform glow discharge that eliminate the filament phenomenon of discharge, its effect and uniformity coefficient are not subjected to the influence of dielectric barrier discharge supply frequency, power, dielectric barrier electrode shape and area size.
Description of drawings
Fig. 1 is the inventive method equipment disposition sketch
Embodiment
The specific embodiment of the present invention adds plasma source 1, plasma spout 2, high frequency capacitance type dielectric barrier discharge device 3 as accompanying drawing 1 layout for what will be used to prepare plasma, plasma spout 2 parallel gas gaps near high frequency capacitance type dielectric barrier discharge device 3, apart from 1 centimetre of the distance of dielectric barrier discharge device 3 dielectric barriers, the plasma jet direction is pointed to the center of gas gap.The metal electrode 11 that adds plasma source 1 is connected with the AC power 12 of 20 KHz, the voltage of the AC power that progressively raises 12, make metal electrode 11 that arc discharge take place and produce plasma, utilizing stream pressure is 4 atmospheric pressure, gas flow is the air-flow of 3 cubic meters per minute sprays into plasma high frequency capacitance type dielectric barrier discharge device 3 by plasma spout 2 a gas gap, plasma enters gas gap under the blowing of air-flow, for dielectric barrier discharge continues to provide initial plasma, the gas gap of high frequency capacitance type dielectric barrier discharge device 3 is 4 millimeters, voltage to the gas gap of rising high frequency capacitance type dielectric barrier discharge device 3 punctures the glow discharge that can obtain to be evenly distributed in the atmosphere air.
Claims (1)
1. method that is used for realizing the atmosphere air uniform glow discharge is characterized in that:
At first, utilization adds plasma source and prepares plasma, and the described plasma source that adds is that 20 KHz AC power and metal electrode connect to form by frequency;
Secondly, with the parallel gas gap near high frequency capacitance type dielectric barrier discharge device of the plasma spout that adds plasma source, the distance that makes itself and dielectric barrier is smaller or equal to 1 centimetre; The injection direction of described plasma is aimed at the center of gas gap, at at least 4 atmospheric pressure of stream pressure, under the effect of the air-flow of gas flow at least 3 cubic meters per minute, described plasma sprays into the gas gap of high frequency capacitance type dielectric barrier discharge device by the plasma spout, and the gas gap distance of described high frequency capacitance type dielectric barrier discharge device is 2 millimeters～6 millimeters;
At last, voltage to the gas gap of rising high frequency capacitance type dielectric barrier discharge device punctures.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100113725A CN100358198C (en) | 2005-03-02 | 2005-03-02 | Method for uniform glow discharge in atmosphere air |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2005100113725A CN100358198C (en) | 2005-03-02 | 2005-03-02 | Method for uniform glow discharge in atmosphere air |
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| Publication Number | Publication Date |
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| CN1694324A CN1694324A (en) | 2005-11-09 |
| CN100358198C true CN100358198C (en) | 2007-12-26 |
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| CNB2005100113725A Expired - Fee Related CN100358198C (en) | 2005-03-02 | 2005-03-02 | Method for uniform glow discharge in atmosphere air |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011089912A1 (en) * | 2010-01-25 | 2011-07-28 | 株式会社日立ハイテクノロジーズ | Mass spectrometry device |
| CN102896115A (en) * | 2011-07-26 | 2013-01-30 | 中国科学院微电子研究所 | Novel normal-pressure medium barrier type active free radical cleaning equipment |
| CN102946685B (en) * | 2012-10-15 | 2016-01-20 | 中国科学院西安光学精密机械研究所 | Atmospheric pressure induced air dielectric barrier discharge low-temperature plasma generating means |
| CN103179772B (en) * | 2013-03-08 | 2016-04-20 | 河北大学 | Produce method and the special purpose device thereof of DC Atmospheric Pressure Glow Discharge |
| CN103245655B (en) * | 2013-05-20 | 2015-11-18 | 大连理工大学 | A kind of experimental provision obtaining Large-Area-Uniform discharge plasma |
| CN104918402A (en) * | 2015-06-01 | 2015-09-16 | 东华大学 | Device for common voltage high voltage radio cooperation radio frequency glow jet discharge and discharge method |
| CN105699359A (en) * | 2016-01-18 | 2016-06-22 | 大连理工大学 | Experimental device and method for obtaining annular uniform plasmas in barometric pressure air |
| CN109587921A (en) * | 2018-11-16 | 2019-04-05 | 中国科学院合肥物质科学研究院 | A kind of plasma jet generating device coupling high energy electron |
| CN112087854B (en) * | 2019-06-12 | 2024-01-23 | 中国石油化工股份有限公司 | Dielectric barrier discharge plasma generating device |
| CN112543543A (en) * | 2019-09-20 | 2021-03-23 | 中国石油化工股份有限公司 | Plasma discharge device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1005512B (en) * | 1985-10-04 | 1989-10-18 | 中国科学院上海光学精密机械研究所 | Chamber of gas glow discharge |
| CN1075676C (en) * | 1996-12-16 | 2001-11-28 | 戴建国 | HF-assisted LF medium blocking-discharge method and equipment |
| US20030030374A1 (en) * | 2001-08-03 | 2003-02-13 | Deepak Pai | Dielectric barrier discharge plasma reactor cell |
| WO2004023615A1 (en) * | 2002-09-04 | 2004-03-18 | Sharp Kabushiki Kaisha | Ion generating device, method for manufacturing ion generating device, ion generator having ion generating device, and electric apparatus having ion generator |
-
2005
- 2005-03-02 CN CNB2005100113725A patent/CN100358198C/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1005512B (en) * | 1985-10-04 | 1989-10-18 | 中国科学院上海光学精密机械研究所 | Chamber of gas glow discharge |
| CN1075676C (en) * | 1996-12-16 | 2001-11-28 | 戴建国 | HF-assisted LF medium blocking-discharge method and equipment |
| US20030030374A1 (en) * | 2001-08-03 | 2003-02-13 | Deepak Pai | Dielectric barrier discharge plasma reactor cell |
| WO2004023615A1 (en) * | 2002-09-04 | 2004-03-18 | Sharp Kabushiki Kaisha | Ion generating device, method for manufacturing ion generating device, ion generator having ion generating device, and electric apparatus having ion generator |
Non-Patent Citations (1)
| Title |
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| 介质阻挡均匀大气压辉光放电数值模拟研究 王艳辉，王德真.物理学报，第52卷第7期 2003 * |
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| CN1694324A (en) | 2005-11-09 |
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Granted publication date: 20071226 Termination date: 20110302 |