CN103917035A - Device for handling particles and gaseous material using non equilibrium plasma - Google Patents
Device for handling particles and gaseous material using non equilibrium plasma Download PDFInfo
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- CN103917035A CN103917035A CN201410134595.XA CN201410134595A CN103917035A CN 103917035 A CN103917035 A CN 103917035A CN 201410134595 A CN201410134595 A CN 201410134595A CN 103917035 A CN103917035 A CN 103917035A
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Abstract
The invention discloses a device for handling particles and gaseous material using non equilibrium plasma. The device comprises a pre-level charger and a plasma generator. The pre-level charger comprises a direct current power source and a resonant charging circuit. The direct current power source is used for supplying direct current voltage for the resonant charging circuit, and the resonant charging circuit is used for supplying alternating current impulse voltage for the plasma generator. The plasma generator is of a cylindrical structure with a reacting cavity in the center and comprises an external shielding layer, a primary low voltage winding, an external insulating layer, a secondary high voltage winding, an internal insulating layer, an internal shielding layer, a secondary capacitor, trigger electrode resistance, a gas clearance steepening switch, an electrode support, a high voltage electrode, a direct line electrode and a metal plate. Particle or gaseous material handling is conducted directly in the reacting cavity. The device discharging can be conducted under the atmospheric pressure opening air environment without blocking media, the energy of electrons and active particles in the plasma is stronger, concentration is higher, and the device is compact in structure, small in size and high in stability.
Description
Technical field
The invention belongs to plasma generation technical field, more specifically, relate to a kind of device of processing particle and gaseous matter with nonequilibrium plasma.
Background technology
Nonequilibrium plasma is a kind of partially ionized low temperature plasma, and the temperature difference of its electronics and ion is very large.In this plasma, contain a large amount of active particles with high reactivity, as: high energy electron, metastable state ion, free radical etc.Meanwhile, its bulk temperature is very low, therefore, is widely used in the numerous areas such as the sterilizing of materials processing and surface treatment, pollutant processing, medical science aspect.
Process particulate matter with nonequilibrium plasma and comprise physical action and chemical action.Physical action refers to that high energy electron in plasma and active particle collide and corrode some organic granular material surface, form spot, change surperficial roughness and surface area (as PETG particle), or generate less particle (as aerosol shape material), remove the pollutant of material surface and the low molecular compound evaporating simultaneously, reach cleaning sterilization, strengthen the object of antibiotic property.Chemical action refers to that the energetic particle hits particle surface in plasma can generate a large amount of living radicals, these free radicals interact and form a kind of cross-linked layer of densification, and form active group with other composition effects in plasma, as containing oxygen base, hydroxyl, carbonyl etc., change the chemical composition (as carbon black pellet thing) of particle surface.Nonequilibrium plasma can also be used to process organic gas material, reaches the object of decomposing organic gas material by destroying the chemical bond of organic gas molecule.
At present, process in the device of particulate matter with nonequilibrium plasma, nonequilibrium plasma is mainly to exchange or direct voltage is drive source, and the method that adopts dielectric impedance or manufacture noble gas discharge atmosphere makes.There is following defect in these methods: (1) discharge environment usually needs to use rare gas, low pressure or vacuum, and plasma device need to be equipped with the complicated equipment such as rare gas bottle, vacuum pump, and is difficult to obtain large-area nonequilibrium plasma.(2) greatly reduce the density of ionizing efficiency and high energy electron due to the use of block media, and very easily change the chemical composition of plasma environment, pollute.(3) weak point of atmospheric pressure corona discharge is to ionize mainly to concentrate near electrode, is difficult to equally obtain large-area nonequilibrium plasma.(4) nonequilibrium plasma that adopts interchange or direct current to obtain as excitaton source at present has obvious heating to gas, and capacity usage ratio is very low.Above-mentioned reason has greatly limited the range of application of nonequilibrium plasma.In addition, because nonequilibrium plasma generator separates with the reaction chamber of processing particle and gaseous matter, the large and poor stability of device volume.
Summary of the invention
For above defect or the Improvement requirement of prior art, the invention provides a kind of device of processing particle and gaseous matter with nonequilibrium plasma, adopt repetition nanosecond pulse mode of excitation, make electric discharge can and not have at atmospheric pressure open air to carry out under the environment of block media, avoid using the corollary apparatus such as complicated vacuum pump and rare gas bottle, and in plasma, the energy of electronics and active particle is larger, concentration is higher, sparking electrode spacing is larger, has higher capacity usage ratio.In addition, by plasma generator and the reaction chamber effective integration of processing particle and gaseous matter, greatly shorten the wire length of electric loop, line inductance and other stray parameters are reduced, be convenient to the standardized and popularized of product, and device volume is little, lightweight, stability is high, compact conformation.
For achieving the above object, the invention provides a kind of device of processing particle and gaseous matter with nonequilibrium plasma, it is characterized in that, comprise prime charger and plasma generator;
Described prime charger comprises DC power supply and resonance charging circuit, and wherein, described DC power supply is used to described resonant charging circuit that direct voltage is provided, and described resonant charging circuit is used to described plasma generator that ac pulse voltage is provided;
Centered by described plasma generator, be provided with the cylindrical-shaped structure of reaction chamber, comprise outer shielding layer, former side's low pressure winding, external insulation layer, secondary side's high pressure winding, inner insulating layer, internal shield, secondary side's electric capacity, trigger electrode resistance, gas gap steepness switch, electrode suppor, high-field electrode, linear electrode and metallic plate;
Described electrode suppor is cylindrical structure, be arranged on reaction chamber sidewall, its inner surface is carved with helical groove, described high-field electrode is helicoidal structure, embed in groove, described metallic plate is arranged on reaction chamber bottom ground connection, described linear electrode is arranged on the axle center of reaction chamber, closely weld with described metallic plate, the skin of described electrode suppor is coated described internal shield and described inner insulating layer successively, described pair side high pressure winding is arranged on the periphery of described inner insulating layer, one end connects the input of described gas gap steepness switch, other end ground connection, the completely coated described pair side of described external insulation layer high pressure winding, to guarantee forming good electrical isolation between described former side's low pressure winding and described pair side high pressure winding, described former side's low pressure winding is arranged on the periphery of described external insulation layer, one end connects the high-pressure side of described resonant charging circuit, other end ground connection, the completely coated described former side's low pressure winding of described outer shielding layer, to prevent that described prime charger is subject to the interference of described plasma generator,
One end of described pair side electric capacity connects the input of described gas gap steepness switch, other end ground connection, one end of described trigger electrode resistance connects the trigger electrode of described gas gap steepness switch, other end ground connection, and the output of described gas gap steepness switch connects described high-field electrode;
It is coated that the two ends of described plasma generator are all insulated material, and wherein, the corresponding position with reaction chamber center of one end just right with described metallic plate is provided with opening, for the input port as particle or gaseous matter.
Preferably, also comprise product gatherer, described product gatherer and reaction chamber UNICOM, for collecting reacted product.
Preferably, described pair side electric capacity, described trigger electrode resistance, described gas gap steepness switch and described product gatherer all embed in the insulating material of described plasma generator end and are outside exposed, so that check or change.
Preferably, described prime charger also comprises Fumction display panel, on described Fumction display panel, multiple control switchs and indicator light is set, for controlling according to actual needs and the electric state of characterization apparatus.
Preferably, also comprise flow speed controller, described flow speed controller is arranged on the opening part of reaction chamber, for regulating particle or gaseous matter to flow into the speed of reaction chamber.
Preferably, also comprise pedestal, described pedestal is arranged on the side of the column structure of described plasma generator, for supporting described plasma generator; Described prime charger is arranged on the side of the column structure of described plasma generator, just right with described pedestal.
In general, the above technical scheme of conceiving by the present invention compared with prior art, has following beneficial effect:
(1) produce low pressure repetition microsecond pulse voltage by prime charger, then boost and steepness gap steepness through transformer, obtain high pressure repetition nanosecond pulse voltage.Owing to having adopted repetition nanosecond pulse mode of excitation, electric discharge can and not have at atmospheric pressure open air to carry out under the environment of block media, avoid using the corollary apparatus such as complicated vacuum pump and rare gas bottle, and in plasma, the energy of electronics and active particle is larger, concentration is higher, sparking electrode spacing is larger, has higher capacity usage ratio.
(2) dexterously using the hollow parts of air-core transformer as the reaction chamber of processing particle and gaseous matter, and related electric element is embedded in crust of the device, by plasma generator and the reaction chamber effective integration of processing particle and gaseous matter, greatly shorten the wire length of electric loop, reduce line inductance and other stray parameters, be convenient to the standardized and popularized of product.Moreover, this device has the advantages such as volume is little, lightweight, stability is high, compact conformation, contributes to the practical and new application of expansion plasma.
(3) on Fumction display panel, multiple control switchs and indicator light can be provided with, the electric state with characterization apparatus can be controlled according to actual needs.
Accompanying drawing explanation
Fig. 1 is the structural representation of the device with nonequilibrium plasma processing particle and gaseous matter of the embodiment of the present invention;
Fig. 2 is the electrical connection schematic diagram of the plasma generator of the embodiment of the present invention.
In institute's drawings attached, identical Reference numeral is used for representing identical element or structure, wherein: 101-outer shielding layer, the former side's low pressure of 102-winding, 103-external insulation layer, 104-pair side high pressure winding, 105-inner insulating layer, 106-internal shield, 107-pair side electric capacity, 108-trigger electrode resistance, 109-gas gap steepness switch, 111-product gatherer, 113-quoit, 114-pedestal, 201-electrode suppor, 202-high-field electrode, 203-flow speed controller, 204-linear electrode, 205-metallic plate, 301-DC power supply, 302-Fumction display panel, 303-resonant charging circuit.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein, only in order to explain the present invention, is not intended to limit the present invention.In addition,, in each execution mode of described the present invention, involved technical characterictic just can combine mutually as long as do not form each other conflict.
The device with nonequilibrium plasma processing particle and gaseous matter of the embodiment of the present invention comprises prime charger, plasma generator and product gatherer 111.Fig. 1 is the structural representation of the device with nonequilibrium plasma processing particle and gaseous matter of the embodiment of the present invention, Fig. 2 is the electrical connection schematic diagram of the plasma generator of the embodiment of the present invention, below in conjunction with Fig. 1 and Fig. 2, technical scheme of the present invention is elaborated.
Centered by plasma generator, be provided with the cylindrical-shaped structure of reaction chamber (processing of particle or gaseous matter is directly carried out in reaction chamber), comprise outer shielding layer 101, former side's low pressure winding 102, external insulation layer 103, secondary side's high pressure winding 104, inner insulating layer 105, internal shield 106, secondary side's electric capacity 107, trigger electrode resistance 108, gas gap steepness switch 109, electrode suppor 201, high-field electrode 202, linear electrode 204 and metallic plate 205.
Electrode suppor 201 is cylindrical structure, is arranged on reaction chamber sidewall, and its inner surface is carved with helical groove.High-field electrode 202 is helicoidal structure, embeds in groove.Metallic plate 205 is arranged on reaction chamber bottom, by quoit 113 ground connection.Linear electrode 204 is arranged on the axle center of reaction chamber, closely welds with metallic plate 205.The skin of electrode suppor 201 is coated internal shield 106 and inner insulating layer 105 successively.Pair side's high pressure winding 104 is entwined by enamelled wire, is arranged on the periphery of inner insulating layer 105, and one end connects the input of gas gap steepness switch 109, and the other end is by quoit 113 ground connection.The completely coated secondary side's high pressure winding 104 of external insulation layer 103, to guarantee forming good electrical isolation between former side's low pressure winding 102 and secondary side's high pressure winding 104.Former side's low pressure winding 102 is made up of metal forming, is arranged on the periphery of external insulation layer 103, and one end connects the high-pressure side of resonant charging circuit 303, and the other end is by quoit 113 ground connection.The completely coated former side's low pressure winding 102 of outer shielding layer 101, to prevent that prime charger is subject to the interference of plasma generator.Internal shield 106 and outer shielding layer 101 all adopt metal material to make.
It is coated that the two ends of plasma generator are all insulated material, and wherein, the corresponding position with reaction chamber center of one end just right with metallic plate 205 is provided with opening, as the input port of particle or gaseous matter.Preferably, embed flow speed controller 203 at opening part, for regulating particle or gaseous matter to flow into the speed of reaction chamber.Pair side's electric capacity 107, trigger electrode resistance 108, gas gap steepness switch 109 and product gatherer 111 all embed in the insulating material of end, wherein, one end of pair side's electric capacity 107 connects the input of gas gap steepness switch 109, the other end is by quoit 113 ground connection, one end of trigger electrode resistance 108 connects the trigger electrode of gas gap steepness switch 109, the other end is by quoit 113 ground connection, and the output of gas gap steepness switch 109 connects high-field electrode 202.Biological gatherer 111 and reaction chamber UNICOM, for collecting reacted product.Preferably, secondary side's electric capacity 107, trigger electrode resistance 108, gas gap steepness switch 109 and product gatherer 111 are all outside exposed, are convenient to check or change.
Pedestal 114 is arranged on the side of the column structure of plasma generator, for supporting plasma generator.
Prime charger is arranged on the side of the column structure of plasma generator, just right with pedestal 114, comprises DC power supply 301 and resonance charging circuit 303.DC power supply 301 can be bridge rectifier, and for direct voltage being provided to resonant charging circuit 303, for safety, the primary power of powering to DC power supply 301 should use isolating transformer and have ground wire.Resonant charging circuit 303 is for charging to former side's low pressure winding 102, by regulating the structure and parameter of resonant charging circuit 303 to obtain the ac pulse voltage of different wave.Preferably, prime charger also comprises Fumction display panel 302, on it, multiple control switchs and indicator light can be set, for controlling according to actual needs and the electric state of characterization apparatus.
Plasma generator of the present invention can adopt the cylinder type structure that is similar to air-core transformer to realize; ingenious will be with the hollow parts of air-core transformer as particle or gaseous matter reaction chamber; make apparatus structure compactness, volume little; and greatly shortened the wire length of electric loop, reduce line inductance and other stray parameters.
The operation principle of the above-mentioned device of processing particle and gaseous matter with nonequilibrium plasma is as follows.Former side's low pressure winding 102 provides low pressure repetition microsecond pulse voltage by prime charger, by the electromagnetic coupled effect of transformer, boosts and obtains high pressure repetition microsecond pulse voltage with 104 couplings of pair side's high pressure winding.Meanwhile, the pair side electric capacity 107 in parallel with pair side's high pressure winding 104 also will produce high-voltage pulse, then pass through gas gap steepness switch 109 steepness, just can on high-field electrode 202, form high pressure repetition nanosecond pulse.In the atmospheric air of high pressure repetition nanosecond pulse between spiral high-field electrode 202 and linear electrode 204, complete gas breakdown, thereby in reaction chamber, form large-area nonequilibrium plasma, for the treatment of particulate matter or organic gas.
Those skilled in the art will readily understand; the foregoing is only preferred embodiment of the present invention; not in order to limit the present invention, all any modifications of doing within the spirit and principles in the present invention, be equal to and replace and improvement etc., within all should being included in protection scope of the present invention.
Claims (6)
1. a device of processing particle and gaseous matter with nonequilibrium plasma, is characterized in that, comprises prime charger and plasma generator;
Described prime charger comprises DC power supply (301) and resonance charging circuit (303), wherein, described DC power supply (301) is used to described resonant charging circuit (303) that direct voltage is provided, and described resonant charging circuit (303) is used to described plasma generator that ac pulse voltage is provided;
Centered by described plasma generator, be provided with the cylindrical-shaped structure of reaction chamber, comprise outer shielding layer (101), former side's low pressure winding (102), external insulation layer (103), secondary side's high pressure winding (104), inner insulating layer (105), internal shield (106), secondary side's electric capacity (107), trigger electrode resistance (108), gas gap steepness switch (109), electrode suppor (201), high-field electrode (202), linear electrode (204) and metallic plate (205);
Described electrode suppor (201) is cylindrical structure, be arranged on reaction chamber sidewall, its inner surface is carved with helical groove, described high-field electrode (202) is helicoidal structure, embed in groove, described metallic plate (205) is arranged on reaction chamber bottom ground connection, described linear electrode (204) is arranged on the axle center of reaction chamber, closely weld with described metallic plate (205), the skin of described electrode suppor (201) is coated described internal shield (106) and described inner insulating layer (105) successively, described pair side's high pressure winding (104) is arranged on the periphery of described inner insulating layer (105), one end connects the input of described gas gap steepness switch (109), other end ground connection, the completely coated described pair side's high pressure winding (104) of described external insulation layer (103), to guarantee forming good electrical isolation between described former side's low pressure winding (102) and described pair side's high pressure winding (104), described former side's low pressure winding (102) is arranged on the periphery of described external insulation layer (103), one end connects the high-pressure side of described resonant charging circuit (303), other end ground connection, the completely coated described former side's low pressure winding (102) of described outer shielding layer (101), to prevent that described prime charger is subject to the interference of described plasma generator,
One end of described pair side electric capacity (107) connects the input of described gas gap steepness switch (109), other end ground connection, one end of described trigger electrode resistance (108) connects the trigger electrode of described gas gap steepness switch (109), other end ground connection, the output of described gas gap steepness switch (109) connects described high-field electrode (202);
It is coated that the two ends of described plasma generator are all insulated material, and wherein, the corresponding position with reaction chamber center of one end just right with described metallic plate (205) is provided with opening, for the input port as particle or gaseous matter.
2. the device of processing particle and gaseous matter with nonequilibrium plasma as claimed in claim 1, is characterized in that, also comprises product gatherer (111), and described product gatherer (111) and reaction chamber UNICOM, for collecting reacted product.
3. the device of processing particle and gaseous matter with nonequilibrium plasma as claimed in claim 2, it is characterized in that, described pair side electric capacity (107), described trigger electrode resistance (108), described gas gap steepness switch (109) and described product gatherer (111) all embed in the insulating material of described plasma generator end and are outside exposed, so that check or change.
4. the device of processing particle and gaseous matter with nonequilibrium plasma as claimed in claim 1, it is characterized in that, described prime charger also comprises Fumction display panel (302), on described Fumction display panel (302), multiple control switchs and indicator light are set, for controlling according to actual needs and the electric state of characterization apparatus.
5. the device with nonequilibrium plasma processing particle and gaseous matter as described in any one in claim 1 to 4; it is characterized in that; also comprise flow speed controller (203); described flow speed controller (203) is arranged on the opening part of reaction chamber, for regulating particle or gaseous matter to flow into the speed of reaction chamber.
6. the device with nonequilibrium plasma processing particle and gaseous matter as described in any one in claim 1 to 5, it is characterized in that, also comprise pedestal (114), described pedestal (114) is arranged on the side of the column structure of described plasma generator, for supporting described plasma generator; Described prime charger is arranged on the side of the column structure of described plasma generator, just right with described pedestal (114).
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