CN103904166A - 一种CdSexTey量子点光电薄膜的制备方法 - Google Patents
一种CdSexTey量子点光电薄膜的制备方法 Download PDFInfo
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- CN103904166A CN103904166A CN201410163618.XA CN201410163618A CN103904166A CN 103904166 A CN103904166 A CN 103904166A CN 201410163618 A CN201410163618 A CN 201410163618A CN 103904166 A CN103904166 A CN 103904166A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02425—Conductive materials, e.g. metallic silicides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/0256—Selenides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02551—Group 12/16 materials
- H01L21/02562—Tellurides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02601—Nanoparticles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201410163618.XA CN103904166B (zh) | 2014-04-23 | 2014-04-23 | 一种CdSexTey量子点光电薄膜的制备方法 |
Applications Claiming Priority (1)
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CN201410163618.XA CN103904166B (zh) | 2014-04-23 | 2014-04-23 | 一种CdSexTey量子点光电薄膜的制备方法 |
Publications (2)
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CN103904166A true CN103904166A (zh) | 2014-07-02 |
CN103904166B CN103904166B (zh) | 2016-03-02 |
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CN201410163618.XA Active CN103904166B (zh) | 2014-04-23 | 2014-04-23 | 一种CdSexTey量子点光电薄膜的制备方法 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104692660A (zh) * | 2015-02-27 | 2015-06-10 | 武汉理工大学 | 一种制备硫硒化镉量子点玻璃的方法 |
CN105499596A (zh) * | 2015-12-06 | 2016-04-20 | 桂林理工大学 | 在电沉积CdSe薄膜上自发生长Au纳米微粒的方法 |
CN105670634A (zh) * | 2016-02-28 | 2016-06-15 | 桂林理工大学 | 一种有机液相法可控制备CdSe量子点的方法 |
CN106653946A (zh) * | 2016-12-27 | 2017-05-10 | 成都中建材光电材料有限公司 | 一种碲化镉薄膜太阳能电池吸收层的沉积方法 |
CN109950330A (zh) * | 2019-03-19 | 2019-06-28 | 扬州大学 | 一种CsPbBr3量子点-硅基复合结构太阳能电池 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1687304A (zh) * | 2005-04-07 | 2005-10-26 | 上海交通大学 | 水溶性高荧光产率的CdTe/ZnSe核壳量子点的制备方法 |
KR101328476B1 (ko) * | 2012-08-20 | 2013-11-13 | 포항공과대학교 산학협력단 | 유기발광다이오드의 제조방법 |
-
2014
- 2014-04-23 CN CN201410163618.XA patent/CN103904166B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1687304A (zh) * | 2005-04-07 | 2005-10-26 | 上海交通大学 | 水溶性高荧光产率的CdTe/ZnSe核壳量子点的制备方法 |
KR101328476B1 (ko) * | 2012-08-20 | 2013-11-13 | 포항공과대학교 산학협력단 | 유기발광다이오드의 제조방법 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104692660A (zh) * | 2015-02-27 | 2015-06-10 | 武汉理工大学 | 一种制备硫硒化镉量子点玻璃的方法 |
CN105499596A (zh) * | 2015-12-06 | 2016-04-20 | 桂林理工大学 | 在电沉积CdSe薄膜上自发生长Au纳米微粒的方法 |
CN105670634A (zh) * | 2016-02-28 | 2016-06-15 | 桂林理工大学 | 一种有机液相法可控制备CdSe量子点的方法 |
CN106653946A (zh) * | 2016-12-27 | 2017-05-10 | 成都中建材光电材料有限公司 | 一种碲化镉薄膜太阳能电池吸收层的沉积方法 |
CN109950330A (zh) * | 2019-03-19 | 2019-06-28 | 扬州大学 | 一种CsPbBr3量子点-硅基复合结构太阳能电池 |
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CN103904166B (zh) | 2016-03-02 |
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Effective date of registration: 20210629 Address after: 215500 5th floor, building 4, 68 Lianfeng Road, Changfu street, Changshu City, Suzhou City, Jiangsu Province Patentee after: Changshu intellectual property operation center Co.,Ltd. Address before: 541004 the Guangxi Zhuang Autonomous Region Guilin Construction Road No. 12 Patentee before: GUILIN University OF TECHNOLOGY Effective date of registration: 20210629 Address after: 215500 Liantang aquaculture farm, Shanghu Town, Changshu City, Suzhou City, Jiangsu Province (east area of Liantang Industrial Park) Patentee after: Changshu Huaqiang insulating material Co.,Ltd. Address before: 215500 5th floor, building 4, 68 Lianfeng Road, Changfu street, Changshu City, Suzhou City, Jiangsu Province Patentee before: Changshu intellectual property operation center Co.,Ltd. |