CN103890088B - 树脂组合物 - Google Patents
树脂组合物 Download PDFInfo
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- CN103890088B CN103890088B CN201280052315.XA CN201280052315A CN103890088B CN 103890088 B CN103890088 B CN 103890088B CN 201280052315 A CN201280052315 A CN 201280052315A CN 103890088 B CN103890088 B CN 103890088B
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- resin
- curing agent
- inorganic filling
- resin combination
- filling material
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- 239000011342 resin composition Substances 0.000 title abstract description 4
- 239000003822 epoxy resin Substances 0.000 claims abstract description 95
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- 150000002894 organic compounds Chemical class 0.000 claims abstract description 28
- 238000007788 roughening Methods 0.000 claims abstract description 26
- 229920005989 resin Polymers 0.000 claims description 179
- 239000011347 resin Substances 0.000 claims description 179
- -1 3-benzylamino-1-propyl Chemical group 0.000 claims description 88
- 239000000463 material Substances 0.000 claims description 75
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 67
- 238000011049 filling Methods 0.000 claims description 55
- 229910052799 carbon Inorganic materials 0.000 claims description 43
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 41
- 239000002245 particle Substances 0.000 claims description 35
- 230000004888 barrier function Effects 0.000 claims description 33
- 239000004593 Epoxy Substances 0.000 claims description 32
- 239000004065 semiconductor Substances 0.000 claims description 31
- 239000000377 silicon dioxide Substances 0.000 claims description 31
- 150000002148 esters Chemical class 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 26
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 22
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- 239000005060 rubber Substances 0.000 claims description 22
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 21
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- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 15
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 14
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- 239000003063 flame retardant Substances 0.000 claims description 9
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- XNIOWJUQPMKCIJ-UHFFFAOYSA-N 2-(benzylamino)ethanol Chemical compound OCCNCC1=CC=CC=C1 XNIOWJUQPMKCIJ-UHFFFAOYSA-N 0.000 claims description 7
- 150000008065 acid anhydrides Chemical class 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007800 oxidant agent Substances 0.000 claims description 6
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 6
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- 150000002460 imidazoles Chemical class 0.000 claims description 5
- 150000004693 imidazolium salts Chemical class 0.000 claims description 5
- DJUWKQYCYKRJNI-UHFFFAOYSA-N n-ethoxyaniline Chemical compound CCONC1=CC=CC=C1 DJUWKQYCYKRJNI-UHFFFAOYSA-N 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 5
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 5
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- 239000010703 silicon Substances 0.000 claims description 5
- 150000004954 1-(2-hydroxyethyl)-imidazoles Chemical class 0.000 claims description 4
- XGIKILRODBEJIL-UHFFFAOYSA-N 1-(ethylamino)ethanol Chemical compound CCNC(C)O XGIKILRODBEJIL-UHFFFAOYSA-N 0.000 claims description 4
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 claims description 4
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical compound CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052582 BN Inorganic materials 0.000 claims description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 claims description 4
- 150000001398 aluminium Chemical class 0.000 claims description 4
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 claims description 4
- 229910021502 aluminium hydroxide Inorganic materials 0.000 claims description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 4
- 229910002113 barium titanate Inorganic materials 0.000 claims description 4
- 229910021523 barium zirconate Inorganic materials 0.000 claims description 4
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 claims description 4
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 4
- 229910002115 bismuth titanate Inorganic materials 0.000 claims description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 4
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 4
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004927 clay Substances 0.000 claims description 4
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 4
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 claims description 4
- 239000001095 magnesium carbonate Substances 0.000 claims description 4
- 229910000021 magnesium carbonate Inorganic materials 0.000 claims description 4
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- LRHPLDYGYMQRHN-UHFFFAOYSA-N n-Butanol Substances CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 4
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- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 4
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- 150000003608 titanium Chemical class 0.000 claims description 4
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- 150000003754 zirconium Chemical class 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- YTVUVYDVQNALCM-UHFFFAOYSA-N 2-(butan-2-ylamino)ethanol Chemical compound CCC(C)NCCO YTVUVYDVQNALCM-UHFFFAOYSA-N 0.000 claims description 2
- RILLZYSZSDGYGV-UHFFFAOYSA-N 2-(propan-2-ylamino)ethanol Chemical compound CC(C)NCCO RILLZYSZSDGYGV-UHFFFAOYSA-N 0.000 claims description 2
- 125000003368 amide group Chemical group 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 claims 3
- 238000005470 impregnation Methods 0.000 claims 2
- LEYYLQKYOZYCRF-UHFFFAOYSA-N 1-(hexylamino)ethanol Chemical compound CCCCCCNC(C)O LEYYLQKYOZYCRF-UHFFFAOYSA-N 0.000 claims 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 claims 1
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- 150000003568 thioethers Chemical class 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- QWWIMOOFEDJKFN-UHFFFAOYSA-N titanium;dihydrate Chemical compound O.O.[Ti] QWWIMOOFEDJKFN-UHFFFAOYSA-N 0.000 description 1
- JIVZKJJQOZQXQB-UHFFFAOYSA-N tolazoline Chemical compound C=1C=CC=CC=1CC1=NCCN1 JIVZKJJQOZQXQB-UHFFFAOYSA-N 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- BWPNIANVWARHPR-UHFFFAOYSA-N tridecyl dihydrogen phosphite Chemical compound CCCCCCCCCCCCCOP(O)O BWPNIANVWARHPR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
- H05K3/4655—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern by using a laminate characterized by the insulating layer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2363/00—Characterised by the use of epoxy resins; Derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2011/075242 WO2013061478A1 (ja) | 2011-10-26 | 2011-10-26 | 樹脂組成物 |
JPPCT/JP2011/075242 | 2011-10-26 | ||
PCT/JP2012/072075 WO2013061688A1 (ja) | 2011-10-26 | 2012-08-30 | 樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
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CN103890088A CN103890088A (zh) | 2014-06-25 |
CN103890088B true CN103890088B (zh) | 2016-05-18 |
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CN201280052315.XA Active CN103890088B (zh) | 2011-10-26 | 2012-08-30 | 树脂组合物 |
Country Status (3)
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KR (1) | KR101489175B1 (ja) |
CN (1) | CN103890088B (ja) |
WO (2) | WO2013061478A1 (ja) |
Families Citing this family (17)
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JP6413444B2 (ja) * | 2014-07-31 | 2018-10-31 | 味の素株式会社 | 樹脂シート、積層シート、積層板及び半導体装置 |
JP6018148B2 (ja) * | 2014-09-25 | 2016-11-02 | 太陽インキ製造株式会社 | ドライフィルムおよびプリント配線板 |
JP6482016B2 (ja) * | 2014-10-08 | 2019-03-13 | ナミックス株式会社 | 封止材組成物、それを用いた半導体装置 |
US9484307B2 (en) | 2015-01-26 | 2016-11-01 | Advanced Semiconductor Engineering, Inc. | Fan-out wafer level packaging structure |
JP6579309B2 (ja) * | 2015-05-01 | 2019-09-25 | 味の素株式会社 | 硬化性組成物 |
EP3434734A4 (en) * | 2016-04-05 | 2019-09-25 | Hitachi Chemical Co., Ltd. | RESIN COMPOSITION, BARRIER MATERIAL AGAINST HYDROGEN GAS, CURED PRODUCT, COMPOSITE MATERIAL, AND STRUCTURE |
JP6878859B2 (ja) * | 2016-12-02 | 2021-06-02 | 味の素株式会社 | 樹脂組成物 |
JP2018104634A (ja) * | 2016-12-28 | 2018-07-05 | ナミックス株式会社 | 表面処理シリカフィラー、および表面処理シリカフィラーを含有する樹脂組成物 |
US20200385514A1 (en) | 2017-01-10 | 2020-12-10 | Sumitomo Seika Chemicals Co., Ltd. | Epoxy resin composition |
CN111164151A (zh) * | 2017-10-10 | 2020-05-15 | 味之素株式会社 | 固化体及其制造方法、树脂片材及树脂组合物 |
JP7148946B2 (ja) * | 2017-12-21 | 2022-10-06 | ナミックス株式会社 | 樹脂組成物 |
SG11202100988PA (en) * | 2018-08-03 | 2021-03-30 | Showa Denko Materials Co Ltd | Adhesive composition, film-like adhesive, adhesive sheet, and method for producing semiconductor device |
JP6690692B2 (ja) * | 2018-11-21 | 2020-04-28 | 味の素株式会社 | 粗化硬化体の製造方法 |
WO2020136902A1 (ja) * | 2018-12-28 | 2020-07-02 | 日立化成株式会社 | ダイボンディングフィルム、接着シート、並びに半導体パッケージ及びその製造方法 |
JP7463736B2 (ja) * | 2020-01-24 | 2024-04-09 | 味の素株式会社 | 樹脂組成物 |
JP7067576B2 (ja) * | 2020-02-21 | 2022-05-16 | 味の素株式会社 | 樹脂組成物 |
JP7264194B2 (ja) * | 2020-06-25 | 2023-04-25 | 味の素株式会社 | 樹脂組成物 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4447564A (en) * | 1981-10-22 | 1984-05-08 | Siemens Aktiengesellschaft | Reactive resin compositions and molded substances made therefrom |
CN101841979A (zh) * | 2009-03-13 | 2010-09-22 | 味之素株式会社 | 包覆有金属的叠层板 |
CN102137758A (zh) * | 2008-09-01 | 2011-07-27 | 积水化学工业株式会社 | 层叠体及层叠体的制造方法 |
Family Cites Families (7)
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JP2003336034A (ja) * | 2002-05-20 | 2003-11-28 | Otsuka Chemical Holdings Co Ltd | 非可視領域光遮断材料及び光学フィルター |
GB0321703D0 (en) * | 2003-09-16 | 2003-10-15 | Imerys Minerals Ltd | Surface modified fillers for polymer resin compositions |
JP2007231125A (ja) | 2006-02-28 | 2007-09-13 | Kaneka Corp | 熱硬化性樹脂組成物およびその利用 |
JP2008174624A (ja) * | 2007-01-17 | 2008-07-31 | Admatechs Co Ltd | 表面処理無機粉体 |
TWI477549B (zh) * | 2009-02-06 | 2015-03-21 | Ajinomoto Kk | Resin composition |
JP5703570B2 (ja) * | 2010-03-01 | 2015-04-22 | 住友ベークライト株式会社 | プリプレグ、積層板、多層プリント配線板、及び、半導体装置 |
TWI540170B (zh) * | 2009-12-14 | 2016-07-01 | Ajinomoto Kk | Resin composition |
-
2011
- 2011-10-26 WO PCT/JP2011/075242 patent/WO2013061478A1/ja active Application Filing
-
2012
- 2012-08-30 KR KR1020147010645A patent/KR101489175B1/ko active IP Right Grant
- 2012-08-30 CN CN201280052315.XA patent/CN103890088B/zh active Active
- 2012-08-30 WO PCT/JP2012/072075 patent/WO2013061688A1/ja active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4447564A (en) * | 1981-10-22 | 1984-05-08 | Siemens Aktiengesellschaft | Reactive resin compositions and molded substances made therefrom |
CN102137758A (zh) * | 2008-09-01 | 2011-07-27 | 积水化学工业株式会社 | 层叠体及层叠体的制造方法 |
CN101841979A (zh) * | 2009-03-13 | 2010-09-22 | 味之素株式会社 | 包覆有金属的叠层板 |
Also Published As
Publication number | Publication date |
---|---|
WO2013061478A1 (ja) | 2013-05-02 |
WO2013061688A1 (ja) | 2013-05-02 |
KR20140062172A (ko) | 2014-05-22 |
KR101489175B1 (ko) | 2015-02-03 |
CN103890088A (zh) | 2014-06-25 |
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