CN103823330B - Spin coating version manufacturing process - Google Patents
Spin coating version manufacturing process Download PDFInfo
- Publication number
- CN103823330B CN103823330B CN201410052503.3A CN201410052503A CN103823330B CN 103823330 B CN103823330 B CN 103823330B CN 201410052503 A CN201410052503 A CN 201410052503A CN 103823330 B CN103823330 B CN 103823330B
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- spin coating
- polishing
- manufacturing process
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
A kind of spin coating version manufacturing process, comprises the following steps：Polish and provide the glass substrate of corresponding size there is provided the spin coating to be produced version and be processed by shot blasting, the polishing includes rough polishing and throws polishing twice with essence；Clean, increasing support frame in the water tank of cleaning machine during cleaning supports the glass substrate after polishing, and air knife is arranged at second segment and glass substrate is dried up；One layer of nitridation metal film is first plated on plated film, glass substrate after cleaning, one layer of nitridation metal film and one layer of oxidized metal film are then plated again；Gluing, applies one layer of photoresist on the film of glass substrate, and the photoresist drips glue while by the way of using static drop glue in rotation；And post bake, glass substrate first horizontal rest after gluing erects post bake again, on the basis of the manufacturing equipment using stock size spin coating version, by the improvement to each link technological parameter, produces unconventional large-sized spin coating version, significantly reduces production cost.
Description
Technical field
The present invention relates to the manufacturing process of the manufacture of spin coating version, more particularly to large scale spin coating version.
Background technology
Spin coating version is a kind of hard surface photomask base version, with high luminous sensitivity, high-resolution, low-defect-density, resistance to
The features such as good, the easy to clean processing of mill property, long service life, it is widely used in the system of the product masks such as IC, LCD, PCB, PDP
Make, be the main flow photosensitive material that current and future microfabrication photomask makes.
Spin coating version have several stock sizes, such as 450mm*550mm, 406.4mm*457.2mm, correspondingly spin coating version
Production equipment is also mutually to be equipped with according to its stock size, when the spin coating version for needing to make Commonly Used Size, then needs change existing
Some production equipments manufacture the equipment matched in addition, and the former can cause certain shadow to the stability of this manufacturing process
Ring, the latter then can significantly increase production cost, in addition, for the production of large-sized spin coating version, with existing equipment
There can be a series of problems with technological standards, such as polishing machine swing arm scope exceeds, polishing powder vestige can't is washed off clearly, spin coating acc power
Small inertia is excessive etc..
The content of the invention
In view of this there is provided a kind of spin coating version manufacturing process, it is adaptable to the production system of unconventional large-sized spin coating version
Make.
A kind of spin coating version manufacturing process, comprises the following steps：Polish and provide corresponding size there is provided the spin coating to be produced version
Glass substrate and be processed by shot blasting, the polishing include rough polishing with essence throw polishing twice；Cleaning, during cleaning
Increase the glass substrate after support frame support polishing in the water tank of cleaning machine, and air knife be arranged at into second segment to enter glass substrate
Row drying；One layer of nitridation metal film is first plated on plated film, glass substrate after cleaning, one layer of nitridation metal film and one is then plated again
Layer oxidized metal film；Gluing, applies one layer of photoresist, the photoresist is using the static side for dripping glue on the film of glass substrate
Formula drips glue in rotation；And post bake, glass substrate first horizontal rest after gluing, then erect baking post bake.
Spin coating version generation technique of the present invention is on the basis of the manufacturing equipment using stock size spin coating version, by each ring
The improvement of technological parameter is saved, unconventional large-sized spin coating version is produced, significantly reduces production cost.
Brief description of the drawings
Fig. 1 is spin coating of the present invention version manufacturing process flow diagram.
Embodiment
Below with reference to the drawings and the specific embodiments, the present invention is described in detail.
Spin coating version manufacturing process of the present invention is used to manufacture unconventional large-sized spin coating version, and such as specification is 508mm*
609mm spin coating version etc., using the production equipment of the spin coating version of existing stock size, reduces production cost to the full extent.Such as
Shown in Fig. 1, the production technology of spin coating version of the present invention comprises the following steps：Polishing, cleaning, plated film, gluing and post bake.Below with
Exemplified by the spin coating version for producing 508mm*609mm, spin coating of the present invention version manufacturing process is described in detail.
First, the glass substrate of corresponding size is provided according to the size of the spin coating to be manufactured version, and glass substrate is entered
Row polishing reaches higher flatness and finish.
The glass substrate can be soda-lime glass plate, Pyrex plate, quartz glass plate etc..As made in the present embodiment
The size of glass substrate is 508mm*609mm*4.8mm, when being polished, and defect point is big, throws and throws twice by rough polishing, essence
The mode of light, using existing polishing powder, first time rough polishing is polished 30 minutes by tow sides, after defect is disposed, second
The smart throwing time is less than 1 minute for front, reverse side 1-3 minutes, defect grinding in the range of receiving, while the glass substrate back side is residual
The polishing powder vestige stayed is effectively handled, and is easy to follow-up cleaning.In polishing process, to avoid bumping against the fence of surrounding,
The polishing machine rocking arm amplitude of oscillation can suitably be turned down.
, it is necessary to be cleaned to glass substrate after the completion of polishing, the chip, dust, residual of glass baseplate surface are removed
Polishing powder etc..
Because the more conventional size of used glass substrate is big, the weight of glass substrate is also correspondingly bigger, polishes defensive position
Directly cleaning is very laborious, can obtain preferable cleaning performance in water tank plus after a support frame.During cleaning, due to air knife first
Duan Shuiliang is larger, and large-sized glass substrate is too near from air knife mouth, causes to blow not to be especially clean, second segment is blown with air knife again
When can leave mark, adjusted by being changed to the test of many times of air knife, air knife changed into the by being placed on first paragraph originally
Two sections, first paragraph air knife stop without, it is to avoid disposable air knife can not dry up surface, caused water soaking.Furthermore it is possible to phase
Should ground change round brush and the meshing gear that goes out of round brush, make large-sized glass substrate can be with smooth by round brush section, such as by round brush
Lengthen to 510mm.
After over cleaning, that is, plated film is carried out, nitridation/oxidized metal film layer is generated on a glass.
, can be by the conventional plated film of 2 limitations because conventional plated film vehicle frame is not appropriate for large-sized glass substrate plated film
Vehicle frame is modified to the Special frame of sized rectangular glass substrate plated film.The plated film includes plated film twice, for the first time in glass substrate
Upper one layer of nitridation metal film of only plating, electric current turns one times down during plated film.Cleaned after first time plated film, second is then carried out again
Secondary plated film, second of plated film is to plate one layer of nitridation metal film and one layer of oxidized metal film on the glass substrate, twice plated film institute shape
Into nitridation/oxidized metal film layer, pin hole is considerably less, and effect is notable after plate-making.
After the completion of plated film, that is, gluing operation is carried out, photoresist is coated in nitridation/oxidized metal film layer of glass substrate.
Conventional spin coating acc power is small, inertia is big, for the coating technique of large-sized glass substrate, after gluing in corner
Between it is serious uneven, and there is lower wall print.The present invention is to the drop glue mode of existing spin coater, drop glue laminated power, drop glue rotating speed, acceleration
Rotating speed, constant velocity time, photoetching adhesiveness and make pallet PVC backing plates carried out change or adjust.With 508mm*
Exemplified by 609mm*4.8mm specification glass substrates, drop glue mode uses static drop glue, and glue, used PVC backing plates are dripped in rotation
On be provided with air-breathing aperture, other design parameters are as shown in table 1：
Table 1508mm*609mm*4.8mm glass substrate coating technique parameters
Finally, i.e. post bake, is bakeed to glass substrate at high temperature, is improved the adhesiveness of photoresist, is made photoresist true
Nitridation/oxidized metal film layer can be protected in fact.
Stock size spin coating version is limited to existing by the way of post bake is kept flat, but for large-sized glass substrate
Have the size of equipment, after gluing, horizontal rest is after 20 minutes, then be erected to and be put into oven-baked, erect post bake, its effect with
The horizontal post bake of stock size is suitable.
As shown in the above, base of the spin coating version generation technique of the present invention in the manufacturing equipment using stock size spin coating version
On plinth, by the improvement to each link technological parameter, unconventional large-sized spin coating version is produced, significantly reduces and is produced into
This.It should be noted that the invention is not limited in above-mentioned embodiment, according to the creative spirit of the present invention, art technology
Personnel can also make other changes, and these changes done according to the creative spirit of the present invention should all be included in institute of the present invention
Within the scope of claimed.
Claims (6)
1. a kind of spin coating version manufacturing process, comprises the following steps：
Polishing, provides the glass substrate of corresponding size according to the spin coating to be produced version and is processed by shot blasting, at the polishing
Reason includes rough polishing and throws polishing twice with essence；
Cleaning, increases the glass substrate after support frame support polishing, and air knife is arranged in the water tank of cleaning machine during cleaning
Cleaning machine second segment is dried up to glass substrate；
Cleaning after one layer of nitridation metal film is first plated on plated film, glass substrate after cleaning, one layer of nitridation metal is then plated again
Film and one layer of oxidized metal film；
Gluing, applies one layer of photoresist on the film of glass substrate, and the photoresist drips while by the way of static drop glue in rotation
Glue；And
Post bake, glass substrate first horizontal rest after gluing, then erect baking post bake.
2. spin coating version manufacturing process as claimed in claim 1, it is characterised in that the rough polishing polishes 30 points by tow sides
Clock.
3. spin coating version manufacturing process as claimed in claim 1, it is characterised in that the smart throwing time is less than 1 minute for front,
Reverse side 1-3 minutes.
4. spin coating version manufacturing process as claimed in claim 1, it is characterised in that the time of glass substrate horizontal rest in post bake
For 20 minutes.
5. spin coating version manufacturing process as claimed in claim 1, it is characterised in that in gluing, the drop glue time is 28s, and pressure is
0.11MPa, drop glue hop count is second segment.
6. spin coating version manufacturing process as claimed in claim 1, it is characterised in that the glass substrate is that size is 508mm*
609mm, manufactured spin coating version is that size is 508mm*609mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410052503.3A CN103823330B (en) | 2014-02-14 | 2014-02-14 | Spin coating version manufacturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410052503.3A CN103823330B (en) | 2014-02-14 | 2014-02-14 | Spin coating version manufacturing process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103823330A CN103823330A (en) | 2014-05-28 |
| CN103823330B true CN103823330B (en) | 2017-07-14 |
Family
ID=50758468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410052503.3A Active CN103823330B (en) | 2014-02-14 | 2014-02-14 | Spin coating version manufacturing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103823330B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106937486B (en) * | 2015-12-31 | 2019-11-05 | 苏州市迪飞特电子有限公司 | A kind of pcb board surface automatic processing apparatus |
| CN105739243A (en) * | 2016-04-22 | 2016-07-06 | 长葛市汇达感光材料有限公司 | Fabrication method of light sensitive material plate |
| CN106226926B (en) * | 2016-08-08 | 2019-08-23 | 深圳市科利德光电材料股份有限公司 | A kind of liquid crystal display and improve the method that nurse draws phenomenon |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1506759A (en) * | 2002-12-09 | 2004-06-23 | 中国科学院光电技术研究所 | Photoresist mask and its making process |
| CN103235481A (en) * | 2013-03-28 | 2013-08-07 | 深圳市科利德光电材料股份有限公司 | Glue uniformization chromium plate manufacturing process |
| CN103365070A (en) * | 2012-03-29 | 2013-10-23 | 山东浪潮华光光电子股份有限公司 | Phase shift mask plate of PSS (patterned sapphire substrates) graphics and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102043323B (en) * | 2009-10-23 | 2014-09-24 | 中芯国际集成电路制造(上海)有限公司 | Method for manufacturing mask plate |
-
2014
- 2014-02-14 CN CN201410052503.3A patent/CN103823330B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1506759A (en) * | 2002-12-09 | 2004-06-23 | 中国科学院光电技术研究所 | Photoresist mask and its making process |
| CN103365070A (en) * | 2012-03-29 | 2013-10-23 | 山东浪潮华光光电子股份有限公司 | Phase shift mask plate of PSS (patterned sapphire substrates) graphics and preparation method thereof |
| CN103235481A (en) * | 2013-03-28 | 2013-08-07 | 深圳市科利德光电材料股份有限公司 | Glue uniformization chromium plate manufacturing process |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103823330A (en) | 2014-05-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103823330B (en) | Spin coating version manufacturing process | |
| TWI316503B (en) | Substrate transferring apparatus | |
| CN102569133A (en) | Liquid processing apparatus, and liquid processing method | |
| CN210279987U (en) | Wafer double-side cleaning device | |
| TWI443001B (en) | Grinding and processing methods and grinding processing equipment | |
| TW201537632A (en) | Polishing cleaning mechanism, substrate processing apparatus, and substrate processing method | |
| CN110402036A (en) | A kind of the welding resistance method and welding devices of 5G high frequency circuit board | |
| CN101354534A (en) | Method for coating photoresist and method for forming photolithography pattern | |
| CN107170667B (en) | Substrate wet processing process method and substrate wet processing process device | |
| CN110164793A (en) | Liquid handling device | |
| JP2009279751A (en) | Nozzle, nozzle unit, and blasting device | |
| CN106098589A (en) | Semiconductor device and washing methods | |
| CN103116248B (en) | Apparatus for coating and coating process thereof | |
| CN110957208A (en) | Wafer edge washing method and wafer washing device | |
| CN104362123B (en) | A kind of fixture and method for removing edge heap glue in square substrate photolithographic process | |
| CN103235481B (en) | Glue uniformization chromium plate manufacturing process | |
| CN106695263B (en) | A kind of pair is taken the photograph technique | |
| CN115632008B (en) | Wafer edge defect processing method and wafer thinning equipment | |
| CN106995912A (en) | A kind of framework for being used to fix mask plate | |
| CN106914454A (en) | A kind of device and sweep-out method for removing reticle surface particulate pollutant | |
| CN208126101U (en) | Photoetching gum coating apparatus | |
| CN102087484B (en) | Method for photoengraving graphical sapphire substrate | |
| JP2008258330A (en) | Single wafer processing cleaner | |
| CN107450282A (en) | A kind of hyperfine nanometer line glass mold preparation method | |
| CN107592379A (en) | glass back cover and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |