CN105739243A - Fabrication method of light sensitive material plate - Google Patents
Fabrication method of light sensitive material plate Download PDFInfo
- Publication number
- CN105739243A CN105739243A CN201610260626.5A CN201610260626A CN105739243A CN 105739243 A CN105739243 A CN 105739243A CN 201610260626 A CN201610260626 A CN 201610260626A CN 105739243 A CN105739243 A CN 105739243A
- Authority
- CN
- China
- Prior art keywords
- sensitive material
- material plate
- polishing
- light sensitive
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 238000001035 drying Methods 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 14
- 230000003647 oxidation Effects 0.000 claims abstract description 13
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 13
- 238000007517 polishing process Methods 0.000 claims abstract description 8
- 239000004945 silicone rubber Substances 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 10
- 238000005498 polishing Methods 0.000 abstract description 27
- 239000011248 coating agent Substances 0.000 abstract description 10
- 238000000576 coating method Methods 0.000 abstract description 10
- 238000006386 neutralization reaction Methods 0.000 abstract description 9
- 238000007639 printing Methods 0.000 abstract description 6
- 238000005868 electrolysis reaction Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 description 7
- 229920000742 Cotton Polymers 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Abstract
The invention relates to the technical field of production of a light sensitive material plate. A fabrication method of the light sensitive material plate comprises processes of washing, neutralization, electrolysis, oxidation, drying and coating and is characterized in that a polishing step for the surface of a light sensitive material substrate to be coated is arranged behind the drying step, the polishing process is a process that the surface is burnished by silicon rubber, and during the polishing process, the silicon rubber is pressed on the surface of the substrate and is pulled along the surface of the substrate, and the press stress is 50-60 grams per square centimeters. According to the fabrication method of the light sensitive material plate, the light sensitive material which is higher in printing resistance degree, long in service life and high in printing clearness can be produced.
Description
Technical field
The present invention relates to photosensitive material plate production technical field, concretely relate to the manufacture method of photosensitive material plate.
Background technology
Photosensitive material plate includes substrate, is coated with one layer of sensitive material and forms on substrate, and photosensitive material plate is coated with on coating machine, manufacture photosensitive material plate rapid successively: clean that to neutralize electrolytic oxidation drying coated etc.；In prior art, the surface that be coated with not carrying out after drying substrates the step of polishing, so the product of production discharging has the shortcoming that press resistance rate is low, printing readability is low, have impact on the service life of photosensitive material plate and result of use.
Summary of the invention
The purpose of the present invention is aiming at disadvantages mentioned above, it is provided that a kind of resistance to print degree is higher, the manufacture method of long service life, photosensitive material plate that printing readability is high.
The technical solution used in the present invention is such that the manufacture method of a kind of photosensitive material plate, neutralize the drying coated operation of electrolytic oxidation including cleaning, it is characterized in that: also have a polishing process on the described dried surface in the face of to be coated with sensitive material substrate.
Preferably, described polishing process is exactly the process polished in this surface with silicone rubber.
Preferably, described polishing process refers to and is pressed against the surface of substrate with silicone rubber and pulls along substrate surface, and it is 50 60g/c by pressure.
The invention has the beneficial effects as follows: the manufacture method of such photosensitive material plate can produce that resistance to print degree is higher, long service life, sensitive material that printing readability is high.
Detailed description of the invention
Below in conjunction with embodiment, the present invention is described further.
Following example to clean the parameter neutralizing the drying coated technique of electrolytic oxidation all identical, record when material that photosensitive material plate uses is also identical.
Embodiment 1
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating not past polishing, obtains the first photosensitive material plate A, and the first plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 2
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is non-woven fabrics, namely polishing is carried out with non-woven fabrics on the surface being coated with sensitive material matrix, obtaining the second photosensitive material plate B, the second plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 3
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is cotton, namely carries out polishing with cotton on the surface being coated with sensitive material matrix, obtaining the 3rd photosensitive material plate C, the 3rd plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 4
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is nylon cloth, namely polishing is carried out with nylon cloth on the surface being coated with sensitive material matrix, obtaining the 4th photosensitive material plate D, the 4th plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 5
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is silicone rubber, namely polishing is carried out with silicone rubber on the surface being coated with sensitive material matrix, obtaining the 5th photosensitive material plate E, the 5th plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 6
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is silicone rubber, it is 50g/c by pressure during its polishing, namely polishing is carried out with silicone rubber on the surface being coated with sensitive material matrix, obtaining the sixth sense finish flitch F, the 6th plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 7
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is silicone rubber, it is 60g/c by pressure during its polishing, namely polishing is carried out with silicone rubber on the surface being coated with sensitive material matrix, obtaining the 7th photosensitive material plate G, the 7th plate of material photosensitive layer unit mass is 2.0g/.
Embodiment 8
Substrate is drying coated through cleaning neutralization electrolytic oxidation, drying between coating also through polishing, polishing thing used is silicone rubber, it is 55g/c by pressure during its polishing, namely polishing is carried out with silicone rubber on the surface being coated with sensitive material matrix, obtaining the 8th photosensitive material plate H, the 8th plate of material photosensitive layer unit mass is 2.0g/.
Table below is obtained through test implementation product:
| Product | A | B | C | D | E | F | G | H |
| The number of resistance to impression (ten thousand times) | 15 | 16 | 15.5 | 15.7 | 16.5 | 17 | 17 | 17.2 |
| Printing effect | Good | Good | Good | Good | Better | Better | Better | Better |
The foregoing is only specific embodiments of the invention, but the architectural feature of the present invention is not limited to this, any those skilled in the art is in the field of the invention, and change or the modification made all are encompassed in the scope of the claims of the present invention.
Claims (3)
1. a manufacture method for photosensitive material plate, neutralizes the drying coated operation of electrolytic oxidation including cleaning, it is characterized in that: also have a polishing process on the described dried surface in the face of to be coated with sensitive material substrate.
2. the manufacture method of photosensitive material plate according to claim 1, is characterized in that: described polishing process is exactly the process polished in this surface with silicone rubber.
3. the manufacture method of photosensitive material plate according to claim 2, is characterized in that: described polishing process refers to and is pressed against the surface of substrate with silicone rubber and pulls along substrate surface, and it is 50 60g/c by pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610260626.5A CN105739243A (en) | 2016-04-22 | 2016-04-22 | Fabrication method of light sensitive material plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610260626.5A CN105739243A (en) | 2016-04-22 | 2016-04-22 | Fabrication method of light sensitive material plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105739243A true CN105739243A (en) | 2016-07-06 |
Family
ID=56255231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610260626.5A Pending CN105739243A (en) | 2016-04-22 | 2016-04-22 | Fabrication method of light sensitive material plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105739243A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02967A (en) * | 1988-05-18 | 1990-01-05 | Dainippon Printing Co Ltd | Manufacture of substrate having pattern of metal on glass |
| CN1276304A (en) * | 1999-06-04 | 2000-12-13 | 昆明重光室内装饰有限责任公司 | Multi-colour copper-plate etching and its making method |
| CN1314254A (en) * | 2000-03-17 | 2001-09-26 | 富士胶片株式会社 | Lithographic printing plate |
| CN1608843A (en) * | 2004-11-11 | 2005-04-27 | 林良智 | Prepainted photosensitive microcrystalline zinc plate and its making process |
| TW200842966A (en) * | 2007-03-13 | 2008-11-01 | Sfa Engineering Corp | Substrate cleaning apparatus |
| CN102096323A (en) * | 2011-01-24 | 2011-06-15 | 北京师范大学 | Positive light-sensitive waterless offset printing plate containing heavy-nitrogen resin and manufacturing method thereof |
| CN103823330A (en) * | 2014-02-14 | 2014-05-28 | 深圳市科利德光电材料股份有限公司 | Manufacturing technology of glue homogenizing plate |
| CN104087998A (en) * | 2014-07-10 | 2014-10-08 | 江苏乐彩印刷材料有限公司 | Manufacturing method of UV (Ultraviolet)-resistant developing-free digital printing CTP (Computer-To-Print) plate |
-
2016
- 2016-04-22 CN CN201610260626.5A patent/CN105739243A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02967A (en) * | 1988-05-18 | 1990-01-05 | Dainippon Printing Co Ltd | Manufacture of substrate having pattern of metal on glass |
| CN1276304A (en) * | 1999-06-04 | 2000-12-13 | 昆明重光室内装饰有限责任公司 | Multi-colour copper-plate etching and its making method |
| CN1314254A (en) * | 2000-03-17 | 2001-09-26 | 富士胶片株式会社 | Lithographic printing plate |
| CN1608843A (en) * | 2004-11-11 | 2005-04-27 | 林良智 | Prepainted photosensitive microcrystalline zinc plate and its making process |
| TW200842966A (en) * | 2007-03-13 | 2008-11-01 | Sfa Engineering Corp | Substrate cleaning apparatus |
| CN102096323A (en) * | 2011-01-24 | 2011-06-15 | 北京师范大学 | Positive light-sensitive waterless offset printing plate containing heavy-nitrogen resin and manufacturing method thereof |
| CN103823330A (en) * | 2014-02-14 | 2014-05-28 | 深圳市科利德光电材料股份有限公司 | Manufacturing technology of glue homogenizing plate |
| CN104087998A (en) * | 2014-07-10 | 2014-10-08 | 江苏乐彩印刷材料有限公司 | Manufacturing method of UV (Ultraviolet)-resistant developing-free digital printing CTP (Computer-To-Print) plate |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160706 |
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| RJ01 | Rejection of invention patent application after publication |