CN103809390B - A kind of development shower nozzle - Google Patents
A kind of development shower nozzle Download PDFInfo
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- CN103809390B CN103809390B CN201210456790.5A CN201210456790A CN103809390B CN 103809390 B CN103809390 B CN 103809390B CN 201210456790 A CN201210456790 A CN 201210456790A CN 103809390 B CN103809390 B CN 103809390B
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- mounting bracket
- shower nozzle
- regulating block
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Abstract
The present invention relates to obtain on the semiconductor wafer the developing process equipment of photoetching offset plate figure, specifically a kind of development shower nozzle, including development feed pipe, mounting bracket regulating block, development pipe joint, development pipe mounting bracket and development jet pipe, the two ends of development pipe mounting bracket are separately installed with the mounting bracket regulating block moved back and forth along its length, and each mounting bracket regulating block is equipped with development pipe joint；Development jet pipe be arranged on development pipe mounting bracket on, two ends respectively with development pipe joint one end connect, the other end of each development pipe joint by develop feed pipe be connected with developer solution source；Development jet pipe is stretched at the mobile and horizontal developed in pipe mounting bracket by mounting bracket regulating block, is evenly equipped with multiple spray orifice on development jet pipe.Using the development shower nozzle of the present invention, the developer solution time of staying on wafer does not has difference, development jet pipe to ensure horizontal stretch, make developer solution uniform fold, improve developing uniformity.
Description
Technical field
The present invention relates to obtain on the semiconductor wafer the developing process equipment of photoetching offset plate figure, specifically a kind of development shower nozzle.
Background technology
After photoetching, figure needs development to obtain figure, and along with the development of semiconductor technology, the requirement to development is more and more higher；Therefore, how developer solution is uniformly coated on wafer and becomes the direction that various equivalent modifications is continually striving to, thus promoted the continuous innovation of development shower nozzle.The developer solution that development shower nozzle is sprayed onto on wafer covers more and more uniform, promotes development effect to gradually step up；But it is more and more higher to result in development shower nozzle manufacturing cost.
Summary of the invention
It is an object of the invention to provide a kind of combination type development shower nozzle.This development shower nozzle, in the case of ensureing development effect, improves critical component machining accuracy, it is ensured that developing uniformity, reduces manufacturing cost.
It is an object of the invention to be achieved through the following technical solutions:
A kind of development shower nozzle, it is positioned at and places above the wafer-supporting platform of wafer, including development feed pipe, mounting bracket regulating block, development pipe joint, development pipe mounting bracket and development jet pipe, wherein the two ends of development pipe mounting bracket are separately installed with the mounting bracket regulating block moved back and forth along its length, and each mounting bracket regulating block is equipped with development pipe joint；Described development jet pipe be arranged on development pipe mounting bracket on, two ends respectively with development pipe joint one end connect, the other end of each development pipe joint by develop feed pipe be connected with developer solution source；Described development jet pipe is stretched at the mobile and horizontal developed in pipe mounting bracket by mounting bracket regulating block, is evenly equipped with multiple spray orifice on development jet pipe.
Wherein: described mounting bracket regulating block is provided with slide block, the chute that this slide block is arranged along its length with development pipe mounting bracket is connected, and moves back and forth in chute；Described mounting bracket regulating block is divided into upper and lower two parts, and top is crisscross arranged with bottom, hollows out, forms slide block in the middle of described bottom；The described superposed lower section of development pipe joint, the other end of development pipe joint is fixed in the bottom surface on top, has through hole on described top, and one end of development feed pipe connects through this through hole with development pipe joint, and the other end is connected to developer solution source；The cross section of described development pipe mounting bracket short transverse is "T"-shaped, and the both sides of "T"-shaped bottom are chute, and the centre of "T"-shaped bottom has straight hole along its length, and described development jet pipe is contained in this straight hole；The radial section of described straight hole is circular, bottom opening, and the hole wall of this straight hole fits tightly with development jet pipe；Described development shower nozzle is by the development feed pipe feed flow at two ends.
Advantages of the present invention with good effect is:
1. using the development shower nozzle of the present invention, the developer solution time of staying on wafer does not has difference, by adjusting the position of mounting bracket regulating block, it is ensured that development jet pipe horizontal stretch, makes developer solution uniform fold, improves developing uniformity.
2. the development shower nozzle of the present invention is by two ends feed flow so that the internal pressure of development feed pipe is more uniform.
3. the PFA pipe that development jet pipe is outsourcing of the present invention, by improving the machining accuracy of spray orifice on development jet pipe, it is ensured that developing uniformity, reduces manufacturing cost.
Accompanying drawing explanation
Fig. 1 is the structural front view of the present invention；
Fig. 2 is the top view of Fig. 1；
Fig. 3 is the upward view taking away wafer-supporting platform and wafer in Fig. 1；
Fig. 4 is the structural front view of mounting bracket regulating block of the present invention；
Fig. 5 is the left view of Fig. 4；
Fig. 6 is that the present invention develops the structural front view of pipe mounting bracket；
Fig. 7 is the left view of Fig. 6；
Wherein: 1 is development feed pipe, and 2 is mounting bracket regulating block, 3 is development pipe joint, and 4 is wafer-supporting platform, and 5 is development pipe mounting bracket, and 6 is wafer, and 7 is development jet pipe, and 8 is chute, and 9 is slide block, and 10 is straight hole.
Detailed description of the invention
The invention will be further described below in conjunction with the accompanying drawings.
As shown in FIG. 1 to 3, the development shower nozzle of the present invention is positioned at above the wafer-supporting platform 4 placing wafer 6, including development feed pipe 1, mounting bracket regulating block 2, development pipe joint 3, development pipe mounting bracket 5 and development jet pipe 7, wherein the two ends of development pipe mounting bracket 5 are separately installed with mounting bracket regulating block 2, and each mounting bracket regulating block 2 is equipped with development pipe joint 3；Development jet pipe 7 be arranged on development pipe mounting bracket 5 on, two ends respectively with development pipe joint 3 one end connect, the other end of each development pipe joint 3 by develop feed pipe 1 be connected with developer solution source；Development jet pipe 7 is stretched at the mobile and horizontal developed in pipe mounting bracket 5 by mounting bracket regulating block 2, is evenly equipped with multiple spray orifice on development jet pipe 7, and this spray orifice is spray developing liquid on the wafer 6 being rotated by wafer-supporting platform 4.
As shown in Figure 6, Figure 7, the cross section of development pipe mounting bracket 5 short transverse is "T"-shaped, and the both sides of "T"-shaped bottom are chute 8, and the centre of "T"-shaped bottom has straight hole 10 along its length, and the radial section of this straight hole 10 is circular, bottom opening；Development jet pipe 7 is contained in this straight hole 10, and the hole wall of straight hole 10 fits tightly with development jet pipe 7, prevents jet pipe 7 play that develops.
As shown in Figure 4, Figure 5, mounting bracket regulating block 2 is divided into upper and lower two parts, and top is crisscross arranged with bottom, the slide block 9 that chute 8 that the pipe mounting bracket 5 that hollows out, formed and develop in the middle of its middle and lower part is arranged along its length is corresponding, mounting bracket regulating block 2 is moved back and forth in chute 8 by slide block 9；The development superposed lower section of pipe joint 3, the other end of development pipe joint 3 is fixed in the bottom surface on top, has through hole on top, and one end of development feed pipe 1 connects through this through hole with development pipe joint 3, and the other end is connected to developer solution source.
Development feed pipe 1 is fixed by the present invention by pipe mounting bracket 2 of developing, and prevents its play；Development jet pipe 7 is commercial PFA (Teflon) pipe, purchases in SMC company of Japan, and model is TL0604-20.
The functional principal of the present invention is:
The shower nozzle that develops is motionless carries out for development shower nozzle is rotated by wafer 6 for the visualization way of the present invention, when the shower nozzle that develops moves to above the center of wafer 6, developer solution sequentially passes through development feed pipe 1, development pipe joint 3, development jet pipe 7, then by spray orifice spray developing liquid；Wafer 6 rotates simultaneously, it is ensured that the uniform fold of developer solution, and the arrow in Fig. 2 is the direction of rotation of wafer 6.
The present invention can drive development pipe joint 3 and the development feed pipe 1 at two ends by adjusting mounting bracket regulating block 2, is displaced outwardly along chute 8, it is ensured that development jet pipe 7 horizontal stretch, improves developing uniformity.It addition, development feed pipe 1 and development pipe joint 3 are from two ends feed flow, the internal pressure making development feed pipe 1 is more uniform, it is ensured that the uniform fold of developer solution.
Claims (6)
1. a development shower nozzle, is positioned at above the wafer-supporting platform placing wafer, it is characterised in that:
Described development shower nozzle includes that development feed pipe (1), mounting bracket regulating block (2), development pipe connect
Head (3), development pipe mounting bracket (5) and development jet pipe (7), the wherein fixing torr of development pipe
The two ends of frame (5) are separately installed with the mounting bracket regulating block moved back and forth along its length
(2), each mounting bracket regulating block (2) is equipped with development pipe joint (3)；Described aobvious
Shadow jet pipe (7) is arranged on that development pipe mounting bracket (5) is upper, two ends respectively with development pipe joint
(3) one end connection, the other end of each development pipe joint (3) is by development feed pipe (1)
It is connected with developer solution source；Described development jet pipe (7) is existed by mounting bracket regulating block (2)
Mobile and horizontal stretching in development pipe mounting bracket (5), is evenly equipped with in development jet pipe (7)
Multiple spray orifices.
2. the development shower nozzle as described in claim 1, it is characterised in that: described mounting bracket
Regulating block (2) is provided with slide block (9), this slide block (9) and development pipe mounting bracket (5)
The chute (8) arranged along its length is connected, and moves back and forth in chute (8).
3. the development shower nozzle as described in claim 2, it is characterised in that: described mounting bracket
Regulating block (2) is divided into upper and lower two parts, and top is crisscross arranged with bottom, described bottom
Centre hollows out, forms slide block (9)；The superposed lower section of described development pipe joint (3),
The other end of development pipe joint (3) is fixed in the bottom surface on top, has through hole on described top,
One end of development feed pipe (1) connects through this through hole with development pipe joint (3), the other end
It is connected to developer solution source.
4. the development shower nozzle as described in claim 1, it is characterised in that: described development Guan Gu
The cross section determining bracket (5) short transverse is "T"-shaped, and the both sides of "T"-shaped bottom are chute (8),
The centre of "T"-shaped bottom has straight hole (10), described development jet pipe (7) along its length
It is contained in this straight hole (10).
5. the development shower nozzle as described in claim 4, it is characterised in that: described straight hole (10)
Radial section be circular, bottom opening, the hole wall of this straight hole (10) and development jet pipe (7)
Fit tightly.
6. the development shower nozzle as described in claim 1, it is characterised in that: described development shower nozzle
By development feed pipe (1) feed flow at two ends.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210456790.5A CN103809390B (en) | 2012-11-14 | 2012-11-14 | A kind of development shower nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210456790.5A CN103809390B (en) | 2012-11-14 | 2012-11-14 | A kind of development shower nozzle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103809390A CN103809390A (en) | 2014-05-21 |
| CN103809390B true CN103809390B (en) | 2016-08-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210456790.5A Active CN103809390B (en) | 2012-11-14 | 2012-11-14 | A kind of development shower nozzle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103809390B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106200280A (en) * | 2016-09-07 | 2016-12-07 | 深圳清溢光电股份有限公司 | A kind of sheathed developing method coordinated with slit liquid curtain |
| CN108469718A (en) * | 2018-04-20 | 2018-08-31 | 无锡中微掩模电子有限公司 | A kind of developing method and device of mask |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1919476A (en) * | 2005-08-23 | 2007-02-28 | 东京应化工业株式会社 | Applying device |
| JP4090648B2 (en) * | 1999-11-18 | 2008-05-28 | 東京エレクトロン株式会社 | Film forming method and film forming apparatus |
| CN101644903A (en) * | 2008-08-07 | 2010-02-10 | 和舰科技(苏州)有限公司 | Developing solution spray head |
| CN102269933A (en) * | 2011-01-19 | 2011-12-07 | 沈阳芯源微电子设备有限公司 | Auxiliary positioning semi-automatic fixing device for replacing photoresist nozzle |
-
2012
- 2012-11-14 CN CN201210456790.5A patent/CN103809390B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4090648B2 (en) * | 1999-11-18 | 2008-05-28 | 東京エレクトロン株式会社 | Film forming method and film forming apparatus |
| CN1919476A (en) * | 2005-08-23 | 2007-02-28 | 东京应化工业株式会社 | Applying device |
| CN101644903A (en) * | 2008-08-07 | 2010-02-10 | 和舰科技(苏州)有限公司 | Developing solution spray head |
| CN102269933A (en) * | 2011-01-19 | 2011-12-07 | 沈阳芯源微电子设备有限公司 | Auxiliary positioning semi-automatic fixing device for replacing photoresist nozzle |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103809390A (en) | 2014-05-21 |
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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Patentee after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Patentee before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
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