CN103773226B - A kind of method of hydrophobic sol and solution slice component outer electrode slurry sagging - Google Patents
A kind of method of hydrophobic sol and solution slice component outer electrode slurry sagging Download PDFInfo
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- CN103773226B CN103773226B CN201310712504.1A CN201310712504A CN103773226B CN 103773226 B CN103773226 B CN 103773226B CN 201310712504 A CN201310712504 A CN 201310712504A CN 103773226 B CN103773226 B CN 103773226B
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Abstract
The invention discloses a kind of method of hydrophobic sol and solution slice component outer electrode slurry sagging, described hydrophobic sol comprise 0.5% ~ 8% of by volume percentage scale octyl triethoxyl silane, 1.0% ~ 5.0% tetraethoxy, the Virahol of 85% ~ 98%, the hydrochloric acid of 0.1% ~ 0.4% and 0.4% ~ 2.0% Glacial acetic acid, wherein the concentration expressed in percentage by volume of Glacial acetic acid is less than or equal to 2%, and the concentration expressed in percentage by volume of hydrochloric acid is less than or equal to 4%.Before making outer electrode, the slice component of outer electrode to be produced is soaked in for some time in aforesaid hydrophobic sol, the outside surface of element is made to be covered parcel by hydrophobic sol, again the element through soaking is dried up, the element surface obtained has one deck hydrophobic film layer, now, again at upper end electrode coated electrode slurry, sagging can not be there is and the phenomenon such as to climb, prevent the generation of crescent moon electrode.
Description
Technical field
The present invention relates to hydrophobic sol and adopt hydrophobic sol to solve the method for slice component outer electrode slurry sagging.
Background technology
In recent years, along with widely using of chip components and parts, and be also tending towards variation to its various aspects of performance and appearance requirement, some bad order of chip components and parts restricts some electrical property again conversely simultaneously.Such as, chip components and parts outer electrode is normally formed with physical mechanical mode dip-coating electrode slurry, electrode slurry easily soaks at product surface, spread, climb, sagging, will form semi-moon shaped outer electrode (i.e. crescent moon electrode) after curing molding, causes product appearance, electrically bad.Crescent moon electrode can produce point discharge effect at electroplating process, and cause coating extend too fast to magnet and climb plating, time serious, two ends outer electrode links together and causes element short; Crescent moon electrode can cause product stray capacity to increase, thus affects product electrical property.
Traditional result of the above problems comprises: 1) by improving slurry thixotropy index, viscosity, adjustment dip-coating parameter, cost plenty of time and material resources cost, and not only effect is not significantly and consistence, reproducibility are poor; 2) by plasma treatment, modification is carried out to component surface, electrode slurry is not easily soaked at product surface, spreads, climbs, sagging, thus it is bad to solve crescent moon electrode.But these methods need spend high equipment, raw material and energy cost, and the not easy operation control of plasma treatment process complexity.
Summary of the invention
The object of the invention is to propose a kind of hydrophobic sol and adopt hydrophobic treatment to solve the method for slice component outer electrode slurry sagging, there is to overcome existing method the problem that processing cost is high, complex process not easily manipulates.
Hydrophobic sol provided by the invention, comprises following component:
Above per-cent is volume percent, and wherein, the concentration expressed in percentage by volume of described Glacial acetic acid is less than or equal to 2%, and the concentration expressed in percentage by volume of described hydrochloric acid is less than or equal to 4%.
The method of solution slice component outer electrode slurry sagging provided by the invention, is included in before making outer electrode and carries out following pre-treatment to the element of outer electrode to be produced:
S1, hydrophobic treatment: the element of outer electrode to be produced is soaked and is submerged in described hydrophobic sol completely, parcel is covered by described hydrophobic sol to make the outside surface of described element, described hydrophobic sol comprise by volume per-cent measures 0.5% ~ 8% octyl triethoxyl silane, 1.0% ~ 5.0% tetraethoxy, the Virahol of 85% ~ 98%, the hydrochloric acid of 0.1% ~ 0.4% and 0.4% ~ 2.0% Glacial acetic acid, the concentration expressed in percentage by volume of wherein said Glacial acetic acid is less than or equal to 2%, and the concentration expressed in percentage by volume of described hydrochloric acid is less than or equal to 4%;
S2, to dry up: the element crossed through step S1 hydrophobic treatment is dried up below 300 DEG C.More than 300 DEG C, hydrophobic film layer is easily destroyed, thus when causing follow-up making outer electrode, still occurs electrode slurry sagging phenomenon.
Find by analysis, electrode slurry soaks at product surface, spread, climb, the major cause of sagging is, electrode slurry has wetting ability, and product surface also often has certain wetting ability.Method of the present invention, the element of outer electrode to be produced is through hydrophobic treatment and after drying up, one deck hydrophobic film layer is formed on surface, be coated with the element of hydrophobic film layer, again at its upper end electrode coated electrode slurry to make outer electrode, due to the effect of hydrophobic film layer, the hydrophilic electrode slurry being coated in upper end electrode can not soak mutually with element surface, there will not be the phenomenon of diffusion, sagging, and the hydrophobic film layer that the present invention's solution used is formed can be eliminated completely in outer electrode sintering processes process, do not affect subsequent handling, also do not affect the performance of element.
Preferably, in step S1, the soak time of described element in described hydrophobic sol is 5-10min, after having soaked, pours described hydrophobic sol into sealed vessel.If soak time is lower than 5min, be difficult to form effective hydrophobic film layer, effect is undesirable, reaches perfect condition after 5min, hydrophobic sol consumption no significant difference in 5-10min, when the time more than 10min after hydrophobic sol consumption significantly to increase but the hydrophobic film layer effect formed is constant.After immersion completes, hydrophobic sol is poured into sealed storage in returnable, to avoid its loss through volatilization, the hydrophobic sol of recovery can be recycled and can not affect and improves effect.
Preferably, in step S2, the mode dried up is: described element is poured into tilting and dry up in basket and dry up below 40 DEG C with 60-100r/min rotating speed.The too high meeting of temperature causes product not easily to disperse, is separated and bonds agglomerating; Adopt tilting to dry up basket and dry up with 60 ~ 100r/min rotating speed, make in the process dried up, element fully can roll, disperse, and avoids cohering agglomerating.
Preferably, described pre-treatment also comprises: S3, grinding chamfering: the element after drying up in step S2 is placed in chamfering tank, and adds the grinding medium with the water of element same volume and 1/4 ~ 3/4 of component size, adopt beveler to carry out grinding chamfering.To remove element hydrophobic film layer seamed edge.
Preferably, described beveler is planet beveler, and with the rotating speed of 80-120r/min to element grinding chamfering 5-8min.Planet beveler possesses rotation and revolution function, and its chamfering efficiency is high, good uniformity.
Preferably, described pre-treatment also comprises: S4, separation: after completing steps S3, adopts the screen cloth of the order number matched with element, described grinding medium size in water by described grinding medium and product separation.
Preferably, described pre-treatment also comprises: S5, oven dry: dry being separated the element obtained through step S4 below 300 DEG C.More than 300 DEG C, hydrophobic film layer is easily destroyed, thus when causing follow-up making outer electrode, still occurs electrode slurry sagging phenomenon.
The method of solution slice component outer electrode slurry sagging provided by the invention, compared with prior art, at least there is following beneficial effect: as long as adopt hydrophobic sol to carry out pre-treatment to the element of outer electrode to be produced before making outer electrode, make the coated last layer hydrophobic film layer of element surface, after drying when coated electrode slurry makes outer electrode, there is the infiltration that hydrophilic electrode slurry just can not appear at element surface again, diffusion, sagging and climbing, prevent from forming crescent moon electrode, both the phenomenons such as the element short that may cause because of crescent moon electrode that turn avoid attractive in appearance occurred, ensure that the electrical property that slice component is good, and have simple to operate relative to existing method, realize the advantage that cost is low.
Accompanying drawing explanation
Fig. 1 is the outer electrode schematic diagram directly formed after undressed slice component upper end electrode coated electrode slurry;
Fig. 2 is the outer electrode schematic diagram formed after adopting hydrophobic sol process provided by the invention to cross again coated electrode slurry.
Embodiment
Below contrast accompanying drawing and combine preferred embodiment the invention will be further described.
When making the outer electrode of slice component, normally coated electrode slurry forms outer electrode, because element surface is wetting ability, and electrode slurry also belongs to hydrophilic fluid, after electrode slurry coating is got on, at element surface easily wetting, diffusion, sagging and climb, thus form the element with crescent moon electrode 100 as shown in Figure 1, easily cause electrically bad.
For this reason, the invention provides a kind of hydrophobic sol that adopts and pre-treatment is carried out to the slice component of outer electrode to be produced, make element surface form one deck hydrophobic film layer, to solve the technical problem of electrode slurry sagging, to avoid the formation of crescent moon electrode.
Embodiment 1
The hydrophobic sol that the present embodiment adopts is produced as follows:
Following component is measured according to volume percent:
Octyl triethoxyl silane 0.5%;
Tetraethoxy 1.0%;
Virahol 85.0%;
Hydrochloric acid 0.1%;
Glacial acetic acid 0.4%;
Wherein the concentration expressed in percentage by volume of Glacial acetic acid is 1%, and the concentration expressed in percentage by volume of hydrochloric acid is 1.5%, then all aforesaid components to be joined in sealed vessel to leave standstill under ambient temperature and moisture environment 6 hours stand-by.
In accordance with the following methods, the above-mentioned hydrophobic sol configured is adopted to carry out following pre-treatment to the element of outer electrode to be produced:
S1, hydrophobic treatment: the slice component of outer electrode to be produced to be poured in hydrophobic treatment container and to spread out, ensure that hydrophobic sol flooded element completely, soak 5min, after having soaked, poured into by hydrophobic sol in the returnable of sealing and wait to continue use;
S2, to dry up: pour the element through step S1 hydrophobic treatment into tilting and dry up in basket, with the condition blowing down 60min of the rotating speed of 60r/min at 300 DEG C, make element fully dry;
S3, grinding chamfering: the element dried up through step S2 is put into a 5L chamfering tank, add the grinding medium (aluminum oxide as φ 3) of the water of same volume and 1/4 of component size with element again, adopt planet beveler with the rotating speed of 80r/min grinding chamfering 5min;
S4, separation: after completing steps S3, be used in element, grinding medium be separated with element by the screen cloth of order number that grinding medium size matches in water;
S5, oven dry: step S4 is separated the element obtained and dries under the condition of 100 DEG C.
After above-mentioned five steps pre-treatment, then at upper end electrode place coated electrode slurry, electrode slurry can not infiltrate again, spread, sagging and climbing, and as shown in Figure 2, its outer electrode 200 no longer includes crescent moon electrode to the slice component produced.
Embodiment 2
The hydrophobic sol that the present embodiment adopts is produced as follows:
Following component is measured according to volume percent:
Octyl triethoxyl silane 4.5%;
Tetraethoxy 3.0%;
Virahol 91.5%;
Hydrochloric acid 0.2%;
Glacial acetic acid 1.2%;
Wherein the concentration expressed in percentage by volume of Glacial acetic acid is 1.5%, and the concentration expressed in percentage by volume of hydrochloric acid is 2.5%, then all aforesaid components to be joined in sealed vessel to leave standstill under ambient temperature and moisture environment 6 hours stand-by.
In accordance with the following methods, the above-mentioned hydrophobic sol configured is adopted to carry out following pre-treatment to the element of outer electrode to be produced:
S1, hydrophobic treatment: the slice component of outer electrode to be produced to be poured in hydrophobic treatment container and to spread out, ensure that hydrophobic sol flooded element completely, soak 7.5min, after having soaked, poured into by hydrophobic sol in the returnable of sealing and wait to continue use;
S2, to dry up: pour the element through step S1 hydrophobic treatment into tilting and dry up in basket, with the condition blowing down 75min of the rotating speed of 80r/min at 40 DEG C, make element fully dry;
S3, grinding chamfering: the element dried up through step S2 is put into a 5L chamfering tank, add the grinding medium (aluminum oxide as φ 3) of the water of same volume and 1/2 of component size with element again, adopt planet beveler with the rotating speed of 100r/min grinding chamfering 6.5min;
S4, separation: after completing steps S3, be used in element, grinding medium be separated with element by the screen cloth of order number that grinding medium size matches in water;
S5, oven dry: step S4 is separated the element obtained and dries under the condition of 200 DEG C.
After above-mentioned five steps pre-treatment, then at upper end electrode place coated electrode slurry, electrode slurry can not infiltrate again, spread, sagging and climbing, and as shown in Figure 2, its outer electrode 200 no longer includes crescent moon electrode to the slice component produced.
Embodiment 3
The hydrophobic sol that the present embodiment adopts is produced as follows:
Following component is measured according to volume percent:
Octyl triethoxyl silane 8.0%;
Tetraethoxy 5.0%;
Virahol 98.0%;
Hydrochloric acid 0.4%;
Glacial acetic acid 2.0%;
Wherein the concentration expressed in percentage by volume of Glacial acetic acid is 2%, and the concentration expressed in percentage by volume of hydrochloric acid is 4%, then all aforesaid components to be joined in sealed vessel to leave standstill under ambient temperature and moisture environment 6 hours stand-by.
In accordance with the following methods, the above-mentioned hydrophobic sol configured is adopted to carry out following pre-treatment to the element of outer electrode to be produced:
S1, hydrophobic treatment: the slice component of outer electrode to be produced to be poured in hydrophobic treatment container and to spread out, ensure that hydrophobic sol flooded element completely, soak 10min, after having soaked, poured into by hydrophobic sol in the returnable of sealing and wait to continue use;
S2, to dry up: pour the element through step S1 hydrophobic treatment into tilting and dry up in basket, with the condition blowing down 90min of the rotating speed of 100r/min at 25 DEG C, make element fully dry;
S3, grinding chamfering: the element dried up through step S2 is put into a 5L chamfering tank, add the grinding medium (aluminum oxide as φ 3) of the water of same volume and 3/4 of component size with element again, adopt planet beveler with the rotating speed of 120r/min grinding chamfering 8min;
S4, separation: after completing steps S3, be used in element, grinding medium be separated with element by the screen cloth of order number that grinding medium size matches in water;
S5, oven dry: step S4 is separated the element obtained and dries under the condition of 300 DEG C.
After above-mentioned five steps pre-treatment, then at upper end electrode place coated electrode slurry, electrode slurry can not infiltrate again, spread, sagging and climbing, and as shown in Figure 2, its outer electrode 200 no longer includes crescent moon electrode to the slice component produced.
To sum up, after adopting hydrophobic sol of the present invention to carry out pre-treatment according to method provided by the invention to the slice component of outer electrode to be produced, surface is coated by hydrophobic film layer, coated electrode slurry again, the outer electrode obtained is smooth, without crescent moon electrode, the phenomenon such as there is not sagging, climb, and in the process of carrying out outer electrode sintering processes, this hydrophobic film layer can be eliminated completely, any impact do not produced on the function of element and characteristic, present method cost is low, easy to operate, solve the effective of electrode slurry sagging.
Above content is in conjunction with concrete preferred implementation further description made for the present invention, can not assert that specific embodiment of the invention is confined to these explanations.For those skilled in the art, without departing from the inventive concept of the premise, some equivalent to substitute or obvious modification can also be made, and performance or purposes identical, all should be considered as belonging to protection scope of the present invention.
Claims (7)
1. solve a method for slice component outer electrode slurry sagging, it is characterized in that: before making outer electrode, the element of outer electrode to be produced is carried out following pre-treatment:
S1, hydrophobic treatment: the element of outer electrode to be produced is soaked and is submerged in completely in hydrophobic sol, parcel is covered by described hydrophobic sol to make the outside surface of described element, wherein, described hydrophobic sol comprise 0.5% ~ 8% of by volume percentage scale octyl triethoxyl silane, 1.0% ~ 5.0% tetraethoxy, the Virahol of 85% ~ 98%, the hydrochloric acid of 0.1% ~ 0.4% and 0.4% ~ 2.0% Glacial acetic acid, the concentration expressed in percentage by volume of wherein said Glacial acetic acid is less than or equal to 2%, and the concentration expressed in percentage by volume of described hydrochloric acid is less than or equal to 4%;
S2, to dry up: the element crossed through step S1 hydrophobic treatment is dried up below 300 DEG C.
2. the method for claim 1, is characterized in that: in step S1, and the soak time of described element in described hydrophobic sol is 5-10min.
3. the method for claim 1, is characterized in that: in step S2, and the mode dried up is: described element is poured into tilting and dry up in basket and dry up below 40 DEG C with 60-100r/min rotating speed.
4. the method as described in any one of claims 1 to 3, is characterized in that, described pre-treatment also comprises:
S3, grinding chamfering: the element after drying up in step S2 is placed in chamfering tank, and adds the grinding medium with the water of element same volume and 1/4 ~ 3/4 of component size, adopt beveler to carry out grinding chamfering.
5. method as claimed in claim 4, is characterized in that: described beveler is planet beveler, and with the rotating speed of 80-120r/min to element grinding chamfering 5-8min.
6. method as claimed in claim 5, it is characterized in that, described pre-treatment also comprises:
S4, separation: after completing steps S3, adopt the screen cloth of the order number matched with element, described grinding medium size to be separated with element by described grinding medium in water.
7. method as claimed in claim 6, it is characterized in that, described pre-treatment also comprises:
S5, oven dry: dry being separated the element obtained through step S4 below 300 DEG C.
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| CN112316844A (en) * | 2020-10-30 | 2021-02-05 | 广东风华高新科技股份有限公司 | Surface modification solution and application thereof |
| CN115635385B (en) * | 2022-09-30 | 2023-06-20 | 广东微容电子科技有限公司 | Chamfering method of MLCC |
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| CN1435392A (en) * | 2002-01-26 | 2003-08-13 | 福耀玻璃工业集团股份有限公司 | Method for making hydrophobic solution and hydrophobic glass |
| CN1931448A (en) * | 2006-09-27 | 2007-03-21 | 中国科学院上海硅酸盐研究所 | Method of forming hydrophobic transparent film on the surface of different substrates |
| CN101863625A (en) * | 2009-04-17 | 2010-10-20 | 信义汽车玻璃(东莞)有限公司 | Hydrophobic solution, hydrophobic glass for vehicle and manufacturing method thereof |
| CN102290239A (en) * | 2010-05-19 | 2011-12-21 | 株式会社村田制作所 | Method for a producing ceramic electronic component |
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| KR20030011778A (en) * | 2000-02-28 | 2003-02-11 | 애드실, 엘씨 | Silane-based, coating compositions, coated articles obtained therefrom and methods of using same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1435392A (en) * | 2002-01-26 | 2003-08-13 | 福耀玻璃工业集团股份有限公司 | Method for making hydrophobic solution and hydrophobic glass |
| CN1931448A (en) * | 2006-09-27 | 2007-03-21 | 中国科学院上海硅酸盐研究所 | Method of forming hydrophobic transparent film on the surface of different substrates |
| CN101863625A (en) * | 2009-04-17 | 2010-10-20 | 信义汽车玻璃(东莞)有限公司 | Hydrophobic solution, hydrophobic glass for vehicle and manufacturing method thereof |
| CN102290239A (en) * | 2010-05-19 | 2011-12-21 | 株式会社村田制作所 | Method for a producing ceramic electronic component |
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