CN103748483A - 包含百叶窗的背景减少系统 - Google Patents

包含百叶窗的背景减少系统 Download PDF

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Publication number
CN103748483A
CN103748483A CN201280039957.6A CN201280039957A CN103748483A CN 103748483 A CN103748483 A CN 103748483A CN 201280039957 A CN201280039957 A CN 201280039957A CN 103748483 A CN103748483 A CN 103748483A
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CN
China
Prior art keywords
charged particle
shutter
transmission
optionally
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280039957.6A
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English (en)
Chinese (zh)
Inventor
迈赫兰·纳赛尔-古德西
克里斯多夫·西尔斯
罗伯特·海恩斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of CN103748483A publication Critical patent/CN103748483A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201280039957.6A 2011-06-30 2012-06-07 包含百叶窗的背景减少系统 Pending CN103748483A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/174,020 US8633457B2 (en) 2011-06-30 2011-06-30 Background reduction system including louver
US13/174,020 2011-06-30
PCT/US2012/041343 WO2013002993A1 (en) 2011-06-30 2012-06-07 Background reduction system including louver

Publications (1)

Publication Number Publication Date
CN103748483A true CN103748483A (zh) 2014-04-23

Family

ID=47389602

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280039957.6A Pending CN103748483A (zh) 2011-06-30 2012-06-07 包含百叶窗的背景减少系统

Country Status (6)

Country Link
US (1) US8633457B2 (enExample)
EP (1) EP2726906A4 (enExample)
JP (1) JP6026527B2 (enExample)
CN (1) CN103748483A (enExample)
TW (1) TW201301333A (enExample)
WO (1) WO2013002993A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2682978B1 (en) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU693487A1 (ru) * 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
CN86108035A (zh) * 1985-12-04 1987-09-16 动能技术公司 探测和定位中性粒子的设备及其应用
SU1814427A1 (ru) * 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
US20080240535A1 (en) * 2004-09-09 2008-10-02 Massachusetts Institute Of Technology Systems And Methods For Multi-Modal Imaging
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135388A (enExample) * 1974-09-20 1976-03-25 Hitachi Ltd
JPH10256136A (ja) * 1997-03-14 1998-09-25 Nikon Corp 荷電ビーム露光装置
JP3603779B2 (ja) * 2000-11-01 2004-12-22 株式会社日立製作所 電子検出装置，荷電粒子ビーム装置，半導体集積回路装置、および半導体集積回路装置の加工，観察，検査方法
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US8304751B2 (en) * 2008-05-12 2012-11-06 Mitsubishi Electric Corporation Charged particle beam irradiation apparatus
WO2011009065A2 (en) * 2009-07-17 2011-01-20 Kla-Tencor Corporation Charged-particle energy analyzer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU693487A1 (ru) * 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
CN86108035A (zh) * 1985-12-04 1987-09-16 动能技术公司 探测和定位中性粒子的设备及其应用
SU1814427A1 (ru) * 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
US20080240535A1 (en) * 2004-09-09 2008-10-02 Massachusetts Institute Of Technology Systems And Methods For Multi-Modal Imaging
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging

Also Published As

Publication number Publication date
EP2726906A4 (en) 2015-07-01
US8633457B2 (en) 2014-01-21
JP6026527B2 (ja) 2016-11-16
WO2013002993A1 (en) 2013-01-03
TW201301333A (zh) 2013-01-01
US20130001417A1 (en) 2013-01-03
JP2014521192A (ja) 2014-08-25
EP2726906A1 (en) 2014-05-07

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Application publication date: 20140423