JP6026527B2 - ルーバを含むバックグラウンド低減システム - Google Patents

ルーバを含むバックグラウンド低減システム Download PDF

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Publication number
JP6026527B2
JP6026527B2 JP2014518593A JP2014518593A JP6026527B2 JP 6026527 B2 JP6026527 B2 JP 6026527B2 JP 2014518593 A JP2014518593 A JP 2014518593A JP 2014518593 A JP2014518593 A JP 2014518593A JP 6026527 B2 JP6026527 B2 JP 6026527B2
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JP
Japan
Prior art keywords
charged particle
reduction system
angle
background reduction
target substrate
Prior art date
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Application number
JP2014518593A
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English (en)
Japanese (ja)
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JP2014521192A5 (enExample
JP2014521192A (ja
Inventor
メヘラーン ナセル−ゴドスィ
メヘラーン ナセル−ゴドスィ
クリストファ シアーズ
クリストファ シアーズ
ロバート ヘインズ
ロバート ヘインズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
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KLA Corp
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Publication date
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Publication of JP2014521192A publication Critical patent/JP2014521192A/ja
Publication of JP2014521192A5 publication Critical patent/JP2014521192A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2516—Secondary particles mass or energy spectrometry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2014518593A 2011-06-30 2012-06-07 ルーバを含むバックグラウンド低減システム Active JP6026527B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/174,020 US8633457B2 (en) 2011-06-30 2011-06-30 Background reduction system including louver
US13/174,020 2011-06-30
PCT/US2012/041343 WO2013002993A1 (en) 2011-06-30 2012-06-07 Background reduction system including louver

Publications (3)

Publication Number Publication Date
JP2014521192A JP2014521192A (ja) 2014-08-25
JP2014521192A5 JP2014521192A5 (enExample) 2015-07-16
JP6026527B2 true JP6026527B2 (ja) 2016-11-16

Family

ID=47389602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014518593A Active JP6026527B2 (ja) 2011-06-30 2012-06-07 ルーバを含むバックグラウンド低減システム

Country Status (6)

Country Link
US (1) US8633457B2 (enExample)
EP (1) EP2726906A4 (enExample)
JP (1) JP6026527B2 (enExample)
CN (1) CN103748483A (enExample)
TW (1) TW201301333A (enExample)
WO (1) WO2013002993A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2682978B1 (en) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Contamination reduction electrode for particle detector
US9082580B2 (en) 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135388A (enExample) * 1974-09-20 1976-03-25 Hitachi Ltd
SU693487A1 (ru) 1978-01-16 1979-10-25 Предприятие П/Я В-2502 Счетчик гейгера-мюллера с экраном
FR2591036A1 (fr) * 1985-12-04 1987-06-05 Balteau Dispositif de detection et de localisation de particules neutres, et applications
SU1814427A1 (ru) 1988-11-23 1995-04-20 Физико-технический институт им.А.Ф.Иоффе Электростатический спектрометр для энергетического и углового анализа заряженных частиц
JPH10256136A (ja) * 1997-03-14 1998-09-25 Nikon Corp 荷電ビーム露光装置
JP3603779B2 (ja) * 2000-11-01 2004-12-22 株式会社日立製作所 電子検出装置，荷電粒子ビーム装置，半導体集積回路装置、および半導体集積回路装置の加工，観察，検査方法
US7394053B2 (en) * 2004-09-09 2008-07-01 Beth Israel Deaconess Medical Center, Inc. Systems and methods for multi-modal imaging having a spatial relationship in three dimensions between first and second image data
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US7692156B1 (en) * 2006-08-23 2010-04-06 Radiation Monitoring Devices, Inc. Beam-oriented pixellated scintillators for radiation imaging
CN102015022B (zh) * 2008-05-12 2014-04-30 三菱电机株式会社 带电粒子束照射装置
JP5694317B2 (ja) * 2009-07-17 2015-04-01 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 荷電粒子エネルギー分析器装置および方法

Also Published As

Publication number Publication date
TW201301333A (zh) 2013-01-01
US20130001417A1 (en) 2013-01-03
CN103748483A (zh) 2014-04-23
WO2013002993A1 (en) 2013-01-03
EP2726906A1 (en) 2014-05-07
US8633457B2 (en) 2014-01-21
JP2014521192A (ja) 2014-08-25
EP2726906A4 (en) 2015-07-01

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