CN103701423A - Quartz crystal frequency chip cleaning process - Google Patents
Quartz crystal frequency chip cleaning process Download PDFInfo
- Publication number
- CN103701423A CN103701423A CN201310625361.0A CN201310625361A CN103701423A CN 103701423 A CN103701423 A CN 103701423A CN 201310625361 A CN201310625361 A CN 201310625361A CN 103701423 A CN103701423 A CN 103701423A
- Authority
- CN
- China
- Prior art keywords
- quartz crystal
- frequency chip
- crystal frequency
- cleaning
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a quartz crystal frequency chip cleaning process, which comprises the following process steps: (1) placing a quartz crystal frequency chip in a primary cleaning machine, adding a neutral surfactant in cleaning water, and cleaning the quartz crystal frequency chip for 10 to 20 minutes; (2) fishing out the quartz crystal frequency chip, draining the water, placing the quartz crystal frequency chip in a secondary cleaning machine, adding an alkali liquor with concentration of 18 percent and temperature of 60 to 80 DEG C in the secondary cleaning machine, and cleaning the quartz crystal frequency chip for 10 to 20 minutes; (3) fishing out the quartz crystal frequency chip, draining the water, placing the quartz crystal frequency chip in a tertiary cleaning machine, adding a weakly acidic cleaning solution in the tertiary cleaning machine, and cleaning the quartz crystal frequency chip for 10 to 20 minutes; (4) fishing out the quartz crystal frequency chip, draining the water, placing the quartz crystal frequency chip in a quaternary cleaning machine, cleaning the quartz crystal frequency chip in a spraying way for 1 to 10 minutes by using pure water, fishing out the quartz crystal frequency chip, and draining the water. The process steps are simple, and the process is convenient to operate; a small amount of water is used, and the cleaning wastewater can be recycled, so that water resources are effectively saved; the good cleaning effects are achieved; the quality of the quartz crystal frequency chip can be effectively improved.
Description
Technical field
The present invention relates to electronic technology field, be specifically related to a kind of quartz crystal frequency chip cleaning.
Background technology
Quartz oscillator, resonator are widely used in various numeric class electronic products, and the market demand is huge.There is significant impact to technical target of the product in the cleaning of such production quartz crystal frequency chip used, at present the following four kinds of cleaning methods of general employing:
1) artificial ultrasound is cleaned: according to cleaning process, manually carry out, and hand shaken is cleaned basket in cleaning process, avoid quartz frequency sheet to assemble.The method efficiency is low, hand labor intensity is large, and it is unified that cleaning performance is difficult to reach.
2) semi-automatic ultrasonic cleaning: according to cleaning process, continuous ultrasonic cleaning tank is set, after reaching the scavenging period of process stipulation, manually quartz crystal frequency chip is transferred to next rinse bath.The method hand labor is emphasized to improve, but in cleaning process, produces wafer clustering phenomena, can not make the surface of all wafers fully be cleaned.
3) fully-automatic ultrasonic cleans: equipment is generally to use producer's self-developing or cooperative development, does not need to intervene midway.The method for strengthening effect, adopts strong current scour wafer in cleaning process, needs to consume a large amount of water sources in production.
4) inorganic acid cleans: adopt hydrochloric acid and hydrogen peroxide to be configured to by a certain percentage solution, under heating condition, carry out.The method can produce irritative gas in actual production, and under heating condition, solution easily seethes with excitement, and jeopardizes operative employee, needs special labour protection measures.
Therefore under the considering of aspects such as improving the quality of products, protect Employee Security, environmental protection, economize on resources, need a kind of effective cleaning process badly.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of quartz crystal frequency chip cleaning of energy-conserving and environment-protective.
Technical problem to be solved by this invention realizes by the following technical solutions:
A quartz crystal frequency chip cleaning, comprises following processing step,
1) quartz crystal frequency chip is put into one to cleaning machine, in rinse water, added neutral surfactant, clean 10-20 minute;
2) pull out, drain the water, put into two road cleaning machines, in Er road cleaning machine, add that concentration is 18%, temperature is the alkali lye of 60-80 ℃, cleans 10-20 minute;
3) pull out, drain the water, put into three road cleaning machines, in San road cleaning machine, add weak acid pickling solution, clean 10-20 minute;
4) pull out, drain the water, put into four road cleaning machines, by the mode of pure water spray, clean 1-10 minute, pull out, drain the water.
The invention has the beneficial effects as follows: processing step of the present invention is simple, easy to operate, and water consumption is little, and the waste water after cleaning can be recycled, effective saving water resource, cleaning performance is good, can effectively improve the quality of quartz crystal frequency chip.
Embodiment
For technological means, creation characteristic that the present invention is realized, reach object and effect is easy to understand, below in conjunction with specific embodiment, further set forth the present invention.
A quartz crystal frequency chip cleaning, comprises following processing step,
1) quartz crystal frequency chip is put into one to cleaning machine, in rinse water, added neutral surfactant, clean 10-20 minute;
2) pull out, drain the water, put into two road cleaning machines, in Er road cleaning machine, add that concentration is 18%, temperature is the alkali lye of 60-80 ℃, cleans 10-20 minute;
3) pull out, drain the water, put into three road cleaning machines, in San road cleaning machine, add weak acid pickling solution, clean 10-20 minute;
4) pull out, drain the water, put into four road cleaning machines, by the mode of pure water spray, clean 1-10 minute, pull out, drain the water.
More than show and described basic principle of the present invention and principal character and advantage of the present invention.The technical staff of the industry should understand; the present invention is not restricted to the described embodiments; that in above-described embodiment and specification, describes just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.The claimed scope of the present invention is defined by appending claims and equivalent thereof.
Claims (1)
1. a quartz crystal frequency chip cleaning, is characterized in that: comprise following processing step,
1) quartz crystal frequency chip is put into one to cleaning machine, in rinse water, added neutral surfactant, clean 10-20 minute;
2) pull out, drain the water, put into two road cleaning machines, in Er road cleaning machine, add that concentration is 18%, temperature is the alkali lye of 60-80 ℃, cleans 10-20 minute;
3) pull out, drain the water, put into three road cleaning machines, in San road cleaning machine, add weak acid pickling solution, clean 10-20 minute;
4) pull out, drain the water, put into four road cleaning machines, by the mode of pure water spray, clean 1-10 minute, pull out, drain the water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310625361.0A CN103701423A (en) | 2013-11-29 | 2013-11-29 | Quartz crystal frequency chip cleaning process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310625361.0A CN103701423A (en) | 2013-11-29 | 2013-11-29 | Quartz crystal frequency chip cleaning process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103701423A true CN103701423A (en) | 2014-04-02 |
Family
ID=50362850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310625361.0A Pending CN103701423A (en) | 2013-11-29 | 2013-11-29 | Quartz crystal frequency chip cleaning process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103701423A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106190030A (en) * | 2016-07-13 | 2016-12-07 | 苏州普锐晶科技有限公司 | The ground and cleaned method of frequency chip |
| CN106971969A (en) * | 2017-05-11 | 2017-07-21 | 济源石晶光电频率技术有限公司 | Quartz wafer decontamination plant and quartz wafer decontamination method |
-
2013
- 2013-11-29 CN CN201310625361.0A patent/CN103701423A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106190030A (en) * | 2016-07-13 | 2016-12-07 | 苏州普锐晶科技有限公司 | The ground and cleaned method of frequency chip |
| CN106971969A (en) * | 2017-05-11 | 2017-07-21 | 济源石晶光电频率技术有限公司 | Quartz wafer decontamination plant and quartz wafer decontamination method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104911229A (en) | Preparation method for extracting agar under assistance of compound enzyme method | |
| CN102601074B (en) | TFT-LCD glass substrate washing method | |
| CN102151669B (en) | Processing method of coating film crushed materials of solar silicon cell | |
| CN103665195B (en) | A kind of method utilizing agar in Enzymatic Extraction fragrant plant mentioned in ancient texts | |
| CN103773639A (en) | Equipment descaling agent and preparation method thereof | |
| CN103701423A (en) | Quartz crystal frequency chip cleaning process | |
| CN107658246A (en) | A kind of solar silicon wafers cleaning | |
| CN103170467B (en) | Ingot casting cycle stock cleaning method | |
| CN101694013A (en) | Corrosion method for increasing strength of solar sige substrate sheets | |
| CN104313581B (en) | Aluminium alloy fluoride-free acid sand processing technology and acid sand treatment agent | |
| CN104028503B (en) | The cleaning method of silicon material | |
| CN105047538A (en) | Silicon wafer cleaning method and cleaning device | |
| CN101875048A (en) | Method for removing impurities on surface of silicon chip | |
| CN102212832A (en) | Silicon material cleaning technology | |
| CN102586789A (en) | Ultrasonic wave cleaning agent for body of stainless steel electric kettle and production method | |
| CN102744230A (en) | Cleaning method for dirty and stuck solar silicon chip | |
| CN105344641A (en) | Cleaning method of silicon raw material | |
| CN204396425U (en) | A kind of glass washing device | |
| CN103628089B (en) | A kind of cleaning method of electrolytic manganese polar plate | |
| CN202845382U (en) | Silicon material cleaning device group | |
| CN106694497B (en) | A kind of cleaning process for dry film/solder mask developing trough | |
| CN103406344B (en) | Treatment method for linearly-chopped silicon wafer impurities | |
| CN104232339A (en) | Low foam liquid detergent | |
| CN102351186A (en) | Method for recovering silicon material with metal coating on surface | |
| CN205803089U (en) | Resin deferrization water saving art device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140402 |