CN202845382U - Silicon material cleaning device group - Google Patents
Silicon material cleaning device group Download PDFInfo
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- CN202845382U CN202845382U CN 201220542400 CN201220542400U CN202845382U CN 202845382 U CN202845382 U CN 202845382U CN 201220542400 CN201220542400 CN 201220542400 CN 201220542400 U CN201220542400 U CN 201220542400U CN 202845382 U CN202845382 U CN 202845382U
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- cleaning machine
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Abstract
The utility model discloses a silicon material cleaning device group. The silicon material cleaning device group comprises a rinsing cleaning machine, and an acid cleaning machine, an acid steeping machine, an alkaline cleaning machine and an ultrasonic cleaning machine are respectively arranged around the rinsing cleaning machine. The acid cleaning machine is opposite to the acid steeping machine, and the alkaline cleaning machine is opposite to the ultrasonic cleaning machine. When the silicon material cleaning device group is used to clean silicon materials, the cleaning can be carried out to the silicon materials by different processes according to the differences of the surfaces of the silicon materials. By using the silicon material cleaning device group to clean the silicon materials, not only can real-time monitoring be carried out, but also cleaning quality of silicon materials can be guaranteed, the loss of silicon materials can be further reduced, cost is saved, and efficiency is improved.
Description
Technical field
The utility model relates to photoelectric field, is specifically related to a kind of silicon material cleaning device group.
Background technology
In the photoelectric field, silicon is raw semiconductor very important and commonly used, is the optimal raw material of solar cell.Generally all can there be impurity and some oxides in the raw material surface of preparation silicon chip, must use through just entering subsequent handling after cleaning.But in the at present production operation, because the hands-off operation that the cleaning equipment of a lot of silicon material adopts pickling, alkali cleaning, water flushing and ultrasonic cleaning to be integrated, so can't implementing monitoring, must wait silicon raw material cleaning procedure to finish after, just can observe the cleaning situation of silicon material; When cleaning by this method, generally can only clean according to pickling, flushing, alkali cleaning, flushing, ultrasonic flow process of washing the silicon raw material, but the impurity composition on raw material surface is different, mechanically clean raw material according to basic procedure, not only waste time and energy, but also caused the unnecessary waste of raw material, reduced production efficiency.
Summary of the invention
The purpose of this utility model is: overcome the deficiencies in the prior art, a kind of silicon material cleaning device group is provided, the cleaning of silicon raw material is carried out different cleaning processes according to the difference of raw material surface impurity.
Technical solution adopted in the utility model is:
A kind of device group of flexible cleaning silicon material comprises the shower cleaning machine, is respectively equipped with acid cleaning machine, acid immersion machine, alkaline cleaning machine and supersonic cleaning machine around the described shower cleaning machine.
The further improvement project of the utility model is, described acid cleaning machine is positioned at the opposite of acid immersion machine, and described alkaline cleaning machine is positioned at the opposite of supersonic cleaning machine.
The utility model further improvement project is that the model of described shower cleaning machine is SGPR-05 silicon material cleaning machine.
The utility model further improvement project is that the model of described acid cleaning machine is SGPR-04 silicon material pickling machine.
The utility model further improvement project is that the model of described acid immersion machine is SGPR-05 silicon material immersion machine.
The utility model further improvement project is that the model of described alkaline cleaning machine is SGSR-04 silicon material alkaline cleaner.
The utility model further improvement project is that the model of described supersonic cleaning machine is the manual silicon material of SGR28-05 cleaning machine.
The beneficial effects of the utility model are:
When carrying out the cleaning of silicon raw material with the utility model, first the silicon raw material is put into the shower cleaning machine and wash in advance, and after flushing, the surface of silicon raw material is detected; According to detection: the surface sent in the supersonic cleaning machine without the silicon raw material of attachment clean, have the silicon raw material of a little impurity to put into acid cleaning machine on the surface and carry out pickling, the silicon raw material that surface impurity is more is put into acid immersion machine and is soaked a few hours; To put into the shower cleaning machine through the silicon raw material of overpickling or acid soak and wash, after the flushing silicon raw material surface be observed; According to the observation: do not have the silicon raw material of residual soil to put into supersonic cleaning machine on the surface and carry out ultrasonic cleaning, still have the silicon raw material of residual soil to put into alkaline cleaning machine on the surface and carry out alkali cleaning; To put into the shower cleaning machine through the silicon raw material of alkali cleaning and wash, and again the silicon raw material be sent in the supersonic cleaning machine afterwards and cleaned.From the above-mentioned course of work as can be known, carry out the cleaning of silicon raw material with the utility model, can either carry out Real Time Monitoring, can guarantee again the cleaning quality of silicon raw material, can also reduce the loss of silicon raw material, save cost, raise the efficiency.
Description of drawings:
Fig. 1 is the utility model position schematic top plan view.
The specific embodiment:
As shown in Figure 1, the utility model comprises in the shower cleaning machine 1(the implementation case, the model of shower cleaning machine 1 is SGPR-05 silicon material cleaning machine), be respectively equipped with in the acid cleaning machine 2(the implementation case around the described shower cleaning machine 1, the model of acid cleaning machine 2 is SGPR-04 silicon material pickling machine), in the acid immersion machine 3(the implementation case, the model of acid immersion machine 3 is SGPR-05 silicon material immersion machine), in the alkalescence cleaning machine 4(the implementation case, alkalescence cleaning machine 4 model be SGSR-04 silicon material alkaline cleaner) and supersonic cleaning machine 5(the implementation case in, the model of supersonic cleaning machine 5 is the manual silicon material of SGR28-05 cleaning machine); Described acid cleaning machine 2 is positioned at the opposite of acid immersion machine 3, and described alkaline cleaning machine 4 is positioned at the opposite of supersonic cleaning machine 5.
When the utility model uses, first the silicon raw material is put into the 1 pre-flushing of shower cleaning machine, and after flushing, the surface of silicon raw material is detected; According to detection: the surface sent in the supersonic cleaning machine 5 without the silicon raw material of attachment clean, there is the silicon raw material of a little impurity to put into acid cleaning machine 2 on the surface and carries out pickling, the silicon raw material that surface impurity is more is put into acid immersion machine 3 and is soaked a few hours (the implementation case, with silicon raw material soaking 1 ~ 3 hour); To put into shower cleaning machine 1 through the silicon raw material of overpickling or acid soak and wash, after the flushing silicon raw material surface be observed; According to the observation: do not have the silicon raw material of residual soil to put into supersonic cleaning machine 5 on the surface and carry out ultrasonic cleaning, still have the silicon raw material of residual soil to put into alkaline cleaning machine 4 on the surface and carry out alkali cleaning; To put into shower cleaning machine 1 through the silicon raw material of alkali cleaning and wash, and again the silicon raw material be sent into afterwards in the supersonic cleaning machine 5 and cleaned.
Claims (7)
1. a silicon material cleaning device group is characterized in that: comprise shower cleaning machine (1), be respectively equipped with acid cleaning machine (2), acid immersion machine (3), alkaline cleaning machine (4) and supersonic cleaning machine (5) around the described shower cleaning machine (1).
2. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: described acid cleaning machine (2) is positioned at the opposite of acid immersion machine (3), and described alkaline cleaning machine (4) is positioned at the opposite of supersonic cleaning machine (5).
3. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: the model of described shower cleaning machine (1) is SGPR-05 silicon material cleaning machine.
4. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: the model of described acid cleaning machine (2) is SGPR-04 silicon material pickling machine.
5. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: the model of described acid immersion machine (3) is SGPR-05 silicon material immersion machine.
6. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: the model of described alkaline cleaning machine (4) is SGSR-04 silicon material alkaline cleaner.
7. a kind of silicon material cleaning device group as claimed in claim 1, it is characterized in that: the model of described supersonic cleaning machine (5) is the manual silicon material of SGR28-05 cleaning machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220542400 CN202845382U (en) | 2012-10-23 | 2012-10-23 | Silicon material cleaning device group |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220542400 CN202845382U (en) | 2012-10-23 | 2012-10-23 | Silicon material cleaning device group |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202845382U true CN202845382U (en) | 2013-04-03 |
Family
ID=47976618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220542400 Expired - Fee Related CN202845382U (en) | 2012-10-23 | 2012-10-23 | Silicon material cleaning device group |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202845382U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866397A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Surface pretreatment device for polycrystalline silicon ingot and treatment method thereof |
| CN106345739A (en) * | 2016-11-29 | 2017-01-25 | 晶科能源有限公司 | Method and device for cleaning silicon materials |
-
2012
- 2012-10-23 CN CN 201220542400 patent/CN202845382U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103866397A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Surface pretreatment device for polycrystalline silicon ingot and treatment method thereof |
| CN103866397B (en) * | 2014-03-23 | 2016-03-30 | 山西中电科新能源技术有限公司 | Polycrystal silicon ingot surface pretreatment device and treatment process thereof |
| CN106345739A (en) * | 2016-11-29 | 2017-01-25 | 晶科能源有限公司 | Method and device for cleaning silicon materials |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130403 Termination date: 20171023 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |