CN103646935A - Secondary plating-prior-to-etching metal frame subtraction imbedded chip flip bump structure and process method - Google Patents
Secondary plating-prior-to-etching metal frame subtraction imbedded chip flip bump structure and process method Download PDFInfo
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- CN103646935A CN103646935A CN201310645356.6A CN201310645356A CN103646935A CN 103646935 A CN103646935 A CN 103646935A CN 201310645356 A CN201310645356 A CN 201310645356A CN 103646935 A CN103646935 A CN 103646935A
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- metal substrate
- photoresistance film
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- pin
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 140
- 239000002184 metal Substances 0.000 title claims abstract description 140
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000005530 etching Methods 0.000 title claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 97
- 239000004033 plastic Substances 0.000 claims abstract description 26
- 239000005022 packaging material Substances 0.000 claims abstract description 16
- 230000003064 anti-oxidating effect Effects 0.000 claims abstract description 4
- 239000003963 antioxidant agent Substances 0.000 claims description 24
- 230000003078 antioxidant effect Effects 0.000 claims description 24
- 235000006708 antioxidants Nutrition 0.000 claims description 24
- 238000003384 imaging method Methods 0.000 claims description 18
- 238000004806 packaging method and process Methods 0.000 claims description 14
- 230000003628 erosive effect Effects 0.000 claims description 13
- 238000003486 chemical etching Methods 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 239000003822 epoxy resin Substances 0.000 claims description 10
- 229920000647 polyepoxide Polymers 0.000 claims description 10
- 238000007747 plating Methods 0.000 claims description 9
- 238000009713 electroplating Methods 0.000 claims description 6
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical compound [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 claims description 2
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 239000003292 glue Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 14
- 238000001465 metallisation Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 6
- 238000005538 encapsulation Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000013043 chemical agent Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Abstract
The invention relates to a secondary plating-prior-to-etching metal frame subtraction imbedded chip flip bump structure and a process method. The structure comprises a metal substrate fame (1). The metal substrate fame (1) is internally provided with base islands (2) and pins (3). The pins (3) are in step shapes. The back surface of each base island (2) is flush with the step surface of each pin (3). The back surface of each base island (2) and the step surface of each pin (3) are invertedly equipped with a chip (6) through bottom filling glue (5). The metal substrate fame (1) is internally filled with plastic packaging material (7). The front surface of the plastic packaging material (7) is flush with the step surface of the pin (3). The back surface of the plastic packaging material (7) is flush with the back surface of the metal substrate fame (1). The front surface of the base island (2), the front surface and the back surface of each pin (3) as well as the front surface and the back surface of the metal substrate fame (1) are provided with an anti-oxidation layer (4). The back surface of each pin (3) is provided with a metal ball (9). The beneficial effect of the structure and method is that: the problem that the function and the application performance of a conventional metal lead frame are limited since an object cannot be imbedded in the metal lead frame with such plate thickness is solved.
Description
Technical field
The present invention relates to a kind of secondary and first plate rear erosion metal frame subtraction and bury flip-chip bump structure and process, belong to semiconductor packaging field.
Background technology
Traditional flat-four-side mainly contains two kinds without pin metal leadframe structure:
Be flat-four-side without pin package (QFN) lead frame, the lead frame of this structure forms (as shown in figure 18) by copper material metal framework and high temperature resistant glued membrane;
Be to seal in advance flat-four-side without pin package (PQFN) lead frame, the lead frame structure of this structure comprises pin Yu Ji island, and the etching area between pin Yu Ji island is filled with plastic packaging material (as shown in figure 19).
There is following shortcoming in above-mentioned traditional metal lead frame:
1, traditional metal lead frame is as the package carrier that loads chip, and itself does not possess systemic-function, thereby has limited integrated functionality and application performance after traditional metal leadframe package;
2, because traditional metal lead frame itself does not possess systemic-function, can only carry out in lead frame front tiling or the stacked package of chip and assembly, and power device and control chip are encapsulated in same packaging body, the heat radiation of power device can affect the transmission of control chip signal;
3, because traditional metal lead frame itself does not possess systemic-function, so multifunction system integration module can only be in traditional metal lead frame front by tiling or stacking realization of multi-chip and assembly, correspondingly also just increase component module shared space on PCB.
Summary of the invention
The object of the invention is to overcome above-mentioned deficiency, provide a kind of secondary first to plate rear erosion metal frame subtraction and bury flip-chip bump structure and process, it can solve the problem that traditional metal lead frame lacks systemic-function.
The object of the present invention is achieved like this: a kind of secondary first plates rear erosion metal frame subtraction and buries flip-chip bump structure, it comprises Metal Substrate sheet frame, described Metal Substrate sheet frame inside is provided with Ji Dao and pin, described pin is step-like, the front of described Ji Dao and pin flushes with Metal Substrate sheet frame front, the back side of described pin flushes with the back side of Metal Substrate sheet frame, the described Ji Dao back side flushes with the step surface of pin, on the step surface of the described Ji Dao back side and pin, by underfill upside-down mounting, there is chip, described Metal Substrate sheet frame interior zone is filled with plastic packaging material, described plastic packaging material is positive to be flushed with pin step surface, the described plastic packaging material back side flushes with the Metal Substrate sheet frame back side, described base island is positive, the front and back of the front and back of pin and Metal Substrate sheet frame is provided with metal oxidation resistance layer or coating antioxidant (OSP), the described pin back side is provided with Metal Ball.
Between the described back side, chip Yu Ji island and pin step surface, be provided with metal level.
Secondary first plates the process that rear erosion metal frame subtraction buries flip-chip bump structure, said method comprising the steps of:
Step 2, the operation of subsides photoresistance film
In metal substrate front and the back side stick respectively the photoresistance film that can carry out exposure imaging;
Part photoresistance film is removed at step 3, metal substrate front and the back side
Graph exposure is carried out, develops and removes part figure photoresistance film, the region of electroplating to expose the follow-up needs in metal substrate front and the back side in the metal substrate front and the back side that utilize exposure imaging equipment that step 2 is completed to the operation of subsides photoresistance film;
In step 3, anti-oxidant metal layer or coating antioxidant (OSP) are electroplated in the region of metal substrate front and back side removal part photoresistance film;
Remove the photoresistance film of metallic substrate surfaces;
Step 6, the operation of subsides photoresistance film
In step 4, complete metal substrate front and the back side of electroplating after anti-oxidant metal layer and stick the photoresistance film that can carry out exposure imaging;
Part photoresistance film is removed at step 7, the metal substrate back side
Part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate back etched region that utilizes exposure imaging equipment that step 6 is completed to the operation of subsides photoresistance film, and to expose, the metal substrate back side is follow-up need to carry out etched region;
Chemical etching is carried out in the region that part photoresistance film is removed at the metal substrate back side in step 7, at the metal substrate back side, forms corresponding Ji Dao and step pin after completing chemical etching;
Step 9, removal photoresistance film
Remove the photoresistance film of metallic substrate surfaces;
Step 10, load
In step 8, form the back side, Ji island and pin step surface the chip that completes surface and have salient point is carried out to upside-down mounting, completing after and carry out bottom filling by underfill and protect upside-down mounting to have chip;
Step 11, epoxy resin plastic packaging
The protection of epoxy resin plastic packaging is carried out in metal substrate back etched region after completing load;
Step 12, the operation of subsides photoresistance film
The photoresistance film that can carry out exposure imaging is sticked at the metal substrate front and the back side that in step 11, complete after epoxy resin plastic packaging;
Step 13, the positive part photoresistance film of removing of metal substrate
Part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate front that utilizes exposure imaging equipment that step 12 is completed to the operation of subsides photoresistance film, and to expose, metal substrate front is follow-up need to carry out etched region;
Step 14, etching
In step 13, chemical etching is carried out in the positive region of removing part photoresistance film of metal substrate;
Step 15, removal photoresistance film
Remove the photoresistance film of metallic substrate surfaces;
Step 10 six, plant ball
In step 15, remove the pin back side implanted metal ball after photoresistance film.
When the anti-oxidant metal layer of step 4 plating is nickel gold or NiPdAu, step 6 and step 7 can be omitted.
In step 9, remove between photoresistance film and step 10 load and carry out anti-oxidant metal layer plating or antioxidant coating in the exposed metal surface of metallic substrate surfaces.
Compared with prior art, the present invention has following beneficial effect:
1, the interlayer of subtractive metallization technology lead frame can be because of the needs of system and function be imbedded active member or assembly or passive assembly in the position of needs or region, becomes a system-level metal lead wire frame of individual layer circuit;
2, from the outward appearance of subtractive metallization technology lead frame finished product, can't see inner interlayer has completely imbedded because of system or the object of function needs, especially the imbedding X-ray and all cannot inspect of the chip of silicon material, fully reaches confidentiality and the protectiveness of system and function;
3, the interlayer of subtractive metallization technology lead frame can be imbedded high-power component in manufacturing process, secondary encapsulation carries out the load of control chip again, thereby high-power component and control chip are contained in respectively subtractive metallization technology lead frame both sides, can avoid high-power component to disturb the signal of control chip because of thermal radiation and transmit;
4, subtractive metallization technology lead frame itself includes the function of imbedding object, after secondary encapsulation, can fully realize the integrated of systemic-function and integrate, it is little that thereby the volume size of the component module of said function comes than the module of conventional lead frame encapsulation, corresponding space shared on PCB is also just fewer, thereby has also just reduced cost;
5, the interlayer of subtractive metallization technology lead frame can be because heat conduction or heat radiation need in manufacturing process be imbedded heat conduction or heat radiation object in the position of needs or region, thereby improves the radiating effect of whole encapsulating structure;
6, subtractive metallization technology lead frame finished product itself has just been rich in various assemblies, if no longer carry out, under its condition of follow-up encapsulation for the second time, subtractive metallization technology lead frame being cut according to each lattice unit, itself just can become a ultra-thin packaging body;
7, subtractive metallization technology lead frame, except itself including imbedding of object can also superpose in packaging body periphery function different unit package or system in package, fully reaches the dual system of individual layer circuit metal lead wire frame or the encapsulation technology ability of polyphyly irrespective of size again;
8, object or the object in subtractive metallization technology lead frame, imbedded all flush with metal thickness, embody fully among the ultra-thin and highdensity thickness space being filled in subtractive metallization technology lead frame.
9, secondary first loses rear plating frame subtraction technology lead frame and can present certain height offset in plastic packaging material front, die-attach area surface, its advantage be after plastic packaging material plastic packaging for the second time firmly snatch live metal salient point, thereby reduced plastic-sealed body and die-attach area produce layering reliability bad because of the gap of CTE (coefficient of expansion or shrinkage).
Accompanying drawing explanation
Fig. 1 ~ Figure 16 is that a kind of secondary of the present invention first plates each operation schematic diagram that rear erosion metal frame subtraction buries flip-chip bump structure process.
Figure 17 is that a kind of secondary of the present invention first plates the schematic diagram that rear erosion metal frame subtraction buries flip-chip bump structure.
Figure 18 is that traditional flat-four-side is without the schematic diagram of pin package (QFN) lead frame structure.
Figure 19 is for to seal flat-four-side without the schematic diagram of pin package (PQFN) lead frame structure in advance.
Wherein:
Metal Substrate sheet frame 1
Base island 2
Pin 3
Chip 6
Embodiment
Referring to Figure 17, a kind of secondary of the present invention first plates rear erosion metal frame subtraction and buries flip-chip bump structure, it comprises Metal Substrate sheet frame 1, described Metal Substrate sheet frame 1 inside is provided with base island 2 and pin 3, described pin 3 is step-like, the front of described base island 2 and pin 3 flushes with Metal Substrate sheet frame 1 front, the back side of described pin 3 flushes with the back side of Metal Substrate sheet frame 1, 2 back sides, described base island flush with the step surface of pin 3, on the step surface of 2 back sides, described base island and pin 3, by underfill 5 upside-down mountings, there is chip 6, described Metal Substrate sheet frame 1 interior zone is filled with plastic packaging material 7, described plastic packaging material 7 is positive to be flushed with pin 3 step surfaces, described plastic packaging material 7 back sides flush with Metal Substrate sheet frame 1 back side, 2 fronts, described base island, the front and back of the front and back of pin 3 and Metal Substrate sheet frame 1 is provided with anti oxidation layer 4, described pin 3 back sides are provided with Metal Ball 8.
Its process is as follows:
Referring to Fig. 1, get the metal substrate that a slice thickness is suitable, the material of metal substrate can be metallics or the nonmetallic substance that copper material, iron material, zinc-plated material, stainless steel, aluminium maybe can reach conducting function, and the selection of thickness can be selected according to product performance;
Step 2, the operation of subsides photoresistance film
Referring to Fig. 2, in metal substrate front and the back side stick respectively the photoresistance film that can carry out exposure imaging, photoresistance film can be that dry type photoresistance film can be also wet type photoresistance film;
Part photoresistance film is removed at step 3, metal substrate front and the back side
Referring to Fig. 3, graph exposure is carried out, develops and removes part figure photoresistance film, the region of electroplating to expose the follow-up needs in metal substrate front and the back side in the metal substrate front and the back side that utilize exposure imaging equipment that step 2 is completed to the operation of subsides photoresistance film;
Referring to Fig. 4, in step 3, anti-oxidant metal layer is electroplated in the region of metal substrate front and back side removal part photoresistance film; Or coating antioxidant (OSP)
Referring to Fig. 5, remove the photoresistance film of metallic substrate surfaces, the method for removing photoresistance film adopts chemical medicinal liquid to soften and adopts high pressure water washing;
Step 6, the operation of subsides photoresistance film
Referring to Fig. 6, in step 4, complete metal substrate front and the back side of electroplating after anti-oxidant metal layer and stick the photoresistance film that can carry out exposure imaging, photoresistance film can be that dry type photoresistance film can be also wet type photoresistance film;
Part photoresistance film is removed at step 7, the metal substrate back side
Referring to Fig. 7, part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate back etched region that utilizes exposure imaging equipment that step 6 is completed to the operation of subsides photoresistance film, and to expose, the metal substrate back side is follow-up need to carry out etched region;
Referring to Fig. 8, in step 7, chemical etching is carried out in the region of metal substrate back side removal part photoresistance film, after completing chemical etching, at the metal substrate back side, form corresponding Ji Dao and step pin, the technology of chemical etching can adopt copper chloride, iron chloride or can carry out the chemical agent of corroding metal material;
Step 9, removal photoresistance film
Referring to Fig. 9, remove the photoresistance film of metallic substrate surfaces, the method for removing photoresistance film adopts chemical medicinal liquid to soften and adopts high pressure water washing;
Step 10, load
Referring to Figure 10, in step 8, form the back side, Ji island and pin step surface the chip that completes surface and have salient point is carried out to upside-down mounting, completing after and carry out bottom filling by underfill and protect upside-down mounting to have chip;
Tin diffusion when preventing the electrical interconnected and upside-down mounting between metal substrate oxidation affects chip and substrate therefore can first be carried out anti-oxidant metal layer plating or antioxidant coating in the exposed metal surface of metallic substrate surfaces before step 10 load.
Step 11, epoxy resin plastic packaging
Referring to Figure 11, the protection of epoxy resin plastic packaging is carried out in the metal substrate back etched region after completing load, and epoxide resin material can be selected to have filler or do not have Packed kind according to product performance;
Step 12, the operation of subsides photoresistance film
Referring to Figure 12, the photoresistance film that can carry out exposure imaging is sticked at the metal substrate front and the back side that in step 11, complete after epoxy resin plastic packaging;
Step 13, the positive part photoresistance film of removing of metal substrate
Referring to Figure 13, part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate front that utilizes exposure imaging equipment that step 12 is completed to the operation of subsides photoresistance film, and to expose, metal substrate front is follow-up need to carry out etched region;
Step 14, etching
Referring to Figure 18, in step 13, chemical etching is carried out in the positive region of removing part photoresistance film of metal substrate, and the technology of chemical etching can adopt copper chloride, iron chloride or can carry out the chemical agent of corroding metal material;
Step 15, removal photoresistance film
Referring to Figure 15, remove the photoresistance film of metallic substrate surfaces, the method for removing photoresistance film adopts chemical medicinal liquid to soften and adopts high pressure water washing;
Step 10 six, plant ball
Referring to Figure 16, in step 15, remove the pin back side implanted metal ball after photoresistance film, the mode of planting ball can be that direct implanted metal ball can be also to adopt mask plate (MASK) to brush into metal paste, then goes into Metal Ball through high temperature reflux.
Claims (5)
1. a secondary first plates rear erosion metal frame subtraction and buries flip-chip bump structure, it is characterized in that: it comprises Metal Substrate sheet frame (1), described Metal Substrate sheet frame (1) inside is provided with Ji Dao (2) and pin (3), described pin (3) is step-like, the front of described Ji Dao (2) and pin (3) flushes with Metal Substrate sheet frame (1) front, the back side of described pin (3) flushes with the back side of Metal Substrate sheet frame (1), described Ji Dao (2) back side flushes with the step surface of pin (3), on the step surface of described Ji Dao (2) back side and pin (3), by underfill (5) upside-down mounting, there is chip (6), described Metal Substrate sheet frame (1) interior zone is filled with plastic packaging material (7), described plastic packaging material (7) is positive to be flushed with pin (3) step surface, described plastic packaging material (7) back side flushes with Metal Substrate sheet frame (1) back side, described Ji Dao (2) front, the front and back of the front and back of pin (3) and Metal Substrate sheet frame (1) is provided with anti oxidation layer (4), described pin (3) back side is provided with Metal Ball (8).
2. a kind of secondary according to claim 1 first plates rear erosion metal frame subtraction and buries flip-chip bump structure, it is characterized in that: between (2) back side, described chip (6) Yu Ji island and pin (3) step surface, be provided with metal level.
3. secondary first plates the process that rear erosion metal frame subtraction buries flip-chip bump structure, it is characterized in that said method comprising the steps of:
Step 1, get metal substrate
Step 2, the operation of subsides photoresistance film
In metal substrate front and the back side stick respectively the photoresistance film that can carry out exposure imaging;
Part photoresistance film is removed at step 3, metal substrate front and the back side
Graph exposure is carried out, develops and removes part figure photoresistance film, the region of electroplating to expose the follow-up needs in metal substrate front and the back side in the metal substrate front and the back side that utilize exposure imaging equipment that step 2 is completed to the operation of subsides photoresistance film;
Step 4, plating anti-oxidant metal layer or coating antioxidant (OSP)
In step 3, anti-oxidant metal layer or coating antioxidant (OSP) are electroplated in the region of metal substrate front and back side removal part photoresistance film;
Step 5, removal photoresistance film
Remove the photoresistance film of metallic substrate surfaces;
Step 6, the operation of subsides photoresistance film
In step 4, complete metal substrate front and the back side of electroplating after anti-oxidant metal layer and stick the photoresistance film that can carry out exposure imaging;
Part photoresistance film is removed at step 7, the metal substrate back side
Part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate back etched region that utilizes exposure imaging equipment that step 6 is completed to the operation of subsides photoresistance film, and to expose, the metal substrate back side is follow-up need to carry out etched region;
Step 8, etching
Chemical etching is carried out in the region that part photoresistance film is removed at the metal substrate back side in step 7, at the metal substrate back side, forms corresponding Ji Dao and step pin after completing chemical etching;
Step 9, removal photoresistance film
Remove the photoresistance film of metallic substrate surfaces;
Step 10, load
In step 8, form the back side, Ji island and pin step surface the chip that completes surface and have salient point is carried out to upside-down mounting, completing after and carry out bottom filling by underfill and protect upside-down mounting to have chip;
Step 11, epoxy resin plastic packaging
The protection of epoxy resin plastic packaging is carried out in metal substrate back etched region after completing load;
Step 12, the operation of subsides photoresistance film
The photoresistance film that can carry out exposure imaging is sticked at the metal substrate front and the back side that in step 11, complete after epoxy resin plastic packaging;
Step 13, the positive part photoresistance film of removing of metal substrate
Part figure photoresistance film is carried out graph exposure, develops and removes in the metal substrate front that utilizes exposure imaging equipment that step 12 is completed to the operation of subsides photoresistance film, and to expose, metal substrate front is follow-up need to carry out etched region;
Step 14, etching
In step 13, chemical etching is carried out in the positive region of removing part photoresistance film of metal substrate;
Step 15, removal photoresistance film
Remove the photoresistance film of metallic substrate surfaces;
Step 10 six, plant ball
In step 15, remove the pin back side implanted metal ball after photoresistance film.
4. a kind of secondary according to claim 3 first plates the process that rear erosion metal frame subtraction buries flip-chip bump structure, it is characterized in that: when the anti-oxidant metal layer of step 4 plating is nickel gold or NiPdAu, step 6 and step 7 can be omitted.
5. a kind of secondary according to claim 3 first plates the process that rear erosion metal frame subtraction buries flip-chip bump structure, it is characterized in that: in step 9, remove between photoresistance film and step 10 load and carry out anti-oxidant metal layer plating or antioxidant coating in the exposed metal surface of metallic substrate surfaces.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310645356.6A CN103646935B (en) | 2013-12-05 | 2013-12-05 | First plate for two times and lose metal frame subtraction afterwards and bury flip-chip bump structure and processing method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310645356.6A CN103646935B (en) | 2013-12-05 | 2013-12-05 | First plate for two times and lose metal frame subtraction afterwards and bury flip-chip bump structure and processing method |
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| Publication Number | Publication Date |
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| CN103646935A true CN103646935A (en) | 2014-03-19 |
| CN103646935B CN103646935B (en) | 2016-06-01 |
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| CN103400767A (en) * | 2013-08-06 | 2013-11-20 | 江苏长电科技股份有限公司 | Packaging-prior-to-etching chip-flipped bump type three-dimensional system-level metal circuit board and process method thereof |
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| CN102456677A (en) * | 2010-10-27 | 2012-05-16 | 三星半导体(中国)研究开发有限公司 | Packaging structure for ball grid array and manufacturing method for same |
| CN102723293A (en) * | 2012-06-09 | 2012-10-10 | 江苏长电科技股份有限公司 | Etching-first and packaging-later manufacturing method for chip inversion single-surface three-dimensional circuit and packaging structure of chip formal double-surface three-dimensional circuit |
| CN103400767A (en) * | 2013-08-06 | 2013-11-20 | 江苏长电科技股份有限公司 | Packaging-prior-to-etching chip-flipped bump type three-dimensional system-level metal circuit board and process method thereof |
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