CN103644849A - Three-dimensional grating displacement measurement system capable of vertically measuring displacement - Google Patents
Three-dimensional grating displacement measurement system capable of vertically measuring displacement Download PDFInfo
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Abstract
The invention provides a three-dimensional grating displacement measurement system capable of vertically measuring displacement, relating to a grating displacement measurement system. The measurement system comprises a single-frequency laser light source, a light splitting component, a polarizing beam splitter prism, a measuring arm quarter-wave plate, a measuring arm light refraction component, a reference arm quarter-wave plate, a reference arm light reflection component, a two-dimensional reflective reference grating, a photoelectric detection and signal processing part and a two-dimensional reflective measurement grating. The surface shape of the two-dimensional reflective measurement grating is same with that of the two-dimensional reflective reference grating, and both the x direction period and the y direction period of the two-dimensional reflective measurement grating and the two-dimensional reflective measurement grating are d. Both the x direction light reflection angle and the y direction light reflection angle of the measuring arm light refraction component and the reference arm light refraction component are theta i, and the following formula that 2d*sin theta i=+/-m*lambda is satisfied. According to the system, the linear displacement in the x axis, y axis and z axis directions can be measured at the same time, and the z direction displacement range of the system is greatly extended compared with the existing technology.
Description
Technical field
The three dimensional grating displacement measurement system of surveying vertical displacement relates to an a kind of grating displacement measuring system, particularly a kind of three dimensional grating displacement measurement system of surveying vertical displacement.
Background technology
Pattern displacement measuring technique originated from for 19th century the earliest, had obtained development rapidly since the 1950's.At present, grating displacement measuring system has become a kind of typical displacement transducer, and is widely used in numerous electromechanical equipments.Grating displacement measuring system, because having the many merits such as resolving power is high, precision is high, cost is low, environmental sensitivity is low, is not only widely used in industry and scientific research field, and is studied by numerous Chinese scholars.
Litho machine is the nucleus equipment of producing semi-conductor chip.Ultraprecise work stage is the kernel subsystems of litho machine, for carrying substrates and complete the high speed ultraprecise motion of load, exposure, zapping, unloading piece process.The features such as ultraprecise work stage has at a high speed, high acceleration, multiple degrees of freedom, large stroke, ultraprecise.Two-frequency laser interferometer, because have advantages of high precision, wide range simultaneously, is widely used in the displacement measurement of ultraprecise work stage.Yet the technological level of semi-conductor chip manufacture in recent years constantly promotes: 2010, the processing of semi-conductor chip adopted 32nm live width technique; In the end of the year 2011, the cpu chip of 22nm live width is list marketing also.The semi-conductor chip level of processing improving constantly is all had higher requirement to indexs such as the resolving power of ultraprecise work stage displacement measurement, precision, two-frequency laser interferometer because it exists that environmental sensitivity is poor, large, the multi-degree of freedom measurement complex structure of taking up room, the problem such as expensive be difficult to meet new measurement demand.
In order to address the above problem, relevant company and numerous scholar in the field of ultra precise measurement both at home and abroad have carried out a large amount of research, and achievement in research all has exposure in many patents and paper.The patent US7 of Holland ASML company, 483, open day on November 15th, 2007 of 120B2() a kind of plane grating measuring system and arrangement that is applied to Ultra-precision Stages of Lithography disclosed, this measuring system is mainly utilized the large travel displacement of level of two-dimensional grating and read head measuring workpieces platform, the displacement of work stage vertical direction can be measured by the height sensor of independent layout, but uses multiple sensors can make the measuring accuracy of complex structure the meeting limiting displacement of ultraprecise work stage.Japanese scholars Gao Wei has proposed a kind of three dimensional grating displacement measurement system based on diffraction interference principle in the paper of delivering " A sub-nanometric three-axis surface encoder with short-period planar gratings for stage motion measurement.Precision Engineering36 (2012) 576-585. ", can measure x simultaneously, y, the straight-line displacement of tri-directions of z, but this system can cause the interference region of measuring light and reference light to diminish when measuring the straight-line displacement of z direction, therefore the range of the z direction straight-line displacement of system is limited to the size of beam diameter, cannot realize the measurement of the large stroke straight-line displacement of z direction.Open day on February 20th, 2013 of patent CN102937411A(of the people such as the Zhu Yu of Tsing-Hua University) in, a kind of dual-frequency grating interferometer displacement measurement system is disclosed, can measure level and the vertically straight-line displacement of both direction simultaneously, and used double-frequency laser as light source to improve the antijamming capability of signal, but the range of the vertical direction straight-line displacement of this system is limited to the size of beam diameter equally, still cannot realize the measurement of the large stroke straight-line displacement of vertical direction, and this system is used the reflective measurement grating of one dimension two dimension only can measure the straight-line displacement of both direction.The people such as the Fan Kuang-Chao of Univ Nat Taiwan have developed a kind of two-dimensional grating displacement measuring device of nanometer scale resolving power in the paper of delivering " Displacement Measurement of Planar Stage by Diffraction Planar Encoder in Nanometer Resolution.I2MTC (2012) 894-897. ", can measure the straight-line displacement of two horizontal directions, but cannot measure the straight-line displacement of vertical direction, can not meet the displacement measurement requirement of ultraprecise work stage vertical direction.
Summary of the invention
In order to address the above problem, the object of this invention is to provide a kind of three dimensional grating displacement measurement system of surveying vertical displacement, this measuring system not only can be measured along the straight-line displacement of x axle, y axle, three directions of z axle simultaneously, and the z that compares this system of prior art has obtained great expansion to displacement range.
The object of the present invention is achieved like this:
Survey a three dimensional grating displacement measurement system for vertical displacement, comprise single-frequency laser light source, light splitting part, polarization splitting prism, gage beam quarter-wave plate, gage beam dioptric element, reference arm quarter-wave plate, reference arm dioptric element, two-dimentional reflective with reference to grating, Photoelectric Inspect & Signal Processing parts and two-dimentional reflective measurement grating;
The reflective measurement grating of described two dimension is reflective identical with reference to grating surface topography with two dimension, and x direction cycle and the y direction cycle of two-dimentional reflective measurement grating are d; The reflective x direction cycle with reference to grating of two dimension and y direction cycle are d; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element are θ
i, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element are θ
i, and meet 2dsin θ
i=± m λ, in formula, λ is that wavelength, the m of single-frequency laser light source are the order of diffraction time;
The single-frequency laser that described single-frequency laser light source penetrates is divided into the equal directional light of four bundle light intensity through light splitting part, the wherein direction of propagation and the xoz plane parallel of the direction of propagation of two-beam and xoy plane parallel, another two-beam, this four bundles directional light is divided into the measurement light that the direction of propagation turn 90 degrees partially and the reference light of propagating along former direction after polarization splitting prism, measures polarisation of light direction vertical with the polarization direction of reference light;
The four bundle directional lights of measuring light are after the gage beam quarter-wave plate of 45 degree through quick shaft direction and measurement light polarization direction, equal measured arm dioptric element deviations, the direction of propagation that after deviation four bundle is measured two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, two bundles that the direction of propagation is parallel to yoz plane measure light be incident to two-dimentional reflective measurement grating and be diffracted to respectively y direction+m order diffraction measure light and-m order diffraction measures light, two bundles that the direction of propagation is parallel to xoz plane measure light be incident to two-dimentional reflective measurement grating and be diffracted to respectively x direction+m order diffraction measure light and-m order diffraction measures light, four bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through gage beam dioptric element, after gage beam quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts,
Four bundle directional lights of reference light are after the reference arm quarter-wave plate of 45 degree through quick shaft direction and reference light polarization direction, equal referenced arm dioptric element deviations, in after deviation four bundle reference light, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the direction of propagation be parallel to xoy plane two bundle reference lighies be incident to two dimension reflective with reference to grating and be diffracted to respectively y direction+m order diffraction reference light and-m order diffraction reference light, the direction of propagation be parallel to xoz plane two bundle reference lighies be incident to two dimension reflective with reference to grating and be diffracted to respectively x direction+m order diffraction reference light and-m order diffraction reference light, four bundle reference diffraction light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through reference arm dioptric element, after reference arm quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts,
Two bundle reference diffraction light of two bundle diffractometry light of x direction and x direction form two groups of interference at Photoelectric Inspect & Signal Processing parts surface, and two bundle reference diffraction light of two bundle diffractometry light of y direction and y direction form another two groups of interference at Photoelectric Inspect & Signal Processing parts surface; When motionless, the two-dimentional reflective measurement grating of other elements moves along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts are exported respectively the straight-line displacement of x direction, y direction and z direction.
Above-mentioned a kind of three dimensional grating displacement measurement system of surveying vertical displacement, described single-frequency laser light source is the gas laser of semiconductor laser diode or outgoing terminated optical fiber.
Above-mentioned a kind of three dimensional grating displacement measurement system of surveying vertical displacement, described light splitting part is a kind of in following four kinds of structures:
First, described light splitting part is by collimation lens, the first unpolarized Amici prism, the second unpolarized Amici prism, the first right-angle reflecting prism, the 3rd unpolarized Amici prism, the second right-angle reflecting prism forms, the laser of single-frequency laser light source transmitting is incident to the first unpolarized Amici prism and is divided into light intensity and equates after collimation lens collimation, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident in the z-direction the second unpolarized Amici prism and is divided into transmitted light and the direction of propagation reflected light in the x-direction that light intensity is equal, transmitted light is propagated in the x-direction by the first right-angle reflecting prism reflection, another light beam propagates in the x-direction and is incident upon the 3rd unpolarized Amici prism and is divided into transmitted light that light intensity is equal and the reflected light of direction of propagation edge-y direction, reflected light is propagated in the x-direction by the second right-angle reflecting prism reflection,
Second, described light splitting part is comprised of collimation lens, two-dimentional transmission grating, catoptron, aperture diaphragm, the grating cycle of described two-dimentional transmission grating x direction and y direction equates, the laser of single-frequency laser light source transmitting is incident to two-dimentional transmission grating diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light forms through catoptron deviation and by aperture diaphragm the parallel emergent light that four bundle light intensity equate, and the diffraction lights of other grades times are filtered by aperture diaphragm;
The 3rd, described light splitting part is comprised of collimation lens, two-dimentional transmission grating, lens, aperture diaphragm, the grating cycle of described two-dimentional transmission grating x direction and y direction equates, the laser of single-frequency laser light source transmitting is incident to two-dimentional transmission grating diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light forms through lens deviation and by aperture diaphragm the parallel emergent light that four bundle light intensity equate, and the diffraction lights of other grades times are filtered by aperture diaphragm;
The 4th, described light splitting part is comprised of collimation lens, two-dimentional transmission grating, prism, aperture diaphragm, the grating cycle of described two-dimentional transmission grating x direction and y direction equates, the laser of single-frequency laser light source transmitting is incident to two-dimentional transmission grating diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light forms through prism deviation and by aperture diaphragm the parallel emergent light that four bundle light intensity equate, and the diffraction lights of other grades times are filtered by aperture diaphragm.
Above-mentioned a kind of three dimensional grating displacement measurement system of surveying vertical displacement, described gage beam dioptric element is a kind of in following four kinds of structures:
The first, described gage beam dioptric element comprises diaphragm and refractive power catoptron, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and refractive power catoptron the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and refractive power catoptron the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction;
The second, described gage beam dioptric element comprises diaphragm and refractive prism, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and refractive prism the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and refractive prism the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction;
The 3rd, described gage beam dioptric element comprises diaphragm and first fold optical lens, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and first fold optical lens the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and first fold optical lens the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction;
The 4th, described gage beam dioptric element comprises diaphragm and the second dioptric lens, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and the second dioptric lens the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and the second dioptric lens the direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating generation diffraction.
Described reference arm dioptric element is a kind of in four kinds of structures adopting of gage beam dioptric element.
Beneficial effect of the present invention is described as follows:
This measuring system has been used and has been met 2dsin θ
ithe reflective measurement grating of two dimension of=± m λ condition, two dimension is reflective with reference to grating, gage beam dioptric element, reference arm dioptric element and single-frequency laser light source, guaranteed that four bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, therefore when the reflective measurement grating of two dimension relative measurement arm dioptric element moves along z axle, four bundle diffractometry light are constant at the facula position of Photoelectric Inspect & Signal Processing parts surface, again because system when measuring except two dimension reflective measurement grating the relative position of other elements constant all the time, therefore four bundle reference diffraction light are constant all the time at the facula position of Photoelectric Inspect & Signal Processing parts surface, so when the reflective measurement grating of two dimension relative measurement arm dioptric element moves along z axle, interfere the interference region of hot spot constant for four groups of Photoelectric Inspect & Signal Processing parts surface, the z of system is no longer limited to the size of spot diameter to displacement range, but depend on the coherent length of light source, light source of the present invention is single-frequency laser light source, the coherent length of single-frequency laser light source is generally centimetre more than magnitude, can reach even km magnitude of meter magnitude, therefore z of the present invention can expand to even km magnitude of meter magnitude to displacement range, the measurement mechanism that in prior art, Japanese scholars Gao Wei develops is that unique single-measurement device that can use is realized the device that three-D displacement is measured, but its z also only reaches 4mm to displacement range, therefore the remarkable beneficial effect that the present invention has is for not only proposed a kind of optical grating measuring system that can measure three-D displacement simultaneously, and the z of this system compares prior art to displacement range and has obtained great expansion.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation of surveying the three dimensional grating displacement measurement system of vertical displacement of the present invention.
Fig. 2 is the structural representation of the first structure of light splitting part of the present invention.
Fig. 3 is the xoz directional profile figure of the second structure of light splitting part of the present invention.
Fig. 4 is the xoz directional profile figure of the third structure of light splitting part of the present invention.
Fig. 5 is the xoz directional profile figure of the 4th kind of structure of light splitting part of the present invention.
Fig. 6 is the xoz directional profile figure of the first structure of gage beam dioptric element of the present invention.
Fig. 7 is the xoz directional profile figure of the second structure of gage beam dioptric element of the present invention.
Fig. 8 is the xoz directional profile figure of the third structure of gage beam dioptric element of the present invention.
Fig. 9 is the xoz directional profile figure of the 4th kind of structure of gage beam dioptric element of the present invention.
In figure: 1 single-frequency laser light source; 2 light splitting parts; 21 collimation lenses; 22 first unpolarized Amici prisms; 23 second unpolarized Amici prisms; 24 first right-angle reflecting prism; 25 the 3rd unpolarized Amici prisms; 26 second right-angle reflecting prism; 27 two-dimentional transmission gratings; 281 catoptrons; 282 lens; 283 prisms; 29 aperture diaphragms; 31 polarization splitting prisms; 32 gage beam quarter-wave plates; 33 gage beam dioptric elements; 331 diaphragms; 332 refractive power catoptrons; 333 refractive prisms; 334 first fold optical lenss; 335 second dioptric lenses; 34 reference arm quarter-wave plates; 35 reference arm dioptric elements; 36 two dimensions are reflective with reference to grating; 4 Photoelectric Inspect & Signal Processing parts; 5 two-dimentional reflective measurement gratings.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the invention is described in further detail.
Specific embodiment one
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment, structural representation as shown in Figure 1.This measuring system comprises single-frequency laser light source 1, light splitting part 2, polarization splitting prism 31, gage beam quarter-wave plate 32, gage beam dioptric element 33, reference arm quarter-wave plate 34, reference arm dioptric element 35, two-dimentional reflective with reference to grating 36, Photoelectric Inspect & Signal Processing parts 4 and two-dimentional reflective measurement grating 5;
The reflective measurement grating 5 of described two dimension is reflective identical with reference to grating 36 surface topographies with two dimension, and x direction cycle and the y direction cycle of two-dimentional reflective measurement grating 5 are d; The reflective x direction cycle with reference to grating 36 of two dimension and y direction cycle are d; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element 33 are θ
i, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element 35 are θ
i, and meet 2dsin θ
i=± m λ, in formula, λ is that wavelength, the m of single-frequency laser light source 1 are the order of diffraction time;
The single-frequency laser that described single-frequency laser light source 1 penetrates is divided into the equal directional light of four bundle light intensity through light splitting part 2, the wherein direction of propagation and the xoz plane parallel of the direction of propagation of two-beam and xoy plane parallel, another two-beam, this four bundles directional light is divided into the measurement light that the direction of propagation turn 90 degrees partially and the reference light of propagating along former direction after polarization splitting prism 31, measures polarisation of light direction vertical with the polarization direction of reference light;
The four bundle directional lights of measuring light are after the gage beam quarter-wave plate 32 of 45 degree through quick shaft direction and measurement light polarization direction, equal measured arm dioptric element 33 deviations, the direction of propagation that after deviation four bundle is measured two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, two bundles that the direction of propagation is parallel to yoz plane measure light be incident to two-dimentional reflective measurement grating 5 and be diffracted to respectively y direction+m order diffraction measure light and-m order diffraction measures light, two bundles that the direction of propagation is parallel to xoz plane measure light be incident to two-dimentional reflective measurement grating 5 and be diffracted to respectively x direction+m order diffraction measure light and-m order diffraction measures light, four bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through gage beam dioptric element 33, after gage beam quarter-wave plate 32 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4,
Four bundle directional lights of reference light are after the reference arm quarter-wave plate 34 of 45 degree through quick shaft direction and reference light polarization direction, equal referenced arm dioptric element 35 deviations, in after deviation four bundle reference light, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the two bundle reference lighies that the direction of propagation is parallel to xoy plane be incident to two dimension reflective with reference to grating 36 and be diffracted to respectively y direction+m order diffraction reference light and-m order diffraction reference light, the two bundle reference lighies that the direction of propagation is parallel to xoz plane be incident to two dimension reflective with reference to grating 36 and be diffracted to respectively x direction+m order diffraction reference light and-m order diffraction reference light, four bundle reference diffraction light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through reference arm dioptric element 35, after reference arm quarter-wave plate 34 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4,
Two bundle reference diffraction light of two bundle diffractometry light of x direction and x direction form two groups of interference on Photoelectric Inspect & Signal Processing parts 4 surfaces, and two bundle reference diffraction light of two bundle diffractometry light of y direction and y direction form another two groups of interference on Photoelectric Inspect & Signal Processing parts 4 surfaces; When motionless, the two-dimentional reflective measurement grating 5 of other elements moves along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts 4 are exported respectively the straight-line displacement of x direction, y direction and z direction.
The above-mentioned three dimensional grating displacement measurement system of surveying vertical displacement, described single-frequency laser light source 1 is semiconductor laser diode.
Specific embodiment two
The present embodiment is from the different of specific embodiment one, and described single-frequency laser light source 1 is the gas laser of outgoing terminated optical fiber.
Specific embodiment three
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the three-dimensional concrete structure of light splitting part 2 as shown in Figure 2.This light splitting part 2 is by collimation lens 21, the first unpolarized Amici prism 22, the second unpolarized Amici prism 23, the first right-angle reflecting prism 24, the 3rd unpolarized Amici prism 25, the second right-angle reflecting prism 26 forms, the laser of single-frequency laser light source 1 transmitting is incident to the first unpolarized Amici prism 22 and is divided into light intensity and equates after collimation lens 21 collimations, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident in the z-direction the second unpolarized Amici prism 23 and is divided into transmitted light and the direction of propagation reflected light in the x-direction that light intensity is equal, transmitted light is propagated in the x-direction by the first right-angle reflecting prism 24 reflections, another light beam propagates in the x-direction and is incident upon the 3rd unpolarized Amici prism 25 and is divided into transmitted light that light intensity is equal and the reflected light of direction of propagation edge-y direction, reflected light is propagated in the x-direction by the second right-angle reflecting prism 26 reflections.
Specific embodiment four
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 3.This light splitting part is comprised of collimation lens 21, two-dimentional transmission grating 27, catoptron 281, aperture diaphragm 29, the grating cycle of described two-dimentional transmission grating 27x direction and y direction equates, the laser of single-frequency laser light source 1 transmitting is incident to two-dimentional transmission grating 27 diffracted after collimation lens 2 collimations, x direction and y direction ± 1 order diffraction light is through catoptron 281 deviations and by the equal parallel emergent light of aperture diaphragm 29 formation four bundle light intensity, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment five
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 4.This light splitting part is comprised of collimation lens 21, two-dimentional transmission grating 27, lens 282, aperture diaphragm 29, the grating cycle of described two-dimentional transmission grating 27x direction and y direction equates, the laser of single-frequency laser light source 1 transmitting is incident to two-dimentional transmission grating 27 diffracted after collimation lens 2 collimations, x direction and y direction ± 1 order diffraction light is through lens 282 deviations and by the equal parallel emergent light of aperture diaphragm 29 formation four bundle light intensity, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment six
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 5.This light splitting part is comprised of collimation lens 21, two-dimentional transmission grating 27, prism 282, aperture diaphragm 29, the grating cycle of described two-dimentional transmission grating 27x direction and y direction equates, the laser of single-frequency laser light source 1 transmitting is incident to two-dimentional transmission grating 27 diffracted after collimation lens 2 collimations, x direction and y direction ± 1 order diffraction light is through prism 282 deviations and by the equal parallel emergent light of aperture diaphragm 29 formation four bundle light intensity, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment seven
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 6.This gage beam dioptric element 33 comprises diaphragm 331 and refractive power catoptron 332, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and refractive power catoptron 332 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and refractive power catoptron 332 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur.
Specific embodiment eight
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 7.This gage beam dioptric element 33 comprises diaphragm 331 and refractive prism 333, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur.
Specific embodiment nine
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 8.This gage beam dioptric element 33 comprises diaphragm 331 and first fold optical lens 334, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and first fold optical lens 334 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and first fold optical lens 334 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur.
Specific embodiment ten
The three dimensional grating displacement measurement system of the vertical displacement surveyed of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 9.This gage beam dioptric element 33 comprises diaphragm 331 and the second dioptric lens 334, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and the second dioptric lens 334 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and the second dioptric lens 334 direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating 5 diffraction occur.
The three dimensional grating displacement measurement system of the vertical displacement surveyed of above embodiment, reference arm dioptric element 35 is a kind of in gage beam dioptric element 33 structures described in specific embodiment seven, specific embodiment eight, specific embodiment nine, specific embodiment ten.
The present invention is not limited to above-mentioned preferred forms, and anyone should learn structural change or the method improvement of making under enlightenment of the present invention, and every have identical or close technical scheme with the present invention, within all falling into protection scope of the present invention.
Claims (5)
1. the three dimensional grating displacement measurement system that can survey vertical displacement, is characterized in that: comprise single-frequency laser light source (1), light splitting part (2), polarization splitting prism (31), gage beam quarter-wave plate (32), gage beam dioptric element (33), reference arm quarter-wave plate (34), reference arm dioptric element (35), two-dimentional reflective with reference to grating (36), Photoelectric Inspect & Signal Processing parts (4) and two-dimentional reflective measurement grating (5);
The reflective measurement grating of described two dimension (5) is reflective identical with reference to grating (36) surface topography with two dimension, and x direction cycle and the y direction cycle of two-dimentional reflective measurement grating (5) are d; The reflective x direction cycle with reference to grating (36) of two dimension and y direction cycle are d; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element (33) are θ
i, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element (35) are θ
i, and meet 2dsin θ
i=± m λ, in formula, λ is that wavelength, the m of single-frequency laser light source (1) they are the order of diffraction time;
The single-frequency laser that described single-frequency laser light source (1) penetrates is divided into the equal directional light of four bundle light intensity through light splitting part (2), the wherein direction of propagation and the xoz plane parallel of the direction of propagation of two-beam and xoy plane parallel, another two-beam, this four bundles directional light is divided into the measurement light that the direction of propagation turn 90 degrees partially and the reference light of propagating along former direction through polarization splitting prism (31) after, and measurement polarisation of light direction is vertical with the polarization direction of reference light;
The four bundle directional lights of measuring light are after the gage beam quarter-wave plate (32) of 45 degree through quick shaft direction and measurement light polarization direction, equal measured arm dioptric element (33) deviations, the direction of propagation that after deviation four bundle is measured two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, two bundles that the direction of propagation is parallel to yoz plane measure light be incident to two-dimentional reflective measurement grating (5) and be diffracted to respectively y direction+m order diffraction measure light and-m order diffraction measures light, two bundles that the direction of propagation is parallel to xoz plane measure light be incident to two-dimentional reflective measurement grating (5) and be diffracted to respectively x direction+m order diffraction measure light and-m order diffraction measures light, four bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through gage beam dioptric element (33), after gage beam quarter-wave plate (32) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4),
Four bundle directional lights of reference light are after the reference arm quarter-wave plate (34) of 45 degree through quick shaft direction and reference light polarization direction, equal referenced arm dioptric element (35) deviations, in after deviation four bundle reference light, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the direction of propagation be parallel to xoy plane two bundle reference lighies be incident to two dimension reflective with reference to grating (36) and be diffracted to respectively y direction+m order diffraction reference light and-m order diffraction reference light, the direction of propagation be parallel to xoz plane two bundle reference lighies be incident to two dimension reflective with reference to grating (36) and be diffracted to respectively x direction+m order diffraction reference light and-m order diffraction reference light, four bundle reference diffraction light are respectively along the opposite direction propagation of the incident light direction of propagation separately, and again pass through reference arm dioptric element (35), after reference arm quarter-wave plate (34) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4),
Two bundle reference diffraction light of two bundle diffractometry light of x direction and x direction form two groups of interference on Photoelectric Inspect & Signal Processing parts (4) surface, and two bundle reference diffraction light of two bundle diffractometry light of y direction and y direction form another two groups of interference on Photoelectric Inspect & Signal Processing parts (4) surface; When motionless, the two-dimentional reflective measurement gratings of other elements (5) move along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts (4) are exported respectively the straight-line displacement of x direction, y direction and z direction.
2. a kind of three dimensional grating displacement measurement system of surveying vertical displacement according to claim 1, is characterized in that: described single-frequency laser light source (1) is the gas laser of semiconductor laser diode or outgoing terminated optical fiber.
3. a kind of three dimensional grating displacement measurement system of surveying vertical displacement according to claim 1 and 2, is characterized in that: a kind of in following four kinds of structures of described light splitting part (2):
First, described light splitting part (2) is by collimation lens (21), the first unpolarized Amici prism (22), the second unpolarized Amici prism (23), the first right-angle reflecting prism (24), the 3rd unpolarized Amici prism (25), the second right-angle reflecting prism (26) forms, the laser of single-frequency laser light source (1) transmitting is incident to the first unpolarized Amici prism (22) after collimation lens (21) collimation, and to be divided into light intensity equal, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident in the z-direction the second unpolarized Amici prism (23) and is divided into transmitted light and the direction of propagation reflected light in the x-direction that light intensity is equal, transmitted light is propagated in the x-direction by the first right-angle reflecting prism (24) reflection, another light beam propagates in the x-direction and is incident upon the 3rd unpolarized Amici prism (25) and is divided into transmitted light that light intensity is equal and the reflected light of direction of propagation edge-y direction, reflected light is propagated in the x-direction by the second right-angle reflecting prism (26) reflection,
Second, described light splitting part is by collimation lens (21), two dimension transmission grating (27), catoptron (281), aperture diaphragm (29) forms, the grating cycle of described two-dimentional transmission grating (27) x direction and y direction equates, the laser of single-frequency laser light source (1) transmitting is incident to two-dimentional transmission grating (27) diffracted after collimation lens (2) collimation, x direction and y direction ± 1 order diffraction light is through catoptron (281) deviation and pass through the parallel emergent light that aperture diaphragm (29) formation four bundle light intensity equate, the diffraction light of other grades times is filtered by aperture diaphragm (29),
The 3rd, described light splitting part is by collimation lens (21), two dimension transmission grating (27), lens (282), aperture diaphragm (29) forms, the grating cycle of described two-dimentional transmission grating (27) x direction and y direction equates, the laser of single-frequency laser light source (1) transmitting is incident to two-dimentional transmission grating (27) diffracted after collimation lens (2) collimation, x direction and y direction ± 1 order diffraction light is through lens (282) deviation and pass through the parallel emergent light that aperture diaphragm (29) formation four bundle light intensity equate, the diffraction light of other grades times is filtered by aperture diaphragm (29),
The 4th, described light splitting part is by collimation lens (21), two dimension transmission grating (27), prism (282), aperture diaphragm (29) forms, the grating cycle of described two-dimentional transmission grating (27) x direction and y direction equates, the laser of single-frequency laser light source (1) transmitting is incident to two-dimentional transmission grating (27) diffracted after collimation lens (2) collimation, x direction and y direction ± 1 order diffraction light is through prism (282) deviation and pass through the parallel emergent light that aperture diaphragm (29) formation four bundle light intensity equate, the diffraction light of other grades times is filtered by aperture diaphragm (29).
4. a kind of three dimensional grating displacement measurement system of surveying vertical displacement according to claim 1 and 2, is characterized in that: a kind of in following four kinds of structures of described gage beam dioptric element (33):
First, described gage beam dioptric element (33) comprises diaphragm (331) and refractive power catoptron (332), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and refractive power catoptron (332) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and refractive power catoptron (332) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occurs;
The second, described gage beam dioptric element (33) comprises diaphragm (331) and refractive prism (333), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and refractive prism (333) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and refractive prism (333) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occurs;
The 3rd, described gage beam dioptric element (33) comprises diaphragm (331) and first fold optical lens (334), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and first fold optical lens (334) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and first fold optical lens (334) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occurs;
The 4th, described gage beam dioptric element (33) comprises diaphragm (331) and the second dioptric lens (334), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and the second dioptric lens (334) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and the second dioptric lens (334) direction of propagation respectively by deviation ± θ
iand be incident to two-dimentional reflective measurement grating (5) diffraction occurs.
5. a kind of three dimensional grating displacement measurement system of surveying vertical displacement according to claim 4, is characterized in that: a kind of in four kinds of structures that described reference arm dioptric element (35) adopts for gage beam dioptric element (33).
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104567696A (en) * | 2015-01-09 | 2015-04-29 | 哈尔滨工业大学 | Two-dimensional displacement measuring device based on diffraction grating |
| CN104596424A (en) * | 2015-01-09 | 2015-05-06 | 哈尔滨工业大学 | Two dimension displacement measurement device which uses double frequency laser and diffraction grating |
| CN106091940A (en) * | 2016-06-20 | 2016-11-09 | 哈尔滨工业大学 | A kind of heterodyne system four-degree-of-freedom grating movement measurement system |
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| CN108775869A (en) * | 2018-03-23 | 2018-11-09 | 中国科学院长春光学精密机械与物理研究所 | Realize the grating displacement measuring system and method that long stroke three-D displacement measures |
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| CN114111587A (en) * | 2021-11-01 | 2022-03-01 | 中国科学院上海光学精密机械研究所 | Three-axis high-optical subdivision grating ruler |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060082783A1 (en) * | 2004-10-15 | 2006-04-20 | Ko Ishizuka | Position detection apparatus and method |
| US20060215171A1 (en) * | 2005-03-28 | 2006-09-28 | Toshihiko Nakata | Method and apparatus for measuring displacement of a sample |
| US20070263197A1 (en) * | 2006-05-09 | 2007-11-15 | Asml Nethlerlands B.V. | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method |
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN102937411A (en) * | 2012-11-09 | 2013-02-20 | 清华大学 | Double-frequency grating interferometer displacement measurement system |
-
2013
- 2013-12-12 CN CN201310675316.6A patent/CN103644849B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060082783A1 (en) * | 2004-10-15 | 2006-04-20 | Ko Ishizuka | Position detection apparatus and method |
| US20060215171A1 (en) * | 2005-03-28 | 2006-09-28 | Toshihiko Nakata | Method and apparatus for measuring displacement of a sample |
| US20070263197A1 (en) * | 2006-05-09 | 2007-11-15 | Asml Nethlerlands B.V. | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method |
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN102937411A (en) * | 2012-11-09 | 2013-02-20 | 清华大学 | Double-frequency grating interferometer displacement measurement system |
Non-Patent Citations (2)
| Title |
|---|
| KUANG-CHAO FAN等: "Displacement Measurement of Planar Stage by Diffraction Planar Encoder in Nanometer Resolution", 《INSTRUMENTATION AND MEASUREMENT TECHNOLOGY CONFERENCE(I2MC),2012 IEEE INTERNATIONAL》 * |
| 王国超等: "光栅干涉位移测量技术发展综述", 《激光技术》 * |
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