CN103644848B - A kind of three dimensional grating displacement measurement system using double-frequency laser - Google Patents
A kind of three dimensional grating displacement measurement system using double-frequency laser Download PDFInfo
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Abstract
A kind of three dimensional grating displacement measurement system of double-frequency laser that uses relates to a kind of grating displacement measuring system; This measuring system comprises the two-frequency laser of outgoing terminated optical fiber, light splitting part, polarization splitting prism, gage beam/reference arm quarter-wave plate, gage beam/reference arm dioptric element, two-dimentional reflective reference/measurement grating and Photoelectric Inspect & Signal Processing parts; The x/y direction cycle of the reflective measurement grating of two dimension is d
1, the two dimension reflective x/y direction cycle with reference to grating is d
2; The x/y direction refractive power angle of described gage beam dioptric element is θ
i1, the x/y direction refractive power angle of reference arm dioptric element is θ
i2, and meet 2d respectively
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2; The present invention not only proposes the optical grating measuring system simultaneously can measuring three-shaft displacement, and improves the antijamming capability of measuring-signal, and z is expanded greatly to displacement range simultaneously.
Description
Technical field
The three dimensional grating displacement measurement system of double-frequency laser is used to relate to an a kind of grating displacement measuring system, particularly a kind of three dimensional grating displacement measurement system using double-frequency laser.
Background technology
Pattern displacement measuring technique originated from for 19th century the earliest, obtains and develop rapidly from the 1950's.At present, grating displacement measuring system has become a kind of typical displacement transducer, and is widely used in numerous electromechanical equipment.Grating displacement measuring system, because having the many merits such as resolving power is high, precision is high, cost is low, environmental sensitivity is low, is not only widely used in industry and scientific research field, and is studied by numerous Chinese scholars.
Litho machine is the nucleus equipment producing semi-conductor chip.Ultra-precision table system is the kernel subsystems of litho machine, for carrying substrates and complete in load, exposure, zapping, unloading piece process high speed ultraprecise motion.Ultra-precision table system has the features such as high speed, high acceleration, multiple degrees of freedom, Long Distances, ultraprecise.Two-frequency laser interferometer, because have the advantage of high precision, wide range simultaneously, is widely used in the displacement measurement of ultra-precision table system.But the technological level of semi-conductor chip manufacture in recent years constantly promotes: 2010, the processing of semi-conductor chip have employed 32nm live width technique; In the end of the year 2011, the cpu chip also list marketing of 22nm live width.The index such as resolving power, precision of the semi-conductor chip level of processing improved constantly to ultra-precision table system displacement measurement is proposed higher requirement, two-frequency laser interferometer because of its there is environmental sensitivity difference, large, the multi-degree of freedom measurement complex structure of taking up room, the problem such as expensive be difficult to satisfied new measurement demand.
In order to solve the problem, the related companies in domestic and international ultra precise measurement field and numerous scholar have carried out large quantifier elimination, and achievement in research all has exposure in many patents and paper.The patent US7 of ASML company of Holland, 483,120B2 (publication date on November 15th, 2007) discloses a kind of the plane grating measuring system and the arrangement that are applied to Ultra-precision Stages of Lithography, this measuring system mainly utilizes the horizontal Long Distances displacement of two-dimensional grating and read head measuring workpieces platform, the displacement of work stage vertical direction can be measured by the height sensor arranged separately, but uses multiple sensors can make the complex structure of ultra-precision table system and the measuring accuracy of meeting limiting displacement.Japanese scholars GaoWei proposes a kind of three dimensional grating displacement measurement system based on diffraction interference principle in the paper delivered " Asub-nanometricthree-axissurfaceencoderwithshort-periodp lanargratingsforstagemotionmeasurement.PrecisionEngineer ing36 (2012) 576-585. ", x can be measured simultaneously, y, the straight-line displacement in z tri-directions, but this system can cause the interference region measuring light and reference light to diminish when measuring the straight-line displacement in z direction, therefore the range of the z direction straight-line displacement of system is limited to the size of beam diameter, the measurement of z direction Long Distances straight-line displacement cannot be realized.A kind of dual-frequency grating interferometer displacement measurement system is disclosed in the patent CN102937411A (publication date on February 20th, 2013) of the people such as Tsing-Hua University Zhu Yu, the straight-line displacement of level and vertical both direction can be measured simultaneously, and employ double-frequency laser as light source to improve the antijamming capability of signal, but the range of the vertical direction straight-line displacement of this system is limited to the size of beam diameter equally, still the measurement of vertical direction Long Distances straight-line displacement cannot be realized, and this system uses the reflective measurement grating of one dimension two dimension only can measure the straight-line displacement of both direction.The people such as Univ Nat Taiwan FanKuang-Chao have developed a kind of two-dimensional grating displacement measuring device of nanometer scale resolving power in the paper delivered " DisplacementMeasurementofPlanarStagebyDiffractionPlanarE ncoderinNanometerResolution.I2MTC (2012) 894-897. ", the straight-line displacement of two horizontal directions can be measured, but the straight-line displacement of vertical direction cannot be measured, the displacement measurement requirement of ultra-precision table system vertical direction can not be met.
Summary of the invention
In order to solve the problem, the object of this invention is to provide a kind of three dimensional grating displacement measurement system using double-frequency laser, this measuring system can not only measure the straight-line displacement along x-axis, y-axis, z-axis three directions simultaneously, and improve the antijamming capability of measuring-signal, the z simultaneously comparing this system of prior art obtains great expansion to displacement range.
The object of the present invention is achieved like this:
Use a three dimensional grating displacement measurement system for double-frequency laser, comprise the two-frequency laser of outgoing terminated optical fiber, light splitting part, polarization splitting prism, gage beam quarter-wave plate, gage beam dioptric element, reference arm quarter-wave plate, reference arm dioptric element, the reflective measurement grating of two dimension reflective reference grating, Photoelectric Inspect & Signal Processing parts and two dimension;
X direction cycle and the y direction cycle of the reflective measurement grating of described two dimension are d
1, the two dimension reflective x direction cycle with reference to grating and y direction cycle are d
2; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element are θ
i1, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element are θ
i2, and meet 2d respectively
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength, the m that are respectively two frequency light waves of the two-frequency laser injection of outgoing terminated optical fiber are the order of diffraction time;
The double-frequency laser of the two-frequency laser injection of described outgoing terminated optical fiber is divided into the equal directional light of four bundle light intensity through light splitting part, wherein the direction of propagation of parallel with xoy plane, the another two-beam in the direction of propagation of two-beam is parallel with xoz plane, and the wavelength that this four bundles directional light is divided into the direction of propagation partially to turn 90 degrees after polarization splitting prism is λ
1measurement light and the wavelength propagated along former direction be λ
2reference light, measure polarisation of light direction vertical with the polarization direction of reference light;
Measure four bundle directional lights of light after quick shaft direction and measurement light polarization direction are the gage beam quarter-wave plate of 45 degree, all measured arm dioptric element deviation, the direction of propagation that four bundles after deviation measure two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, two bundles that the direction of propagation is parallel to yoz plane are measured light and are incident to two-dimentional reflective measurement grating and the+m order diffraction being diffracted to y direction is respectively measured light and-m order diffraction and measured light, two bundles that the direction of propagation is parallel to xoz plane are measured light and are incident to two-dimentional reflective measurement grating and the+m order diffraction being diffracted to x direction is respectively measured light and-m order diffraction and measured light, four bundle diffractometry light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through gage beam dioptric element, after gage beam quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts,
Four bundle directional lights of reference light are after the reference arm quarter-wave plate that quick shaft direction and reference light polarization direction are 45 degree, all referenced arm dioptric element deviation, in four bundle reference lighies after deviation, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the two bundle reference lighies that the direction of propagation is parallel to xoy plane are incident to reflective+m order diffraction reference light and the-m order diffraction reference light being also diffracted to y direction with reference to grating respectively of two dimension, the two bundle reference lighies that the direction of propagation is parallel to xoz plane are incident to reflective+m order diffraction reference light and the-m order diffraction reference light being also diffracted to x direction with reference to grating respectively of two dimension, four bundle reference diffraction light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through reference arm dioptric element, after reference arm quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts,
The two bundle diffractometry light in x direction and the two bundle reference diffraction light in x direction form two groups of interfere beat frequency signals at Photoelectric Inspect & Signal Processing parts surface, and the two bundle diffractometry light in y direction and the two bundle reference diffraction light in y direction form another two groups of interfere beat frequency signals at Photoelectric Inspect & Signal Processing parts surface; When motionless, the two-dimentional reflective measurement grating of other elements moves along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts export the straight-line displacement in x direction, y direction and z direction respectively.
Above-mentioned a kind of three dimensional grating displacement measurement system using double-frequency laser, described light splitting part is the one in following four kinds of structures:
First, described light splitting part is by collimation lens, first unpolarized Amici prism, second unpolarized Amici prism, first right-angle reflecting prism, 3rd unpolarized Amici prism, second right-angle reflecting prism composition, the laser that the two-frequency laser of outgoing terminated optical fiber is launched is incident to the first unpolarized Amici prism after collimation lens collimation, and to be divided into light intensity equal, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident to the second unpolarized Amici prism in the z-direction and is divided into the equal transmitted light of light intensity and direction of propagation reflected light in the x-direction, transmitted light is propagated in the x-direction by the first right-angle reflecting prism reflection, another light beam propagates into the reflected light being incident upon the 3rd unpolarized Amici prism and being divided into the equal transmitted light of light intensity and-y direction, edge, the direction of propagation in the x-direction, reflected light is propagated in the x-direction by the second right-angle reflecting prism reflection,
Second, described light splitting part is made up of collimation lens, two-dimensional transmission grating, catoptron, aperture diaphragm, the screen periods in described two-dimensional transmission grating x direction and y direction is equal, the laser that the two-frequency laser of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating and diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light is through catoptron deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm, and the diffraction light of other grades times is filtered by aperture diaphragm;
3rd, described light splitting part is made up of collimation lens, two-dimensional transmission grating, lens, aperture diaphragm, the screen periods in described two-dimensional transmission grating x direction and y direction is equal, the laser that the two-frequency laser of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating and diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light is through lens deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm, and the diffraction light of other grades times is filtered by aperture diaphragm;
4th, described light splitting part is made up of collimation lens, two-dimensional transmission grating, prism, aperture diaphragm, the screen periods in described two-dimensional transmission grating x direction and y direction is equal, the laser that the two-frequency laser of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating and diffracted after collimation lens collimation, x direction and y direction ± 1 order diffraction light is through prism deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm, and the diffraction light of other grades times is filtered by aperture diaphragm.
Above-mentioned a kind of three dimensional grating displacement measurement system using double-frequency laser, described gage beam dioptric element is the one in following four kinds of structures:
The first, described gage beam dioptric element comprises diaphragm and refractive power catoptron, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and refractive power catoptron the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and refractive power catoptron the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction;
The second, described gage beam dioptric element comprises diaphragm and refractive prism, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and refractive prism the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and refractive prism the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction;
3rd, described gage beam dioptric element comprises diaphragm and the first dioptric lens, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and the first dioptric lens the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and the first dioptric lens the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction;
4th, described gage beam dioptric element comprises diaphragm and the second dioptric lens, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm and the second dioptric lens the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm and the second dioptric lens the direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating generation diffraction.
Described reference arm dioptric element is the one in four kinds of structures of gage beam dioptric element employing, and general ± θ
i1replace with ± θ
i2.
Beneficial effect of the present invention is described as follows:
This measuring system employs and meets 2d
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2the reflective two-frequency laser with reference to grating, gage beam dioptric element, reference arm dioptric element and outgoing terminated optical fiber of the two dimension reflective measurement grating of condition, two dimension, ensure that four bundle diffractometry light are propagated along the opposite direction in respective incident light propagation direction respectively, therefore, when two dimension reflective measurement grating relative measurement arm dioptric element moves along z-axis, four bundle diffractometry light are constant at the facula position of Photoelectric Inspect & Signal Processing parts surface, again because system measure time except two dimension reflective measurement grating the relative position of other elements constant all the time, therefore four bundle reference diffraction light are constant all the time at the facula position of Photoelectric Inspect & Signal Processing parts surface, so when two dimension reflective measurement grating relative measurement arm dioptric element moves along z-axis, interfere the interference region of hot spot constant for four groups of Photoelectric Inspect & Signal Processing parts surface, the z of system is no longer limited to the size of spot diameter to displacement range, but depend on the coherent length of light source, light source of the present invention is the two-frequency laser of outgoing terminated optical fiber, its coherent length can reach meter magnitude even km magnitude, therefore z of the present invention can expand to meter magnitude even km magnitude to displacement range, in prior art, the z of the measurement mechanism that Japanese scholars GaoWei develops is only 4mm to displacement range, though the z of undeclared system is to displacement range in the patent of the people such as Zhu Yu, but its z is limited to the size of spot diameter to displacement range, the z of centimetres cannot be realized to displacement measurement, therefore the remarkable beneficial effect that the present invention has is not only propose a kind of optical grating measuring system simultaneously can measuring three-shaft displacement, and the z of this system compares prior art to displacement range and obtains great expansion.In addition, the present invention uses dual-frequency laser source, improves the antijamming capability of displacement measurement signal.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation using the three dimensional grating displacement measurement system of double-frequency laser of the present invention.
Fig. 2 is the structural representation of the first structure of light splitting part of the present invention.
Fig. 3 is the xoz directional profile figure of the second structure of light splitting part of the present invention.
Fig. 4 is the xoz directional profile figure of the third structure of light splitting part of the present invention.
Fig. 5 is the xoz directional profile figure of the 4th kind of structure of light splitting part of the present invention.
Fig. 6 is the xoz directional profile figure of the first structure of gage beam dioptric element of the present invention.
Fig. 7 is the xoz directional profile figure of the second structure of gage beam dioptric element of the present invention.
Fig. 8 is the xoz directional profile figure of the third structure of gage beam dioptric element of the present invention.
Fig. 9 is the xoz directional profile figure of the 4th kind of structure of gage beam dioptric element of the present invention.
In figure: 1 single-frequency laser light source; 2 light splitting parts; 21 collimation lenses; 22 first unpolarized Amici prisms; 23 second unpolarized Amici prisms; 24 first right-angle reflecting prism; 25 the 3rd unpolarized Amici prisms; 26 second right-angle reflecting prism; 27 two-dimensional transmission gratings; 281 catoptrons; 282 lens; 283 prisms; 29 aperture diaphragms; 31 polarization splitting prisms; 32 gage beam quarter-wave plates; 33 gage beam dioptric elements; 331 diaphragms; 332 refractive power catoptrons; 333 refractive prisms; 334 first dioptric lenses; 335 second dioptric lenses; 34 reference arm quarter-wave plates; 35 reference arm dioptric elements; 36 two dimensions are reflective with reference to grating; 4 Photoelectric Inspect & Signal Processing parts; 5 two-dimentional reflective measurement gratings.
Embodiment
Below in conjunction with accompanying drawing, the specific embodiment of the invention is described in further detail.
Specific embodiment one
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment, structural representation as shown in Figure 1.This measuring system comprises two-frequency laser 1, light splitting part 2, polarization splitting prism 31, gage beam quarter-wave plate 32, gage beam dioptric element 33, reference arm quarter-wave plate 34, reference arm dioptric element 35, the reflective measurement grating 5 of two dimension reflective reference grating 36, Photoelectric Inspect & Signal Processing parts 4 and two dimension of outgoing terminated optical fiber;
X direction cycle and the y direction cycle of the reflective measurement grating 5 of described two dimension are d
1, the two dimension reflective x direction cycle with reference to grating 36 and y direction cycle are d
2; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element 33 are θ
i1, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element 35 are θ
i2, and meet 2d respectively
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength of two frequency light waves that the two-frequency laser 1 being respectively outgoing terminated optical fiber penetrates, m are the order of diffraction time;
The double-frequency laser that the two-frequency laser 1 of described outgoing terminated optical fiber penetrates is divided into the equal directional light of four bundle light intensity through light splitting part 2, wherein the direction of propagation of parallel with xoy plane, the another two-beam in the direction of propagation of two-beam is parallel with xoz plane, and the wavelength that this four bundles directional light is divided into the direction of propagation partially to turn 90 degrees after polarization splitting prism 31 is λ
1measurement light and the wavelength propagated along former direction be λ
2reference light, measure polarisation of light direction vertical with the polarization direction of reference light;
Measure four bundle directional lights of light after quick shaft direction and measurement light polarization direction are the gage beam quarter-wave plate 32 of 45 degree, all measured arm dioptric element 33 deviation, the direction of propagation that four bundles after deviation measure two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, two bundles that the direction of propagation is parallel to yoz plane are measured light and are incident to two-dimentional reflective measurement grating 5 and+m the order diffraction being diffracted to y direction is respectively measured light and-m order diffraction and measured light, two bundles that the direction of propagation is parallel to xoz plane are measured light and are incident to two-dimentional reflective measurement grating 5 and+m the order diffraction being diffracted to x direction is respectively measured light and-m order diffraction and measured light, four bundle diffractometry light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through gage beam dioptric element 33, after gage beam quarter-wave plate 32 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4,
Four bundle directional lights of reference light are after the reference arm quarter-wave plate 34 that quick shaft direction and reference light polarization direction are 45 degree, all referenced arm dioptric element 35 deviation, in four bundle reference lighies after deviation, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the two bundle reference lighies that the direction of propagation is parallel to xoy plane are incident to reflective+m order diffraction reference light and the-m order diffraction reference light being also diffracted to y direction with reference to grating 36 respectively of two dimension, the two bundle reference lighies that the direction of propagation is parallel to xoz plane are incident to reflective+m order diffraction reference light and the-m order diffraction reference light being also diffracted to x direction with reference to grating 36 respectively of two dimension, four bundle reference diffraction light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through reference arm dioptric element 35, after reference arm quarter-wave plate 34 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts 4,
The two bundle diffractometry light in x direction and the two bundle reference diffraction light in x direction form two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts 4 surface, and the two bundle diffractometry light in y direction and the two bundle reference diffraction light in y direction form another two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts 4 surface; When motionless, the two-dimentional reflective measurement grating 5 of other elements moves along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts 4 export the straight-line displacement in x direction, y direction and z direction respectively.
Specific embodiment two
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 2.This light splitting part 2 is by collimation lens 21, first unpolarized Amici prism 22, second unpolarized Amici prism 23, first right-angle reflecting prism 24, 3rd unpolarized Amici prism 25, second right-angle reflecting prism 26 forms, the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is incident to the first unpolarized Amici prism 22 after collimation lens 21 collimates, and to be divided into light intensity equal, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident to the second unpolarized Amici prism 23 in the z-direction and is divided into the equal transmitted light of light intensity and direction of propagation reflected light in the x-direction, transmitted light is reflected by the first right-angle reflecting prism 24 to be propagated in the x-direction, another light beam propagates into the reflected light being incident upon the 3rd unpolarized Amici prism 25 and being divided into the equal transmitted light of light intensity and-y direction, edge, the direction of propagation in the x-direction, reflected light is reflected by the second right-angle reflecting prism 26 to be propagated in the x-direction.
Specific embodiment three
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 3.This light splitting part is made up of collimation lens 21, two-dimensional transmission grating 27, catoptron 281, aperture diaphragm 29, the screen periods in described two-dimensional transmission grating 27x direction and y direction is equal, the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating 27 and diffracted after collimation lens 21 collimates, x direction and y direction ± 1 order diffraction light is through catoptron 281 deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm 29, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment four
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 4.This light splitting part is made up of collimation lens 21, two-dimensional transmission grating 27, lens 282, aperture diaphragm 29, the screen periods in described two-dimensional transmission grating 27x direction and y direction is equal, the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating 27 and diffracted after collimation lens 21 collimates, x direction and y direction ± 1 order diffraction light is through lens 282 deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm 29, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment five
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of light splitting part 2 as shown in Figure 5.This light splitting part is made up of collimation lens 21, two-dimensional transmission grating 27, prism 282, aperture diaphragm 29, the screen periods in described two-dimensional transmission grating 27x direction and y direction is equal, the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating 27 and diffracted after collimation lens 21 collimates, x direction and y direction ± 1 order diffraction light is through prism 282 deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm 29, and the diffraction light of other grades times is filtered by aperture diaphragm 29.
Specific embodiment six
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 6.This gage beam dioptric element 33 comprises diaphragm 331 and refractive power catoptron 332, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and refractive power catoptron 332 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and refractive power catoptron 332 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occurs.
Specific embodiment seven
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 7.This gage beam dioptric element 33 comprises diaphragm 331 and refractive prism 333, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occurs.
Specific embodiment eight
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 8.This gage beam dioptric element 33 comprises diaphragm 331 and the first dioptric lens 334, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and the first dioptric lens 334 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and the first dioptric lens 334 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occurs.
Specific embodiment nine
The three dimensional grating displacement measurement system of the use double-frequency laser of the present embodiment is identical with the one-piece construction of specific embodiment one.Wherein, the xoz directional profile figure of gage beam dioptric element 33 as shown in Figure 9.This gage beam dioptric element 33 comprises diaphragm 331 and the second dioptric lens 334, the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm 331 and the second dioptric lens 334 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm 331 and the second dioptric lens 334 direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating 5 diffraction occurs.
The diaxon grating displacement measuring system of the use double-frequency laser of above embodiment, reference arm dioptric element 35 is specific embodiment six, one in gage beam dioptric element 33 structure described in specific embodiment seven, specific embodiment eight, specific embodiment nine, and general ± θ
i1replace with ± θ
i2.
The present invention is not limited to above-mentioned preferred forms, and anyone should learn the structure change or method improvement made under enlightenment of the present invention, and every have identical or close technical scheme with the present invention, all falls within protection scope of the present invention.
Claims (3)
1. use a three dimensional grating displacement measurement system for double-frequency laser, it is characterized in that: comprise the two-frequency laser (1) of outgoing terminated optical fiber, light splitting part (2), polarization splitting prism (31), gage beam quarter-wave plate (32), gage beam dioptric element (33), reference arm quarter-wave plate (34), reference arm dioptric element (35), two dimension reflective reference grating (36), Photoelectric Inspect & Signal Processing parts (4) and the reflective measurement grating (5) of two dimension;
X direction cycle and the y direction cycle of the reflective measurement grating (5) of described two dimension are d
1, the two dimension reflective x direction cycle with reference to grating (36) and y direction cycle are d
2; X direction refractive power angle and the y direction refractive power angle of described gage beam dioptric element (33) are θ
i1, x direction refractive power angle and the y direction refractive power angle of reference arm dioptric element (35) are θ
i2, and meet 2d respectively
1sin θ
i1=± m λ
1, 2d
2sin θ
i2=± m λ
2, λ in formula
1, λ
2the wavelength of two frequency light waves that the two-frequency laser (1) being respectively outgoing terminated optical fiber penetrates, m are the order of diffraction time;
The double-frequency laser that the two-frequency laser (1) of described outgoing terminated optical fiber penetrates is divided into the equal directional light of four bundle light intensity through light splitting part (2), wherein the direction of propagation of parallel with xoy plane, the another two-beam in the direction of propagation of two-beam is parallel with xoz plane, and the wavelength that this four bundles directional light is divided into the direction of propagation partially to turn 90 degrees after polarization splitting prism (31) is λ
1measurement light and the wavelength propagated along former direction be λ
2reference light, measure polarisation of light direction vertical with the polarization direction of reference light;
Measure four bundle directional lights of light after quick shaft direction and measurement light polarization direction are the gage beam quarter-wave plate (32) of 45 degree, all measured arm dioptric element (33) deviation, the direction of propagation that four bundles after deviation measure two-beam in light is parallel to yoz plane, the direction of propagation of another two-beam is parallel to xoz plane, the two bundle measurement light that the direction of propagation is parallel to yoz plane are incident to two-dimentional reflective measurement grating (5) and are diffracted to+m order diffraction measurement light and the-m order diffraction measurement light in y direction respectively, the two bundle measurement light that the direction of propagation is parallel to xoz plane are incident to two-dimentional reflective measurement grating (5) and are diffracted to+m order diffraction measurement light and the-m order diffraction measurement light in x direction respectively, four bundle diffractometry light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through gage beam dioptric element (33), after gage beam quarter-wave plate (32) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4),
Four bundle directional lights of reference light are after the reference arm quarter-wave plate (34) that quick shaft direction and reference light polarization direction are 45 degree, all referenced arm dioptric element (35) deviation, in four bundle reference lighies after deviation, the direction of propagation of two-beam is parallel to xoy plane, the direction of propagation of another two-beam is parallel to xoz plane, the two bundle reference lighies that the direction of propagation is parallel to xoy plane are incident to two dimension reflective reference grating (36) and are diffracted to+m order diffraction reference light and the-m order diffraction reference light in y direction respectively, the two bundle reference lighies that the direction of propagation is parallel to xoz plane are incident to two dimension reflective reference grating (36) and are diffracted to+m order diffraction reference light and the-m order diffraction reference light in x direction respectively, four bundle reference diffraction light are propagated along the opposite direction in respective incident light propagation direction respectively, and again through reference arm dioptric element (35), after reference arm quarter-wave plate (34) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4),
The two bundle diffractometry light in x direction and the two bundle reference diffraction light in x direction form two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts (4) surface, and the two bundle diffractometry light in y direction and the two bundle reference diffraction light in y direction form another two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts (4) surface; When motionless, the two-dimentional reflective measurement grating (5) of other elements is moved along x-axis, y-axis and z-axis, Photoelectric Inspect & Signal Processing parts (4) export the straight-line displacement in x direction, y direction and z direction respectively.
2. a kind of three dimensional grating displacement measurement system using double-frequency laser according to claim 1, is characterized in that: described light splitting part (2) is the one in following four kinds of structures:
First, described light splitting part (2) is by collimation lens (21), first unpolarized Amici prism (22), second unpolarized Amici prism (23), first right-angle reflecting prism (24), 3rd unpolarized Amici prism (25), second right-angle reflecting prism (26) forms, the laser that the two-frequency laser (1) of outgoing terminated optical fiber is launched is incident to the first unpolarized Amici prism (22) after collimation lens (21) collimation, and to be divided into light intensity equal, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is incident to the second unpolarized Amici prism (23) in the z-direction and is divided into the equal transmitted light of light intensity and direction of propagation reflected light in the x-direction, transmitted light is propagated in the x-direction by the first right-angle reflecting prism (24) reflection, another light beam propagates into the reflected light being incident upon the 3rd unpolarized Amici prism (25) and being divided into the equal transmitted light of light intensity and-y direction, edge, the direction of propagation in the x-direction, reflected light is propagated in the x-direction by the second right-angle reflecting prism (26) reflection,
Second, described light splitting part is by collimation lens (21), two-dimensional transmission grating (27), catoptron (281), aperture diaphragm (29) forms, the screen periods in described two-dimensional transmission grating (27) x direction and y direction is equal, the laser that the two-frequency laser (1) of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating (27) and diffracted after collimation lens (21) collimation, x direction and y direction ± 1 order diffraction light is through catoptron (281) deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm (29), the diffraction light of other grades times is filtered by aperture diaphragm (29),
3rd, described light splitting part is by collimation lens (21), two-dimensional transmission grating (27), lens (282), aperture diaphragm (29) forms, the screen periods in described two-dimensional transmission grating (27) x direction and y direction is equal, the laser that the two-frequency laser (1) of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating (27) and diffracted after collimation lens (21) collimation, x direction and y direction ± 1 order diffraction light is through lens (282) deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm (29), the diffraction light of other grades times is filtered by aperture diaphragm (29),
4th, described light splitting part is by collimation lens (21), two-dimensional transmission grating (27), prism (283), aperture diaphragm (29) forms, the screen periods in described two-dimensional transmission grating (27) x direction and y direction is equal, the laser that the two-frequency laser (1) of outgoing terminated optical fiber is launched is incident to two-dimensional transmission grating (27) and diffracted after collimation lens (21) collimation, x direction and y direction ± 1 order diffraction light is through prism (283) deviation and form the equal exiting parallel light of four bundle light intensity by aperture diaphragm (29), the diffraction light of other grades times is filtered by aperture diaphragm (29).
3. a kind of three dimensional grating displacement measurement system using double-frequency laser according to claim 1, is characterized in that: described gage beam dioptric element (33) is the one in following four kinds of structures:
First, described gage beam dioptric element (33) comprises diaphragm (331) and refractive power catoptron (332), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and refractive power catoptron (332) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and refractive power catoptron (332) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) generation diffraction;
Second, described gage beam dioptric element (33) comprises diaphragm (331) and refractive prism (333), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and refractive prism (333) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and refractive prism (333) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) generation diffraction;
3rd, described gage beam dioptric element (33) comprises diaphragm (331) and the first dioptric lens (334), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and the first dioptric lens (334) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and the first dioptric lens (334) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) generation diffraction;
4th, described gage beam dioptric element (33) comprises diaphragm (331) and the second dioptric lens (334), the two bundle horizontal survey light that the described direction of propagation is parallel to yoz plane after diaphragm (331) and the second dioptric lens (334) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) diffraction occur, the two bundle horizontal survey light that the described direction of propagation is parallel to xoz plane after diaphragm (331) and the second dioptric lens (334) direction of propagation respectively by deviation ± θ
i1and be incident to two-dimentional reflective measurement grating (5) generation diffraction.
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|---|---|---|---|---|
| CN104596425B (en) * | 2015-01-09 | 2017-05-17 | 哈尔滨工业大学 | Three-dimensional displacement measurement device based on diffraction grating |
| CN106091940A (en) * | 2016-06-20 | 2016-11-09 | 哈尔滨工业大学 | A kind of heterodyne system four-degree-of-freedom grating movement measurement system |
| CN106152974A (en) * | 2016-06-20 | 2016-11-23 | 哈尔滨工业大学 | A kind of heterodyne system six degree of freedom grating movement measurement system |
| CN107664481B (en) * | 2016-07-29 | 2019-08-23 | 上海微电子装备（集团）股份有限公司 | Grating measuring device |
| CN107255517B (en) * | 2017-06-02 | 2018-08-14 | 中国科学院合肥物质科学研究院 | Polarizing film assembles angle high-accuracy calibration device |
| CN109342025B (en) * | 2018-09-27 | 2022-03-29 | 西北工业大学 | Method for testing polarization transmittance of infrared polarization imaging camera with split-focus plane |
| CN112097651B (en) * | 2020-09-11 | 2022-07-22 | 中国科学院长春光学精密机械与物理研究所 | Heterodyne two-dimensional grating displacement measurement system and measurement method |
| CN113701640B (en) * | 2020-09-17 | 2023-01-20 | 中国科学院上海光学精密机械研究所 | Three-axis grating ruler |
| CN112484647B (en) * | 2020-11-18 | 2022-06-10 | 北京华卓精科科技股份有限公司 | Interferometer displacement measurement system and method |
| CN113932909B (en) * | 2021-09-30 | 2022-06-21 | 中国科学院长春光学精密机械与物理研究所 | Online detection device for tool flutter state |
| CN114459516B (en) * | 2022-02-21 | 2023-07-28 | 清华大学深圳国际研究生院 | Absolute six-degree-of-freedom grating encoder |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN101566459A (en) * | 2009-05-27 | 2009-10-28 | 上海微电子装备有限公司 | Dual-frequency laser interferometer |
| CN102937411A (en) * | 2012-11-09 | 2013-02-20 | 清华大学 | Double-frequency grating interferometer displacement measurement system |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4514209B2 (en) * | 2004-10-15 | 2010-07-28 | キヤノン株式会社 | Position detection apparatus and method |
| JP4939765B2 (en) * | 2005-03-28 | 2012-05-30 | 株式会社日立製作所 | Displacement measuring method and apparatus |
| US7483120B2 (en) * | 2006-05-09 | 2009-01-27 | Asml Netherlands B.V. | Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method |
-
2013
- 2013-12-12 CN CN201310674590.1A patent/CN103644848B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101216286A (en) * | 2007-12-26 | 2008-07-09 | 上海微电子装备有限公司 | Heterodyne interferometer measuring system for measuring displacement and its measurement method |
| CN101566459A (en) * | 2009-05-27 | 2009-10-28 | 上海微电子装备有限公司 | Dual-frequency laser interferometer |
| CN102937411A (en) * | 2012-11-09 | 2013-02-20 | 清华大学 | Double-frequency grating interferometer displacement measurement system |
Non-Patent Citations (2)
| Title |
|---|
| Displacement Measurement of Planar Stage by Diffraction Planar Encoder in Nanometer Resolution;Kuang-Chao Fan等;《Instrumentation and Measurement Technology Conference(I2MC),2012 IEEE International》;20121231;第894-897页 * |
| 光栅干涉位移测量技术发展综述;王国超等;《激光技术》;20100930;第34卷(第5期);第661-664,716页 * |
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