CN103630077B - A kind of diaxon grating displacement measuring system that uses double-frequency laser - Google Patents
A kind of diaxon grating displacement measuring system that uses double-frequency laser Download PDFInfo
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Abstract
A kind of diaxon grating displacement measuring system that uses double-frequency laser relates to a kind of grating displacement measuring system; This measuring system comprises the reflective measurement grating of two-frequency laser, light splitting part, optical interference circuit parts, Photoelectric Inspect & Signal Processing parts and one dimension of outgoing terminated optical fiber; Described optical interference circuit parts comprise that polarization splitting prism, gage beam quarter-wave plate, gage beam dioptric element, reference arm quarter-wave plate, reference arm dioptric element and one dimension are reflective with reference to grating; Between the wavelength of the two-frequency laser of the reflective measurement/reference light of described one dimension grid cycle, measurement/reference arm dioptric element refractive power angle, outgoing terminated optical fiber, meet 2d1sinθi1=±mλ1、2d2sinθi2=±mλ2; The present invention not only can measure along the straight-line displacement of x axle, z axle both direction simultaneously, and has improved the antijamming capability of measuring-signal, and the z that simultaneously compares this system of prior art has obtained great expansion to displacement range.
Description
Technical field
Use the diaxon grating displacement measuring system of double-frequency laser to relate to an a kind of grating displacement measuring system, particularly oneUse the diaxon grating displacement measuring system of double-frequency laser.
Background technology
Pattern displacement measuring technique originated from for 19th century the earliest, had obtained development rapidly since the 1950's. At present,Grating displacement measuring system has become a kind of typical displacement transducer, and is widely used in numerous electromechanical equipments. GratingDisplacement measurement system is because having the many merits such as resolving power is high, precision is high, cost is low, environmental sensitivity is low, not only in industry andScientific research field is widely used, and is studied by numerous Chinese scholars.
Litho machine is the nucleus equipment of producing semiconductor chip. Ultraprecise work stage is the kernel subsystems of litho machine, for carryingSubstrate also completes the high speed ultraprecise motion in load, exposure, zapping, unloading piece process. Ultraprecise work stage has at a high speed,The features such as high acceleration, multiple degrees of freedom, large stroke, ultraprecise. Two-frequency laser interferometer is because have high accuracy, a large amount of simultaneouslyThe advantage of journey, is widely used in the displacement measurement of ultraprecise work stage. But, the technological level that semiconductor chip is manufactured in recent yearsConstantly promote: 2010, the processing of semiconductor chip adopted 32nm live width technique; In the end of the year 2011,22nm lineWide cpu chip is list marketing also. The semiconductor chip level of processing improving constantly divides ultraprecise work stage displacement measurementDistinguish that the index such as power, precision all has higher requirement, two-frequency laser interferometer because of its exist environmental sensitivity poor, take up roomGreatly, multi-degree of freedom measurement complex structure, the problem such as expensive are difficult to meet new measurement demand.
In order to address the above problem, relevant company and numerous scholar in the field of ultra precise measurement both at home and abroad have carried out a large amount of research,Achievement in research all has exposure in many patents and paper. The patent US7 of ASML company of Holland, 483,120B2 (open dayOn November 15th, 2007) a kind of plane grating measuring system and arrangement that is applied to Ultra-precision Stages of Lithography disclosed,This measuring system is mainly utilized the large travel displacement of level of two-dimensional grating and read head measuring workpieces platform, work stage vertical directionDisplacement can measure by the height sensor of independent layout, but use multiple sensors can make ultraprecise work stageThe certainty of measurement of complex structure meeting limiting displacement. Paper " the Designandconstruction that Japanese scholars GaoWei is deliveringofatwo-degree-of-freedomlinearencoderfornanometricmeasurementofstagepositionandStraightness.PrecisionEngineering34 (2010) 145-155. " and " Positionandout-of-straightnessmeasurementofaprecisionlinearair-bearingstagebyusingatwo-degree-of-freedomlinearEncoder.MeasurementScienceandTechnology21 (2010) 054005. " in proposed a kind of based on diffraction interferenceThe diaxon grating displacement measuring system of principle can be measured level and the vertically straight-line displacement of both direction simultaneously, but this systemIn the time measuring the straight-line displacement of vertical direction, can cause the interference region of measuring light and reference light to diminish, the therefore vertical direction of systemThe range of straight-line displacement is limited to the size of beam diameter, cannot realize the measurement of the large stroke straight-line displacement of vertical direction. Tsing-Hua University is largeIn the people's such as Zhu Yu patent CN102937411A (open day on February 20th, 2013), disclosing a kind of dual-frequency grating interferesInstrument displacement measurement system, also can measure level and the vertically straight-line displacement of both direction simultaneously, and use double-frequency laser workFor light source is to improve the antijamming capability of signal, straight but the range of the vertical direction straight-line displacement of this system is limited to light beam equallyThe size in footpath, still cannot realize the measurement of the large stroke straight-line displacement of vertical direction. The FanKuang-Chao of Univ Nat Taiwan etc.People is at the paper of delivering " DisplacementMeasurementofPlanarStagebyDiffractionPlanarE ncoderinNanometerResolution.I2MTC (2012) 894-897. " in developed a kind of two-dimensional grating of nanometer scale resolving powerDisplacement measuring device, the straight-line displacement that can measure two horizontal directions, but the straight-line displacement that cannot measure vertical direction, noCan meet the displacement measurement requirement of ultraprecise work stage vertical direction.
Summary of the invention
In order to address the above problem, the object of this invention is to provide a kind of diaxon grating displacement measuring system that uses double-frequency laser,This measuring system not only can be measured along the straight-line displacement of x axle, z axle both direction simultaneously, and has improved the anti-dry of measuring-signalDisturb ability, the z that simultaneously compares this system of prior art has obtained great expansion to displacement range.
The object of the present invention is achieved like this:
Use a diaxon grating displacement measuring system for double-frequency laser, comprise two-frequency laser, the spectrum part of outgoing terminated optical fiberThe reflective measurement grating of part, optical interference circuit parts, Photoelectric Inspect & Signal Processing parts and one dimension; Described optical interference circuit parts bagDraw together polarization splitting prism, gage beam quarter-wave plate, gage beam dioptric element, reference arm quarter-wave plate, reference arm foldingOptical element and one dimension are reflective with reference to grating;
The reflective grating cycle with reference to grating of the reflective measurement grating of described one dimension and one dimension is respectively d1And d2; Described gage beamThe refractive power angle of dioptric element and reference arm dioptric element is respectively θi1And θi2, and meet respectively 2d1sinθi1＝±mλ1、2d2sinθi2＝±mλ2, λ in formula1、λ2Be respectively outgoing terminated optical fiber two-frequency laser penetrate two frequency light waves wavelength,M is the order of diffraction time;
The double-frequency laser that the two-frequency laser of described outgoing terminated optical fiber penetrates is divided into two bundle directional lights through light splitting part, this two bundleIt is λ that directional light is divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism1Measurement light and pass along former directionThe wavelength of broadcasting is λ2Reference light, the polarization direction of measuring light and reference light is orthogonal, measures two of light and restraints directional lights through too fastDirection of principal axis with measure light polarization direction and be after the gage beam quarter-wave plate of 45 degree all measured arm dioptric element deviations, after deviationTwo bundles measure light be incident to the reflective measurement grating of one dimension be diffracted to respectively+m order diffraction measure light and-m order diffraction measuresLight, ± m order diffraction is measured light respectively along the opposite direction propagation of incident light separately, and again passes through gage beam dioptric element, gage beamAfter quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts; Two bundle directional light warps of reference lightCross after the reference arm quarter-wave plate that quick shaft direction and reference light polarization direction be 45 degree all referenced arm dioptric element deviations, partiallyAfter folding two bundle reference light be incident to one dimension reflective with reference to grating be diffracted to respectively+m order diffraction reference light and-m order diffractionReference light, the edge opposite direction propagation of incident light separately respectively of ± m order diffraction reference light, and again pass through reference arm dioptric element, ginsengAfter examining arm quarter-wave plate and polarization splitting prism, be incident to Photoelectric Inspect & Signal Processing parts; Two bundle diffractometry light respectivelyForm two groups of interfere beat frequency signals at Photoelectric Inspect & Signal Processing parts surface, interfere beat frequency signal quilt with two bundle reference diffraction lightPhotoelectric Inspect & Signal Processing parts are surveyed and are processed, and the relative optical interference circuit parts of the reflective measurement grating of one dimension are along x axle and z axleWhen motion, Photoelectric Inspect & Signal Processing parts are exported respectively the straight-line displacement of x direction and z direction.
Above-mentioned a kind of diaxon grating displacement measuring system that uses double-frequency laser, described light splitting part is in following four kinds of structuresA kind of:
The first, described light splitting part is made up of collimation lens, unpolarized Amici prism, right-angle reflecting prism, outgoing terminated optical fiberThe laser of two-frequency laser transmitting after collimation lens collimation, be incident to unpolarized Amici prism and be divided into light intensity and equate, propagateThe mutually perpendicular two-beam of direction, wherein light beam direction of propagation after right-angle reflecting prism is spent and another bundle parallel light by deviation 90Propagate, form the parallel emergent light that two-beam equates by force;
The second, described light splitting part is made up of collimation lens, one dimension transmission grating, speculum, aperture diaphragm, outgoing termination lightThe laser of fine two-frequency laser transmitting is incident to one dimension transmission grating diffracted, ± 1 order diffraction light after collimation lens collimationForm through speculum deviation and by aperture diaphragm the parallel emergent light that two-beam equates by force, the diffraction light of other grades times is by aperture lightDoor screen filters;
Three, described light splitting part is made up of collimation lens, one dimension transmission grating, lens, aperture diaphragm, outgoing terminated optical fiberThe laser of two-frequency laser transmitting after collimation lens collimation, be incident to one dimension transmission grating diffracted, ± 1 order diffraction light warpLens deviation also forms by aperture diaphragm the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is by aperture diaphragm mistakeFilter;
Four, described light splitting part is made up of collimation lens, one dimension transmission grating, prism, aperture diaphragm, outgoing terminated optical fiberThe laser of two-frequency laser transmitting after collimation lens collimation, be incident to one dimension transmission grating diffracted, ± 1 order diffraction light warpPrism deviation also forms by aperture diaphragm the parallel emergent light that two-beam equates by force, and the diffraction light of other grades times is by aperture diaphragm mistakeFilter.
Above-mentioned a kind of diaxon grating displacement measuring system that uses double-frequency laser, described gage beam dioptric element is following four kinds of knotsOne in structure:
The first, described gage beam dioptric element comprises diaphragm and refractive power speculum, and described two bundle horizontal survey light are through diaphragm and foldingAfter light reflection mirror, the direction of propagation is respectively by deviation ± θi1And be incident to the reflective measurement grating of one dimension generation diffraction;
The second, described gage beam dioptric element comprises diaphragm and refractive prism, and described two bundle horizontal survey light are through diaphragm and refractive powerAfter prism, the direction of propagation is respectively by deviation ± θi1And be incident to the reflective measurement grating of one dimension generation diffraction;
The 3rd, described gage beam dioptric element comprises diaphragm and first fold optical lens, described two bundle horizontal survey light through diaphragms andAfter first fold optical lens, the direction of propagation is respectively by deviation ± θi1And be incident to the reflective measurement grating of one dimension generation diffraction;
The 4th, described gage beam dioptric element comprises diaphragm and the second dioptric lens, described two bundle horizontal survey light through diaphragms andAfter the second dioptric lens, the direction of propagation is respectively by deviation ± θi1And be incident to the reflective measurement grating of one dimension generation diffraction;
Described reference arm dioptric element is the one in four kinds of structures adopting of gage beam dioptric element, and general ± θi1Replace with ± θi2。
Beneficial effect of the present invention is described as follows:
This measuring system has been used and has met 2d1sinθi1＝±mλ1、2d2sinθi2＝±mλ2The reflective measurement grating of one dimension of condition, one dimensionThe reflective two-frequency laser with reference to grating, gage beam dioptric element, reference arm dioptric element and outgoing terminated optical fiber, has ensuredTwo bundle diffractometry light are respectively along the opposite direction propagation of the incident light direction of propagation separately, therefore relative at the reflective measurement grating of one dimensionWhen optical interference circuit parts move along z axle, two bundle diffractometry light are not at the facula position of Photoelectric Inspect & Signal Processing parts surfaceBecome; Again because system measure time except the reflective measurement grating of one dimension the relative position of other elements constant all the time, therefore two restraintReference diffraction light is constant all the time at the facula position of Photoelectric Inspect & Signal Processing parts surface, so at the reflective measurement light of one dimensionWhen grid relative measurement arm dioptric element moves along z axle, interfere the interference of hot spot for two groups of Photoelectric Inspect & Signal Processing parts surfaceRegion is constant, and the z of system is no longer limited to the size of spot diameter to displacement range, but depends on the coherence length of light source,Light source of the present invention is the two-frequency laser of outgoing terminated optical fiber, and its coherence length can reach even km magnitude of meter magnitude, because ofThis z of the present invention can expand to even km magnitude of meter magnitude to displacement range, Japanese scholars GaoWei institute in prior artThe z of measurement mechanism of development is only 4mm to displacement range, though in the people's such as Zhu Yu patent the z of undeclared system to displacement range,But its z is limited to the size of spot diameter to displacement range, cannot realize the z of centimetre magnitude to displacement measurement, therefore the present inventionThe remarkable beneficial effect having is not only to have proposed a kind ofly can measure the optical grating measuring system of two axial displacements simultaneously, and this systemZ compare prior art to displacement range and obtained great expansion. In addition, the present invention uses dual-frequency laser source, has improvedThe antijamming capability of displacement measurement signal.
Brief description of the drawings
Fig. 1 is the structural representation of a kind of diaxon grating displacement measuring system that uses double-frequency laser of the present invention.
Fig. 2 is the structural representation of the first structure of light splitting part of the present invention.
Fig. 3 is the structural representation of the second structure of light splitting part of the present invention.
Fig. 4 is the structural representation of the third structure of light splitting part of the present invention.
Fig. 5 is the structural representation of the 4th kind of structure of light splitting part of the present invention.
Fig. 6 is the structural representation of the first structure of gage beam dioptric element of the present invention.
Fig. 7 is the structural representation of the second structure of gage beam dioptric element of the present invention.
Fig. 8 is the structural representation of the third structure of gage beam dioptric element of the present invention.
Fig. 9 is the structural representation of the 4th kind of structure of gage beam dioptric element of the present invention.
In figure: the two-frequency laser of 1 outgoing terminated optical fiber; 2 light splitting parts; 21 collimation lenses; 22 unpolarized Amici prisms;23 right-angle reflecting prism; 24 one dimension transmission gratings; 251 speculums; 252 lens; 253 prisms; 26 aperture diaphragms; 3 is dryRelate to light path part; 31 polarization splitting prisms; 32 gage beam quarter-wave plates; 33 gage beam dioptric elements; 331 diaphragms; 332Refractive power speculum; 333 refractive prisms; 334 first fold optical lens; 335 second dioptric lenses; 34 reference arm quarter-wave plates;35 reference arm dioptric elements; 36 one dimensions are reflective with reference to grating; 4 Photoelectric Inspect & Signal Processing parts; The reflective survey of 5 one dimensionAmount grating.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the invention is described in further detail.
Specific embodiment one
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment, structural representation as shown in Figure 1. This Department of SurveyTurnkey is drawn together two-frequency laser 1, light splitting part 2, optical interference circuit parts 3, the Photoelectric Inspect & Signal Processing portion of outgoing terminated optical fiberThe reflective measurement grating 5 of part 4 and one dimension; Described optical interference circuit parts 3 comprise polarization splitting prism 31, gage beam 1/4thWave plate 32, gage beam dioptric element 33, reference arm quarter-wave plate 34, reference arm dioptric element 35 and the reflective ginseng of one dimensionExamine grating 36;
The reflective grating cycle with reference to grating 36 of the reflective measurement grating 5 of described one dimension and one dimension is respectively d1And d2; DescribedThe refractive power angle of gage beam dioptric element 33 and reference arm dioptric element 35 is respectively θi1And θi2, and meet respectively2d1sinθi1＝±mλ1、2d2sinθi2＝±mλ2, λ in formula1、λ2Be respectively two that the two-frequency laser 1 of outgoing terminated optical fiber penetratesThe wavelength of frequency light wave, m are the order of diffraction time;
The double-frequency laser that the two-frequency laser 1 of described outgoing terminated optical fiber penetrates is divided into two bundle directional lights through light splitting part 2, thisIt is λ that two bundle directional lights are divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism 311Measurement light and along formerThe wavelength that direction is propagated is λ2Reference light, the polarization direction of measuring light and reference light is orthogonal, measures two of light and restraints directional lightsThrough quick shaft direction with measure light polarization direction and be after the gage beam quarter-wave plate 32 of 45 degree all measured arm dioptric elements 33Deviation, two after deviation bundle measure light be incident to the reflective measurement grating 5 of one dimension be diffracted to respectively+m order diffraction measure light and-m order diffraction is measured light, and ± m order diffraction is measured light respectively along the opposite direction propagation of incident light separately, and again through gage beam foldingAfter optical element 33, gage beam quarter-wave plate 32 and polarization splitting prism 31, be incident to Photoelectric Inspect & Signal Processing parts4; Two bundle directional lights of reference light are after the reference arm quarter-wave plate 34 of 45 degree through quick shaft direction and reference light polarization directionAll referenced arm dioptric element 35 deviations, two after deviation bundle reference light be incident to one dimension reflective with reference to grating 36 and respectively byBe diffracted to+m order diffraction reference light and-m order diffraction reference light, ± m order diffraction reference light passes along the opposite direction of incident light separately respectivelyBroadcast, and again after reference arm dioptric element 35, reference arm quarter-wave plate 34 and polarization splitting prism 31, be incident to lightElectrical resistivity survey is surveyed and Signal Processing Element 4; Two bundle diffractometry light respectively with two bundle reference diffraction light are in Photoelectric Inspect & Signal Processing portionPart 4 surfaces form two groups of interfere beat frequency signals, and interfere beat frequency signal is surveyed and processed by Photoelectric Inspect & Signal Processing parts 4,When the relative optical interference circuit parts 3 of the reflective measurement grating 5 of one dimension move along x axle and z axle, Photoelectric Inspect & Signal Processing parts 4Export respectively the straight-line displacement of x direction and z direction.
Specific embodiment two
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 2. This light splitting part 2 by collimation lens 21, unpolarized Amici prism 22,Right-angle reflecting prism 23 forms, and the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched enters after collimation lens 21 collimationsBe incident upon unpolarized Amici prism 22 be divided into light intensity equate, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is anti-through right anglePenetrate the rear direction of propagation of prism 23 and spent with another bundle parallel light and propagate by deviation 90, form the parallel emergent light that two-beam equates by force.
Specific embodiment three
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 3. This light splitting part 2 by collimation lens 21, one dimension transmission grating 24,Speculum 251, aperture diaphragm 26 form, and the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is through collimation lens 21After collimation, be incident to one dimension transmission grating 24 diffracted, ± 1 order diffraction light is through speculum 251 deviations and by aperture diaphragm 26Form the parallel emergent light that two-beam equates by force, the diffraction light of other grades times is filtered by aperture diaphragm 26.
Specific embodiment four
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 4. This light splitting part 2 by collimation lens 21, one dimension transmission grating 24,Lens 252, aperture diaphragm 26 form, and the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is through collimation lens 21 standardsAfter straight, be incident to one dimension transmission grating 24 diffracted, ± 1 order diffraction light is through lens 252 deviations and form by aperture diaphragm 26The parallel emergent light that two-beam equates by force, the diffraction light of other grades times is filtered by aperture diaphragm 26.
Specific embodiment five
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of light splitting part 2 as shown in Figure 5. This light splitting part 2 by collimation lens 21, one dimension transmission grating 24,Prism 253, aperture diaphragm 26 form, and the laser that the two-frequency laser 1 of outgoing terminated optical fiber is launched is through collimation lens 21 standardsAfter straight, be incident to one dimension transmission grating 24 diffracted, ± 1 order diffraction light is through prism 253 deviations and form by aperture diaphragm 26The parallel emergent light that two-beam equates by force, the diffraction light of other grades times is filtered by aperture diaphragm 26.
Specific embodiment six
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 6. This gage beam dioptric element 33 comprises diaphragm 331 and foldingLight reflection mirror 332, described two bundle horizontal survey light after diaphragm 331 and refractive power speculum 332 direction of propagation respectively by deviation±θi1And be incident to the reflective measurement grating 5 of one dimension diffraction occurs.
Specific embodiment seven
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 7. This gage beam dioptric element 33 comprises diaphragm 331 and foldingLight prism 333, described two bundle horizontal survey light after diaphragm 331 and refractive prism 333 direction of propagation respectively by deviation ± θi1And be incident to the reflective measurement grating 5 of one dimension diffraction occurs.
Specific embodiment eight
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 8. This gage beam dioptric element 33 comprises diaphragm 331 andOne dioptric lens 334, described two bundle horizontal survey light after diaphragm 331 and first fold optical lens 334 direction of propagation respectively byDeviation ± θi1And be incident to the reflective measurement grating 5 of one dimension diffraction occurs.
Specific embodiment nine
The diaxon grating displacement measuring system of the use double-frequency laser of the present embodiment is identical with the overall structure of specific embodiment one.Wherein, the concrete structure of gage beam dioptric element 33 as shown in Figure 9. This gage beam dioptric element 33 comprises diaphragm 331 andTwo dioptric lenses 335, described two bundle horizontal survey light after diaphragm 331 and the second dioptric lens 335 direction of propagation respectively byDeviation ± θi1And be incident to the reflective measurement grating 5 of one dimension diffraction occurs.
The diaxon grating displacement measuring system of the use double-frequency laser of above embodiment, reference arm dioptric element 35 is specific embodimentSix, the one in gage beam dioptric element 33 structures described in specific embodiment seven, specific embodiment eight, specific embodiment nine,And general ± θi1Replace with ± θi2。
The present invention is not limited to above-mentioned preferred forms, and anyone should learn the structural change of making under enlightenment of the present inventionOr method improvement, every have identical or close technical scheme with the present invention, within all falling into protection scope of the present invention.
Claims (2)
1. a diaxon grating displacement measuring system that uses double-frequency laser, is characterized in that: the double frequency that comprises outgoing terminated optical fiberLaser instrument (1), light splitting part (2), optical interference circuit parts (3), Photoelectric Inspect & Signal Processing parts (4) and one dimension reflectionFormula is measured grating (5); Described optical interference circuit parts (3) comprise polarization splitting prism (31), gage beam quarter-wave plate (32),Gage beam dioptric element (33), reference arm quarter-wave plate (34), reference arm dioptric element (35) and the reflective ginseng of one dimensionExamine grating (36);
The reflective grating cycle with reference to grating (36) of the reflective measurement grating of described one dimension (5) and one dimension is respectively d1And d2；The refractive power angle of described gage beam dioptric element (33) and reference arm dioptric element (35) is respectively θi1And θi2, and full respectivelyFoot 2d1sinθi1＝±mλ1、2d2sinθi2＝±mλ2, λ in formula1、λ2The two-frequency laser (1) that is respectively outgoing terminated optical fiber penetratesWavelength, the m of two frequency light waves be the order of diffraction time;
It is parallel that the double-frequency laser that the two-frequency laser (1) of described outgoing terminated optical fiber penetrates is divided into two bundles through light splitting part (2)Light, it is λ that this two bundles directional light is divided into the wavelength of being spent by deviation 90 direction of propagation again after polarization splitting prism (31)1SurveyAmount light and the wavelength of propagating along former direction are λ2Reference light, the polarization direction of measuring light and reference light is orthogonal, measurement lightAll measured after the gage beam quarter-wave plate (32) that two bundle directional lights are 45 degree through quick shaft direction and measurement light polarization directionArm dioptric element (33) deviation, the bundle of two after deviation is measured light and is incident to the reflective measurement grating of one dimension (5) diffracted respectivelyFor+m order diffraction measure light and-m order diffraction measures light, ± m order diffraction is measured light and is propagated along the opposite direction of incident light separately respectively,And again after gage beam dioptric element (33), gage beam quarter-wave plate (32) and polarization splitting prism (31), enterBe incident upon Photoelectric Inspect & Signal Processing parts (4); Two bundle directional lights of reference light are through quick shaft direction and reference light polarization directionEqual referenced arm dioptric element (35) deviation after the reference arm quarter-wave plates (34) of 45 degree, the bundle of two after deviation reference lightBe incident to one dimension reflective with reference to grating (36) be diffracted to respectively+m order diffraction reference light and-m order diffraction reference light, ± mThe edge opposite direction propagation of incident light separately respectively of order diffraction reference light, and again pass through reference arm dioptric element (35), reference arm fourAfter/mono-wave plate (34) and polarization splitting prism (31), be incident to Photoelectric Inspect & Signal Processing parts (4); Two bundle diffractionMeasure light respectively with two bundle reference diffraction light and form two groups of interfere beat frequency signals on Photoelectric Inspect & Signal Processing parts (4) surface,Interfere beat frequency signal is surveyed and is processed by Photoelectric Inspect & Signal Processing parts (4), and the reflective measurement grating of one dimension (5) is relativeWhen optical interference circuit parts (3) move along x axle and z axle, Photoelectric Inspect & Signal Processing parts (4) are exported respectively x direction and zThe straight-line displacement of direction.
2. a kind of diaxon grating displacement measuring system that uses double-frequency laser according to claim 1, is characterized in that: instituteState light splitting part (2) for the one in following four kinds of structures:
The first, described light splitting part (2) is by collimation lens (21), unpolarized Amici prism (22), right-angle reflecting prism (23)Composition, the laser of two-frequency laser (1) transmitting of outgoing terminated optical fiber is incident to unpolarized after collimation lens (21) collimationAmici prism (22) be divided into light intensity equate, the mutually perpendicular two-beam in the direction of propagation, wherein light beam is through right-angle reflecting prism(23) after, the direction of propagation is spent with another bundle parallel light and is propagated by deviation 90, forms the parallel emergent light that two-beam equates by force;
The second, described light splitting part (2) is by collimation lens (21), one dimension transmission grating (24), speculum (251), apertureDiaphragm (26) composition, the laser of two-frequency laser (1) transmitting of outgoing terminated optical fiber enters after collimation lens (21) collimationBe incident upon one dimension transmission grating (24) diffracted, ± 1 order diffraction light is through speculum (251) deviation and by aperture diaphragm (26)Form the parallel emergent light that two-beam equates by force, the diffraction light of other grades times is filtered by aperture diaphragm (26);
Three, described light splitting part (2) is by collimation lens (21), one dimension transmission grating (24), lens (252), aperture lightDoor screen (26) composition, laser incident after collimation lens (21) collimation of two-frequency laser (1) transmitting of outgoing terminated optical fiberTo one dimension transmission grating (24) diffracted, ± 1 order diffraction light is through lens (252) deviation and by aperture diaphragm (26) shapeThe parallel emergent light that becomes two-beam to equate by force, the diffraction light of other grades times is filtered by aperture diaphragm (26);
Four, described light splitting part (2) is by collimation lens (21), one dimension transmission grating (24), prism (253), aperture lightDoor screen (26) composition, laser incident after collimation lens (21) collimation of two-frequency laser (1) transmitting of outgoing terminated optical fiberTo one dimension transmission grating (24) diffracted, ± 1 order diffraction light is through prism (253) deviation and by aperture diaphragm (26) shapeThe parallel emergent light that becomes two-beam to equate by force, the diffraction light of other grades times is filtered by aperture diaphragm (26).
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| CN106931887B (en) * | 2015-12-30 | 2019-11-26 | 上海微电子装备（集团）股份有限公司 | Dual-frequency grating measuring device |
| CN106091940A (en) * | 2016-06-20 | 2016-11-09 | 哈尔滨工业大学 | A kind of heterodyne system four-degree-of-freedom grating movement measurement system |
| CN106152974A (en) * | 2016-06-20 | 2016-11-23 | 哈尔滨工业大学 | A kind of heterodyne system six degree of freedom grating movement measurement system |
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| CN108627099B (en) * | 2018-07-02 | 2020-03-20 | 清华大学 | Five-degree-of-freedom heterodyne grating interferometry system |
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