CN103594319A - Powder material surface plasma processing device - Google Patents
Powder material surface plasma processing device Download PDFInfo
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- CN103594319A CN103594319A CN201310607896.5A CN201310607896A CN103594319A CN 103594319 A CN103594319 A CN 103594319A CN 201310607896 A CN201310607896 A CN 201310607896A CN 103594319 A CN103594319 A CN 103594319A
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Abstract
The invention relates to a powder material surface plasma processing device. The powder material surface plasma processing device comprises a reaction cavity, an electrode assembly, a power supply and a gas distribution plate, wherein an extraction opening used for vacuum pumping is formed in the top of the reaction cavity, a gas inlet used for allowing reaction gas to come in is formed in the bottom of the reaction cavity, a reaction cavity body is formed in the reaction cavity, the electrode assembly and the gas distribution plate are arranged in the reaction cavity body, the electrode assembly is arranged above the gas distribution plate, a plurality of gas holes which allow the reaction gas to come in are formed in the gas distribution plate, and the electrode assembly is electrically connected with the power supply. The reaction gas comes in from the gas inlet, the reaction gas enters the reaction cavity body from the gas holes in the gas distribution plate while powder materials are wafted to move upward, the electrode assembly is powered on to form a high-frequency electric field to ionize the reaction gas so that surface processing can be conducted on the powder materials, the phenomenon that the powder materials are stacked and can not be uniformly processed is avoided, the processing effect is good, and work efficiency is improved.
Description
Technical field
The present invention relates to plasma processing apparatus, relate in particular to a kind of powder body material surface plasma processing apparatus.
Background technology
Low temperature plasma surface treatment is: under negative pressure (vacuum), apply high-frequency electric field to reacting gas environment, gas ionizes under the excitation of high-frequency electric field, produces plasma.Plasma is the 4th state of material, wherein contain the various active particles such as a large amount of electronics, ion and free radical, active particle and material surface generation physical and chemical reaction, thus structure, composition and the group of material surface are changed, be met the surface of actual requirement.Plasma reaction speed is fast, treatment effeciency is high, and modification occurs over just material surface, on the not impact of the performance of material internal bulk material, is desirable surface modification means.
Powder is the fine particle that a kind of solid particle dry, that disperse forms.In prior art, plasma processing apparatus is when processing powder surface, because powder is piled up, the surface that reunion between particulate makes not to be exposed in plasma atmosphere can not get processing, be difficult to realize microparticle surfaces and all process, cause processing incomplete, inhomogeneous, poor processing effect.
Therefore, need a kind of powder body material surface plasma processing apparatus badly.
Summary of the invention
The object of the invention is to overcome the defect that prior art exists, a kind of powder body material surface plasma processing apparatus is provided.
The technical scheme that realizes the object of the invention is: a kind of powder body material surface plasma processing apparatus, comprise reaction chamber, electrode assemblie, power supply and gas distribution grid, described reaction chamber top is provided with the bleeding point for vacuumizing, described reaction chamber bottom is provided with for passing into the gas access of reacting gas, in described reaction chamber, be provided with reaction chamber, described electrode assemblie and gas distribution grid are arranged in described reaction chamber, described electrode assemblie is arranged at described gas distribution grid top, on described gas distribution grid, be provided with some pores that enter for reacting gas, described electrode assemblie is electrically connected to described power supply.
Further, described electrode assemblie is the annular electrode being wrapped in described reaction chamber outer wall.
Further, also comprise the air pump for exhaust, described air pump is connected with described bleeding point,, between air pump and bleeding point, be also provided with filter.
Further, also comprise that described source of the gas is connected with described gas access for the source of the gas of reacting gas is provided.
The present invention has positive effect: gas access of the present invention passes into reacting gas, reacting gas enters in reaction chamber and blows powder body material simultaneously from the pore of gas distribution grid and moves upward, electrode assemblie energising forms high-frequency electric field reacting gas ionization is processed powder body material surface, having avoided powder body material to pile up cannot process completely uniformly, treatment effect is good, increases work efficiency.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is the structural representation of first embodiment of the invention;
Fig. 2 is the structural representation of second embodiment of the invention.
Wherein: 1, source of the gas, 2, gas access, 3, gas distribution grid, 4, electrode assemblie, 5, filter, 6, air pump, 7, bleeding point, 8, reaction chamber.
Embodiment
Embodiment 1
As shown in Figure 1, first embodiment of the invention provides a kind of powder body material surface plasma processing apparatus, comprise reaction chamber 8, electrode assemblie 4, power supply (not shown) and gas distribution grid 3, reaction chamber 8 tops are provided with the bleeding point 7 for vacuumizing, reaction chamber 8 bottoms are provided with for passing into the gas access 2 of reacting gas, in reaction chamber 8, be provided with reaction chamber (not shown), electrode assemblie 4 and gas distribution grid 3 are arranged in reaction chamber, electrode assemblie 4 is arranged at gas distribution grid 3 tops, on gas distribution grid 3, be provided with some pore (not shown)s that enter for reacting gas, electrode assemblie 4 is electrically connected to power supply, electrode assemblie 4 is for being wrapped in the annular electrode in reaction chamber outer wall.
The present embodiment gas access 2 passes into reacting gas, reacting gas enters in reaction chamber and blows powder body material simultaneously from the pore of gas distribution grid 3 and moves upward, plate electrode is switched on and between plate electrode, is formed high-frequency electric field reacting gas ionization is processed powder body material surface, having avoided powder body material to pile up cannot process completely uniformly, treatment effect is good, increases work efficiency.
As shown in Figure 2, all the other are identical with embodiment 1, difference is, the present embodiment also comprises for the air pump 6 of exhaust with for the source of the gas 1 of reacting gas is provided, source of the gas 1 is connected with gas access 2, and air pump 6 is connected with bleeding point 7, between air pump 6 and bleeding point 7, is also provided with filter 5, filter 5 is effectively avoided taking away powder body material, environmental protection more in the process of exhaust.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of making, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.
Claims (4)
1. a powder body material surface plasma processing apparatus, it is characterized in that, comprise reaction chamber, electrode assemblie, power supply and gas distribution grid, described reaction chamber top is provided with the bleeding point for vacuumizing, described reaction chamber bottom is provided with for passing into the gas access of reacting gas, in described reaction chamber, be provided with reaction chamber, described electrode assemblie and gas distribution grid are arranged in described reaction chamber, described electrode assemblie is arranged at described gas distribution grid top, on described gas distribution grid, be provided with some pores that enter for reacting gas, described electrode assemblie is electrically connected to described power supply.
2. powder body material surface plasma processing apparatus according to claim 1, is characterized in that, described electrode assemblie is the annular electrode being wrapped in described reaction chamber outer wall.
3. powder body material surface plasma processing apparatus according to claim 1 and 2, is characterized in that, also comprises the air pump for exhaust, and described air pump is connected with described bleeding point, is also provided with filter between air pump and bleeding point.
4. powder body material surface plasma processing apparatus according to claim 3, is characterized in that, also comprises that described source of the gas is connected with described gas access for the source of the gas of reacting gas is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310607896.5A CN103594319A (en) | 2013-11-27 | 2013-11-27 | Powder material surface plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310607896.5A CN103594319A (en) | 2013-11-27 | 2013-11-27 | Powder material surface plasma processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103594319A true CN103594319A (en) | 2014-02-19 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310607896.5A Pending CN103594319A (en) | 2013-11-27 | 2013-11-27 | Powder material surface plasma processing device |
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| CN (1) | CN103594319A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108998763A (en) * | 2018-07-23 | 2018-12-14 | 桑德集团有限公司 | The method for coating and sputtering equipment of powder |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2718948Y (en) * | 2004-06-23 | 2005-08-17 | 中国科学院物理研究所 | Plasma material processing equipment |
| CN101421203A (en) * | 2006-03-31 | 2009-04-29 | 国立大学法人东北大学 | Porous member |
| CN202205700U (en) * | 2011-09-07 | 2012-04-25 | 苏州市奥普斯等离子体科技有限公司 | Low-temperature plasma treatment device on surface of granular material |
| CN202205701U (en) * | 2011-09-07 | 2012-04-25 | 苏州市奥普斯等离子体科技有限公司 | Processing apparatus for low temperature plasma upon powder material surface |
| CN203562396U (en) * | 2013-11-27 | 2014-04-23 | 苏州市奥普斯等离子体科技有限公司 | Powder material surface plasma processing device |
-
2013
- 2013-11-27 CN CN201310607896.5A patent/CN103594319A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2718948Y (en) * | 2004-06-23 | 2005-08-17 | 中国科学院物理研究所 | Plasma material processing equipment |
| CN101421203A (en) * | 2006-03-31 | 2009-04-29 | 国立大学法人东北大学 | Porous member |
| CN202205700U (en) * | 2011-09-07 | 2012-04-25 | 苏州市奥普斯等离子体科技有限公司 | Low-temperature plasma treatment device on surface of granular material |
| CN202205701U (en) * | 2011-09-07 | 2012-04-25 | 苏州市奥普斯等离子体科技有限公司 | Processing apparatus for low temperature plasma upon powder material surface |
| CN203562396U (en) * | 2013-11-27 | 2014-04-23 | 苏州市奥普斯等离子体科技有限公司 | Powder material surface plasma processing device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108998763A (en) * | 2018-07-23 | 2018-12-14 | 桑德集团有限公司 | The method for coating and sputtering equipment of powder |
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Application publication date: 20140219 |