CN103730319A - Novel powder plasma processing device - Google Patents

Novel powder plasma processing device Download PDF

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Publication number
CN103730319A
CN103730319A CN201310713037.4A CN201310713037A CN103730319A CN 103730319 A CN103730319 A CN 103730319A CN 201310713037 A CN201310713037 A CN 201310713037A CN 103730319 A CN103730319 A CN 103730319A
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CN
China
Prior art keywords
reaction chamber
plasma processing
cavity
processing apparatus
novel powder
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Pending
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CN201310713037.4A
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Chinese (zh)
Inventor
王红卫
沈文凯
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SUZHOU OPS PLASMA TECHNOLOGY Co Ltd
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SUZHOU OPS PLASMA TECHNOLOGY Co Ltd
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Priority to CN201310713037.4A priority Critical patent/CN103730319A/en
Publication of CN103730319A publication Critical patent/CN103730319A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a novel powder plasma processing device which comprises a feeding cavity, a reaction cavity, an electrode assembly, a plasma generator, a collecting cavity and a negative pressure device. A gas inlet where reaction gas is led is formed in the top of the reaction cavity, a feeding opening is formed in the upper portion of the reaction cavity, a discharging opening is formed in the bottom of the reaction cavity, the feeding cavity is connected with the feeding opening, the electrode assembly is arranged on the outer surface of the reaction cavity and located below the feeding opening, the plasma generator is electrically connected with the electrode assembly, the collecting cavity is connected with the discharging opening, and the negative pressure device is respectively connected with the feeding cavity and the reaction cavity. According to the novel powder plasma processing device, powder materials are blown by the reaction gas in the process of entering the reaction cavity so that the processing effect can be even, the vacuum degree of the reaction cavity is kept in the feeding process of the feeding cavity, feeding can be carried out without stopping processing, time is saved, and the work efficiency is improved.

Description

A kind of novel powder plasma processing apparatus
Technical field
The invention belongs to plasma processing apparatus field, relate in particular a kind of novel powder plasma processing apparatus.
Background technology
The ionized gas shape material that the positron-electron that atom after plasma is deprived of by portions of electronics and atom are ionized rear generation forms, it is extensively present in universe, is often considered to be and removes outside solid, liquid, gas, the 4th state that material exists.
At present, what plasma device was general is two electrodes to be set in airtight container form electric field, with vacuum pump, realize certain vacuum degree, along with gas is more and more thin, the free movement distance of intermolecular distance and molecule or ion is also more and more long, be subject to electric field action, they bump and form gas ions, the activity of these ions is very high, its energy is enough to destroy nearly all chemical bond, material surface in any exposure causes chemical reaction, thereby structure, composition and the group of material surface are changed, and is met the surface of actual requirement.Plasma reaction speed is fast, treatment effeciency is high, and modification occurs over just material surface, on the not impact of the performance of material internal bulk material, is desirable surface modification means.
Powder is the fine particle that a kind of solid particle dry, that disperse forms.In prior art, plasma processing apparatus is when processing powder surface, because powder is piled up, the surface that reunion between particulate makes not to be exposed in plasma atmosphere can not get processing, be difficult to realize microparticle surfaces and all process, cause processing incomplete, inhomogeneous, poor processing effect.
Therefore, need a kind of powder body material surface plasma processing apparatus of uniform treatment badly.
Summary of the invention
The object of the invention is to overcome the defect that prior art exists, a kind of novel powder plasma processing apparatus is provided.
The technical scheme that realizes the object of the invention is: a kind of novel powder plasma processing apparatus, comprise feed cavity, reaction chamber, electrode assemblie, plasma generator, collecting chamber and negative pressure device, described reaction chamber top is provided with the gas access passing into for reacting gas, described reaction chamber top is provided with charging aperture, described reaction chamber bottom is provided with discharging opening, described feed cavity is connected with described charging aperture, described electrode assemblie is arranged at described reaction chamber outer surface and is positioned at described charging aperture below, described plasma generator is electrically connected to described electrode assemblie, described collecting chamber is connected with described discharging opening, described negative pressure device respectively with described feed cavity, described reaction chamber connects.
Further, also comprise screw feeding mechanism, described screw feeding mechanism is arranged between described feed cavity and described charging aperture, and described screw feeding mechanism comprises shell and is arranged at the feed worm in described shell.
Further, the envelope of described feed worm and described outer casing inner wall match.
Further, in described feed cavity, be also provided with rabbling mechanism.
Further, described plasma generator comprises that described adaptation is also connected with described electrode assemblie for regulating the power supply and the adaptation being connected with described power supply of electrode assemblie power.
Further, described negative pressure device comprises the vacuum pump being connected with described reaction chamber, between described vacuum pump and described reaction chamber, is also provided with filter.
Further, between described negative pressure device and described reaction chamber, be also provided with cyclone separator, described cyclone separator bottom is connected with the second collecting chamber.
The present invention has positive effect: in the present invention, negative pressure device is by feed cavity, reaction chamber and collecting chamber vacuumize, reacting gas enters reaction chamber from gas access, plasma generator drive electrode assembly generates electric field, through electric field, ionization forms plasma to reacting gas, powder body material in feed cavity enters reaction chamber from charging aperture and processes, finally by collecting chamber, collected, the powder body material gas that responds in entering the process of reaction chamber blows, make treatment effect even, feed cavity keeps the vacuum degree of reaction chamber in the process of charging, do not need to stop to process and get final product charging, saved the time, improved operating efficiency.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is the structural representation of first embodiment of the invention;
Fig. 2 is the structural representation of second embodiment of the invention.
Wherein: 1, feed worm, 2, shell, 3, feed cavity, 4, rabbling mechanism, 5, negative pressure device, 6, gas access, 7, reaction chamber, 8, electrode assemblie, 9, adaptation, 10, power supply, 11, cyclone separator, 12, filter, 13, collecting chamber, the 14, second collecting chamber.
Embodiment
Embodiment 1
As shown in Figure 1, as the first preferred embodiment, the present embodiment provides a kind of novel powder plasma processing apparatus, comprise feed cavity 3, screw feeding mechanism, reaction chamber 7, electrode assemblie 8, plasma generator, collecting chamber 13 and negative pressure device 5, reaction chamber 7 tops are provided with the gas access 6 passing into for reacting gas, reaction chamber 7 tops are provided with charging aperture (not shown), reaction chamber 7 bottoms are provided with discharging opening (not shown), feed cavity 3 is connected with charging aperture, screw feeding mechanism is arranged between feed cavity 3 and charging aperture, electrode assemblie 8 is arranged at reaction chamber 7 outer surfaces and is positioned at charging aperture below, plasma generator is electrically connected to electrode assemblie 8, collecting chamber 13 is connected with discharging opening, negative pressure device 5 is connected with reaction chamber 7.
In the feed cavity 3 that the present embodiment provides, be provided with rabbling mechanism 4, feed cavity 3 is also connected with negative pressure device 5, and screw feeding mechanism comprises shell 2 and be arranged at the feed worm 1 in shell 2, and the envelope of feed worm 1 and outer casing inner wall 1 match; Plasma generator comprises that adaptation 9 is also connected with electrode assemblie 8 for regulating the power supply 10 and the adaptation 9 being connected with power supply 10 of electrode assemblie 8 power; Negative pressure device 5 comprises the vacuum pump being connected with reaction chamber 7, between vacuum pump and reaction chamber 7, is also provided with filter 12.
In the present embodiment, negative pressure device 5 vacuumizes feed cavity 3, reaction chamber 7 and collecting chamber 13, reacting gas 6 enters reaction chamber 7 from gas access, plasma generator drive electrode assembly 8 generates electric field, through electric field, ionization forms plasma to reacting gas, powder body material in feed cavity 3 enters reaction chamber 7 by screw feeding mechanism from charging aperture and processes, finally by collecting chamber 13, collected, the powder body material gas that responds in the process that enters reaction chamber 7 blows, and makes treatment effect even.
Embodiment 2
As shown in Figure 2, all the other are identical with embodiment 1, and difference is, the present embodiment also comprises cyclone separator 11, and cyclone separator 11 is arranged between negative pressure device 5 and reaction chamber 7, and cyclone separator 11 bottoms are connected with the second collecting chamber 14.
In the present embodiment, increase cyclone separator 11, the powder body material that reacting gas can be taken out of separates with reacting gas, powder body material is collected by the second collecting chamber 14, reacting gas is extracted out by negative pressure device 5, secondary is collected powder body material, effectively avoid powder body material to extract out with reacting gas, saved raw material, more environmental protection.
Above-described specific embodiment; object of the present invention, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of making, be equal to replacement, improvement etc., within all should being included in protection scope of the present invention.

Claims (7)

1. a novel powder plasma processing apparatus, it is characterized in that, comprise feed cavity, reaction chamber, electrode assemblie, plasma generator, collecting chamber and negative pressure device, described reaction chamber top is provided with the gas access passing into for reacting gas, described reaction chamber top is provided with charging aperture, described reaction chamber bottom is provided with discharging opening, described feed cavity is connected with described charging aperture, described electrode assemblie is arranged at described reaction chamber outer surface and is positioned at described charging aperture below, described plasma generator is electrically connected to described electrode assemblie, described collecting chamber is connected with described discharging opening, described negative pressure device respectively with described feed cavity, described reaction chamber connects.
2. novel powder plasma processing apparatus according to claim 1, it is characterized in that, also comprise screw feeding mechanism, described screw feeding mechanism is arranged between described feed cavity and described charging aperture, and described screw feeding mechanism comprises shell and is arranged at the feed worm in described shell.
3. novel powder plasma processing apparatus according to claim 2, is characterized in that, the envelope of described feed worm and described outer casing inner wall match.
4. novel powder plasma processing apparatus according to claim 1, is characterized in that, is also provided with rabbling mechanism in described feed cavity.
5. novel powder plasma processing apparatus according to claim 1, it is characterized in that, described plasma generator comprises that described adaptation is also connected with described electrode assemblie for regulating the power supply and the adaptation being connected with described power supply of electrode assemblie power.
6. novel powder plasma processing apparatus according to claim 1, is characterized in that, described negative pressure device comprises the vacuum pump being connected with described reaction chamber, between described vacuum pump and described reaction chamber, is also provided with filter.
7. according to the arbitrary described novel powder plasma processing apparatus of claim 1-6, it is characterized in that, between described negative pressure device and described reaction chamber, be also provided with cyclone separator, described cyclone separator bottom is connected with the second collecting chamber.
CN201310713037.4A 2013-12-23 2013-12-23 Novel powder plasma processing device Pending CN103730319A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104299882A (en) * 2014-10-24 2015-01-21 苏州奥斯特新材料科技有限公司 Surface plasma processing device for powder materials
CN105906833A (en) * 2016-03-24 2016-08-31 东莞市恒核机电科技有限公司 Atmospheric pressure plasma particle polymer treatment device
CN106449343A (en) * 2016-08-31 2017-02-22 亚洲硅业(青海)有限公司 Plasma doping method of powder material

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1085876A (en) * 1993-11-05 1994-04-27 中国科学院化工冶金研究所 Plasma body prepares the method for Namigai
US20030172772A1 (en) * 1996-11-04 2003-09-18 Materials Modification, Inc. Microwave plasma chemical synthesis of ultrafine powders
CN2807733Y (en) * 2005-06-07 2006-08-23 山西省农业科学院旱地农业研究中心 Plasma treating apparatus for activating crop seed
CN201494905U (en) * 2009-07-23 2010-06-02 江苏博隆环保设备有限公司 Inclined screw conveyor
CN102126746A (en) * 2011-05-05 2011-07-20 贵州正业工程技术投资有限公司 Method and device for preparing nano tin dioxide by using high-frequency plasmas as heat source
CN202205701U (en) * 2011-09-07 2012-04-25 苏州市奥普斯等离子体科技有限公司 Processing apparatus for low temperature plasma upon powder material surface
CN203339107U (en) * 2013-05-23 2013-12-11 苏州金瑞晨科技有限公司 Arc discharge-plasma combined device used for preparing nanometer silicon powder
CN203617245U (en) * 2013-12-23 2014-05-28 苏州市奥普斯等离子体科技有限公司 Novel powder plasma treating device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1085876A (en) * 1993-11-05 1994-04-27 中国科学院化工冶金研究所 Plasma body prepares the method for Namigai
US20030172772A1 (en) * 1996-11-04 2003-09-18 Materials Modification, Inc. Microwave plasma chemical synthesis of ultrafine powders
CN2807733Y (en) * 2005-06-07 2006-08-23 山西省农业科学院旱地农业研究中心 Plasma treating apparatus for activating crop seed
CN201494905U (en) * 2009-07-23 2010-06-02 江苏博隆环保设备有限公司 Inclined screw conveyor
CN102126746A (en) * 2011-05-05 2011-07-20 贵州正业工程技术投资有限公司 Method and device for preparing nano tin dioxide by using high-frequency plasmas as heat source
CN202205701U (en) * 2011-09-07 2012-04-25 苏州市奥普斯等离子体科技有限公司 Processing apparatus for low temperature plasma upon powder material surface
CN203339107U (en) * 2013-05-23 2013-12-11 苏州金瑞晨科技有限公司 Arc discharge-plasma combined device used for preparing nanometer silicon powder
CN203617245U (en) * 2013-12-23 2014-05-28 苏州市奥普斯等离子体科技有限公司 Novel powder plasma treating device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104299882A (en) * 2014-10-24 2015-01-21 苏州奥斯特新材料科技有限公司 Surface plasma processing device for powder materials
CN105906833A (en) * 2016-03-24 2016-08-31 东莞市恒核机电科技有限公司 Atmospheric pressure plasma particle polymer treatment device
CN105906833B (en) * 2016-03-24 2019-04-09 东莞市恒核机电科技有限公司 Atmospheric plasma particulate polymer material processing equipment
CN106449343A (en) * 2016-08-31 2017-02-22 亚洲硅业(青海)有限公司 Plasma doping method of powder material

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