CN105979691A - Apparatus for modifying material surface performance by using non-thermal plasma technology - Google Patents

Apparatus for modifying material surface performance by using non-thermal plasma technology Download PDF

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Publication number
CN105979691A
CN105979691A CN201610365262.7A CN201610365262A CN105979691A CN 105979691 A CN105979691 A CN 105979691A CN 201610365262 A CN201610365262 A CN 201610365262A CN 105979691 A CN105979691 A CN 105979691A
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China
Prior art keywords
electrode plate
cylindrical housing
thermal plasma
plate
surface property
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CN201610365262.7A
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Chinese (zh)
Inventor
段钰锋
丁卫科
张君
刘猛
李建
王玺玉
张晓东
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Southeast University
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Southeast University
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Priority to CN201610365262.7A priority Critical patent/CN105979691A/en
Publication of CN105979691A publication Critical patent/CN105979691A/en
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The invention discloses an apparatus for modifying a material surface performance by using a non-thermal plasma technology. The apparatus comprises a cylindrical housing, a sealing cover installed at one end of the cylindrical housing, multi-interval slotting quartz plates fixed in the cylindrical housing, and a high-voltage electrode plate and a grounding electrode plate, wherein the high-voltage electrode plate and the grounding electrode plate are installed on the multi-interval slotting quartz plates. According to the apparatus, the surface physicochemical property of the solid material is modified by using high-energy electrons and active free radicals generated at high-voltage dielectric-barrier-discharge non-thermal plasma areas of two electrode plates based on collision, crosslinking, and reaction and the like. According to the invention, the apparatus can be widely applied to modification of surface physicochemical properties of various adsorbents, catalysts, and solid materials. On the basis of surface characteristics of the material application demands, modification can be carried out on solid material surfaces by adjusting pressures, dielectric barrier discharge spaces, atmospheres and discharge voltages, so that surface modification demands of different solid materials can be satisfied.

Description

A kind of device utilizing the material modified surface property of non-thermal plasma trap
Technical field
The present invention relates to the processing system of the material modified surface property of low-temperature plasma, especially a kind of dielectric barrier discharge Cold plasma discharge module.
Background technology
Non-thermal plasma trap (Non-Thermal Plasma, NTP) is that one possesses multiple pollutant and combines removing New technique, be considered most to develop one of pollutant removing technology with application potential by Chinese scholars.Low temperature etc. Gas ions technology is one and integrates chemistry, discharge physics and the cross-synthesis technology of environmental science, has place Reason system is simple, treatment effeciency is high, small investment, floor space are little, operating cost is low, technical process is dry type, does not has Have equipment corrosion, there is not the advantages such as secondary pollution, be generally acknowledge in the world there is great market potential and application prospect Flue gas pollutant New Process for Treatment, the research with corona discharge pulse and dielectric barrier discharge the most especially is the most active.
In recent years, plasma technique is in the application in the fields such as material science, biology, environmental science and chemical metallurgy The most active, and have applications well in catalyst modification field.Low temperature plasma does not change the bulk of material Characteristic and only affect the surface characteristic of material.Low temperature plasma can be to porous material surface physical chemistry as one The novel method that matter is modified, has the advantages such as effect is notable, pollution-free in terms of material surface modifying.Therefore, Low temperature plasma has good application prospect in terms of the surface modification of material.
Summary of the invention
Technical problem: the invention provides a kind of device utilizing the material modified surface property of non-thermal plasma trap, can By regulation modified gas pressure, component, block media discharging distance, discharge voltage etc. produce different low temperature etc. from Subfield region of discharge, intensity and active component etc., to adapt to different solid material surface modification needs.
Technical scheme: the device utilizing the material modified surface property of non-thermal plasma trap of the present invention, including one Cylindrical housing, be arranged on described cylindrical housing one end seal lid, be fixed in cylindrical housing how spaced Groove quartz plate, the electrode plate with high voltage being arranged on described many spacing fluting quartz plate and grounding electrode plate.
Further, in apparatus of the present invention, many spacing fluting quartz plate has parallel groove, two pieces of fluting quartz plates Vertically symmetrical setting, electrode plate with high voltage and grounding electrode plate are all inserted in horizontal parallel groove.
Further, in apparatus of the present invention, in described electrode plate with high voltage, grounding electrode plate, equal level embeds one piece of T2 Copper plate is as discharge electrode.Copper plate therein uses T2 red copper to prepare, according to GB GB-T 5231-2001, pure Copper is also known as red copper, and general T 2 red copper is No. two copper of fine copper, code name T2.
Further, in apparatus of the present invention, it is provided with air inlet on the upside of described cylindrical housing, sidewall is provided with Gas outlet, arranges check valve in the exit of described air inlet, gas outlet.
Further, in apparatus of the present invention, the high-pressure side high pressure string holes that the upside of described cylindrical housing is provided with, under The earth terminal high pressure string holes that side is provided with.
Further, in apparatus of the present invention, described cylindrical housing is quartz material, and sealing lid is polytetrafluoro material, Both are connected with each other by screw thread.
In the preferred version of apparatus of the present invention, cylindrical housing is provided with air inlet, gas outlet, electrode plate with high voltage and connects The high pressure string holes of ground electrode plate.At air inlet, gas outlet, check valve is set.Can create by being passed through the difference of gas Make different atmospheres, produce different modified effects.
Described seal lid and cylindrical housing be connected by threaded, gasket seal to be used process at screw thread, Ensure sealing when using.
Described many spacing fluting quartz plate is symmetrically arranged two pieces, uses the mode of welding to be connected with cylindrical housing Get up.Level fluting is used for inserting electrode plate with high voltage, grounding electrode plate.
Described high and low pressure battery lead plate is the copper plate being embedded in certain size at quartz plate center, as electrode, it Between quartz formed block media.Copper plate is connected with high voltage power supply by welding high-voltage line.Described High Level AC Voltage Source (0-30kV, 20kHz) will provide energy between electrodes, after being regulated by pressure regulator, set up discharge channel.
Described electrode plate with high voltage, grounding electrode plate are to be horizontally inserted in the level trough of many spacing fluting quartz plate, make Used time can be retracted to outside mouth, convenient placement modified sample.Can be according to different demand spacing, by grounding electrode plate Insert in different grooves.The spacing of the device realizing dielectric barrier discharge low-temperature plasma modification material surface performance is adjusted Joint.
Beneficial effect: the present invention compared with prior art, has the advantage that
Present invention application high voltage power supply, does electrode by power-on and power-off pole plate, produces plasma, is reacted by vibration etc., Realize the plasma modification to material surface performance.Structurally have employed airtight quartz cylinder shape shell, can be not With surface property material modified under atmosphere, evacuation, it is also possible to realize the modification to material under different pressures;By Insert electrode plate with high voltage and grounding electrode plate on many spacing fluting quartz plate, can under different spacing material modified superficiality Energy.The conditions such as the power of low-temperature plasma modification, pressure, atmosphere, spacing are the key factors of the modified performance of impact, To different materials, influence factor is different.The present invention not only can be determined by experiment optimal material modified surface property Condition, it is also possible to realize optimal plasma according to different modified conditions modified.By changing dielectric barrier discharge Spacing, modified atmospheres, modified power, modifier pressure etc., it is achieved the plasma modification under different operating modes, meet difference Material plasma modification technology condition requirement.Before low temperature plasma has well application in terms of the surface modification of material Scape, apparatus of the present invention have the advantages such as effect is notable, pollution-free in terms of material surface modifying.Such as: activated carbon exists Through low-temperature plasma modification under oxygen atmosphere, there is higher mercury removal efficiency.
Accompanying drawing explanation
Fig. 1 is the perspective view of the present invention.
Fig. 2 is the side view schematic diagram of Fig. 1.
Fig. 3 is the front schematic view of Fig. 1.
Fig. 4 is the schematic top plan view of Fig. 1.
In figure: sealing lid 1, cylindrical housing 2, air inlet 3, high-pressure side high pressure string holes 4, high-pressure side high-voltage line 5, Electrode plate with high voltage 6, gas outlet 7, grounding electrode plate 8, earth terminal high pressure string holes 9, earth terminal high-voltage line 10, many between Away from fluting quartz plate 11, parallel groove 12.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearer, below in conjunction with Figure of description, the present invention is done Further illustrate.
According to Fig. 1-4, the device of the material modified surface property of non-thermal plasma trap of the present invention, including a quartz The cylindrical housing 2 of material, and be disposed with in cylindrical housing 2: seal lid 1, many spacing fluting quartz plate 11, electrode plate with high voltage 6, grounding electrode plate 8;Cylindrical housing 2 side 1 is connected with sealing lid, seal lid 1 and Being connected by of cylindrical housing 2 is threaded, and cylindrical housing 2 is quartz material, and sealing lid 1 is polytetrafluoro material Material, and by the mutual airtight connection of screw thread.Fluting quartz plate 11 is symmetrically arranged two pieces, with cylindrical housing 2 The mode using welding connects.On fluting quartz plate 11, arrange parallel groove 12 according to pitch requirements, parallel recessed Groove 12 is used for inserting electrode plate with high voltage 6, grounding electrode plate 8.Electrode plate with high voltage 6, grounding electrode plate 8 are that level is inserted Enter in the parallel groove 12 of fluting quartz plate 11, can be retracted to outside mouth during use, convenient placement modified sample. Grounding electrode plate can be inserted in different grooves, it is achieved dielectric barrier discharge low-temperature according to different demand spacing The adjustability of the device of the material modified surface property of plasma technology.Electrode plate with high voltage 6, the equal level of grounding electrode plate 8 Embed one piece of copper plate, as high and low pressure electrode;High-voltage ac power is by the copper of high-voltage line with high and low pressure electrode Plate is connected.Copper plate is connected with high voltage power supply by welding high-voltage line.Described high-voltage ac power (0-30kV, 20kHz) energy will be provided between electrodes, after being regulated by pressure regulator, set up discharge channel.Cylindrical housing 2 are provided with air inlet 3, gas outlet 7, the high pressure string holes 6 of electrode plate with high voltage, the high pressure string holes 9 of grounding electrode plate. At air inlet 3, gas outlet 7, check valve is set.Different atmospheres can be created by being passed through the difference of gas, Produce different modified effects.
When device uses, it would be desirable to modified solid material is uniformly positioned in grounding electrode plate, by high-field electrode with high The HV Terminal of voltage source connects, ground electrode be connected with high voltage power supply low-voltage terminal after ground connection again, by regulating high-tension electricity Source output voltage changes the energy injected, it is thus achieved that discharge plasma, it is achieved the plasma modification to sample.High-field electrode Copper coin in plate 6 and grounding electrode plate 8 is T2 copper plate, and copper plate thickness is about 1mm, is embedded in plate center. Sealing lid 1 is polytetrafluoro material, and is connected with cylindrical housing 2 by screw thread.Other parts are quartz material. The sealing of device to be guaranteed, air inlet 3, gas outlet 7, the high pressure string holes 6 of electrode plate with high voltage, ground connection The high pressure string holes 9 of battery lead plate all ensures to seal.Device both can realize pressure and the regulation of block media spacing, also Different gas can be filled with, it is achieved the low-temperature plasma modification under different atmosphere.
Above-described embodiment is only the preferred embodiment of the present invention, it should be pointed out that: for the ordinary skill of the art For personnel, under the premise without departing from the principles of the invention, it is also possible to make some improvement and equivalent, these are right The claims in the present invention improve with equivalent after technical scheme, each fall within protection scope of the present invention.

Claims (6)

1. the device utilizing the material modified surface property of non-thermal plasma trap, it is characterized in that, this device includes a cylindrical housing (2), the sealing lid (1) being arranged on described cylindrical housing (2) one end, many spacing fluting quartz plate (11) being fixed in cylindrical housing (2), the electrode plate with high voltage (6) being arranged in described many spacing fluting quartz plate (11) and grounding electrode plate (8).
A kind of device utilizing the material modified surface property of non-thermal plasma trap the most according to claim 1, it is characterized in that: in described many spacing fluting quartz plate (11), have parallel groove (12), quartz plate (11) the vertically symmetrical setting of two pieces of flutings, electrode plate with high voltage (6) and grounding electrode plate (8) are all inserted in horizontal parallel groove.
A kind of device utilizing the material modified surface property of non-thermal plasma trap the most according to claim 1, it is characterised in that: in described electrode plate with high voltage (6), grounding electrode plate (8), equal level embeds one piece of T2 copper plate as discharge electrode.
A kind of device utilizing the material modified surface property of non-thermal plasma trap the most according to claim 1, it is characterized in that: described cylindrical housing (2) upside is provided with air inlet (3), it is provided with gas outlet (7) on sidewall, check valve is set in the exit of described air inlet (3), gas outlet (7).
A kind of device utilizing the material modified surface property of non-thermal plasma trap the most according to claim 1, it is characterized in that: high-pressure side high pressure string holes (4) that the upside of described cylindrical housing (2) is provided with, earth terminal high pressure string holes (9) that downside is provided with.
A kind of device utilizing the material modified surface property of non-thermal plasma trap the most according to claim 1, it is characterized in that: described cylindrical housing (2) is quartz material, sealing lid (1) is polytetrafluoro material, and both are connected with each other by screw thread.
CN201610365262.7A 2016-05-26 2016-05-26 Apparatus for modifying material surface performance by using non-thermal plasma technology Pending CN105979691A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107018617A (en) * 2017-03-16 2017-08-04 深圳市奥普斯等离子体科技有限公司 A kind of material surface processing unit and method
CN107915226A (en) * 2017-12-12 2018-04-17 浙江工商大学 A kind of preparation method and device of hydrogen-free absorbent charcoal material
CN109370226A (en) * 2018-10-24 2019-02-22 嘉兴市海德姆智能电气有限公司 A kind of preparation method of electromagnetic shielding material
CN109887673A (en) * 2018-12-27 2019-06-14 深圳市欧科力科技有限公司 A kind of preparation method of composite conductive ceramic slurry
CN112312637A (en) * 2019-08-02 2021-02-02 中国石油化工股份有限公司 Plasma generator
FR3127099A1 (en) * 2021-09-22 2023-03-24 Sorbonne Universite Device for the treatment of products of vegetable origin by a cold plasma

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2138651Y (en) * 1992-09-04 1993-07-21 中央民族学院 Surface modifying device for composite plasma material
CN101468281A (en) * 2008-01-23 2009-07-01 邵光震 Low-temperature plasma-discharge device for purifying hot gas
CN102337205A (en) * 2011-09-27 2012-02-01 大连大学 Novel bioreactor
CN104378900A (en) * 2014-10-31 2015-02-25 大连民族学院 Atmospheric pressure large-area uniform space plasma generating device
CN104640338A (en) * 2015-02-01 2015-05-20 华南理工大学 Remote control type dielectric barrier discharge electrode device and use method thereof
CN204583165U (en) * 2015-02-05 2015-08-26 昆明理工大学 For the parallel plate type reaction of low temperature plasma device of catalyst surface modification
CN105101603A (en) * 2015-08-04 2015-11-25 昆山禾信质谱技术有限公司 Dielectric barrier discharge plasma gas jet apparatus

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2138651Y (en) * 1992-09-04 1993-07-21 中央民族学院 Surface modifying device for composite plasma material
CN101468281A (en) * 2008-01-23 2009-07-01 邵光震 Low-temperature plasma-discharge device for purifying hot gas
CN102337205A (en) * 2011-09-27 2012-02-01 大连大学 Novel bioreactor
CN104378900A (en) * 2014-10-31 2015-02-25 大连民族学院 Atmospheric pressure large-area uniform space plasma generating device
CN104640338A (en) * 2015-02-01 2015-05-20 华南理工大学 Remote control type dielectric barrier discharge electrode device and use method thereof
CN204583165U (en) * 2015-02-05 2015-08-26 昆明理工大学 For the parallel plate type reaction of low temperature plasma device of catalyst surface modification
CN105101603A (en) * 2015-08-04 2015-11-25 昆山禾信质谱技术有限公司 Dielectric barrier discharge plasma gas jet apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107018617A (en) * 2017-03-16 2017-08-04 深圳市奥普斯等离子体科技有限公司 A kind of material surface processing unit and method
CN107915226A (en) * 2017-12-12 2018-04-17 浙江工商大学 A kind of preparation method and device of hydrogen-free absorbent charcoal material
CN109370226A (en) * 2018-10-24 2019-02-22 嘉兴市海德姆智能电气有限公司 A kind of preparation method of electromagnetic shielding material
CN109887673A (en) * 2018-12-27 2019-06-14 深圳市欧科力科技有限公司 A kind of preparation method of composite conductive ceramic slurry
CN112312637A (en) * 2019-08-02 2021-02-02 中国石油化工股份有限公司 Plasma generator
FR3127099A1 (en) * 2021-09-22 2023-03-24 Sorbonne Universite Device for the treatment of products of vegetable origin by a cold plasma

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