CN103570249A - 玻璃基板蚀刻用刀片 - Google Patents

玻璃基板蚀刻用刀片 Download PDF

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CN103570249A
CN103570249A CN201310190989.2A CN201310190989A CN103570249A CN 103570249 A CN103570249 A CN 103570249A CN 201310190989 A CN201310190989 A CN 201310190989A CN 103570249 A CN103570249 A CN 103570249A
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glass substrate
etching
etching solution
concavo
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黄龙云
姜东昊
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NOVELLUS TECHNOLOGIES Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133302Rigid substrates, e.g. inorganic substrates

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

本发明涉及在以垂直流式对使用于显示面板、太阳能电池等的玻璃基板进行减薄的工艺中使用的蚀刻装置用刀片结构。由于,现有的一字型刀片存在蚀刻溶液向内侧偏向而产生凝聚的现象,因此,存在蚀刻的均匀度不良,并在玻璃基板上产生斑点的问题,由此,本发明的刀片端部形成弯曲形状,使得蚀刻溶液沿着玻璃基板的整个表面均匀地流下。

Description

玻璃基板蚀刻用刀片
技术领域
本发明涉及使用于显示面板、太阳能电池等的玻璃基板蚀刻装置,尤其涉及一种以垂直流式方式进行减薄时使用的蚀刻装置用刀片结构。
背景技术
作为显示面板等的主要部件,可举例以较薄的厚度进行蚀刻(减薄)的玻璃基板。此类薄玻璃基板是将1mm以上厚度的玻璃基板通过蚀刻溶液薄薄地进行蚀刻而制成。使用破损率低且较厚的玻璃基板进行几道工艺之后,将一面进行蚀刻进行薄化处理,也可在进行工艺前,将玻璃基板进行双面蚀刻薄化处理之后再进行工艺。玻璃基板的减薄工艺通过使用蚀刻溶液的化学性蚀刻进行,减薄方式可使用液浸方式、喷淋方式、垂直流式中的任意一种方式。垂直流式破损率低,具有稳定性,且生产率高。
如图1所示,垂直流式是将玻璃基板放入框架并用夹具固定,使蚀刻溶液沿着玻璃基板的一面或双面流淌一定时间,并以所需的厚度进行减薄的工艺。此时,使用刀片200,以使蚀刻溶液均匀地流到玻璃基板的整个表面,由此,通过所述刀片200,蚀刻溶液能够流向玻璃基板的整个表面。
但是,由于蚀刻溶液特有的表面张力及玻璃基板的黏度,即使使用刀片200,蚀刻溶液也会向内侧流进,而发生凝聚现象,从而导致蚀刻溶液不能均匀分布于玻璃基板的整个表面,此为玻璃基板上产生斑点或厚度整体上不均匀的原因。
而且,需要根据蚀刻溶液的流动部分对齐玻璃基板,比较繁琐,但与初期对齐不同地,蚀刻溶液的流动仍然由于黏度等原因发生变化,从而导致发生同样的问题。
发明内容
技术问题
因此,本发明的目的为提供一种可均匀地蚀刻玻璃基板的整个表面的改良结构的新型刀片。
技术方案
根据所述目的,本发明将刀片的端部形成弯曲形状,使得蚀刻溶液沿着刀片的整个长度以均匀的流量流下。
即,本发明提供一种玻璃基板蚀刻用刀片,使用于以垂直流式蚀刻玻璃基板的减薄工艺的刀片,其特征在于:所述刀片的端部形成弯曲形状,使得蚀刻溶液沿着刀片的整个长度以均匀的流量流下。
并且,本发明提供一种玻璃基板蚀刻用刀片,其特征在于:所述刀片端部的弯曲由波纹凹凸、锯齿凹凸、四角凹凸、菱形凹凸、圆形凹凸形状中的任意一种形成。
并且,本发明提供一种玻璃基板蚀刻用刀片,其特征在于:所述凹凸的节距为5至15mm。
并且,本发明提供一种玻璃基板蚀刻用刀片,其特征在于:所述刀片的厚度为3至7mm。
并且,本发明提供一种玻璃基板蚀刻用刀片,其特征在于:所述刀片具有供蚀刻溶液流入的缝隙,并在内部具有空心的空间,并且在弯曲的端部具有孔或裂缝,由此,蚀刻溶液通过刀片的外周面和孔或裂缝流入。
有益效果
根据本发明,通过在刀片的端部形成的弯曲,能够防止蚀刻溶液向内侧发生凝聚现象,而沿着刀片的整个长度均匀地分散,并均匀地流向处于下端的玻璃基板的整个表面,从而,可均匀地蚀刻玻璃基板的整个表面,并且,通过在刀片的端部形成的弯曲,增加了蚀刻溶液的宽幅,从而,无需特别考虑刀片和玻璃基板的对齐精密度,使操作更加便利,并且,由于增加了刀片的厚度,通过增加蚀刻溶液的流量,从而,可缩短减薄工艺作业时间,整体上提高了生产效率。
附图说明
图1为显示一般的垂直流式的玻璃基板的减薄装置结构的正面图和侧面图。
图2为显示根据现有刀片结构发生的蚀刻溶液向内侧偏向的现象的正面图。
图3为显示根据本发明的在端部形成弯曲的刀片实施例的正面图。
图4为显示使用根据本发明的刀片,使蚀刻溶液均匀流过玻璃基板的整个表面进行蚀刻的正面图。
图5为显示在一般的垂直流式玻璃基板减薄装置中的刀片喷嘴结构并说明蚀刻工艺的截面图。
附图符号说明
100:玻璃基板
200:刀片
具体实施方案
下面,参照附图对本发明的优选实施例进行详细说明。
如图3所示,垂直流式的玻璃基板蚀刻用刀片200,其端部制作成弯曲形状。即由波纹形状、锯齿形状、四角凹凸、菱形凹凸、圆形凹凸等形状形成刀片的端部。如图1的截面图及图3的剖视图所示,刀片越向端部厚度越薄,并且,蚀刻溶液沿着刀片的外周面流下。并且,可将刀片的内部做成空心的空间,在上端设置供蚀刻溶液流入的缝隙,在弯曲的端部形成孔(hole)或裂缝,此时,蚀刻溶液不仅可通过刀片的外周面流下,而且还可通过孔或裂缝流入。缝隙的厚度、孔、裂缝等的大小至幅度可为数毫米,孔可形成于每个弯曲部,形成多个,并且裂缝可形成为一体形缝隙形态或多个裂缝。
如上所述的刀片的弯曲的端部与现有的一字型端部不同,起到稍微分散蚀刻溶液的流动的作用,从而,能够达到不必考虑蚀刻溶液的黏度或表面张力,达到使蚀刻溶液不向玻璃基板内部偏斜,而向两端部扩张的效果。
因此,可防止现有的刀片由于蚀刻溶液流到玻璃基板的端部的量少,使得玻璃基板的端部产生斑点的现象。并且,现有的刀片,因蚀刻溶液在玻璃基板的上部的流动速度快,多少影响蚀刻作用,但是,本发明通过端部的弯曲形状,使得蚀刻溶液的流动速度稍微趋缓,因此,玻璃基板上部的蚀刻也与其它部分相同,从而,整体上能够均匀地进行蚀刻。
所述弯曲的端部的形状,其凹凸部的节距5至15mm左右,优选地,形成为10mm左右,由此,可使从刀片流下的蚀刻溶液的流动宽幅整体上均匀地扩张,并且,与现有的一字型刀片相比,蚀刻溶液的宽幅再扩大了7mm。
并且,将现有的以2至3mm构成的刀片的厚度稍微增加,至3至5mm左右,由此,可增加到达玻璃基板的上部的蚀刻溶液的流量。
由此,通过在刀片的端部形成的弯曲形状,可增加蚀刻溶液宽幅,从而,无需特别考虑刀片和玻璃基板之间的对齐精密度,从而操作更加便利。即,现有的刀片,需要特别注意对齐工艺,以防止蚀刻溶液流量的宽幅不及玻璃基板的宽幅的情况,但本发明通过弯曲的端部扩大了流量宽幅,使得蚀刻溶液充分地覆盖玻璃基板的整个表面,从而,可节省在对齐工艺中花费的时间和精力。
并且,通过扩大蚀刻溶液的幅度及覆盖玻璃基板的整个表面的均匀的流量,提高玻璃基板的减薄的均匀度,并通过增加刀片的厚度,增加了蚀刻溶液的流量,从而,可缩短减薄工艺作业时间,整体上可提高生产效率。
本发明的权利并非限定于如上所述的实施例,而是被所记载的权利要求范围所定义,本发明领域的技术人员在权利要求范围中记载的权利范围内进行各种变形和改动。

Claims (5)

1.一种玻璃基板蚀刻用刀片,使用于以垂直流式蚀刻玻璃基板的减薄工艺的刀片,其特征在于:
所述刀片的端部形成弯曲形状,使得蚀刻溶液沿着刀片的整个长度以均匀的流量流下。
2.根据权利要求1所述的玻璃基板蚀刻用刀片,其特征在于:
所述刀片端部的弯曲形状由波纹凹凸、锯齿凹凸、四角凹凸、菱形凹凸、圆形凹凸形状中的任意一种形成。
3.根据权利要求1或2所述的玻璃基板蚀刻用刀片,其特征在于:
所述凹凸的节距为5至15mm。
4.根据权利要求1或2所述的玻璃基板蚀刻用刀片,其特征在于:
所述刀片的厚度为3至7mm。
5.根据权利要求1或2所述的玻璃基板蚀刻用刀片,其特征在于:
所述刀片具有供蚀刻溶液流入的缝隙,并在内部具有空心的空间,并且在弯曲的端部具有孔或裂缝,从而,使得蚀刻溶液也可通过刀片的外周面和孔或裂缝流入。
CN201310190989.2A 2012-08-09 2013-05-21 玻璃基板蚀刻用刀片 Pending CN103570249A (zh)

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CN101723598A (zh) * 2008-10-22 2010-06-09 株式会社海赈Imp 具有双层管喷嘴的玻璃蚀刻设备

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